
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6769782
[patent_doc_number] => 20030215722
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-11-20
[patent_title] => 'Photomask repair method and apparatus'
[patent_app_type] => new
[patent_app_number] => 10/326112
[patent_app_country] => US
[patent_app_date] => 2002-12-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 4303
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 148
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0215/20030215722.pdf
[firstpage_image] =>[orig_patent_app_number] => 10326112
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/326112 | Photomask repair method and apparatus | Dec 22, 2002 | Issued |
Array
(
[id] => 6791824
[patent_doc_number] => 20030087168
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-05-08
[patent_title] => 'Reticle cleaning without damaging pellicle'
[patent_app_type] => new
[patent_app_number] => 10/328771
[patent_app_country] => US
[patent_app_date] => 2002-12-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 3961
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 82
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0087/20030087168.pdf
[firstpage_image] =>[orig_patent_app_number] => 10328771
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/328771 | Reticle cleaning without damaging pellicle | Dec 22, 2002 | Issued |
Array
(
[id] => 7469437
[patent_doc_number] => 20040121243
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-06-24
[patent_title] => 'Damage-resistant coatings for EUV lithography components'
[patent_app_type] => new
[patent_app_number] => 10/327599
[patent_app_country] => US
[patent_app_date] => 2002-12-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 1663
[patent_no_of_claims] => 25
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 22
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0121/20040121243.pdf
[firstpage_image] =>[orig_patent_app_number] => 10327599
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/327599 | Damage-resistant coatings for EUV lithography components | Dec 20, 2002 | Issued |
Array
(
[id] => 7469435
[patent_doc_number] => 20040121242
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-06-24
[patent_title] => 'Sidelobe correction for attenuated phase shift masks'
[patent_app_type] => new
[patent_app_number] => 10/327451
[patent_app_country] => US
[patent_app_date] => 2002-12-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 1350
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 132
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0121/20040121242.pdf
[firstpage_image] =>[orig_patent_app_number] => 10327451
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/327451 | Sidelobe correction for attenuated phase shift masks | Dec 19, 2002 | Issued |
Array
(
[id] => 1239181
[patent_doc_number] => 06686103
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-02-03
[patent_title] => 'Fused silica pellicle'
[patent_app_type] => B2
[patent_app_number] => 10/322858
[patent_app_country] => US
[patent_app_date] => 2002-12-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 4
[patent_no_of_words] => 1819
[patent_no_of_claims] => 4
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 111
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/686/06686103.pdf
[firstpage_image] =>[orig_patent_app_number] => 10322858
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/322858 | Fused silica pellicle | Dec 17, 2002 | Issued |
Array
(
[id] => 6658774
[patent_doc_number] => 20030134207
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-07-17
[patent_title] => 'Alternating phase shift mask'
[patent_app_type] => new
[patent_app_number] => 10/320243
[patent_app_country] => US
[patent_app_date] => 2002-12-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 1738
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 78
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0134/20030134207.pdf
[firstpage_image] =>[orig_patent_app_number] => 10320243
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/320243 | Alternating phase shift mask | Dec 15, 2002 | Issued |
Array
(
[id] => 1053028
[patent_doc_number] => 06858355
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-02-22
[patent_title] => 'Mask and method for defining a guard ring pattern'
[patent_app_type] => utility
[patent_app_number] => 10/319076
[patent_app_country] => US
[patent_app_date] => 2002-12-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 6
[patent_no_of_words] => 1632
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 70
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/858/06858355.pdf
[firstpage_image] =>[orig_patent_app_number] => 10319076
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/319076 | Mask and method for defining a guard ring pattern | Dec 12, 2002 | Issued |
Array
(
[id] => 7160760
[patent_doc_number] => 20050084767
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-04-21
[patent_title] => 'Method and system for reparing defected photomasks'
[patent_app_type] => utility
[patent_app_number] => 10/504866
[patent_app_country] => US
[patent_app_date] => 2002-12-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 4239
[patent_no_of_claims] => 31
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0084/20050084767.pdf
[firstpage_image] =>[orig_patent_app_number] => 10504866
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/504866 | Method and system for repairing defected photomasks | Dec 11, 2002 | Issued |
Array
(
[id] => 951209
[patent_doc_number] => 06960411
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-11-01
[patent_title] => 'Mask with extended mask clear-out window and method of dummy exposure using the same'
[patent_app_type] => utility
[patent_app_number] => 10/314959
[patent_app_country] => US
[patent_app_date] => 2002-12-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
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[patent_no_of_words] => 2162
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/960/06960411.pdf
[firstpage_image] =>[orig_patent_app_number] => 10314959
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/314959 | Mask with extended mask clear-out window and method of dummy exposure using the same | Dec 9, 2002 | Issued |
Array
(
[id] => 6825143
[patent_doc_number] => 20030235765
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-12-25
[patent_title] => 'Photo mask and method of manufacturing the same, and method of forming photosensitive film pattern of using the photo mask'
[patent_app_type] => new
[patent_app_number] => 10/310868
[patent_app_country] => US
[patent_app_date] => 2002-12-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 5032
[patent_no_of_claims] => 22
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[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0235/20030235765.pdf
[firstpage_image] =>[orig_patent_app_number] => 10310868
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/310868 | Photo mask and method of manufacturing the same, and method of forming photosensitive film pattern of using the photo mask | Dec 5, 2002 | Issued |
Array
(
[id] => 7134142
[patent_doc_number] => 20040043306
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-03-04
[patent_title] => 'Phase shift mask'
[patent_app_type] => new
[patent_app_number] => 10/302826
[patent_app_country] => US
[patent_app_date] => 2002-11-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
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[patent_no_of_words] => 3552
[patent_no_of_claims] => 4
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0043/20040043306.pdf
[firstpage_image] =>[orig_patent_app_number] => 10302826
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/302826 | Phase shift mask | Nov 24, 2002 | Abandoned |
Array
(
[id] => 1192638
[patent_doc_number] => 06730445
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-05-04
[patent_title] => 'Attenuated embedded phase shift photomask blanks'
[patent_app_type] => B2
[patent_app_number] => 10/303341
[patent_app_country] => US
[patent_app_date] => 2002-11-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
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[patent_no_of_words] => 3285
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/730/06730445.pdf
[firstpage_image] =>[orig_patent_app_number] => 10303341
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/303341 | Attenuated embedded phase shift photomask blanks | Nov 21, 2002 | Issued |
Array
(
[id] => 1009220
[patent_doc_number] => 06899981
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2005-05-31
[patent_title] => 'Photomask and method for detecting violations in a mask pattern file using a manufacturing rule'
[patent_app_type] => utility
[patent_app_number] => 10/301195
[patent_app_country] => US
[patent_app_date] => 2002-11-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/899/06899981.pdf
[firstpage_image] =>[orig_patent_app_number] => 10301195
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/301195 | Photomask and method for detecting violations in a mask pattern file using a manufacturing rule | Nov 20, 2002 | Issued |
Array
(
[id] => 6724869
[patent_doc_number] => 20030207181
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-11-06
[patent_title] => 'Mask for estimating aberration in projection lens system of exposure apparatus'
[patent_app_type] => new
[patent_app_number] => 10/295843
[patent_app_country] => US
[patent_app_date] => 2002-11-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[patent_no_of_words] => 1667
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0207/20030207181.pdf
[firstpage_image] =>[orig_patent_app_number] => 10295843
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/295843 | Mask for estimating aberration in projection lens system of exposure apparatus | Nov 17, 2002 | Issued |
Array
(
[id] => 7165807
[patent_doc_number] => 20040076892
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-04-22
[patent_title] => 'Method and apparatus for using a complementary mask to clear phase conflicts on a phase shifting mask'
[patent_app_type] => new
[patent_app_number] => 10/294253
[patent_app_country] => US
[patent_app_date] => 2002-11-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0076/20040076892.pdf
[firstpage_image] =>[orig_patent_app_number] => 10294253
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/294253 | Method and apparatus for using a complementary mask to clear phase conflicts on a phase shifting mask | Nov 13, 2002 | Issued |
Array
(
[id] => 1062622
[patent_doc_number] => 06849365
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-02-01
[patent_title] => 'Reflection mask for EUV-lithography and method for fabricating the reflection mask'
[patent_app_type] => utility
[patent_app_number] => 10/292866
[patent_app_country] => US
[patent_app_date] => 2002-11-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 21
[patent_no_of_words] => 5618
[patent_no_of_claims] => 13
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/849/06849365.pdf
[firstpage_image] =>[orig_patent_app_number] => 10292866
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/292866 | Reflection mask for EUV-lithography and method for fabricating the reflection mask | Nov 11, 2002 | Issued |
Array
(
[id] => 619794
[patent_doc_number] => 07141338
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-11-28
[patent_title] => 'Sub-resolution sized assist features'
[patent_app_type] => utility
[patent_app_number] => 10/292169
[patent_app_country] => US
[patent_app_date] => 2002-11-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[pdf_file] => patents/07/141/07141338.pdf
[firstpage_image] =>[orig_patent_app_number] => 10292169
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/292169 | Sub-resolution sized assist features | Nov 11, 2002 | Issued |
Array
(
[id] => 1014438
[patent_doc_number] => 06893780
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2005-05-17
[patent_title] => 'Photomask and method for reducing electrostatic discharge on the same with an ESD protection pattern'
[patent_app_type] => utility
[patent_app_number] => 10/290574
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[pdf_file] => patents/06/893/06893780.pdf
[firstpage_image] =>[orig_patent_app_number] => 10290574
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/290574 | Photomask and method for reducing electrostatic discharge on the same with an ESD protection pattern | Nov 7, 2002 | Issued |
Array
(
[id] => 788039
[patent_doc_number] => 06986971
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[patent_kind] => B2
[patent_issue_date] => 2006-01-17
[patent_title] => 'Reflective mask useful for transferring a pattern using extreme ultraviolet (EUV) radiation and method of making the same'
[patent_app_type] => utility
[patent_app_number] => 10/290693
[patent_app_country] => US
[patent_app_date] => 2002-11-08
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/986/06986971.pdf
[firstpage_image] =>[orig_patent_app_number] => 10290693
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/290693 | Reflective mask useful for transferring a pattern using extreme ultraviolet (EUV) radiation and method of making the same | Nov 7, 2002 | Issued |
Array
(
[id] => 1205068
[patent_doc_number] => 06716558
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-04-06
[patent_title] => 'Transparent phase shift mask for fabrication of small feature sizes'
[patent_app_type] => B1
[patent_app_number] => 10/291116
[patent_app_country] => US
[patent_app_date] => 2002-11-08
[patent_effective_date] => 0000-00-00
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[patent_no_of_words] => 7514
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/716/06716558.pdf
[firstpage_image] =>[orig_patent_app_number] => 10291116
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/291116 | Transparent phase shift mask for fabrication of small feature sizes | Nov 7, 2002 | Issued |