
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1296477
[patent_doc_number] => 06627358
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-09-30
[patent_title] => 'Mask repair in resist image'
[patent_app_type] => B1
[patent_app_number] => 09/838514
[patent_app_country] => US
[patent_app_date] => 2001-04-20
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/627/06627358.pdf
[firstpage_image] =>[orig_patent_app_number] => 09838514
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/838514 | Mask repair in resist image | Apr 19, 2001 | Issued |
Array
(
[id] => 1559136
[patent_doc_number] => 06436590
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[patent_kind] => B1
[patent_issue_date] => 2002-08-20
[patent_title] => 'Phase shifting circuit manufacture method and apparatus'
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[pdf_file] => patents/06/436/06436590.pdf
[firstpage_image] =>[orig_patent_app_number] => 09839672
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/839672 | Phase shifting circuit manufacture method and apparatus | Apr 19, 2001 | Issued |
Array
(
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[patent_doc_number] => 06703167
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[patent_kind] => B2
[patent_issue_date] => 2004-03-09
[patent_title] => 'Prioritizing the application of resolution enhancement techniques'
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[patent_app_number] => 09/837889
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[patent_app_date] => 2001-04-18
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/837889 | Prioritizing the application of resolution enhancement techniques | Apr 17, 2001 | Issued |
Array
(
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[patent_doc_number] => 06709791
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[patent_issue_date] => 2004-03-23
[patent_title] => 'Halftone phase shift photomask and blanks for halftone phase shift photomask for it and pattern forming method using this'
[patent_app_type] => B1
[patent_app_number] => 09/807276
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[firstpage_image] =>[orig_patent_app_number] => 09807276
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/807276 | Halftone phase shift photomask and blanks for halftone phase shift photomask for it and pattern forming method using this | Apr 9, 2001 | Issued |
Array
(
[id] => 6586321
[patent_doc_number] => 20020015187
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[patent_issue_date] => 2002-02-07
[patent_title] => 'Halftone phase shifting photomask and blanks for halftone phase shifting photomask therefor and a method for forming pattern by using the halftone phase shifting photomask'
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[patent_app_number] => 09/825578
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/825578 | Halftone phase shifting photomask and blanks for halftone phase shifting photomask therefor and a method for forming pattern by using the halftone phase shifting photomask | Apr 2, 2001 | Issued |
Array
(
[id] => 1311116
[patent_doc_number] => 06610447
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[patent_issue_date] => 2003-08-26
[patent_title] => 'Extreme ultraviolet mask with improved absorber'
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[patent_app_number] => 09/823641
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/823641 | Extreme ultraviolet mask with improved absorber | Mar 29, 2001 | Issued |
Array
(
[id] => 6886534
[patent_doc_number] => 20010019803
[patent_country] => US
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[patent_issue_date] => 2001-09-06
[patent_title] => 'Mitigation of substrate defects in reflective reticles using sequential coating and annealing'
[patent_app_type] => new
[patent_app_number] => 09/819156
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[pdf_file] => publications/A1/0019/20010019803.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/819156 | Mitigation of substrate defects in reflective reticles using sequential coating and annealing | Mar 26, 2001 | Issued |
Array
(
[id] => 1286463
[patent_doc_number] => 06635393
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-10-21
[patent_title] => 'Blank for alternating PSM photomask with charge dissipation layer'
[patent_app_type] => B2
[patent_app_number] => 09/816619
[patent_app_country] => US
[patent_app_date] => 2001-03-23
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[firstpage_image] =>[orig_patent_app_number] => 09816619
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/816619 | Blank for alternating PSM photomask with charge dissipation layer | Mar 22, 2001 | Issued |
Array
(
[id] => 6921498
[patent_doc_number] => 20010028983
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[patent_issue_date] => 2001-10-11
[patent_title] => 'Photomask used in manufacture of semiconductor device, photomask blank, and method of applying light exposure to semiconductor wafer by using said photomask'
[patent_app_type] => new
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/815005 | Photomask used in manufacturing of semiconductor device, photomask blank, and method of applying light exposure to semiconductor wafer by using said photomask | Mar 22, 2001 | Issued |
Array
(
[id] => 7027965
[patent_doc_number] => 20010014425
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[patent_kind] => A1
[patent_issue_date] => 2001-08-16
[patent_title] => 'Phase shift mask and phase shift mask blank'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/814657 | Phase shift mask and phase shift mask blank | Mar 21, 2001 | Issued |
Array
(
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[patent_title] => 'Alternating phase shifting masks'
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Array
(
[id] => 1487350
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[patent_issue_date] => 2002-08-06
[patent_title] => 'Enhanced bright peak clear phase shifting mask and method of use'
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Array
(
[id] => 6533479
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Array
(
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[patent_title] => 'Phaseshift mask and manufacturing the same'
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Array
(
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Array
(
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[patent_title] => 'Method of reshaping a patterned organic photoresist surface'
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Array
(
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Array
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Array
(
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Array
(
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[patent_title] => 'Phase shifter film and process for the same'
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