
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 7460048
[patent_doc_number] => 20040197679
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-10-07
[patent_title] => 'Photomask blank, photomask, and method of manufacture'
[patent_app_type] => new
[patent_app_number] => 10/811924
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[pdf_file] => publications/A1/0197/20040197679.pdf
[firstpage_image] =>[orig_patent_app_number] => 10811924
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/811924 | Photomask blank, photomask, and method of manufacture | Mar 29, 2004 | Issued |
Array
(
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[patent_doc_number] => 07232629
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[patent_kind] => B2
[patent_issue_date] => 2007-06-19
[patent_title] => 'Method of forming and testing a phase shift mask'
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Array
(
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[patent_doc_number] => 20050214652
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[patent_issue_date] => 2005-09-29
[patent_title] => 'Continuous sloped phase edge architecture fabrication technique using electron or optical beam blur for single phase shift mask ret'
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[patent_app_number] => 10/808063
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[patent_app_date] => 2004-03-26
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/808063 | Continuous sloped phase edge architecture fabrication technique using electron or optical beam blur for single phase shift mask ret | Mar 25, 2004 | Issued |
Array
(
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[patent_doc_number] => 20050214654
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[patent_issue_date] => 2005-09-29
[patent_title] => 'ESD-resistant photomask and method of preventing mask ESD damage'
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[patent_app_number] => 10/810920
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[patent_app_date] => 2004-03-26
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Array
(
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[patent_title] => 'Substrate for photomask, photomask blank and photomask'
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Array
(
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[patent_title] => 'Methods of printing structures'
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Array
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[patent_title] => 'Method of producing phase shift mask blank, method of producing phase shift mask, phase shift mask blank, and phase shift mask'
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[patent_app_number] => 10/806202
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Array
(
[id] => 397469
[patent_doc_number] => 07294438
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[patent_issue_date] => 2007-11-13
[patent_title] => 'Method of producing a reflective mask and method of producing a semiconductor device'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/802886 | Method of producing a reflective mask and method of producing a semiconductor device | Mar 17, 2004 | Issued |
Array
(
[id] => 376904
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/803847 | Embedded attenuated phase shift mask with tunable transmission | Mar 17, 2004 | Issued |
Array
(
[id] => 432134
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[patent_issue_date] => 2007-09-04
[patent_title] => 'Photomask having central and peripheral line patterns'
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[patent_app_number] => 10/802052
[patent_app_country] => US
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/802052 | Photomask having central and peripheral line patterns | Mar 16, 2004 | Issued |
Array
(
[id] => 7404328
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[patent_title] => 'Alternating phase shift mask design with optimized phase shapes'
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Array
(
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Array
(
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Array
(
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Array
(
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Array
(
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Array
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[patent_title] => 'Reflective mask blank having a programmed defect and method of producing the same, reflective mask having a programmed defect and method of producing the same, and substrate for use in producing the reflective mask blank or the reflective mask having a programmed defect'
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Array
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Array
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Array
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