Search

Liliana Di Nola Baron

Examiner (ID: 15438)

Most Active Art Unit
1615
Art Unit(s)
1615
Total Applications
361
Issued Applications
209
Pending Applications
88
Abandoned Applications
63

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 650813 [patent_doc_number] => 07112390 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-09-26 [patent_title] => 'Method of manufacturing chromeless phase shift mask' [patent_app_type] => utility [patent_app_number] => 10/368630 [patent_app_country] => US [patent_app_date] => 2003-02-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 9 [patent_no_of_words] => 2661 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 194 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/112/07112390.pdf [firstpage_image] =>[orig_patent_app_number] => 10368630 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/368630
Method of manufacturing chromeless phase shift mask Feb 19, 2003 Issued
Array ( [id] => 7232838 [patent_doc_number] => 20040157134 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-08-12 [patent_title] => 'Simulation based PSM clear defect repair method and system' [patent_app_type] => new [patent_app_number] => 10/364260 [patent_app_country] => US [patent_app_date] => 2003-02-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 5471 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 49 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0157/20040157134.pdf [firstpage_image] =>[orig_patent_app_number] => 10364260 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/364260
Simulation based PSM clear defect repair method and system Feb 10, 2003 Issued
Array ( [id] => 1002260 [patent_doc_number] => 06908713 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2005-06-21 [patent_title] => 'EUV mask blank defect mitigation' [patent_app_type] => utility [patent_app_number] => 10/359421 [patent_app_country] => US [patent_app_date] => 2003-02-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 9 [patent_no_of_words] => 2768 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 22 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/908/06908713.pdf [firstpage_image] =>[orig_patent_app_number] => 10359421 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/359421
EUV mask blank defect mitigation Feb 4, 2003 Issued
Array ( [id] => 1037349 [patent_doc_number] => 06872497 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2005-03-29 [patent_title] => 'Reflective mask for short wavelength lithography' [patent_app_type] => utility [patent_app_number] => 10/357818 [patent_app_country] => US [patent_app_date] => 2003-02-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 19 [patent_no_of_words] => 6791 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 190 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/872/06872497.pdf [firstpage_image] =>[orig_patent_app_number] => 10357818 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/357818
Reflective mask for short wavelength lithography Feb 3, 2003 Issued
Array ( [id] => 788040 [patent_doc_number] => 06986972 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2006-01-17 [patent_title] => 'Alternating aperture phase-shift mask fabrication method' [patent_app_type] => utility [patent_app_number] => 10/358968 [patent_app_country] => US [patent_app_date] => 2003-02-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 13 [patent_no_of_words] => 5709 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 154 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/986/06986972.pdf [firstpage_image] =>[orig_patent_app_number] => 10358968 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/358968
Alternating aperture phase-shift mask fabrication method Feb 3, 2003 Issued
Array ( [id] => 1088726 [patent_doc_number] => 06828068 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-12-07 [patent_title] => 'Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same' [patent_app_type] => B2 [patent_app_number] => 10/349629 [patent_app_country] => US [patent_app_date] => 2003-01-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 18 [patent_no_of_words] => 8950 [patent_no_of_claims] => 92 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 50 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/828/06828068.pdf [firstpage_image] =>[orig_patent_app_number] => 10349629 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/349629
Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same Jan 22, 2003 Issued
Array ( [id] => 662362 [patent_doc_number] => 07101645 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2006-09-05 [patent_title] => 'Reflective mask for short wavelength lithography' [patent_app_type] => utility [patent_app_number] => 10/342500 [patent_app_country] => US [patent_app_date] => 2003-01-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 16 [patent_no_of_words] => 5903 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 67 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/101/07101645.pdf [firstpage_image] =>[orig_patent_app_number] => 10342500 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/342500
Reflective mask for short wavelength lithography Jan 14, 2003 Issued
Array ( [id] => 7323201 [patent_doc_number] => 20040137337 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-07-15 [patent_title] => 'Method for repairing attenuated phase shift masks' [patent_app_type] => new [patent_app_number] => 10/345862 [patent_app_country] => US [patent_app_date] => 2003-01-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 2710 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 128 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0137/20040137337.pdf [firstpage_image] =>[orig_patent_app_number] => 10345862 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/345862
Method for repairing attenuated phase shift masks Jan 14, 2003 Issued
Array ( [id] => 749086 [patent_doc_number] => 07022436 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-04-04 [patent_title] => 'Embedded etch stop for phase shift masks and planar phase shift masks to reduce topography induced and wave guide effects' [patent_app_type] => utility [patent_app_number] => 10/341385 [patent_app_country] => US [patent_app_date] => 2003-01-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 15 [patent_figures_cnt] => 19 [patent_no_of_words] => 6927 [patent_no_of_claims] => 33 [patent_no_of_ind_claims] => 9 [patent_words_short_claim] => 60 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/022/07022436.pdf [firstpage_image] =>[orig_patent_app_number] => 10341385 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/341385
Embedded etch stop for phase shift masks and planar phase shift masks to reduce topography induced and wave guide effects Jan 13, 2003 Issued
Array ( [id] => 6846587 [patent_doc_number] => 20030165754 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-09-04 [patent_title] => 'Phase shifting circuit manufacture method and apparatus' [patent_app_type] => new [patent_app_number] => 10/341290 [patent_app_country] => US [patent_app_date] => 2003-01-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 5875 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 100 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0165/20030165754.pdf [firstpage_image] =>[orig_patent_app_number] => 10341290 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/341290
Phase shifting circuit manufacture method and apparatus Jan 12, 2003 Issued
Array ( [id] => 1046627 [patent_doc_number] => 06864021 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2005-03-08 [patent_title] => 'Photomask and pattern forming method used in a thermal flow process and semiconductor integrated circuit fabricated using the thermal flow process' [patent_app_type] => utility [patent_app_number] => 10/341160 [patent_app_country] => US [patent_app_date] => 2003-01-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 20 [patent_no_of_words] => 5246 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 146 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/864/06864021.pdf [firstpage_image] =>[orig_patent_app_number] => 10341160 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/341160
Photomask and pattern forming method used in a thermal flow process and semiconductor integrated circuit fabricated using the thermal flow process Jan 12, 2003 Issued
Array ( [id] => 7334321 [patent_doc_number] => 20040131948 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-07-08 [patent_title] => 'Reflective mask with high inspection contrast' [patent_app_type] => new [patent_app_number] => 10/339617 [patent_app_country] => US [patent_app_date] => 2003-01-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 1706 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 20 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0131/20040131948.pdf [firstpage_image] =>[orig_patent_app_number] => 10339617 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/339617
Reflective mask with high inspection contrast Jan 7, 2003 Issued
Array ( [id] => 1040438 [patent_doc_number] => 06869735 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2005-03-22 [patent_title] => 'Method of pattern layout of a photomask for pattern transfer' [patent_app_type] => utility [patent_app_number] => 10/338004 [patent_app_country] => US [patent_app_date] => 2003-01-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 18 [patent_no_of_words] => 5510 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 135 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/869/06869735.pdf [firstpage_image] =>[orig_patent_app_number] => 10338004 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/338004
Method of pattern layout of a photomask for pattern transfer Jan 7, 2003 Issued
Array ( [id] => 7334319 [patent_doc_number] => 20040131947 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-07-08 [patent_title] => 'Reflective mask structure and method of formation' [patent_app_type] => new [patent_app_number] => 10/248300 [patent_app_country] => US [patent_app_date] => 2003-01-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 2756 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 44 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0131/20040131947.pdf [firstpage_image] =>[orig_patent_app_number] => 10248300 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/248300
Reflective mask structure and method of formation Jan 6, 2003 Abandoned
Array ( [id] => 777087 [patent_doc_number] => 06998217 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-02-14 [patent_title] => 'Critical dimension edge placement and slope enhancement with central pixel dose addition and modulated inner pixels' [patent_app_type] => utility [patent_app_number] => 10/326953 [patent_app_country] => US [patent_app_date] => 2003-01-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 18 [patent_no_of_words] => 7132 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 89 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/998/06998217.pdf [firstpage_image] =>[orig_patent_app_number] => 10326953 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/326953
Critical dimension edge placement and slope enhancement with central pixel dose addition and modulated inner pixels Jan 5, 2003 Issued
Array ( [id] => 7675447 [patent_doc_number] => 20040126671 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-07-01 [patent_title] => 'Structure and process for a pellicle membrane for 157 nanometer lithography' [patent_app_type] => new [patent_app_number] => 10/334297 [patent_app_country] => US [patent_app_date] => 2002-12-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 3495 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 86 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0126/20040126671.pdf [firstpage_image] =>[orig_patent_app_number] => 10334297 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/334297
Structure and process for a pellicle membrane for 157 nanometer lithography Dec 30, 2002 Issued
Array ( [id] => 1040437 [patent_doc_number] => 06869734 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2005-03-22 [patent_title] => 'EUV reflective mask having a carbon film and a method of making such a mask' [patent_app_type] => utility [patent_app_number] => 10/331681 [patent_app_country] => US [patent_app_date] => 2002-12-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 6 [patent_no_of_words] => 2360 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 38 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/869/06869734.pdf [firstpage_image] =>[orig_patent_app_number] => 10331681 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/331681
EUV reflective mask having a carbon film and a method of making such a mask Dec 29, 2002 Issued
Array ( [id] => 1005209 [patent_doc_number] => 06905801 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2005-06-14 [patent_title] => 'High performance EUV mask' [patent_app_type] => utility [patent_app_number] => 10/334175 [patent_app_country] => US [patent_app_date] => 2002-12-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 7 [patent_no_of_words] => 3321 [patent_no_of_claims] => 27 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 29 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/905/06905801.pdf [firstpage_image] =>[orig_patent_app_number] => 10334175 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/334175
High performance EUV mask Dec 27, 2002 Issued
Array ( [id] => 1046626 [patent_doc_number] => 06864020 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2005-03-08 [patent_title] => 'Chromeless phase shift mask using non-linear optical materials' [patent_app_type] => utility [patent_app_number] => 10/328346 [patent_app_country] => US [patent_app_date] => 2002-12-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 4 [patent_no_of_words] => 3980 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 46 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/864/06864020.pdf [firstpage_image] =>[orig_patent_app_number] => 10328346 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/328346
Chromeless phase shift mask using non-linear optical materials Dec 23, 2002 Issued
Array ( [id] => 707167 [patent_doc_number] => 07060398 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-06-13 [patent_title] => 'Photomask, method for producing the same, and method for forming pattern using the photomask' [patent_app_type] => utility [patent_app_number] => 10/474336 [patent_app_country] => US [patent_app_date] => 2002-12-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 30 [patent_figures_cnt] => 113 [patent_no_of_words] => 26724 [patent_no_of_claims] => 40 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 133 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/060/07060398.pdf [firstpage_image] =>[orig_patent_app_number] => 10474336 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/474336
Photomask, method for producing the same, and method for forming pattern using the photomask Dec 23, 2002 Issued
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