
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 7406991
[patent_doc_number] => 20040106049
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-06-03
[patent_title] => 'Ion-beam deposition process for manufacturing binary photomask blanks'
[patent_app_type] => new
[patent_app_number] => 10/474220
[patent_app_country] => US
[patent_app_date] => 2003-10-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 3511
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 159
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0106/20040106049.pdf
[firstpage_image] =>[orig_patent_app_number] => 10474220
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/474220 | Ion-beam deposition process for manufacturing binary photomask blanks | Oct 1, 2003 | Abandoned |
Array
(
[id] => 7071865
[patent_doc_number] => 20050145131
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-07-07
[patent_title] => 'Marking method and marked molding'
[patent_app_type] => utility
[patent_app_number] => 10/502098
[patent_app_country] => US
[patent_app_date] => 2003-10-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 4035
[patent_no_of_claims] => 2
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0145/20050145131.pdf
[firstpage_image] =>[orig_patent_app_number] => 10502098
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/502098 | Marking method and marked molding | Sep 30, 2003 | Abandoned |
Array
(
[id] => 707172
[patent_doc_number] => 07060401
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2006-06-13
[patent_title] => 'Phase-shift reflective mask for lithography, and method of using and fabricating'
[patent_app_type] => utility
[patent_app_number] => 10/676923
[patent_app_country] => US
[patent_app_date] => 2003-10-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 7
[patent_no_of_words] => 4535
[patent_no_of_claims] => 37
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 64
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/060/07060401.pdf
[firstpage_image] =>[orig_patent_app_number] => 10676923
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/676923 | Phase-shift reflective mask for lithography, and method of using and fabricating | Sep 30, 2003 | Issued |
Array
(
[id] => 5793401
[patent_doc_number] => 20060014082
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-01-19
[patent_title] => 'Method of correcting mask pattern'
[patent_app_type] => utility
[patent_app_number] => 10/529385
[patent_app_country] => US
[patent_app_date] => 2003-09-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 15
[patent_figures_cnt] => 15
[patent_no_of_words] => 5818
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0014/20060014082.pdf
[firstpage_image] =>[orig_patent_app_number] => 10529385
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/529385 | Method of correcting mask pattern | Sep 29, 2003 | Abandoned |
Array
(
[id] => 5710334
[patent_doc_number] => 20060051679
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-03-09
[patent_title] => 'Lithographic method for wiring a side surface of a substrate'
[patent_app_type] => utility
[patent_app_number] => 10/528946
[patent_app_country] => US
[patent_app_date] => 2003-09-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 11
[patent_no_of_words] => 7739
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0051/20060051679.pdf
[firstpage_image] =>[orig_patent_app_number] => 10528946
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/528946 | Lithographic method for wiring a side surface of a substrate | Sep 25, 2003 | Issued |
Array
(
[id] => 7116480
[patent_doc_number] => 20050069781
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-03-31
[patent_title] => 'METHOD OF IMPROVING A RESOLUTION OF CONTACT HOLE PATTERNS BY UTILIZING ALTERNATE PHASE SHIFT PRINCIPLE'
[patent_app_type] => utility
[patent_app_number] => 10/605377
[patent_app_country] => US
[patent_app_date] => 2003-09-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 3722
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0069/20050069781.pdf
[firstpage_image] =>[orig_patent_app_number] => 10605377
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/605377 | Method of improving a resolution of contact hole patterns by utilizing alternate phase shift principle | Sep 24, 2003 | Issued |
Array
(
[id] => 7334331
[patent_doc_number] => 20040131951
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-07-08
[patent_title] => 'Mask, manufacturing method for mask, and manufacturing method for semiconductor device'
[patent_app_type] => new
[patent_app_number] => 10/668245
[patent_app_country] => US
[patent_app_date] => 2003-09-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 12
[patent_no_of_words] => 10288
[patent_no_of_claims] => 47
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 139
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0131/20040131951.pdf
[firstpage_image] =>[orig_patent_app_number] => 10668245
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/668245 | Mask, manufacturing method for mask, and manufacturing method for semiconductor device | Sep 23, 2003 | Issued |
Array
(
[id] => 7010583
[patent_doc_number] => 20050064299
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-03-24
[patent_title] => 'Method for fabricating a mask using a hardmask and method for making a semiconductor device using the same'
[patent_app_type] => utility
[patent_app_number] => 10/668432
[patent_app_country] => US
[patent_app_date] => 2003-09-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 3348
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0064/20050064299.pdf
[firstpage_image] =>[orig_patent_app_number] => 10668432
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/668432 | Method for fabricating a mask using a hardmask and method for making a semiconductor device using the same | Sep 22, 2003 | Issued |
Array
(
[id] => 7303465
[patent_doc_number] => 20040115442
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-06-17
[patent_title] => 'Photomask, in particular alternating phase shift mask, with compensation structure'
[patent_app_type] => new
[patent_app_number] => 10/667552
[patent_app_country] => US
[patent_app_date] => 2003-09-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 4046
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 13
[patent_words_short_claim] => 32
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0115/20040115442.pdf
[firstpage_image] =>[orig_patent_app_number] => 10667552
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/667552 | Photomask, in particular alternating phase shift mask, with compensation structure | Sep 21, 2003 | Issued |
Array
(
[id] => 913856
[patent_doc_number] => 07326502
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-02-05
[patent_title] => 'Multilayer coatings for EUV mask substrates'
[patent_app_type] => utility
[patent_app_number] => 10/665416
[patent_app_country] => US
[patent_app_date] => 2003-09-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 5
[patent_no_of_words] => 2279
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 82
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/326/07326502.pdf
[firstpage_image] =>[orig_patent_app_number] => 10665416
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/665416 | Multilayer coatings for EUV mask substrates | Sep 17, 2003 | Issued |
Array
(
[id] => 259834
[patent_doc_number] => 07572556
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-08-11
[patent_title] => 'Masks, lithography device and semiconductor component'
[patent_app_type] => utility
[patent_app_number] => 10/572149
[patent_app_country] => US
[patent_app_date] => 2003-09-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 15
[patent_no_of_words] => 3939
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 51
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/572/07572556.pdf
[firstpage_image] =>[orig_patent_app_number] => 10572149
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/572149 | Masks, lithography device and semiconductor component | Sep 16, 2003 | Issued |
Array
(
[id] => 337841
[patent_doc_number] => 07504182
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-03-17
[patent_title] => 'Photolithography mask repair'
[patent_app_type] => utility
[patent_app_number] => 10/664247
[patent_app_country] => US
[patent_app_date] => 2003-09-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 3
[patent_no_of_words] => 5311
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 76
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/504/07504182.pdf
[firstpage_image] =>[orig_patent_app_number] => 10664247
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/664247 | Photolithography mask repair | Sep 16, 2003 | Issued |
Array
(
[id] => 7448026
[patent_doc_number] => 20040067423
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-04-08
[patent_title] => 'Hybrid phase-shift mask'
[patent_app_type] => new
[patent_app_number] => 10/662365
[patent_app_country] => US
[patent_app_date] => 2003-09-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
[patent_figures_cnt] => 13
[patent_no_of_words] => 9499
[patent_no_of_claims] => 35
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 57
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0067/20040067423.pdf
[firstpage_image] =>[orig_patent_app_number] => 10662365
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/662365 | Hybrid phase-shift mask | Sep 15, 2003 | Issued |
Array
(
[id] => 7439957
[patent_doc_number] => 20040066569
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-04-08
[patent_title] => 'Crystallization apparatus, crystallization method, and phase shift mask and filter for use in these apparatus and method'
[patent_app_type] => new
[patent_app_number] => 10/661600
[patent_app_country] => US
[patent_app_date] => 2003-09-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 10
[patent_no_of_words] => 11645
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 45
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0066/20040066569.pdf
[firstpage_image] =>[orig_patent_app_number] => 10661600
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/661600 | Crystallization apparatus, crystallization method, and phase shift mask and filter for use in these apparatus and method | Sep 14, 2003 | Issued |
Array
(
[id] => 7127168
[patent_doc_number] => 20050058912
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-03-17
[patent_title] => 'Half tone alternating phase shift masks'
[patent_app_type] => utility
[patent_app_number] => 10/661048
[patent_app_country] => US
[patent_app_date] => 2003-09-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 16
[patent_no_of_words] => 7155
[patent_no_of_claims] => 57
[patent_no_of_ind_claims] => 10
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0058/20050058912.pdf
[firstpage_image] =>[orig_patent_app_number] => 10661048
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/661048 | Half tone alternating phase shift masks | Sep 12, 2003 | Issued |
Array
(
[id] => 630241
[patent_doc_number] => 07132201
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-11-07
[patent_title] => 'Transparent amorphous carbon structure in semiconductor devices'
[patent_app_type] => utility
[patent_app_number] => 10/661379
[patent_app_country] => US
[patent_app_date] => 2003-09-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 18
[patent_figures_cnt] => 25
[patent_no_of_words] => 5930
[patent_no_of_claims] => 40
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 61
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/132/07132201.pdf
[firstpage_image] =>[orig_patent_app_number] => 10661379
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/661379 | Transparent amorphous carbon structure in semiconductor devices | Sep 11, 2003 | Issued |
Array
(
[id] => 719338
[patent_doc_number] => 07049034
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-05-23
[patent_title] => 'Photomask having an internal substantially transparent etch stop layer'
[patent_app_type] => utility
[patent_app_number] => 10/658039
[patent_app_country] => US
[patent_app_date] => 2003-09-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 12
[patent_no_of_words] => 5540
[patent_no_of_claims] => 35
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 57
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/049/07049034.pdf
[firstpage_image] =>[orig_patent_app_number] => 10658039
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/658039 | Photomask having an internal substantially transparent etch stop layer | Sep 8, 2003 | Issued |
Array
(
[id] => 532491
[patent_doc_number] => 07175941
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-02-13
[patent_title] => 'Phase shift assignments for alternate PSM'
[patent_app_type] => utility
[patent_app_number] => 10/657503
[patent_app_country] => US
[patent_app_date] => 2003-09-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 11
[patent_no_of_words] => 2243
[patent_no_of_claims] => 38
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 115
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/175/07175941.pdf
[firstpage_image] =>[orig_patent_app_number] => 10657503
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/657503 | Phase shift assignments for alternate PSM | Sep 7, 2003 | Issued |
Array
(
[id] => 7210162
[patent_doc_number] => 20050053845
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-03-10
[patent_title] => 'Attenuating phase shift mask blank and photomask'
[patent_app_type] => utility
[patent_app_number] => 10/655593
[patent_app_country] => US
[patent_app_date] => 2003-09-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 10
[patent_no_of_words] => 9403
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0053/20050053845.pdf
[firstpage_image] =>[orig_patent_app_number] => 10655593
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/655593 | Attenuating phase shift mask blank and photomask | Sep 4, 2003 | Issued |
Array
(
[id] => 686420
[patent_doc_number] => 07078135
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-07-18
[patent_title] => 'Method for patterning a mask layer and semiconductor product'
[patent_app_type] => utility
[patent_app_number] => 10/653589
[patent_app_country] => US
[patent_app_date] => 2003-09-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 9
[patent_no_of_words] => 5017
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 153
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/078/07078135.pdf
[firstpage_image] =>[orig_patent_app_number] => 10653589
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/653589 | Method for patterning a mask layer and semiconductor product | Sep 1, 2003 | Issued |