
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6896235
[patent_doc_number] => 20010027025
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-10-04
[patent_title] => 'Projection lithography photomask blanks, preforms and method of making'
[patent_app_type] => new
[patent_app_number] => 09/876194
[patent_app_country] => US
[patent_app_date] => 2001-06-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 12
[patent_no_of_words] => 8235
[patent_no_of_claims] => 81
[patent_no_of_ind_claims] => 12
[patent_words_short_claim] => 19
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0027/20010027025.pdf
[firstpage_image] =>[orig_patent_app_number] => 09876194
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/876194 | Projection lithography photomask blanks, preforms and method of making | Jun 5, 2001 | Issued |
Array
(
[id] => 6557621
[patent_doc_number] => 20020164533
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-11-07
[patent_title] => 'Method and apparatus for reducing color conflicts during trim generation for phase shifters'
[patent_app_type] => new
[patent_app_number] => 09/876307
[patent_app_country] => US
[patent_app_date] => 2001-06-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 10
[patent_no_of_words] => 4114
[patent_no_of_claims] => 33
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 92
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0164/20020164533.pdf
[firstpage_image] =>[orig_patent_app_number] => 09876307
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/876307 | Method and apparatus for reducing color conflicts during trim generation for phase shifters | Jun 5, 2001 | Issued |
Array
(
[id] => 1286473
[patent_doc_number] => 06635394
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-10-21
[patent_title] => 'Three dimensional mask'
[patent_app_type] => B2
[patent_app_number] => 09/871073
[patent_app_country] => US
[patent_app_date] => 2001-05-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 5
[patent_no_of_words] => 2064
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 88
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/635/06635394.pdf
[firstpage_image] =>[orig_patent_app_number] => 09871073
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/871073 | Three dimensional mask | May 30, 2001 | Issued |
Array
(
[id] => 1296482
[patent_doc_number] => 06627359
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-09-30
[patent_title] => 'Phase-shift photomask manufacturing method and phase-shift photomask'
[patent_app_type] => B2
[patent_app_number] => 09/859552
[patent_app_country] => US
[patent_app_date] => 2001-05-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 13
[patent_no_of_words] => 5490
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 143
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/627/06627359.pdf
[firstpage_image] =>[orig_patent_app_number] => 09859552
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/859552 | Phase-shift photomask manufacturing method and phase-shift photomask | May 16, 2001 | Issued |
Array
(
[id] => 6524427
[patent_doc_number] => 20020192569
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-12-19
[patent_title] => 'Devices and methods for exposure of photoreactive compositions with light emitting diodes'
[patent_app_type] => new
[patent_app_number] => 09/858272
[patent_app_country] => US
[patent_app_date] => 2001-05-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 4034
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 70
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0192/20020192569.pdf
[firstpage_image] =>[orig_patent_app_number] => 09858272
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/858272 | Devices and methods for exposure of photoreactive compositions with light emitting diodes | May 14, 2001 | Abandoned |
Array
(
[id] => 6901460
[patent_doc_number] => 20010023043
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-09-20
[patent_title] => 'Optical proximity correction methods, and methods of forming radiation-patterning tools'
[patent_app_type] => new
[patent_app_number] => 09/858834
[patent_app_country] => US
[patent_app_date] => 2001-05-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 3596
[patent_no_of_claims] => 27
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 118
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0023/20010023043.pdf
[firstpage_image] =>[orig_patent_app_number] => 09858834
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/858834 | Optical proximity correction methods, and methods forming radiation-patterning tools | May 14, 2001 | Issued |
Array
(
[id] => 6404780
[patent_doc_number] => 20020182514
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-12-05
[patent_title] => 'Organic bottom antireflective coating for high performance mask making using optical imaging'
[patent_app_type] => new
[patent_app_number] => 09/848859
[patent_app_country] => US
[patent_app_date] => 2001-05-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 9494
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 61
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0182/20020182514.pdf
[firstpage_image] =>[orig_patent_app_number] => 09848859
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/848859 | Organic bottom antireflective coating for high performance mask making using optical imaging | May 2, 2001 | Issued |
Array
(
[id] => 1334448
[patent_doc_number] => 06593037
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-07-15
[patent_title] => 'EUV mask or reticle having reduced reflections'
[patent_app_type] => B1
[patent_app_number] => 09/847803
[patent_app_country] => US
[patent_app_date] => 2001-05-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 5
[patent_no_of_words] => 2793
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 38
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/593/06593037.pdf
[firstpage_image] =>[orig_patent_app_number] => 09847803
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/847803 | EUV mask or reticle having reduced reflections | May 1, 2001 | Issued |
Array
(
[id] => 1317321
[patent_doc_number] => 06605393
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-08-12
[patent_title] => 'Alternative PSM with new phase conflict canceling method'
[patent_app_type] => B2
[patent_app_number] => 09/847485
[patent_app_country] => US
[patent_app_date] => 2001-05-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 14
[patent_no_of_words] => 2202
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 116
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/605/06605393.pdf
[firstpage_image] =>[orig_patent_app_number] => 09847485
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/847485 | Alternative PSM with new phase conflict canceling method | May 1, 2001 | Issued |
Array
(
[id] => 1369307
[patent_doc_number] => 06562525
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-05-13
[patent_title] => 'Photo mask to be used for photolithography, method of inspecting pattern defect, and method of manufacturing semiconductor device through use of the mask'
[patent_app_type] => B2
[patent_app_number] => 09/843693
[patent_app_country] => US
[patent_app_date] => 2001-04-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 9
[patent_no_of_words] => 3590
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 75
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/562/06562525.pdf
[firstpage_image] =>[orig_patent_app_number] => 09843693
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/843693 | Photo mask to be used for photolithography, method of inspecting pattern defect, and method of manufacturing semiconductor device through use of the mask | Apr 29, 2001 | Issued |
Array
(
[id] => 5786787
[patent_doc_number] => 20020160275
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-10-31
[patent_title] => 'Dark field trench in an alternating phase shift mask to avoid phase conflict'
[patent_app_type] => new
[patent_app_number] => 09/844015
[patent_app_country] => US
[patent_app_date] => 2001-04-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 2970
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 52
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0160/20020160275.pdf
[firstpage_image] =>[orig_patent_app_number] => 09844015
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/844015 | Dark field trench in an alternating phase shift mask to avoid phase conflict | Apr 26, 2001 | Issued |
Array
(
[id] => 1154612
[patent_doc_number] => 06764792
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-07-20
[patent_title] => 'Halftone phase shift photomask and blanks for halftone phase shift photomask for producing it'
[patent_app_type] => B1
[patent_app_number] => 09/830598
[patent_app_country] => US
[patent_app_date] => 2001-04-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 23
[patent_no_of_words] => 5828
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 43
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/764/06764792.pdf
[firstpage_image] =>[orig_patent_app_number] => 09830598
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/830598 | Halftone phase shift photomask and blanks for halftone phase shift photomask for producing it | Apr 26, 2001 | Issued |
Array
(
[id] => 6884792
[patent_doc_number] => 20010038953
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-11-08
[patent_title] => 'Reflection-type mask for use in pattern exposure, manufacturing method therefor, exposure apparatus, and method of manufacturing a device'
[patent_app_type] => new
[patent_app_number] => 09/842056
[patent_app_country] => US
[patent_app_date] => 2001-04-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 7258
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 67
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0038/20010038953.pdf
[firstpage_image] =>[orig_patent_app_number] => 09842056
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/842056 | Reflection-type mask for use in pattern exposure, manufacturing method therefor, exposure apparatus, and method of manufacturing a device | Apr 25, 2001 | Issued |
Array
(
[id] => 5814568
[patent_doc_number] => 20020039689
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-04-04
[patent_title] => 'Halftone phase shift photomask and blank for halftone phase shift photomask'
[patent_app_type] => new
[patent_app_number] => 09/843309
[patent_app_country] => US
[patent_app_date] => 2001-04-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 9472
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 48
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0039/20020039689.pdf
[firstpage_image] =>[orig_patent_app_number] => 09843309
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/843309 | Halftone phase shift photomask and blank for halftone phase shift photomask | Apr 25, 2001 | Issued |
Array
(
[id] => 5905503
[patent_doc_number] => 20020142232
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-10-03
[patent_title] => 'Using double exposure effects during phase shifting to control line end shortening'
[patent_app_type] => new
[patent_app_number] => 09/843498
[patent_app_country] => US
[patent_app_date] => 2001-04-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 3673
[patent_no_of_claims] => 31
[patent_no_of_ind_claims] => 9
[patent_words_short_claim] => 107
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0142/20020142232.pdf
[firstpage_image] =>[orig_patent_app_number] => 09843498
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/843498 | Using double exposure effects during phase shifting to control line end shortening | Apr 24, 2001 | Issued |
Array
(
[id] => 5905502
[patent_doc_number] => 20020142231
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-10-03
[patent_title] => 'Method and apparatus for reducing incidental exposure by using a phase shifter with a variable regulator'
[patent_app_type] => new
[patent_app_number] => 09/843487
[patent_app_country] => US
[patent_app_date] => 2001-04-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 3669
[patent_no_of_claims] => 23
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 139
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0142/20020142231.pdf
[firstpage_image] =>[orig_patent_app_number] => 09843487
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/843487 | Method and apparatus for reducing incidental exposure by using a phase shifter with a variable regulator | Apr 24, 2001 | Issued |
Array
(
[id] => 6610631
[patent_doc_number] => 20020015899
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-02-07
[patent_title] => 'Hybrid phase-shift mask'
[patent_app_type] => new
[patent_app_number] => 09/840291
[patent_app_country] => US
[patent_app_date] => 2001-04-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
[patent_figures_cnt] => 14
[patent_no_of_words] => 9488
[patent_no_of_claims] => 35
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 57
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0015/20020015899.pdf
[firstpage_image] =>[orig_patent_app_number] => 09840291
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/840291 | Hybrid phase-shift mask | Apr 23, 2001 | Issued |
Array
(
[id] => 7064768
[patent_doc_number] => 20010044054
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-11-22
[patent_title] => 'Photomask blank and photomask'
[patent_app_type] => new
[patent_app_number] => 09/840097
[patent_app_country] => US
[patent_app_date] => 2001-04-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 5049
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 44
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0044/20010044054.pdf
[firstpage_image] =>[orig_patent_app_number] => 09840097
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/840097 | Photomask blank and photomask | Apr 23, 2001 | Issued |
Array
(
[id] => 6032616
[patent_doc_number] => 20020018942
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-02-14
[patent_title] => 'Vacuum ultraviolet transmitting direct deposit vitrified silicon oxyfluoride lithography glass photomask blanks'
[patent_app_type] => new
[patent_app_number] => 09/841517
[patent_app_country] => US
[patent_app_date] => 2001-04-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 17
[patent_figures_cnt] => 17
[patent_no_of_words] => 13824
[patent_no_of_claims] => 50
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 64
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0018/20020018942.pdf
[firstpage_image] =>[orig_patent_app_number] => 09841517
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/841517 | Vacuum ultraviolet transmitting direct deposit vitrified silicon oxyfluoride lithography glass photomask blanks | Apr 23, 2001 | Issued |
Array
(
[id] => 6141435
[patent_doc_number] => 20020001758
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-01-03
[patent_title] => 'Optical proximity correction'
[patent_app_type] => new
[patent_app_number] => 09/840307
[patent_app_country] => US
[patent_app_date] => 2001-04-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 35
[patent_figures_cnt] => 35
[patent_no_of_words] => 12829
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 44
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0001/20020001758.pdf
[firstpage_image] =>[orig_patent_app_number] => 09840307
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/840307 | Optical proximity correction | Apr 23, 2001 | Issued |