
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 650813
[patent_doc_number] => 07112390
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-09-26
[patent_title] => 'Method of manufacturing chromeless phase shift mask'
[patent_app_type] => utility
[patent_app_number] => 10/368630
[patent_app_country] => US
[patent_app_date] => 2003-02-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 9
[patent_no_of_words] => 2661
[patent_no_of_claims] => 10
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[patent_words_short_claim] => 194
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/112/07112390.pdf
[firstpage_image] =>[orig_patent_app_number] => 10368630
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/368630 | Method of manufacturing chromeless phase shift mask | Feb 19, 2003 | Issued |
Array
(
[id] => 7232838
[patent_doc_number] => 20040157134
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-08-12
[patent_title] => 'Simulation based PSM clear defect repair method and system'
[patent_app_type] => new
[patent_app_number] => 10/364260
[patent_app_country] => US
[patent_app_date] => 2003-02-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
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[patent_no_of_words] => 5471
[patent_no_of_claims] => 21
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0157/20040157134.pdf
[firstpage_image] =>[orig_patent_app_number] => 10364260
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/364260 | Simulation based PSM clear defect repair method and system | Feb 10, 2003 | Issued |
Array
(
[id] => 1002260
[patent_doc_number] => 06908713
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-06-21
[patent_title] => 'EUV mask blank defect mitigation'
[patent_app_type] => utility
[patent_app_number] => 10/359421
[patent_app_country] => US
[patent_app_date] => 2003-02-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[patent_no_of_words] => 2768
[patent_no_of_claims] => 20
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[pdf_file] => patents/06/908/06908713.pdf
[firstpage_image] =>[orig_patent_app_number] => 10359421
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/359421 | EUV mask blank defect mitigation | Feb 4, 2003 | Issued |
Array
(
[id] => 1037349
[patent_doc_number] => 06872497
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2005-03-29
[patent_title] => 'Reflective mask for short wavelength lithography'
[patent_app_type] => utility
[patent_app_number] => 10/357818
[patent_app_country] => US
[patent_app_date] => 2003-02-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
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[patent_no_of_words] => 6791
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[pdf_file] => patents/06/872/06872497.pdf
[firstpage_image] =>[orig_patent_app_number] => 10357818
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/357818 | Reflective mask for short wavelength lithography | Feb 3, 2003 | Issued |
Array
(
[id] => 788040
[patent_doc_number] => 06986972
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2006-01-17
[patent_title] => 'Alternating aperture phase-shift mask fabrication method'
[patent_app_type] => utility
[patent_app_number] => 10/358968
[patent_app_country] => US
[patent_app_date] => 2003-02-04
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/986/06986972.pdf
[firstpage_image] =>[orig_patent_app_number] => 10358968
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/358968 | Alternating aperture phase-shift mask fabrication method | Feb 3, 2003 | Issued |
Array
(
[id] => 1088726
[patent_doc_number] => 06828068
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-12-07
[patent_title] => 'Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same'
[patent_app_type] => B2
[patent_app_number] => 10/349629
[patent_app_country] => US
[patent_app_date] => 2003-01-23
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/828/06828068.pdf
[firstpage_image] =>[orig_patent_app_number] => 10349629
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/349629 | Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same | Jan 22, 2003 | Issued |
Array
(
[id] => 662362
[patent_doc_number] => 07101645
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2006-09-05
[patent_title] => 'Reflective mask for short wavelength lithography'
[patent_app_type] => utility
[patent_app_number] => 10/342500
[patent_app_country] => US
[patent_app_date] => 2003-01-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
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[pdf_file] => patents/07/101/07101645.pdf
[firstpage_image] =>[orig_patent_app_number] => 10342500
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/342500 | Reflective mask for short wavelength lithography | Jan 14, 2003 | Issued |
Array
(
[id] => 7323201
[patent_doc_number] => 20040137337
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-07-15
[patent_title] => 'Method for repairing attenuated phase shift masks'
[patent_app_type] => new
[patent_app_number] => 10/345862
[patent_app_country] => US
[patent_app_date] => 2003-01-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[pdf_file] => publications/A1/0137/20040137337.pdf
[firstpage_image] =>[orig_patent_app_number] => 10345862
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/345862 | Method for repairing attenuated phase shift masks | Jan 14, 2003 | Issued |
Array
(
[id] => 749086
[patent_doc_number] => 07022436
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-04-04
[patent_title] => 'Embedded etch stop for phase shift masks and planar phase shift masks to reduce topography induced and wave guide effects'
[patent_app_type] => utility
[patent_app_number] => 10/341385
[patent_app_country] => US
[patent_app_date] => 2003-01-14
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[patent_drawing_sheets_cnt] => 15
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[pdf_file] => patents/07/022/07022436.pdf
[firstpage_image] =>[orig_patent_app_number] => 10341385
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/341385 | Embedded etch stop for phase shift masks and planar phase shift masks to reduce topography induced and wave guide effects | Jan 13, 2003 | Issued |
Array
(
[id] => 6846587
[patent_doc_number] => 20030165754
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-09-04
[patent_title] => 'Phase shifting circuit manufacture method and apparatus'
[patent_app_type] => new
[patent_app_number] => 10/341290
[patent_app_country] => US
[patent_app_date] => 2003-01-13
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0165/20030165754.pdf
[firstpage_image] =>[orig_patent_app_number] => 10341290
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/341290 | Phase shifting circuit manufacture method and apparatus | Jan 12, 2003 | Issued |
Array
(
[id] => 1046627
[patent_doc_number] => 06864021
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-03-08
[patent_title] => 'Photomask and pattern forming method used in a thermal flow process and semiconductor integrated circuit fabricated using the thermal flow process'
[patent_app_type] => utility
[patent_app_number] => 10/341160
[patent_app_country] => US
[patent_app_date] => 2003-01-13
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[pdf_file] => patents/06/864/06864021.pdf
[firstpage_image] =>[orig_patent_app_number] => 10341160
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/341160 | Photomask and pattern forming method used in a thermal flow process and semiconductor integrated circuit fabricated using the thermal flow process | Jan 12, 2003 | Issued |
Array
(
[id] => 7334321
[patent_doc_number] => 20040131948
[patent_country] => US
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[patent_issue_date] => 2004-07-08
[patent_title] => 'Reflective mask with high inspection contrast'
[patent_app_type] => new
[patent_app_number] => 10/339617
[patent_app_country] => US
[patent_app_date] => 2003-01-08
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[pdf_file] => publications/A1/0131/20040131948.pdf
[firstpage_image] =>[orig_patent_app_number] => 10339617
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/339617 | Reflective mask with high inspection contrast | Jan 7, 2003 | Issued |
Array
(
[id] => 1040438
[patent_doc_number] => 06869735
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-03-22
[patent_title] => 'Method of pattern layout of a photomask for pattern transfer'
[patent_app_type] => utility
[patent_app_number] => 10/338004
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[firstpage_image] =>[orig_patent_app_number] => 10338004
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/338004 | Method of pattern layout of a photomask for pattern transfer | Jan 7, 2003 | Issued |
Array
(
[id] => 7334319
[patent_doc_number] => 20040131947
[patent_country] => US
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[patent_issue_date] => 2004-07-08
[patent_title] => 'Reflective mask structure and method of formation'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/248300 | Reflective mask structure and method of formation | Jan 6, 2003 | Abandoned |
Array
(
[id] => 777087
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[patent_issue_date] => 2006-02-14
[patent_title] => 'Critical dimension edge placement and slope enhancement with central pixel dose addition and modulated inner pixels'
[patent_app_type] => utility
[patent_app_number] => 10/326953
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/326953 | Critical dimension edge placement and slope enhancement with central pixel dose addition and modulated inner pixels | Jan 5, 2003 | Issued |
Array
(
[id] => 7675447
[patent_doc_number] => 20040126671
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[patent_issue_date] => 2004-07-01
[patent_title] => 'Structure and process for a pellicle membrane for 157 nanometer lithography'
[patent_app_type] => new
[patent_app_number] => 10/334297
[patent_app_country] => US
[patent_app_date] => 2002-12-31
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[firstpage_image] =>[orig_patent_app_number] => 10334297
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/334297 | Structure and process for a pellicle membrane for 157 nanometer lithography | Dec 30, 2002 | Issued |
Array
(
[id] => 1040437
[patent_doc_number] => 06869734
[patent_country] => US
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[patent_issue_date] => 2005-03-22
[patent_title] => 'EUV reflective mask having a carbon film and a method of making such a mask'
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[patent_app_number] => 10/331681
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/331681 | EUV reflective mask having a carbon film and a method of making such a mask | Dec 29, 2002 | Issued |
Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/334175 | High performance EUV mask | Dec 27, 2002 | Issued |
Array
(
[id] => 1046626
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/328346 | Chromeless phase shift mask using non-linear optical materials | Dec 23, 2002 | Issued |
Array
(
[id] => 707167
[patent_doc_number] => 07060398
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[patent_issue_date] => 2006-06-13
[patent_title] => 'Photomask, method for producing the same, and method for forming pattern using the photomask'
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[firstpage_image] =>[orig_patent_app_number] => 10474336
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/474336 | Photomask, method for producing the same, and method for forming pattern using the photomask | Dec 23, 2002 | Issued |