
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 765808
[patent_doc_number] => 07008735
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-03-07
[patent_title] => 'Mask for improving lithography performance by using multi-transmittance photomask'
[patent_app_type] => utility
[patent_app_number] => 10/653390
[patent_app_country] => US
[patent_app_date] => 2003-09-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 15
[patent_no_of_words] => 4197
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 80
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/008/07008735.pdf
[firstpage_image] =>[orig_patent_app_number] => 10653390
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/653390 | Mask for improving lithography performance by using multi-transmittance photomask | Sep 1, 2003 | Issued |
Array
(
[id] => 7334330
[patent_doc_number] => 20040131950
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-07-08
[patent_title] => 'Mask for projecting a structure pattern onto a semiconductor substrate'
[patent_app_type] => new
[patent_app_number] => 10/653537
[patent_app_country] => US
[patent_app_date] => 2003-09-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 4022
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 138
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0131/20040131950.pdf
[firstpage_image] =>[orig_patent_app_number] => 10653537
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/653537 | Mask for projecting a structure pattern onto a semiconductor substrate | Sep 1, 2003 | Issued |
Array
(
[id] => 7080152
[patent_doc_number] => 20050045584
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-03-03
[patent_title] => 'Method for repair of photomasks'
[patent_app_type] => utility
[patent_app_number] => 10/652843
[patent_app_country] => US
[patent_app_date] => 2003-08-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 1688
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0045/20050045584.pdf
[firstpage_image] =>[orig_patent_app_number] => 10652843
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/652843 | Method for repair of photomasks | Aug 28, 2003 | Issued |
Array
(
[id] => 7201850
[patent_doc_number] => 20050042524
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-02-24
[patent_title] => 'Process for making hard pellicles'
[patent_app_type] => utility
[patent_app_number] => 10/646409
[patent_app_country] => US
[patent_app_date] => 2003-08-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 7705
[patent_no_of_claims] => 23
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0042/20050042524.pdf
[firstpage_image] =>[orig_patent_app_number] => 10646409
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/646409 | Process for making hard pellicles | Aug 21, 2003 | Abandoned |
Array
(
[id] => 6905402
[patent_doc_number] => 20050100797
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-05-12
[patent_title] => 'Method of manufacturing a reflection type mask blank and method of manufacturing a reflection type mask'
[patent_app_type] => utility
[patent_app_number] => 10/644964
[patent_app_country] => US
[patent_app_date] => 2003-08-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 11157
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0100/20050100797.pdf
[firstpage_image] =>[orig_patent_app_number] => 10644964
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/644964 | Method of manufacturing a reflection type mask blank and method of manufacturing a reflection type mask | Aug 20, 2003 | Issued |
Array
(
[id] => 7199711
[patent_doc_number] => 20050042153
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-02-24
[patent_title] => 'Extreme ultraviolet pellicle using a thin film and supportive mesh'
[patent_app_type] => utility
[patent_app_number] => 10/645877
[patent_app_country] => US
[patent_app_date] => 2003-08-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 2523
[patent_no_of_claims] => 31
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0042/20050042153.pdf
[firstpage_image] =>[orig_patent_app_number] => 10645877
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/645877 | Extreme ultraviolet pellicle using a thin film and supportive mesh | Aug 19, 2003 | Issued |
Array
(
[id] => 7427236
[patent_doc_number] => 20040161677
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-08-19
[patent_title] => 'Phase shift mask, method for forming pattern using phase shift mask and manufacturing method for electronic device'
[patent_app_type] => new
[patent_app_number] => 10/638339
[patent_app_country] => US
[patent_app_date] => 2003-08-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 11
[patent_no_of_words] => 5713
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 147
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0161/20040161677.pdf
[firstpage_image] =>[orig_patent_app_number] => 10638339
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/638339 | Phase shift mask, method for forming pattern using phase shift mask and manufacturing method for electronic device | Aug 11, 2003 | Issued |
Array
(
[id] => 707170
[patent_doc_number] => 07060400
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-06-13
[patent_title] => 'Method to improve photomask critical dimension uniformity and photomask fabrication process'
[patent_app_type] => utility
[patent_app_number] => 10/637347
[patent_app_country] => US
[patent_app_date] => 2003-08-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 16
[patent_no_of_words] => 2553
[patent_no_of_claims] => 26
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 107
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/060/07060400.pdf
[firstpage_image] =>[orig_patent_app_number] => 10637347
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/637347 | Method to improve photomask critical dimension uniformity and photomask fabrication process | Aug 7, 2003 | Issued |
Array
(
[id] => 7160020
[patent_doc_number] => 20050027905
[patent_country] => US
[patent_kind] => A9
[patent_issue_date] => 2005-02-03
[patent_title] => 'Reflective mirror for lithographic exposure and production method'
[patent_app_type] => utility
[patent_app_number] => 10/632752
[patent_app_country] => US
[patent_app_date] => 2003-08-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 4061
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A9/0027/20050027905.pdf
[firstpage_image] =>[orig_patent_app_number] => 10632752
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/632752 | Reflective mirror for lithographic exposure and production method | Jul 31, 2003 | Issued |
Array
(
[id] => 7160020
[patent_doc_number] => 20050027905
[patent_country] => US
[patent_kind] => A9
[patent_issue_date] => 2005-02-03
[patent_title] => 'Reflective mirror for lithographic exposure and production method'
[patent_app_type] => utility
[patent_app_number] => 10/632752
[patent_app_country] => US
[patent_app_date] => 2003-08-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 4061
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A9/0027/20050027905.pdf
[firstpage_image] =>[orig_patent_app_number] => 10632752
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/632752 | Reflective mirror for lithographic exposure and production method | Jul 31, 2003 | Issued |
Array
(
[id] => 777043
[patent_doc_number] => 06998202
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-02-14
[patent_title] => 'Multilayer reflective extreme ultraviolet lithography mask blanks'
[patent_app_type] => utility
[patent_app_number] => 10/631171
[patent_app_country] => US
[patent_app_date] => 2003-07-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 1193
[patent_no_of_claims] => 28
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 27
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/998/06998202.pdf
[firstpage_image] =>[orig_patent_app_number] => 10631171
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/631171 | Multilayer reflective extreme ultraviolet lithography mask blanks | Jul 30, 2003 | Issued |
Array
(
[id] => 7153272
[patent_doc_number] => 20050025959
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-02-03
[patent_title] => 'Hard pellicle and fabrication thereof'
[patent_app_type] => utility
[patent_app_number] => 10/632363
[patent_app_country] => US
[patent_app_date] => 2003-07-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 7828
[patent_no_of_claims] => 23
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0025/20050025959.pdf
[firstpage_image] =>[orig_patent_app_number] => 10632363
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/632363 | Hard pellicle and fabrication thereof | Jul 30, 2003 | Abandoned |
Array
(
[id] => 1002262
[patent_doc_number] => 06908715
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-06-21
[patent_title] => 'Multi-layer, attenuated phase-shifting mask'
[patent_app_type] => utility
[patent_app_number] => 10/629641
[patent_app_country] => US
[patent_app_date] => 2003-07-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 19
[patent_no_of_words] => 6528
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 99
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/908/06908715.pdf
[firstpage_image] =>[orig_patent_app_number] => 10629641
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/629641 | Multi-layer, attenuated phase-shifting mask | Jul 28, 2003 | Issued |
Array
(
[id] => 633954
[patent_doc_number] => 07129010
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-10-31
[patent_title] => 'Substrates for in particular microlithography'
[patent_app_type] => utility
[patent_app_number] => 10/628059
[patent_app_country] => US
[patent_app_date] => 2003-07-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 3
[patent_no_of_words] => 5523
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 79
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/129/07129010.pdf
[firstpage_image] =>[orig_patent_app_number] => 10628059
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/628059 | Substrates for in particular microlithography | Jul 24, 2003 | Issued |
Array
(
[id] => 7427222
[patent_doc_number] => 20040161676
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-08-19
[patent_title] => 'Crystallization apparatus, crystallization method, thin film transistor and display apparatus'
[patent_app_type] => new
[patent_app_number] => 10/624555
[patent_app_country] => US
[patent_app_date] => 2003-07-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 16
[patent_no_of_words] => 15819
[patent_no_of_claims] => 31
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 135
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0161/20040161676.pdf
[firstpage_image] =>[orig_patent_app_number] => 10624555
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/624555 | Crystallization apparatus, crystallization method, thin film transistor and display apparatus | Jul 22, 2003 | Issued |
Array
(
[id] => 7025279
[patent_doc_number] => 20050019673
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-01-27
[patent_title] => 'Attenuated film with etched quartz phase shift mask'
[patent_app_type] => utility
[patent_app_number] => 10/624662
[patent_app_country] => US
[patent_app_date] => 2003-07-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 1467
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0019/20050019673.pdf
[firstpage_image] =>[orig_patent_app_number] => 10624662
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/624662 | Attenuated film with etched quartz phase shift mask | Jul 21, 2003 | Abandoned |
Array
(
[id] => 7448020
[patent_doc_number] => 20040067422
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-04-08
[patent_title] => 'Photomask having a transparency-adjusting layer, method of manufacturing the photomask, and exposure method using the photomask'
[patent_app_type] => new
[patent_app_number] => 10/623616
[patent_app_country] => US
[patent_app_date] => 2003-07-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
[patent_figures_cnt] => 14
[patent_no_of_words] => 10016
[patent_no_of_claims] => 36
[patent_no_of_ind_claims] => 7
[patent_words_short_claim] => 225
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0067/20040067422.pdf
[firstpage_image] =>[orig_patent_app_number] => 10623616
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/623616 | Photomask having a transparency-adjusting layer, method of manufacturing the photomask, and exposure method using the photomask | Jul 21, 2003 | Issued |
Array
(
[id] => 7122246
[patent_doc_number] => 20050014075
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-01-20
[patent_title] => 'Phase edge darkening binary masks'
[patent_app_type] => utility
[patent_app_number] => 10/623344
[patent_app_country] => US
[patent_app_date] => 2003-07-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 1397
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0014/20050014075.pdf
[firstpage_image] =>[orig_patent_app_number] => 10623344
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/623344 | Phase edge darkening binary masks | Jul 17, 2003 | Abandoned |
Array
(
[id] => 1115039
[patent_doc_number] => 06800406
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-10-05
[patent_title] => 'Method of generating optical assist features for two-mask exposure lithography'
[patent_app_type] => B2
[patent_app_number] => 10/622995
[patent_app_country] => US
[patent_app_date] => 2003-07-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 3544
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 101
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/800/06800406.pdf
[firstpage_image] =>[orig_patent_app_number] => 10622995
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/622995 | Method of generating optical assist features for two-mask exposure lithography | Jul 17, 2003 | Issued |
Array
(
[id] => 7232840
[patent_doc_number] => 20050079425
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-04-14
[patent_title] => 'Method for correcting local loading effects in the etching of photomasks'
[patent_app_type] => utility
[patent_app_number] => 10/621535
[patent_app_country] => US
[patent_app_date] => 2003-07-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 1782
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0079/20050079425.pdf
[firstpage_image] =>[orig_patent_app_number] => 10621535
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/621535 | Method for correcting local loading effects in the etching of photomasks | Jul 16, 2003 | Issued |