
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6801013
[patent_doc_number] => 20030096177
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-05-22
[patent_title] => 'Levenson phase shift mask and method for forming fine pattern by using the same'
[patent_app_type] => new
[patent_app_number] => 10/277512
[patent_app_country] => US
[patent_app_date] => 2002-10-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 3187
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 46
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0096/20030096177.pdf
[firstpage_image] =>[orig_patent_app_number] => 10277512
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/277512 | Levenson phase shift mask and method for forming fine pattern by using the same | Oct 21, 2002 | Issued |
Array
(
[id] => 1107157
[patent_doc_number] => 06808850
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-10-26
[patent_title] => 'Performing optical proximity correction on trim-level segments not abutting features to be printed'
[patent_app_type] => B2
[patent_app_number] => 10/277250
[patent_app_country] => US
[patent_app_date] => 2002-10-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 11
[patent_no_of_words] => 4022
[patent_no_of_claims] => 45
[patent_no_of_ind_claims] => 8
[patent_words_short_claim] => 75
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/808/06808850.pdf
[firstpage_image] =>[orig_patent_app_number] => 10277250
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/277250 | Performing optical proximity correction on trim-level segments not abutting features to be printed | Oct 20, 2002 | Issued |
Array
(
[id] => 6655065
[patent_doc_number] => 20030077525
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-04-24
[patent_title] => 'Photomask and method for manufacturing the photomask'
[patent_app_type] => new
[patent_app_number] => 10/273759
[patent_app_country] => US
[patent_app_date] => 2002-10-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 1939
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 2
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0077/20030077525.pdf
[firstpage_image] =>[orig_patent_app_number] => 10273759
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/273759 | Photomask and method for manufacturing the photomask | Oct 17, 2002 | Issued |
Array
(
[id] => 7235343
[patent_doc_number] => 20040073884
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-04-15
[patent_title] => 'Phase shifting mask topography effect correction based on near-field image properties'
[patent_app_type] => new
[patent_app_number] => 10/268874
[patent_app_country] => US
[patent_app_date] => 2002-10-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 11
[patent_no_of_words] => 5641
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 57
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0073/20040073884.pdf
[firstpage_image] =>[orig_patent_app_number] => 10268874
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/268874 | Phase shifting mask topography effect correction based on near-field image properties | Oct 8, 2002 | Issued |
Array
(
[id] => 7448000
[patent_doc_number] => 20040067420
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-04-08
[patent_title] => 'Reduced-stress, electrostatically chuckable reticles for use in extreme ultraviolet and soft X-ray microlithography apparatus and methods'
[patent_app_type] => new
[patent_app_number] => 10/264795
[patent_app_country] => US
[patent_app_date] => 2002-10-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 8917
[patent_no_of_claims] => 63
[patent_no_of_ind_claims] => 8
[patent_words_short_claim] => 77
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0067/20040067420.pdf
[firstpage_image] =>[orig_patent_app_number] => 10264795
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/264795 | Reduced-stress, electrostatically chuckable reticles for use in extreme ultraviolet and soft X-ray microlithography apparatus and methods | Oct 2, 2002 | Abandoned |
Array
(
[id] => 7612981
[patent_doc_number] => 06902852
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-06-07
[patent_title] => 'Pattern transfer method using a mask and half tone mask'
[patent_app_type] => utility
[patent_app_number] => 10/260532
[patent_app_country] => US
[patent_app_date] => 2002-10-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 31
[patent_no_of_words] => 10472
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/902/06902852.pdf
[firstpage_image] =>[orig_patent_app_number] => 10260532
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/260532 | Pattern transfer method using a mask and half tone mask | Sep 30, 2002 | Issued |
Array
(
[id] => 6801012
[patent_doc_number] => 20030096176
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-05-22
[patent_title] => 'Photomask, microstructure, manufacturing method of photomask, and aligner'
[patent_app_type] => new
[patent_app_number] => 10/261170
[patent_app_country] => US
[patent_app_date] => 2002-09-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 34
[patent_figures_cnt] => 34
[patent_no_of_words] => 11752
[patent_no_of_claims] => 60
[patent_no_of_ind_claims] => 7
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[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0096/20030096176.pdf
[firstpage_image] =>[orig_patent_app_number] => 10261170
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/261170 | Photomask, microstructure, manufacturing method of photomask, and aligner | Sep 29, 2002 | Issued |
Array
(
[id] => 1034334
[patent_doc_number] => 06875543
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-04-05
[patent_title] => 'Etched-multilayer phase shifting masks for EUV lithography'
[patent_app_type] => utility
[patent_app_number] => 10/256377
[patent_app_country] => US
[patent_app_date] => 2002-09-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 2023
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 88
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/875/06875543.pdf
[firstpage_image] =>[orig_patent_app_number] => 10256377
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/256377 | Etched-multilayer phase shifting masks for EUV lithography | Sep 26, 2002 | Issued |
Array
(
[id] => 532953
[patent_doc_number] => 07172838
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-02-06
[patent_title] => 'Chromeless phase mask layout generation'
[patent_app_type] => utility
[patent_app_number] => 10/259373
[patent_app_country] => US
[patent_app_date] => 2002-09-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
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[patent_no_of_words] => 8787
[patent_no_of_claims] => 51
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/172/07172838.pdf
[firstpage_image] =>[orig_patent_app_number] => 10259373
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/259373 | Chromeless phase mask layout generation | Sep 26, 2002 | Issued |
Array
(
[id] => 749084
[patent_doc_number] => 07022435
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-04-04
[patent_title] => 'Method for the manufacture of phase shifting masks for EUV lithography'
[patent_app_type] => utility
[patent_app_number] => 10/256454
[patent_app_country] => US
[patent_app_date] => 2002-09-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 7
[patent_no_of_words] => 4015
[patent_no_of_claims] => 16
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/022/07022435.pdf
[firstpage_image] =>[orig_patent_app_number] => 10256454
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/256454 | Method for the manufacture of phase shifting masks for EUV lithography | Sep 26, 2002 | Issued |
Array
(
[id] => 6808933
[patent_doc_number] => 20030198872
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-10-23
[patent_title] => 'Method for setting mask pattern and illumination condition'
[patent_app_type] => new
[patent_app_number] => 10/251581
[patent_app_country] => US
[patent_app_date] => 2002-09-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 48
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[patent_no_of_words] => 23357
[patent_no_of_claims] => 74
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0198/20030198872.pdf
[firstpage_image] =>[orig_patent_app_number] => 10251581
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/251581 | Method for setting mask pattern and illumination condition | Sep 19, 2002 | Issued |
Array
(
[id] => 7462475
[patent_doc_number] => 20040053141
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-03-18
[patent_title] => 'Using second exposure to assist a PSM exposure in printing a tight space adjacent to large feature'
[patent_app_type] => new
[patent_app_number] => 10/244451
[patent_app_country] => US
[patent_app_date] => 2002-09-16
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0053/20040053141.pdf
[firstpage_image] =>[orig_patent_app_number] => 10244451
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/244451 | Using second exposure to assist a PSM exposure in printing a tight space adjacent to large feature | Sep 15, 2002 | Issued |
Array
(
[id] => 1140545
[patent_doc_number] => 06777141
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-08-17
[patent_title] => 'Phase shift mask including sub-resolution assist features for isolated spaces'
[patent_app_type] => B2
[patent_app_number] => 10/244226
[patent_app_country] => US
[patent_app_date] => 2002-09-16
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/777/06777141.pdf
[firstpage_image] =>[orig_patent_app_number] => 10244226
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/244226 | Phase shift mask including sub-resolution assist features for isolated spaces | Sep 15, 2002 | Issued |
Array
(
[id] => 6774064
[patent_doc_number] => 20030017402
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-01-23
[patent_title] => 'Extreme ultraviolet soft x-ray projection lithographic method and mask devices'
[patent_app_type] => new
[patent_app_number] => 10/242911
[patent_app_country] => US
[patent_app_date] => 2002-09-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
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[pdf_file] => publications/A1/0017/20030017402.pdf
[firstpage_image] =>[orig_patent_app_number] => 10242911
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/242911 | Extreme ultraviolet soft x-ray projection lithographic method and mask devices | Sep 12, 2002 | Issued |
Array
(
[id] => 1059365
[patent_doc_number] => 06852455
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2005-02-08
[patent_title] => 'Amorphous carbon absorber/shifter film for attenuated phase shift mask'
[patent_app_type] => utility
[patent_app_number] => 10/237643
[patent_app_country] => US
[patent_app_date] => 2002-09-09
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[pdf_file] => patents/06/852/06852455.pdf
[firstpage_image] =>[orig_patent_app_number] => 10237643
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/237643 | Amorphous carbon absorber/shifter film for attenuated phase shift mask | Sep 8, 2002 | Issued |
Array
(
[id] => 6650151
[patent_doc_number] => 20030008222
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-01-09
[patent_title] => 'Phase shift mask layout process for patterns including intersecting line segments'
[patent_app_type] => new
[patent_app_number] => 10/235458
[patent_app_country] => US
[patent_app_date] => 2002-09-05
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0008/20030008222.pdf
[firstpage_image] =>[orig_patent_app_number] => 10235458
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/235458 | Phase shift mask layout process for patterns including intersecting line segments | Sep 4, 2002 | Issued |
Array
(
[id] => 1024321
[patent_doc_number] => 06884551
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[patent_kind] => B2
[patent_issue_date] => 2005-04-26
[patent_title] => 'Method and system of lithography using masks having gray-tone features'
[patent_app_type] => utility
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/234783 | Method and system of lithography using masks having gray-tone features | Sep 3, 2002 | Issued |
Array
(
[id] => 6653394
[patent_doc_number] => 20030077039
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[patent_issue_date] => 2003-04-24
[patent_title] => 'Process for the fabrication of a phase mask for optical fiber processing, optical fiber-processing phase mask, optical fiber with a bragg grating, and dispersion compensating device using the optical fiber'
[patent_app_type] => new
[patent_app_number] => 10/234452
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[firstpage_image] =>[orig_patent_app_number] => 10234452
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/234452 | Process for the fabrication of a phase mask for optical fiber processing, optical fiber-processing phase mask, optical fiber with a Bragg grating, and dispersion compensating device using the optical fiber | Sep 2, 2002 | Issued |
Array
(
[id] => 6720575
[patent_doc_number] => 20030054263
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[patent_issue_date] => 2003-03-20
[patent_title] => 'Mask for manufacturing semiconductor devices, method for fabricating the same, and exposure method for the same'
[patent_app_type] => new
[patent_app_number] => 10/233282
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[pdf_file] => publications/A1/0054/20030054263.pdf
[firstpage_image] =>[orig_patent_app_number] => 10233282
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/233282 | Mask for manufacturing semiconductor devices, method for fabricating the same, and exposure method for the same | Aug 29, 2002 | Issued |
Array
(
[id] => 1098867
[patent_doc_number] => 06818359
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-11-16
[patent_title] => 'Reticles and methods of forming and using the same'
[patent_app_type] => B2
[patent_app_number] => 10/230946
[patent_app_country] => US
[patent_app_date] => 2002-08-29
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/818/06818359.pdf
[firstpage_image] =>[orig_patent_app_number] => 10230946
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/230946 | Reticles and methods of forming and using the same | Aug 28, 2002 | Issued |