
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 7464062
[patent_doc_number] => 20040166422
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-08-26
[patent_title] => 'Mask and its manufacturing method, exposure, and device fabrication method'
[patent_app_type] => new
[patent_app_number] => 10/783218
[patent_app_country] => US
[patent_app_date] => 2004-02-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 39
[patent_figures_cnt] => 39
[patent_no_of_words] => 14430
[patent_no_of_claims] => 22
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0166/20040166422.pdf
[firstpage_image] =>[orig_patent_app_number] => 10783218
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/783218 | Mask and its manufacturing method, exposure, and device fabrication method | Feb 19, 2004 | Issued |
Array
(
[id] => 648833
[patent_doc_number] => 07115344
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-10-03
[patent_title] => 'Photomask and pattern forming method employing the same'
[patent_app_type] => utility
[patent_app_number] => 10/777060
[patent_app_country] => US
[patent_app_date] => 2004-02-13
[patent_effective_date] => 0000-00-00
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[patent_no_of_words] => 4071
[patent_no_of_claims] => 19
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[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/115/07115344.pdf
[firstpage_image] =>[orig_patent_app_number] => 10777060
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/777060 | Photomask and pattern forming method employing the same | Feb 12, 2004 | Issued |
Array
(
[id] => 7295692
[patent_doc_number] => 20040214094
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-10-28
[patent_title] => 'Photomasks including shadowing elements therein and related methods and systems'
[patent_app_type] => new
[patent_app_number] => 10/775772
[patent_app_country] => US
[patent_app_date] => 2004-02-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
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[patent_no_of_words] => 7175
[patent_no_of_claims] => 70
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0214/20040214094.pdf
[firstpage_image] =>[orig_patent_app_number] => 10775772
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/775772 | Photomasks including shadowing elements therein and related methods and systems | Feb 8, 2004 | Issued |
Array
(
[id] => 532499
[patent_doc_number] => 07175942
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-02-13
[patent_title] => 'Method of conflict avoidance in fabrication of gate-shrink alternating phase shifting masks'
[patent_app_type] => utility
[patent_app_number] => 10/708055
[patent_app_country] => US
[patent_app_date] => 2004-02-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[patent_no_of_words] => 4641
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[pdf_file] => patents/07/175/07175942.pdf
[firstpage_image] =>[orig_patent_app_number] => 10708055
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/708055 | Method of conflict avoidance in fabrication of gate-shrink alternating phase shifting masks | Feb 4, 2004 | Issued |
Array
(
[id] => 7195089
[patent_doc_number] => 20050164099
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-07-28
[patent_title] => 'Method to overcome minimum photomask dimension rules'
[patent_app_type] => utility
[patent_app_number] => 10/767357
[patent_app_country] => US
[patent_app_date] => 2004-01-28
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0164/20050164099.pdf
[firstpage_image] =>[orig_patent_app_number] => 10767357
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/767357 | Method to overcome minimum photomask dimension rules | Jan 27, 2004 | Abandoned |
Array
(
[id] => 472027
[patent_doc_number] => 07229722
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-06-12
[patent_title] => 'Alternating phase shift mask design for high performance circuitry'
[patent_app_type] => utility
[patent_app_number] => 10/707962
[patent_app_country] => US
[patent_app_date] => 2004-01-28
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[pdf_file] => patents/07/229/07229722.pdf
[firstpage_image] =>[orig_patent_app_number] => 10707962
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/707962 | Alternating phase shift mask design for high performance circuitry | Jan 27, 2004 | Issued |
Array
(
[id] => 928379
[patent_doc_number] => 07314689
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-01-01
[patent_title] => 'System and method for processing masks with oblique features'
[patent_app_type] => utility
[patent_app_number] => 10/765531
[patent_app_country] => US
[patent_app_date] => 2004-01-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
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[patent_no_of_words] => 3014
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[pdf_file] => patents/07/314/07314689.pdf
[firstpage_image] =>[orig_patent_app_number] => 10765531
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/765531 | System and method for processing masks with oblique features | Jan 26, 2004 | Issued |
Array
(
[id] => 7677833
[patent_doc_number] => 20040151993
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-08-05
[patent_title] => 'Fabrication method of semiconductor integrated circuit device and mask fabrication method'
[patent_app_type] => new
[patent_app_number] => 10/762548
[patent_app_country] => US
[patent_app_date] => 2004-01-23
[patent_effective_date] => 0000-00-00
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0151/20040151993.pdf
[firstpage_image] =>[orig_patent_app_number] => 10762548
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/762548 | Fabrication method of semiconductor integrated circuit device and mask fabrication method | Jan 22, 2004 | Issued |
Array
(
[id] => 6983145
[patent_doc_number] => 20050153215
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-07-14
[patent_title] => 'Real-time configurable masking'
[patent_app_type] => utility
[patent_app_number] => 10/755875
[patent_app_country] => US
[patent_app_date] => 2004-01-13
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 10755875
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/755875 | Real-time configurable masking | Jan 12, 2004 | Issued |
Array
(
[id] => 6983144
[patent_doc_number] => 20050153214
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-07-14
[patent_title] => 'Single trench repair method with etched quartz for attenuated phase shifting mask'
[patent_app_type] => utility
[patent_app_number] => 10/755500
[patent_app_country] => US
[patent_app_date] => 2004-01-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
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[pdf_file] => publications/A1/0153/20050153214.pdf
[firstpage_image] =>[orig_patent_app_number] => 10755500
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/755500 | Single trench repair method with etched quartz for attenuated phase shifting mask | Jan 11, 2004 | Issued |
Array
(
[id] => 6983142
[patent_doc_number] => 20050153212
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-07-14
[patent_title] => 'SYSTEM AND METHOD OF SMOOTHING MASK SHAPES FOR IMPROVED PLACEMENT OF SUB-RESOLUTION ASSIST FEATURES'
[patent_app_type] => utility
[patent_app_number] => 10/707778
[patent_app_country] => US
[patent_app_date] => 2004-01-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
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[pdf_file] => publications/A1/0153/20050153212.pdf
[firstpage_image] =>[orig_patent_app_number] => 10707778
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/707778 | System and method of smoothing mask shapes for improved placement of sub-resolution assist features | Jan 11, 2004 | Issued |
Array
(
[id] => 6983143
[patent_doc_number] => 20050153213
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-07-14
[patent_title] => 'Method for the repair of defects in photolithographic masks for patterning semiconductor wafers'
[patent_app_type] => utility
[patent_app_number] => 10/753604
[patent_app_country] => US
[patent_app_date] => 2004-01-08
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[firstpage_image] =>[orig_patent_app_number] => 10753604
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/753604 | Method for the repair of defects in photolithographic masks for patterning semiconductor wafers | Jan 7, 2004 | Issued |
Array
(
[id] => 7464049
[patent_doc_number] => 20040166420
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-08-26
[patent_title] => 'Substrate for the micro-lithography and process of manufacturing thereof'
[patent_app_type] => new
[patent_app_number] => 10/753220
[patent_app_country] => US
[patent_app_date] => 2004-01-07
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/753220 | Substrate for the micro-lithography and process of manufacturing thereof | Jan 6, 2004 | Issued |
Array
(
[id] => 516583
[patent_doc_number] => 07189480
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-03-13
[patent_title] => 'Mask used for layer formation and process of making the mask'
[patent_app_type] => utility
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[patent_app_date] => 2004-01-05
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/750975 | Mask used for layer formation and process of making the mask | Jan 4, 2004 | Issued |
Array
(
[id] => 7074626
[patent_doc_number] => 20050147894
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-07-07
[patent_title] => 'Extreme ultraviolet mask with molybdenum phase shifter'
[patent_app_type] => utility
[patent_app_number] => 10/750122
[patent_app_country] => US
[patent_app_date] => 2003-12-31
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/750122 | Extreme ultraviolet mask with molybdenum phase shifter | Dec 30, 2003 | Issued |
Array
(
[id] => 585580
[patent_doc_number] => 07438996
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-10-21
[patent_title] => 'Mask correcting method'
[patent_app_type] => utility
[patent_app_number] => 10/511079
[patent_app_country] => US
[patent_app_date] => 2003-12-19
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/07/438/07438996.pdf
[firstpage_image] =>[orig_patent_app_number] => 10511079
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/511079 | Mask correcting method | Dec 18, 2003 | Issued |
Array
(
[id] => 690164
[patent_doc_number] => 07074528
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[patent_kind] => B2
[patent_issue_date] => 2006-07-11
[patent_title] => 'Effective assist pattern for nested and isolated contacts'
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[patent_app_number] => 10/739423
[patent_app_country] => US
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[firstpage_image] =>[orig_patent_app_number] => 10739423
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/739423 | Effective assist pattern for nested and isolated contacts | Dec 17, 2003 | Issued |
Array
(
[id] => 7219136
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/741932 | Mask and method for producing thereof and a semiconductor device using the same | Dec 17, 2003 | Issued |
Array
(
[id] => 1056241
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[patent_title] => 'Grating test patterns and methods for overlay metrology'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/739660 | Grating test patterns and methods for overlay metrology | Dec 16, 2003 | Issued |
Array
(
[id] => 689043
[patent_doc_number] => 07073969
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[patent_title] => 'Method for fabricating a photomask for an integrated circuit and corresponding photomask'
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[firstpage_image] =>[orig_patent_app_number] => 10736775
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/736775 | Method for fabricating a photomask for an integrated circuit and corresponding photomask | Dec 16, 2003 | Issued |