Search

Liliana Di Nola Baron

Examiner (ID: 15438)

Most Active Art Unit
1615
Art Unit(s)
1615
Total Applications
361
Issued Applications
209
Pending Applications
88
Abandoned Applications
63

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 765808 [patent_doc_number] => 07008735 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-03-07 [patent_title] => 'Mask for improving lithography performance by using multi-transmittance photomask' [patent_app_type] => utility [patent_app_number] => 10/653390 [patent_app_country] => US [patent_app_date] => 2003-09-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 15 [patent_no_of_words] => 4197 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 80 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/008/07008735.pdf [firstpage_image] =>[orig_patent_app_number] => 10653390 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/653390
Mask for improving lithography performance by using multi-transmittance photomask Sep 1, 2003 Issued
Array ( [id] => 7334330 [patent_doc_number] => 20040131950 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-07-08 [patent_title] => 'Mask for projecting a structure pattern onto a semiconductor substrate' [patent_app_type] => new [patent_app_number] => 10/653537 [patent_app_country] => US [patent_app_date] => 2003-09-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 4022 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 138 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0131/20040131950.pdf [firstpage_image] =>[orig_patent_app_number] => 10653537 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/653537
Mask for projecting a structure pattern onto a semiconductor substrate Sep 1, 2003 Issued
Array ( [id] => 7080152 [patent_doc_number] => 20050045584 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-03-03 [patent_title] => 'Method for repair of photomasks' [patent_app_type] => utility [patent_app_number] => 10/652843 [patent_app_country] => US [patent_app_date] => 2003-08-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 1688 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0045/20050045584.pdf [firstpage_image] =>[orig_patent_app_number] => 10652843 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/652843
Method for repair of photomasks Aug 28, 2003 Issued
Array ( [id] => 7201850 [patent_doc_number] => 20050042524 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-02-24 [patent_title] => 'Process for making hard pellicles' [patent_app_type] => utility [patent_app_number] => 10/646409 [patent_app_country] => US [patent_app_date] => 2003-08-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 7705 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0042/20050042524.pdf [firstpage_image] =>[orig_patent_app_number] => 10646409 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/646409
Process for making hard pellicles Aug 21, 2003 Abandoned
Array ( [id] => 6905402 [patent_doc_number] => 20050100797 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-05-12 [patent_title] => 'Method of manufacturing a reflection type mask blank and method of manufacturing a reflection type mask' [patent_app_type] => utility [patent_app_number] => 10/644964 [patent_app_country] => US [patent_app_date] => 2003-08-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 11157 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0100/20050100797.pdf [firstpage_image] =>[orig_patent_app_number] => 10644964 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/644964
Method of manufacturing a reflection type mask blank and method of manufacturing a reflection type mask Aug 20, 2003 Issued
Array ( [id] => 7199711 [patent_doc_number] => 20050042153 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-02-24 [patent_title] => 'Extreme ultraviolet pellicle using a thin film and supportive mesh' [patent_app_type] => utility [patent_app_number] => 10/645877 [patent_app_country] => US [patent_app_date] => 2003-08-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 2523 [patent_no_of_claims] => 31 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0042/20050042153.pdf [firstpage_image] =>[orig_patent_app_number] => 10645877 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/645877
Extreme ultraviolet pellicle using a thin film and supportive mesh Aug 19, 2003 Issued
Array ( [id] => 7427236 [patent_doc_number] => 20040161677 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-08-19 [patent_title] => 'Phase shift mask, method for forming pattern using phase shift mask and manufacturing method for electronic device' [patent_app_type] => new [patent_app_number] => 10/638339 [patent_app_country] => US [patent_app_date] => 2003-08-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 11 [patent_no_of_words] => 5713 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 147 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0161/20040161677.pdf [firstpage_image] =>[orig_patent_app_number] => 10638339 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/638339
Phase shift mask, method for forming pattern using phase shift mask and manufacturing method for electronic device Aug 11, 2003 Issued
Array ( [id] => 707170 [patent_doc_number] => 07060400 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-06-13 [patent_title] => 'Method to improve photomask critical dimension uniformity and photomask fabrication process' [patent_app_type] => utility [patent_app_number] => 10/637347 [patent_app_country] => US [patent_app_date] => 2003-08-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 16 [patent_no_of_words] => 2553 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 107 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/060/07060400.pdf [firstpage_image] =>[orig_patent_app_number] => 10637347 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/637347
Method to improve photomask critical dimension uniformity and photomask fabrication process Aug 7, 2003 Issued
Array ( [id] => 7160020 [patent_doc_number] => 20050027905 [patent_country] => US [patent_kind] => A9 [patent_issue_date] => 2005-02-03 [patent_title] => 'Reflective mirror for lithographic exposure and production method' [patent_app_type] => utility [patent_app_number] => 10/632752 [patent_app_country] => US [patent_app_date] => 2003-08-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 4061 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A9/0027/20050027905.pdf [firstpage_image] =>[orig_patent_app_number] => 10632752 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/632752
Reflective mirror for lithographic exposure and production method Jul 31, 2003 Issued
Array ( [id] => 7160020 [patent_doc_number] => 20050027905 [patent_country] => US [patent_kind] => A9 [patent_issue_date] => 2005-02-03 [patent_title] => 'Reflective mirror for lithographic exposure and production method' [patent_app_type] => utility [patent_app_number] => 10/632752 [patent_app_country] => US [patent_app_date] => 2003-08-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 4061 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A9/0027/20050027905.pdf [firstpage_image] =>[orig_patent_app_number] => 10632752 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/632752
Reflective mirror for lithographic exposure and production method Jul 31, 2003 Issued
Array ( [id] => 777043 [patent_doc_number] => 06998202 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-02-14 [patent_title] => 'Multilayer reflective extreme ultraviolet lithography mask blanks' [patent_app_type] => utility [patent_app_number] => 10/631171 [patent_app_country] => US [patent_app_date] => 2003-07-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 1193 [patent_no_of_claims] => 28 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 27 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/998/06998202.pdf [firstpage_image] =>[orig_patent_app_number] => 10631171 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/631171
Multilayer reflective extreme ultraviolet lithography mask blanks Jul 30, 2003 Issued
Array ( [id] => 7153272 [patent_doc_number] => 20050025959 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-02-03 [patent_title] => 'Hard pellicle and fabrication thereof' [patent_app_type] => utility [patent_app_number] => 10/632363 [patent_app_country] => US [patent_app_date] => 2003-07-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 7828 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0025/20050025959.pdf [firstpage_image] =>[orig_patent_app_number] => 10632363 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/632363
Hard pellicle and fabrication thereof Jul 30, 2003 Abandoned
Array ( [id] => 1002262 [patent_doc_number] => 06908715 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2005-06-21 [patent_title] => 'Multi-layer, attenuated phase-shifting mask' [patent_app_type] => utility [patent_app_number] => 10/629641 [patent_app_country] => US [patent_app_date] => 2003-07-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 19 [patent_no_of_words] => 6528 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 99 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/908/06908715.pdf [firstpage_image] =>[orig_patent_app_number] => 10629641 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/629641
Multi-layer, attenuated phase-shifting mask Jul 28, 2003 Issued
Array ( [id] => 633954 [patent_doc_number] => 07129010 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-10-31 [patent_title] => 'Substrates for in particular microlithography' [patent_app_type] => utility [patent_app_number] => 10/628059 [patent_app_country] => US [patent_app_date] => 2003-07-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 3 [patent_no_of_words] => 5523 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 79 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/129/07129010.pdf [firstpage_image] =>[orig_patent_app_number] => 10628059 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/628059
Substrates for in particular microlithography Jul 24, 2003 Issued
Array ( [id] => 7427222 [patent_doc_number] => 20040161676 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-08-19 [patent_title] => 'Crystallization apparatus, crystallization method, thin film transistor and display apparatus' [patent_app_type] => new [patent_app_number] => 10/624555 [patent_app_country] => US [patent_app_date] => 2003-07-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 16 [patent_figures_cnt] => 16 [patent_no_of_words] => 15819 [patent_no_of_claims] => 31 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 135 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0161/20040161676.pdf [firstpage_image] =>[orig_patent_app_number] => 10624555 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/624555
Crystallization apparatus, crystallization method, thin film transistor and display apparatus Jul 22, 2003 Issued
Array ( [id] => 7025279 [patent_doc_number] => 20050019673 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-01-27 [patent_title] => 'Attenuated film with etched quartz phase shift mask' [patent_app_type] => utility [patent_app_number] => 10/624662 [patent_app_country] => US [patent_app_date] => 2003-07-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 1467 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0019/20050019673.pdf [firstpage_image] =>[orig_patent_app_number] => 10624662 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/624662
Attenuated film with etched quartz phase shift mask Jul 21, 2003 Abandoned
Array ( [id] => 7448020 [patent_doc_number] => 20040067422 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-04-08 [patent_title] => 'Photomask having a transparency-adjusting layer, method of manufacturing the photomask, and exposure method using the photomask' [patent_app_type] => new [patent_app_number] => 10/623616 [patent_app_country] => US [patent_app_date] => 2003-07-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 14 [patent_no_of_words] => 10016 [patent_no_of_claims] => 36 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 225 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0067/20040067422.pdf [firstpage_image] =>[orig_patent_app_number] => 10623616 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/623616
Photomask having a transparency-adjusting layer, method of manufacturing the photomask, and exposure method using the photomask Jul 21, 2003 Issued
Array ( [id] => 7122246 [patent_doc_number] => 20050014075 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-01-20 [patent_title] => 'Phase edge darkening binary masks' [patent_app_type] => utility [patent_app_number] => 10/623344 [patent_app_country] => US [patent_app_date] => 2003-07-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 1397 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0014/20050014075.pdf [firstpage_image] =>[orig_patent_app_number] => 10623344 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/623344
Phase edge darkening binary masks Jul 17, 2003 Abandoned
Array ( [id] => 1115039 [patent_doc_number] => 06800406 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-10-05 [patent_title] => 'Method of generating optical assist features for two-mask exposure lithography' [patent_app_type] => B2 [patent_app_number] => 10/622995 [patent_app_country] => US [patent_app_date] => 2003-07-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 3544 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 101 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/800/06800406.pdf [firstpage_image] =>[orig_patent_app_number] => 10622995 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/622995
Method of generating optical assist features for two-mask exposure lithography Jul 17, 2003 Issued
Array ( [id] => 7232840 [patent_doc_number] => 20050079425 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-04-14 [patent_title] => 'Method for correcting local loading effects in the etching of photomasks' [patent_app_type] => utility [patent_app_number] => 10/621535 [patent_app_country] => US [patent_app_date] => 2003-07-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 1782 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0079/20050079425.pdf [firstpage_image] =>[orig_patent_app_number] => 10621535 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/621535
Method for correcting local loading effects in the etching of photomasks Jul 16, 2003 Issued
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