
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1364312
[patent_doc_number] => 06566022
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-05-20
[patent_title] => 'Micro devices manufacturing method and apparatus therefor'
[patent_app_type] => B2
[patent_app_number] => 09/930310
[patent_app_country] => US
[patent_app_date] => 2001-08-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 23
[patent_no_of_words] => 10112
[patent_no_of_claims] => 19
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[patent_words_short_claim] => 67
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/566/06566022.pdf
[firstpage_image] =>[orig_patent_app_number] => 09930310
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/930310 | Micro devices manufacturing method and apparatus therefor | Aug 15, 2001 | Issued |
Array
(
[id] => 1279917
[patent_doc_number] => 06641959
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-11-04
[patent_title] => 'Absorberless phase-shifting mask for EUV'
[patent_app_type] => B2
[patent_app_number] => 09/927100
[patent_app_country] => US
[patent_app_date] => 2001-08-09
[patent_effective_date] => 0000-00-00
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[patent_no_of_words] => 3959
[patent_no_of_claims] => 22
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/641/06641959.pdf
[firstpage_image] =>[orig_patent_app_number] => 09927100
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/927100 | Absorberless phase-shifting mask for EUV | Aug 8, 2001 | Issued |
Array
(
[id] => 1266165
[patent_doc_number] => 06656645
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-12-02
[patent_title] => 'Method of manufacturing a photomask'
[patent_app_type] => B2
[patent_app_number] => 09/924769
[patent_app_country] => US
[patent_app_date] => 2001-08-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 38
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[pdf_file] => patents/06/656/06656645.pdf
[firstpage_image] =>[orig_patent_app_number] => 09924769
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/924769 | Method of manufacturing a photomask | Aug 8, 2001 | Issued |
Array
(
[id] => 7640476
[patent_doc_number] => 06395436
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2002-05-28
[patent_title] => 'Reticle cleaning without damaging pellicle'
[patent_app_type] => B2
[patent_app_number] => 09/924636
[patent_app_country] => US
[patent_app_date] => 2001-08-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[patent_no_of_words] => 3857
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/395/06395436.pdf
[firstpage_image] =>[orig_patent_app_number] => 09924636
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/924636 | Reticle cleaning without damaging pellicle | Aug 7, 2001 | Issued |
Array
(
[id] => 1334480
[patent_doc_number] => 06593041
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-07-15
[patent_title] => 'Damascene extreme ultraviolet lithography (EUVL) photomask and method of making'
[patent_app_type] => B2
[patent_app_number] => 09/919680
[patent_app_country] => US
[patent_app_date] => 2001-07-31
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/593/06593041.pdf
[firstpage_image] =>[orig_patent_app_number] => 09919680
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/919680 | Damascene extreme ultraviolet lithography (EUVL) photomask and method of making | Jul 30, 2001 | Issued |
Array
(
[id] => 7064771
[patent_doc_number] => 20010044057
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-11-22
[patent_title] => 'Subresolution grating for attenuated phase shifting mask fabrication'
[patent_app_type] => new
[patent_app_number] => 09/918064
[patent_app_country] => US
[patent_app_date] => 2001-07-30
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[pdf_file] => publications/A1/0044/20010044057.pdf
[firstpage_image] =>[orig_patent_app_number] => 09918064
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/918064 | Subresolution grating for attenuated phase shifting mask fabrication | Jul 29, 2001 | Issued |
Array
(
[id] => 6744890
[patent_doc_number] => 20030022073
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-01-30
[patent_title] => 'Fluoropolymer-coated photomasks for photolithography'
[patent_app_type] => new
[patent_app_number] => 09/916732
[patent_app_country] => US
[patent_app_date] => 2001-07-26
[patent_effective_date] => 0000-00-00
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[patent_no_of_words] => 2906
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[pdf_file] => publications/A1/0022/20030022073.pdf
[firstpage_image] =>[orig_patent_app_number] => 09916732
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/916732 | Fluoropolymer-coated photomasks for photolithography | Jul 25, 2001 | Issued |
Array
(
[id] => 6015460
[patent_doc_number] => 20020102473
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-08-01
[patent_title] => 'Photo mask having film formed from halftone material, method of manufacturing photo mask, and method of manufacturing semiconductor device'
[patent_app_type] => new
[patent_app_number] => 09/912536
[patent_app_country] => US
[patent_app_date] => 2001-07-26
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0102/20020102473.pdf
[firstpage_image] =>[orig_patent_app_number] => 09912536
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/912536 | Photo mask having film formed from halftone material, method of manufacturing photo mask, and method of manufacturing semiconductor device | Jul 25, 2001 | Issued |
Array
(
[id] => 5888264
[patent_doc_number] => 20020012851
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-01-31
[patent_title] => 'Ternary photomask and method of making the same'
[patent_app_type] => new
[patent_app_number] => 09/682121
[patent_app_country] => US
[patent_app_date] => 2001-07-24
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 09682121
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/682121 | Ternary photomask and method of making the same | Jul 23, 2001 | Abandoned |
Array
(
[id] => 1279911
[patent_doc_number] => 06641958
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-11-04
[patent_title] => 'Phase shift mask blank, phase shift mask, and methods of manufacture'
[patent_app_type] => B2
[patent_app_number] => 09/902645
[patent_app_country] => US
[patent_app_date] => 2001-07-12
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/641/06641958.pdf
[firstpage_image] =>[orig_patent_app_number] => 09902645
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/902645 | Phase shift mask blank, phase shift mask, and methods of manufacture | Jul 11, 2001 | Issued |
Array
(
[id] => 7014259
[patent_doc_number] => 20010051304
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-12-13
[patent_title] => 'Method and apparatus for a reflective mask that is inspected at a first wavelength and exposed during semiconductor manufacturing at a second wavelength'
[patent_app_type] => new
[patent_app_number] => 09/899881
[patent_app_country] => US
[patent_app_date] => 2001-07-05
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0051/20010051304.pdf
[firstpage_image] =>[orig_patent_app_number] => 09899881
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/899881 | Method and apparatus for a reflective mask that is inspected at a first wavelength and exposed during semiconductor manufacturing at a second wavelength | Jul 4, 2001 | Issued |
Array
(
[id] => 6650119
[patent_doc_number] => 20030008215
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-01-09
[patent_title] => 'Method for correcting optical proximity effects in a lithographic process using the radius of curvature of shapes on a mask'
[patent_app_type] => new
[patent_app_number] => 09/898201
[patent_app_country] => US
[patent_app_date] => 2001-07-03
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[pdf_file] => publications/A1/0008/20030008215.pdf
[firstpage_image] =>[orig_patent_app_number] => 09898201
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/898201 | Method for correcting optical proximity effects in a lithographic process using the radius of curvature of shapes on a mask | Jul 2, 2001 | Issued |
Array
(
[id] => 6986751
[patent_doc_number] => 20010036583
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-11-01
[patent_title] => 'Photomask and pattern forming method employing the same'
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[patent_app_number] => 09/893532
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Array
(
[id] => 1359280
[patent_doc_number] => 06569584
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-05-27
[patent_title] => 'Methods and structures for protecting reticles from electrostatic damage'
[patent_app_type] => B1
[patent_app_number] => 09/895538
[patent_app_country] => US
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[firstpage_image] =>[orig_patent_app_number] => 09895538
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/895538 | Methods and structures for protecting reticles from electrostatic damage | Jun 28, 2001 | Issued |
Array
(
[id] => 1398829
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[patent_issue_date] => 2003-03-18
[patent_title] => 'Tapered ion implantation with femtosecond laser ablation to remove printable alternating phase shift features'
[patent_app_type] => B2
[patent_app_number] => 09/892957
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/892957 | Tapered ion implantation with femtosecond laser ablation to remove printable alternating phase shift features | Jun 26, 2001 | Issued |
Array
(
[id] => 6884793
[patent_doc_number] => 20010038954
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[patent_kind] => A1
[patent_issue_date] => 2001-11-08
[patent_title] => 'Method and apparatus for repairing an alternating phase shift mask'
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[patent_app_number] => 09/893151
[patent_app_country] => US
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[firstpage_image] =>[orig_patent_app_number] => 09893151
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/893151 | Method and apparatus for repairing a photomask | Jun 25, 2001 | Issued |
Array
(
[id] => 6325552
[patent_doc_number] => 20020197541
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[patent_issue_date] => 2002-12-26
[patent_title] => 'Method and apparatus for forming a pattern on an integrated circuit using differing exposure characteristics'
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Array
(
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[patent_title] => 'Photoresist mask that combines attenuated and alternating phase shifting masks'
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Array
(
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Array
(
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[patent_title] => 'Method and apparatus for using phase shifter cutbacks to resolve phase shifter conflicts'
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[patent_app_number] => 09/876306
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/876306 | Method and apparatus for using phase shifter cutbacks to resolve phase shifter conflicts | Jun 5, 2001 | Issued |