
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 619793
[patent_doc_number] => 07141337
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-11-28
[patent_title] => 'Phase shift mask'
[patent_app_type] => utility
[patent_app_number] => 10/249372
[patent_app_country] => US
[patent_app_date] => 2003-04-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 1980
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 137
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/141/07141337.pdf
[firstpage_image] =>[orig_patent_app_number] => 10249372
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/249372 | Phase shift mask | Apr 2, 2003 | Issued |
Array
(
[id] => 6808935
[patent_doc_number] => 20030198874
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-10-23
[patent_title] => 'Reflection photomasks with a capping layer and methods for manufacturing the same'
[patent_app_type] => new
[patent_app_number] => 10/404398
[patent_app_country] => US
[patent_app_date] => 2003-04-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 5034
[patent_no_of_claims] => 49
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 53
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0198/20030198874.pdf
[firstpage_image] =>[orig_patent_app_number] => 10404398
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/404398 | Reflection photomasks with a capping layer and methods for manufacturing the same | Mar 31, 2003 | Issued |
Array
(
[id] => 7342880
[patent_doc_number] => 20040191638
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-09-30
[patent_title] => 'LAYOUT IMPACT REDUCTION WITH ANGLED PHASE SHAPES'
[patent_app_type] => new
[patent_app_number] => 10/249317
[patent_app_country] => US
[patent_app_date] => 2003-03-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 3688
[patent_no_of_claims] => 28
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 91
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0191/20040191638.pdf
[firstpage_image] =>[orig_patent_app_number] => 10249317
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/249317 | Layout impact reduction with angled phase shapes | Mar 30, 2003 | Issued |
Array
(
[id] => 7342891
[patent_doc_number] => 20040191642
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-09-30
[patent_title] => 'Multiple stepped aperture repair of transparent photomask substrates'
[patent_app_type] => new
[patent_app_number] => 10/402196
[patent_app_country] => US
[patent_app_date] => 2003-03-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 2755
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 50
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0191/20040191642.pdf
[firstpage_image] =>[orig_patent_app_number] => 10402196
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/402196 | Multiple stepped aperture repair of transparent photomask substrates | Mar 27, 2003 | Issued |
Array
(
[id] => 6821494
[patent_doc_number] => 20030219655
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-11-27
[patent_title] => 'Photomask having a focus monitor pattern'
[patent_app_type] => new
[patent_app_number] => 10/396309
[patent_app_country] => US
[patent_app_date] => 2003-03-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 16
[patent_no_of_words] => 11834
[patent_no_of_claims] => 25
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 113
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0219/20030219655.pdf
[firstpage_image] =>[orig_patent_app_number] => 10396309
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/396309 | Photomask having a focus monitor pattern | Mar 25, 2003 | Issued |
Array
(
[id] => 1037362
[patent_doc_number] => 06872510
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-03-29
[patent_title] => 'Photomask having small pitch images of openings for fabricating openings in a semiconductor memory device and a photolithographic method for fabricating the same'
[patent_app_type] => utility
[patent_app_number] => 10/391909
[patent_app_country] => US
[patent_app_date] => 2003-03-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 10
[patent_no_of_words] => 3248
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 205
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/872/06872510.pdf
[firstpage_image] =>[orig_patent_app_number] => 10391909
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/391909 | Photomask having small pitch images of openings for fabricating openings in a semiconductor memory device and a photolithographic method for fabricating the same | Mar 18, 2003 | Issued |
Array
(
[id] => 7439350
[patent_doc_number] => 20040185348
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-09-23
[patent_title] => 'Alternating aperture phase shift photomask having light absorption layer'
[patent_app_type] => new
[patent_app_number] => 10/391001
[patent_app_country] => US
[patent_app_date] => 2003-03-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 11
[patent_no_of_words] => 5553
[patent_no_of_claims] => 38
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 111
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0185/20040185348.pdf
[firstpage_image] =>[orig_patent_app_number] => 10391001
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/391001 | Alternating aperture phase shift photomask having light absorption layer | Mar 17, 2003 | Issued |
Array
(
[id] => 6809185
[patent_doc_number] => 20030199124
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-10-23
[patent_title] => 'Photomask and pattern forming method'
[patent_app_type] => new
[patent_app_number] => 10/390948
[patent_app_country] => US
[patent_app_date] => 2003-03-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 4662
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 170
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0199/20030199124.pdf
[firstpage_image] =>[orig_patent_app_number] => 10390948
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/390948 | Photomask and pattern forming method | Mar 16, 2003 | Issued |
Array
(
[id] => 6825144
[patent_doc_number] => 20030235766
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-12-25
[patent_title] => 'Method of designing phase grating pattern for use in modifying illumination in an exposure process, and method of manufacturing a photo mask system having the phase grating pattern'
[patent_app_type] => new
[patent_app_number] => 10/384540
[patent_app_country] => US
[patent_app_date] => 2003-03-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 4670
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 217
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0235/20030235766.pdf
[firstpage_image] =>[orig_patent_app_number] => 10384540
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/384540 | Method of designing phase grating pattern for use in modifying illumination in an exposure process, and method of manufacturing a photo mask system having the phase grating pattern | Mar 10, 2003 | Issued |
Array
(
[id] => 6829574
[patent_doc_number] => 20030180632
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-09-25
[patent_title] => 'Mask for use in lithography, method of making a mask, lithographic apparatus, and device manufacturing method'
[patent_app_type] => new
[patent_app_number] => 10/379999
[patent_app_country] => US
[patent_app_date] => 2003-03-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 5931
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 68
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0180/20030180632.pdf
[firstpage_image] =>[orig_patent_app_number] => 10379999
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/379999 | Mask for use in lithography, method of making a mask, lithographic apparatus, and device manufacturing method | Mar 5, 2003 | Issued |
Array
(
[id] => 7404292
[patent_doc_number] => 20040175630
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-09-09
[patent_title] => 'Method of patterning photoresist on a wafer using a reflective mask with a multi-layer ARC'
[patent_app_type] => new
[patent_app_number] => 10/377847
[patent_app_country] => US
[patent_app_date] => 2003-03-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 2444
[patent_no_of_claims] => 30
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 98
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0175/20040175630.pdf
[firstpage_image] =>[orig_patent_app_number] => 10377847
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/377847 | Method of patterning photoresist on a wafer using a reflective mask with a multi-layer ARC | Mar 2, 2003 | Issued |
Array
(
[id] => 1034337
[patent_doc_number] => 06875546
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-04-05
[patent_title] => 'Method of patterning photoresist on a wafer using an attenuated phase shift mask'
[patent_app_type] => utility
[patent_app_number] => 10/377844
[patent_app_country] => US
[patent_app_date] => 2003-03-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 3
[patent_no_of_words] => 2113
[patent_no_of_claims] => 30
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 63
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/875/06875546.pdf
[firstpage_image] =>[orig_patent_app_number] => 10377844
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/377844 | Method of patterning photoresist on a wafer using an attenuated phase shift mask | Mar 2, 2003 | Issued |
Array
(
[id] => 540511
[patent_doc_number] => 07166392
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-01-23
[patent_title] => 'Halftone type phase shift mask blank and halftone type phase shift mask'
[patent_app_type] => utility
[patent_app_number] => 10/375063
[patent_app_country] => US
[patent_app_date] => 2003-02-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 14
[patent_no_of_words] => 15606
[patent_no_of_claims] => 34
[patent_no_of_ind_claims] => 17
[patent_words_short_claim] => 83
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/166/07166392.pdf
[firstpage_image] =>[orig_patent_app_number] => 10375063
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/375063 | Halftone type phase shift mask blank and halftone type phase shift mask | Feb 27, 2003 | Issued |
Array
(
[id] => 698217
[patent_doc_number] => 07067221
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-06-27
[patent_title] => 'Designing method and device for phase shift mask'
[patent_app_type] => utility
[patent_app_number] => 10/373569
[patent_app_country] => US
[patent_app_date] => 2003-02-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 15
[patent_figures_cnt] => 21
[patent_no_of_words] => 23695
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 826
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/067/07067221.pdf
[firstpage_image] =>[orig_patent_app_number] => 10373569
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/373569 | Designing method and device for phase shift mask | Feb 24, 2003 | Issued |
Array
(
[id] => 492714
[patent_doc_number] => 07211354
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-05-01
[patent_title] => 'Mask substrate and its manufacturing method'
[patent_app_type] => utility
[patent_app_number] => 10/372396
[patent_app_country] => US
[patent_app_date] => 2003-02-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 8
[patent_no_of_words] => 3170
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 42
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/211/07211354.pdf
[firstpage_image] =>[orig_patent_app_number] => 10372396
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/372396 | Mask substrate and its manufacturing method | Feb 24, 2003 | Issued |
Array
(
[id] => 6829573
[patent_doc_number] => 20030180631
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-09-25
[patent_title] => 'Halftone phase shift mask blank, halftone phase shift mask, and method of producing the same'
[patent_app_type] => new
[patent_app_number] => 10/370776
[patent_app_country] => US
[patent_app_date] => 2003-02-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 13504
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 12
[patent_words_short_claim] => 36
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0180/20030180631.pdf
[firstpage_image] =>[orig_patent_app_number] => 10370776
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/370776 | Halftone phase shift mask blank, halftone phase shift mask, and method of producing the same | Feb 23, 2003 | Issued |
Array
(
[id] => 6829572
[patent_doc_number] => 20030180630
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-09-25
[patent_title] => 'Halftone type phase shift mask blank and phase shift mask thereof'
[patent_app_type] => new
[patent_app_number] => 10/370713
[patent_app_country] => US
[patent_app_date] => 2003-02-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 18
[patent_figures_cnt] => 18
[patent_no_of_words] => 17374
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 10
[patent_words_short_claim] => 25
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0180/20030180630.pdf
[firstpage_image] =>[orig_patent_app_number] => 10370713
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/370713 | Halftone type phase shift mask blank and phase shift mask thereof | Feb 23, 2003 | Issued |
Array
(
[id] => 6834559
[patent_doc_number] => 20030162104
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-08-28
[patent_title] => 'Reflective-type mask blank for exposure, method of producing the same, and reflective-type mask for exposure'
[patent_app_type] => new
[patent_app_number] => 10/370716
[patent_app_country] => US
[patent_app_date] => 2003-02-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 8428
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 31
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0162/20030162104.pdf
[firstpage_image] =>[orig_patent_app_number] => 10370716
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/370716 | Reflective-type mask blank for exposure, method of producing the same, and reflective-type mask for exposure | Feb 23, 2003 | Issued |
Array
(
[id] => 6804860
[patent_doc_number] => 20030232254
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-12-18
[patent_title] => 'Method of manufacturing an alternating phase shift mask'
[patent_app_type] => new
[patent_app_number] => 10/368368
[patent_app_country] => US
[patent_app_date] => 2003-02-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 1882
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 144
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0232/20030232254.pdf
[firstpage_image] =>[orig_patent_app_number] => 10368368
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/368368 | Method of manufacturing an alternating phase shift mask | Feb 19, 2003 | Issued |
Array
(
[id] => 996419
[patent_doc_number] => 06913858
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-07-05
[patent_title] => 'Photomask for measuring lens aberration, method of manufacturing the same, and method of measuring lens aberration'
[patent_app_type] => utility
[patent_app_number] => 10/368422
[patent_app_country] => US
[patent_app_date] => 2003-02-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 12
[patent_no_of_words] => 3652
[patent_no_of_claims] => 41
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 128
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/913/06913858.pdf
[firstpage_image] =>[orig_patent_app_number] => 10368422
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/368422 | Photomask for measuring lens aberration, method of manufacturing the same, and method of measuring lens aberration | Feb 19, 2003 | Issued |