
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1359205
[patent_doc_number] => 06569580
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-05-27
[patent_title] => 'Binary and phase-shift photomasks'
[patent_app_type] => B2
[patent_app_number] => 09/809733
[patent_app_country] => US
[patent_app_date] => 2001-03-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[patent_no_of_words] => 7193
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/569/06569580.pdf
[firstpage_image] =>[orig_patent_app_number] => 09809733
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/809733 | Binary and phase-shift photomasks | Mar 12, 2001 | Issued |
Array
(
[id] => 1409257
[patent_doc_number] => 06524755
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-02-25
[patent_title] => 'Phase-shift masks and methods of fabrication'
[patent_app_type] => B2
[patent_app_number] => 09/804590
[patent_app_country] => US
[patent_app_date] => 2001-03-12
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/524/06524755.pdf
[firstpage_image] =>[orig_patent_app_number] => 09804590
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/804590 | Phase-shift masks and methods of fabrication | Mar 11, 2001 | Issued |
Array
(
[id] => 1276799
[patent_doc_number] => 06645679
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-11-11
[patent_title] => 'Attenuated phase shift mask for use in EUV lithography and a method of making such a mask'
[patent_app_type] => B1
[patent_app_number] => 09/803853
[patent_app_country] => US
[patent_app_date] => 2001-03-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[patent_no_of_words] => 3873
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[pdf_file] => patents/06/645/06645679.pdf
[firstpage_image] =>[orig_patent_app_number] => 09803853
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/803853 | Attenuated phase shift mask for use in EUV lithography and a method of making such a mask | Mar 11, 2001 | Issued |
Array
(
[id] => 6632052
[patent_doc_number] => 20030211401
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-11-13
[patent_title] => 'Alternating phase shift masking for multiple levels of masking resolution'
[patent_app_type] => new
[patent_app_number] => 10/240006
[patent_app_country] => US
[patent_app_date] => 2002-09-26
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[pdf_file] => publications/A1/0211/20030211401.pdf
[firstpage_image] =>[orig_patent_app_number] => 10240006
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/240006 | Alternating phase shift masking for multiple levels of masking resolution | Mar 7, 2001 | Issued |
Array
(
[id] => 1373168
[patent_doc_number] => 06558855
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[patent_kind] => B2
[patent_issue_date] => 2003-05-06
[patent_title] => 'Phase shift mask and manufacturing the same'
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[patent_app_number] => 09/800501
[patent_app_country] => US
[patent_app_date] => 2001-03-08
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[firstpage_image] =>[orig_patent_app_number] => 09800501
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/800501 | Phase shift mask and manufacturing the same | Mar 7, 2001 | Issued |
Array
(
[id] => 1594627
[patent_doc_number] => 06492072
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2002-12-10
[patent_title] => 'Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass'
[patent_app_type] => B2
[patent_app_number] => 09/799987
[patent_app_country] => US
[patent_app_date] => 2001-03-06
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/492/06492072.pdf
[firstpage_image] =>[orig_patent_app_number] => 09799987
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/799987 | Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass | Mar 5, 2001 | Issued |
Array
(
[id] => 6517459
[patent_doc_number] => 20020135875
[patent_country] => US
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[patent_issue_date] => 2002-09-26
[patent_title] => 'Grating test patterns and methods for overlay metrology'
[patent_app_type] => new
[patent_app_number] => 09/794686
[patent_app_country] => US
[patent_app_date] => 2001-02-27
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0135/20020135875.pdf
[firstpage_image] =>[orig_patent_app_number] => 09794686
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/794686 | Grating test patterns and methods for overlay metrology | Feb 26, 2001 | Issued |
Array
(
[id] => 1415567
[patent_doc_number] => 06514642
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-02-04
[patent_title] => 'Phase shift mask and method of manufacture'
[patent_app_type] => B2
[patent_app_number] => 09/790886
[patent_app_country] => US
[patent_app_date] => 2001-02-23
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/514/06514642.pdf
[firstpage_image] =>[orig_patent_app_number] => 09790886
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/790886 | Phase shift mask and method of manufacture | Feb 22, 2001 | Issued |
Array
(
[id] => 5921465
[patent_doc_number] => 20020115001
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-08-22
[patent_title] => 'Electrostatic discharge effect free mask'
[patent_app_type] => new
[patent_app_number] => 09/792380
[patent_app_country] => US
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[pdf_file] => publications/A1/0115/20020115001.pdf
[firstpage_image] =>[orig_patent_app_number] => 09792380
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/792380 | Electrostatic discharge effect free mask | Feb 20, 2001 | Abandoned |
Array
(
[id] => 5921464
[patent_doc_number] => 20020115000
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-08-22
[patent_title] => 'Method of extreme ultraviolet mask engineering'
[patent_app_type] => new
[patent_app_number] => 09/785116
[patent_app_country] => US
[patent_app_date] => 2001-02-20
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0115/20020115000.pdf
[firstpage_image] =>[orig_patent_app_number] => 09785116
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/785116 | Method of extreme ultraviolet mask engineering | Feb 19, 2001 | Issued |
Array
(
[id] => 1352403
[patent_doc_number] => 06576377
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-06-10
[patent_title] => 'Photo mask pattern designing method, resist pattern fabricating method and semiconductor device manufacturing method'
[patent_app_type] => B2
[patent_app_number] => 09/783973
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[pdf_file] => patents/06/576/06576377.pdf
[firstpage_image] =>[orig_patent_app_number] => 09783973
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/783973 | Photo mask pattern designing method, resist pattern fabricating method and semiconductor device manufacturing method | Feb 15, 2001 | Issued |
Array
(
[id] => 1352423
[patent_doc_number] => 06576378
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[patent_issue_date] => 2003-06-10
[patent_title] => 'Photomask and exposure method for large scaled LCD device'
[patent_app_type] => B2
[patent_app_number] => 09/784092
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/784092 | Photomask and exposure method for large scaled LCD device | Feb 15, 2001 | Issued |
Array
(
[id] => 6886532
[patent_doc_number] => 20010019801
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[patent_issue_date] => 2001-09-06
[patent_title] => 'Photomask blank, photomask and method of manufacture'
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[pdf_file] => publications/A1/0019/20010019801.pdf
[firstpage_image] =>[orig_patent_app_number] => 09783322
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/783322 | Photomask blank, photomask and method of manufacture | Feb 14, 2001 | Issued |
Array
(
[id] => 6947856
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[patent_title] => 'Photomask having small pitch images of openings for fabricating openings in a semiconductor memory device and a photolithographic method for fabricating the same'
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Array
(
[id] => 6632040
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[patent_title] => 'Method of improving photomask geometry'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/203793 | Method of improving photomask geometry | Feb 13, 2001 | Issued |
Array
(
[id] => 6610578
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[patent_title] => 'Method of forming identifying elements for mask read only memory'
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Array
(
[id] => 1352393
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[patent_title] => 'Tri-tone mask process for dense and isolated patterns'
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Array
(
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Array
(
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Array
(
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[firstpage_image] =>[orig_patent_app_number] => 09773122
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/773122 | Electrical critical dimension measurements on photomasks | Jan 30, 2001 | Issued |