
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 7103748
[patent_doc_number] => 20050106474
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-05-19
[patent_title] => 'METHOD FOR CONTROLLING LINEWIDTH IN ADVANCED LITHOGRAPHY MASKS USING ELECTROCHEMISTRY'
[patent_app_type] => utility
[patent_app_number] => 10/707034
[patent_app_country] => US
[patent_app_date] => 2003-11-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 2436
[patent_no_of_claims] => 21
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0106/20050106474.pdf
[firstpage_image] =>[orig_patent_app_number] => 10707034
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/707034 | Method for controlling linewidth in advanced lithography masks using electrochemistry | Nov 16, 2003 | Issued |
Array
(
[id] => 432132
[patent_doc_number] => 07264905
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-09-04
[patent_title] => 'Photomask, and method and apparatus for producing the same'
[patent_app_type] => utility
[patent_app_number] => 10/714362
[patent_app_country] => US
[patent_app_date] => 2003-11-17
[patent_effective_date] => 0000-00-00
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[patent_no_of_words] => 15569
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[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/264/07264905.pdf
[firstpage_image] =>[orig_patent_app_number] => 10714362
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/714362 | Photomask, and method and apparatus for producing the same | Nov 16, 2003 | Issued |
Array
(
[id] => 7103747
[patent_doc_number] => 20050106473
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-05-19
[patent_title] => 'OPTICAL PROXIMITY CORRECTION METHOD'
[patent_app_type] => utility
[patent_app_number] => 10/707025
[patent_app_country] => US
[patent_app_date] => 2003-11-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[patent_no_of_words] => 2739
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0106/20050106473.pdf
[firstpage_image] =>[orig_patent_app_number] => 10707025
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/707025 | Optical proximity correction method | Nov 15, 2003 | Issued |
Array
(
[id] => 7465014
[patent_doc_number] => 20040101767
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-05-27
[patent_title] => 'Method and apparatus for dry-etching half-tone phase-shift films, half-tone phase-shift photomasks and method for the preparation thereof, and semiconductor circuits and method for the fabrication thereof'
[patent_app_type] => new
[patent_app_number] => 10/706971
[patent_app_country] => US
[patent_app_date] => 2003-11-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
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[patent_no_of_words] => 9621
[patent_no_of_claims] => 20
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0101/20040101767.pdf
[firstpage_image] =>[orig_patent_app_number] => 10706971
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/706971 | Method and apparatus for dry-etching half-tone phase-shift films, half-tone phase-shift photomasks and method for the preparation thereof, and semiconductor circuits and method for the fabrication thereof | Nov 13, 2003 | Issued |
Array
(
[id] => 7323204
[patent_doc_number] => 20040137340
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-07-15
[patent_title] => 'Method for evaluating photo mask and method for manufacturing semiconductor device'
[patent_app_type] => new
[patent_app_number] => 10/705954
[patent_app_country] => US
[patent_app_date] => 2003-11-13
[patent_effective_date] => 0000-00-00
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0137/20040137340.pdf
[firstpage_image] =>[orig_patent_app_number] => 10705954
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/705954 | Method for evaluating photo mask and method for manufacturing semiconductor device | Nov 12, 2003 | Issued |
Array
(
[id] => 7103746
[patent_doc_number] => 20050106472
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-05-19
[patent_title] => 'ALTERNATING PHASE MASK BUILT BY ADDITIVE FILM DEPOSITION'
[patent_app_type] => utility
[patent_app_number] => 10/707009
[patent_app_country] => US
[patent_app_date] => 2003-11-13
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0106/20050106472.pdf
[firstpage_image] =>[orig_patent_app_number] => 10707009
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/707009 | Alternating phase mask built by additive film deposition | Nov 12, 2003 | Issued |
Array
(
[id] => 499241
[patent_doc_number] => 07205076
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-04-17
[patent_title] => 'Mask for laser irradiation and apparatus for laser crystallization using the same'
[patent_app_type] => utility
[patent_app_number] => 10/705891
[patent_app_country] => US
[patent_app_date] => 2003-11-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 17
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[patent_no_of_words] => 5674
[patent_no_of_claims] => 24
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/205/07205076.pdf
[firstpage_image] =>[orig_patent_app_number] => 10705891
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/705891 | Mask for laser irradiation and apparatus for laser crystallization using the same | Nov 12, 2003 | Issued |
Array
(
[id] => 623350
[patent_doc_number] => 07138212
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-11-21
[patent_title] => 'Method and apparatus for performing model-based layout conversion for use with dipole illumination'
[patent_app_type] => utility
[patent_app_number] => 10/705231
[patent_app_country] => US
[patent_app_date] => 2003-11-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
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[patent_no_of_words] => 7470
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[pdf_file] => patents/07/138/07138212.pdf
[firstpage_image] =>[orig_patent_app_number] => 10705231
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/705231 | Method and apparatus for performing model-based layout conversion for use with dipole illumination | Nov 11, 2003 | Issued |
Array
(
[id] => 7470129
[patent_doc_number] => 20040096753
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-05-20
[patent_title] => 'Mask for laser irradiation, method of manufacturing the same, and apparatus for laser crystallization using the same'
[patent_app_type] => new
[patent_app_number] => 10/704749
[patent_app_country] => US
[patent_app_date] => 2003-11-12
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0096/20040096753.pdf
[firstpage_image] =>[orig_patent_app_number] => 10704749
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/704749 | Mask for laser irradiation, method of manufacturing the same, and apparatus for laser crystallization using the same | Nov 11, 2003 | Issued |
Array
(
[id] => 7620223
[patent_doc_number] => 06942958
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-09-13
[patent_title] => 'Modifying circuitry features in radiation sensitive layers with active secondary exposure masks'
[patent_app_type] => utility
[patent_app_number] => 10/703832
[patent_app_country] => US
[patent_app_date] => 2003-11-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
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[pdf_file] => patents/06/942/06942958.pdf
[firstpage_image] =>[orig_patent_app_number] => 10703832
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/703832 | Modifying circuitry features in radiation sensitive layers with active secondary exposure masks | Nov 6, 2003 | Issued |
Array
(
[id] => 555117
[patent_doc_number] => 07157190
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-01-02
[patent_title] => 'Method for repairing a photolithographic mask, and a photolithographic mask'
[patent_app_type] => utility
[patent_app_number] => 10/703298
[patent_app_country] => US
[patent_app_date] => 2003-11-06
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/07/157/07157190.pdf
[firstpage_image] =>[orig_patent_app_number] => 10703298
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/703298 | Method for repairing a photolithographic mask, and a photolithographic mask | Nov 5, 2003 | Issued |
Array
(
[id] => 7278094
[patent_doc_number] => 20040060471
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-04-01
[patent_title] => 'Device for measuring a rail segment for a magnetic levitation railway'
[patent_app_type] => new
[patent_app_number] => 10/432963
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[firstpage_image] =>[orig_patent_app_number] => 10432963
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/432963 | Device for measuring a rail segment for a magnetic levitation railway | Nov 5, 2003 | Abandoned |
Array
(
[id] => 1128711
[patent_doc_number] => 06782716
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-08-31
[patent_title] => 'Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass'
[patent_app_type] => B2
[patent_app_number] => 10/702266
[patent_app_country] => US
[patent_app_date] => 2003-11-05
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[firstpage_image] =>[orig_patent_app_number] => 10702266
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/702266 | Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass | Nov 4, 2003 | Issued |
Array
(
[id] => 459421
[patent_doc_number] => 07241538
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-07-10
[patent_title] => 'Method for providing representative features for use in inspection of photolithography mask and for use in inspection photo-lithographically developed and/or patterned wafer layers, and products of same'
[patent_app_type] => utility
[patent_app_number] => 10/702527
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[firstpage_image] =>[orig_patent_app_number] => 10702527
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/702527 | Method for providing representative features for use in inspection of photolithography mask and for use in inspection photo-lithographically developed and/or patterned wafer layers, and products of same | Nov 4, 2003 | Issued |
Array
(
[id] => 7406996
[patent_doc_number] => 20040106050
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-06-03
[patent_title] => 'Method of making gratings and phase masks for fiber grating fabrication'
[patent_app_type] => new
[patent_app_number] => 10/701585
[patent_app_country] => US
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[firstpage_image] =>[orig_patent_app_number] => 10701585
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/701585 | Method of making gratings and phase masks for fiber grating fabrication | Nov 4, 2003 | Issued |
Array
(
[id] => 648850
[patent_doc_number] => 07115354
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-10-03
[patent_title] => 'Microfabrication of pattern imprinting'
[patent_app_type] => utility
[patent_app_number] => 10/699873
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[firstpage_image] =>[orig_patent_app_number] => 10699873
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/699873 | Microfabrication of pattern imprinting | Nov 3, 2003 | Issued |
Array
(
[id] => 638921
[patent_doc_number] => RE039349
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[patent_issue_date] => 2006-10-17
[patent_title] => 'Masks for use in optical lithography below 180 nm'
[patent_app_type] => reissue
[patent_app_number] => 10/701023
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/701023 | Masks for use in optical lithography below 180 nm | Nov 3, 2003 | Issued |
Array
(
[id] => 790455
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[patent_issue_date] => 2006-01-10
[patent_title] => 'Extreme ultraviolet (EUV) lithography masks'
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[firstpage_image] =>[orig_patent_app_number] => 10699767
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/699767 | Extreme ultraviolet (EUV) lithography masks | Nov 2, 2003 | Issued |
Array
(
[id] => 935303
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[patent_kind] => B1
[patent_issue_date] => 2005-12-13
[patent_title] => 'Lithographic photomask and method of manufacture to improve photomask test measurement'
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[firstpage_image] =>[orig_patent_app_number] => 10699748
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/699748 | Lithographic photomask and method of manufacture to improve photomask test measurement | Nov 2, 2003 | Issued |
Array
(
[id] => 7116482
[patent_doc_number] => 20050069783
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[patent_kind] => A1
[patent_issue_date] => 2005-03-31
[patent_title] => 'Method and structure for fabricating patterns on phase shift mask for the manufacture of semiconductor wafers'
[patent_app_type] => utility
[patent_app_number] => 10/701035
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[firstpage_image] =>[orig_patent_app_number] => 10701035
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/701035 | Method and structure for fabricating patterns on phase shift mask for the manufacture of semiconductor wafers | Nov 2, 2003 | Issued |