
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1283965
[patent_doc_number] => 06638667
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-10-28
[patent_title] => 'Fabricating optical elements using a photoresist formed using of a gray level mask'
[patent_app_type] => B2
[patent_app_number] => 10/158941
[patent_app_country] => US
[patent_app_date] => 2002-06-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 11
[patent_no_of_words] => 4927
[patent_no_of_claims] => 10
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[patent_words_short_claim] => 93
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/638/06638667.pdf
[firstpage_image] =>[orig_patent_app_number] => 10158941
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/158941 | Fabricating optical elements using a photoresist formed using of a gray level mask | Jun 2, 2002 | Issued |
Array
(
[id] => 1082713
[patent_doc_number] => 06833223
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-12-21
[patent_title] => 'Multilayer-film reflective mirrors and optical systems comprising same'
[patent_app_type] => B2
[patent_app_number] => 10/161118
[patent_app_country] => US
[patent_app_date] => 2002-05-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[patent_no_of_words] => 6551
[patent_no_of_claims] => 29
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[patent_words_short_claim] => 159
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/833/06833223.pdf
[firstpage_image] =>[orig_patent_app_number] => 10161118
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/161118 | Multilayer-film reflective mirrors and optical systems comprising same | May 30, 2002 | Issued |
Array
(
[id] => 1263909
[patent_doc_number] => 06660437
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-12-09
[patent_title] => 'Alternating phase mask'
[patent_app_type] => B2
[patent_app_number] => 10/158733
[patent_app_country] => US
[patent_app_date] => 2002-05-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[patent_no_of_words] => 4113
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/660/06660437.pdf
[firstpage_image] =>[orig_patent_app_number] => 10158733
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/158733 | Alternating phase mask | May 29, 2002 | Issued |
Array
(
[id] => 1364322
[patent_doc_number] => 06566023
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-05-20
[patent_title] => 'Phase shifting circuit manufacture method and apparatus'
[patent_app_type] => B2
[patent_app_number] => 10/154858
[patent_app_country] => US
[patent_app_date] => 2002-05-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[patent_no_of_words] => 5891
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/566/06566023.pdf
[firstpage_image] =>[orig_patent_app_number] => 10154858
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/154858 | Phase shifting circuit manufacture method and apparatus | May 23, 2002 | Issued |
Array
(
[id] => 6444234
[patent_doc_number] => 20020177050
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-11-28
[patent_title] => 'Phase shift mask and design method therefor'
[patent_app_type] => new
[patent_app_number] => 10/152809
[patent_app_country] => US
[patent_app_date] => 2002-05-23
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0177/20020177050.pdf
[firstpage_image] =>[orig_patent_app_number] => 10152809
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/152809 | Phase shift mask and design method therefor | May 22, 2002 | Abandoned |
Array
(
[id] => 731990
[patent_doc_number] => 07037626
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-05-02
[patent_title] => 'Lithographic method of manufacturing a device'
[patent_app_type] => utility
[patent_app_number] => 10/478339
[patent_app_country] => US
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[pdf_file] => patents/07/037/07037626.pdf
[firstpage_image] =>[orig_patent_app_number] => 10478339
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/478339 | Lithographic method of manufacturing a device | May 15, 2002 | Issued |
Array
(
[id] => 1037347
[patent_doc_number] => 06872495
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-03-29
[patent_title] => 'Method for fabricating a lithographic reflection mask in particular for the patterning of a semiconductor wafer, and a reflection mask'
[patent_app_type] => utility
[patent_app_number] => 10/147543
[patent_app_country] => US
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[patent_effective_date] => 0000-00-00
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/872/06872495.pdf
[firstpage_image] =>[orig_patent_app_number] => 10147543
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/147543 | Method for fabricating a lithographic reflection mask in particular for the patterning of a semiconductor wafer, and a reflection mask | May 15, 2002 | Issued |
Array
(
[id] => 6733114
[patent_doc_number] => 20030010749
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-01-16
[patent_title] => 'Mask for fabrication of semiconductor devices, process for production of the same, and process for fabrication of semiconductor devices'
[patent_app_type] => new
[patent_app_number] => 10/143797
[patent_app_country] => US
[patent_app_date] => 2002-05-14
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[pdf_file] => publications/A1/0010/20030010749.pdf
[firstpage_image] =>[orig_patent_app_number] => 10143797
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/143797 | Mask for fabrication of semiconductor devices, process for production of the same, and process for fabrication of semiconductor devices | May 13, 2002 | Issued |
Array
(
[id] => 5786793
[patent_doc_number] => 20020160278
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-10-31
[patent_title] => 'Method for designing photolithographic reticle layout, reticle, and photolithographic process'
[patent_app_type] => new
[patent_app_number] => 10/126626
[patent_app_country] => US
[patent_app_date] => 2002-04-22
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[pdf_file] => publications/A1/0160/20020160278.pdf
[firstpage_image] =>[orig_patent_app_number] => 10126626
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/126626 | Method for designing photolithographic reticle layout, reticle, and photolithographic process | Apr 21, 2002 | Issued |
Array
(
[id] => 707160
[patent_doc_number] => 07060395
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-06-13
[patent_title] => 'Photomask, method for forming the same,and method for designing mask pattern'
[patent_app_type] => utility
[patent_app_number] => 10/399762
[patent_app_country] => US
[patent_app_date] => 2002-04-22
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[firstpage_image] =>[orig_patent_app_number] => 10399762
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/399762 | Photomask, method for forming the same,and method for designing mask pattern | Apr 21, 2002 | Issued |
Array
(
[id] => 1516798
[patent_doc_number] => 06500588
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2002-12-31
[patent_title] => 'Reticle cleaning without damaging pellicle'
[patent_app_type] => B2
[patent_app_number] => 10/125853
[patent_app_country] => US
[patent_app_date] => 2002-04-19
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/500/06500588.pdf
[firstpage_image] =>[orig_patent_app_number] => 10125853
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/125853 | Reticle cleaning without damaging pellicle | Apr 18, 2002 | Issued |
Array
(
[id] => 1040435
[patent_doc_number] => 06869732
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-03-22
[patent_title] => 'Glass substrate for photomasks and preparation method'
[patent_app_type] => utility
[patent_app_number] => 10/125518
[patent_app_country] => US
[patent_app_date] => 2002-04-19
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[pdf_file] => patents/06/869/06869732.pdf
[firstpage_image] =>[orig_patent_app_number] => 10125518
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/125518 | Glass substrate for photomasks and preparation method | Apr 18, 2002 | Issued |
Array
(
[id] => 978733
[patent_doc_number] => 06929887
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2005-08-16
[patent_title] => 'Printable assist lines and the removal of such'
[patent_app_type] => utility
[patent_app_number] => 10/125215
[patent_app_country] => US
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[pdf_file] => patents/06/929/06929887.pdf
[firstpage_image] =>[orig_patent_app_number] => 10125215
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/125215 | Printable assist lines and the removal of such | Apr 17, 2002 | Issued |
Array
(
[id] => 6259550
[patent_doc_number] => 20020187405
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[patent_title] => 'Ion-beam deposition process for manufacturing attenuated phase shift photomask blanks'
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[firstpage_image] =>[orig_patent_app_number] => 10123724
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Array
(
[id] => 6874319
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[patent_issue_date] => 2003-10-16
[patent_title] => 'Ion-beam deposition process for manufacture of binary photomask blanks'
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Array
(
[id] => 1241007
[patent_doc_number] => 06682860
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[patent_issue_date] => 2004-01-27
[patent_title] => 'Attenuated embedded phase shift photomask blanks'
[patent_app_type] => B2
[patent_app_number] => 10/122876
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[firstpage_image] =>[orig_patent_app_number] => 10122876
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/122876 | Attenuated embedded phase shift photomask blanks | Apr 11, 2002 | Issued |
Array
(
[id] => 648831
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[patent_title] => 'Preparation of photomasks'
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Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/118971 | Method of forming a phase shift mask | Apr 9, 2002 | Abandoned |
Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/118916 | Mask for adjusting transmittance of a light and method for manufacturing the same | Apr 9, 2002 | Issued |
Array
(
[id] => 1119211
[patent_doc_number] => 06797439
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[patent_title] => 'Photomask with back-side anti-reflective layer and method of manufacture'
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[pdf_file] => patents/06/797/06797439.pdf
[firstpage_image] =>[orig_patent_app_number] => 10113007
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/113007 | Photomask with back-side anti-reflective layer and method of manufacture | Mar 28, 2002 | Issued |