Search

Liliana Di Nola Baron

Examiner (ID: 15438)

Most Active Art Unit
1615
Art Unit(s)
1615
Total Applications
361
Issued Applications
209
Pending Applications
88
Abandoned Applications
63

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 6015458 [patent_doc_number] => 20020102471 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-08-01 [patent_title] => 'Phase shift mask and system and method for making the same' [patent_app_type] => new [patent_app_number] => 09/772577 [patent_app_country] => US [patent_app_date] => 2001-01-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 14 [patent_no_of_words] => 5269 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 71 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0102/20020102471.pdf [firstpage_image] =>[orig_patent_app_number] => 09772577 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/772577
Phase shift mask and system and method for making the same Jan 29, 2001 Issued
Array ( [id] => 1386997 [patent_doc_number] => 06544694 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-04-08 [patent_title] => 'Method of manufacturing a device by means of a mask phase-shifting mask for use in said method' [patent_app_type] => B2 [patent_app_number] => 09/772485 [patent_app_country] => US [patent_app_date] => 2001-01-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 10 [patent_no_of_words] => 7803 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 201 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/544/06544694.pdf [firstpage_image] =>[orig_patent_app_number] => 09772485 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/772485
Method of manufacturing a device by means of a mask phase-shifting mask for use in said method Jan 28, 2001 Issued
Array ( [id] => 1386980 [patent_doc_number] => 06544693 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-04-08 [patent_title] => 'Pellicle for use in small wavelength lithography and a method for making such a pellicle' [patent_app_type] => B2 [patent_app_number] => 09/770733 [patent_app_country] => US [patent_app_date] => 2001-01-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 8 [patent_no_of_words] => 3471 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 58 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/544/06544693.pdf [firstpage_image] =>[orig_patent_app_number] => 09770733 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/770733
Pellicle for use in small wavelength lithography and a method for making such a pellicle Jan 25, 2001 Issued
Array ( [id] => 1334429 [patent_doc_number] => 06593035 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-07-15 [patent_title] => 'Pellicle for use in small wavelength lithography and a method for making such a pellicle using polymer films' [patent_app_type] => B1 [patent_app_number] => 09/771236 [patent_app_country] => US [patent_app_date] => 2001-01-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 8 [patent_no_of_words] => 3431 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 38 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/593/06593035.pdf [firstpage_image] =>[orig_patent_app_number] => 09771236 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/771236
Pellicle for use in small wavelength lithography and a method for making such a pellicle using polymer films Jan 25, 2001 Issued
Array ( [id] => 1409240 [patent_doc_number] => 06524754 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-02-25 [patent_title] => 'Fused silica pellicle' [patent_app_type] => B2 [patent_app_number] => 09/766907 [patent_app_country] => US [patent_app_date] => 2001-01-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 4 [patent_no_of_words] => 1770 [patent_no_of_claims] => 36 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 54 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/524/06524754.pdf [firstpage_image] =>[orig_patent_app_number] => 09766907 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/766907
Fused silica pellicle Jan 21, 2001 Issued
Array ( [id] => 6921496 [patent_doc_number] => 20010028981 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-10-11 [patent_title] => 'Data processing apparatus, method and program product for compensating for photo proximity effect with reduced data amount, and photomask fabricated using same' [patent_app_type] => new [patent_app_number] => 09/764162 [patent_app_country] => US [patent_app_date] => 2001-01-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 3221 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 8 [patent_words_short_claim] => 111 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0028/20010028981.pdf [firstpage_image] =>[orig_patent_app_number] => 09764162 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/764162
Data processing apparatus, method and program product for compensating for photo proximity effect with reduced data amount, and photomask fabricated using same Jan 18, 2001 Issued
Array ( [id] => 1390445 [patent_doc_number] => 06541166 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-04-01 [patent_title] => 'Method and apparatus for lithographically printing tightly nested and isolated device features using multiple mask exposures' [patent_app_type] => B2 [patent_app_number] => 09/766005 [patent_app_country] => US [patent_app_date] => 2001-01-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 5135 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 114 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/541/06541166.pdf [firstpage_image] =>[orig_patent_app_number] => 09766005 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/766005
Method and apparatus for lithographically printing tightly nested and isolated device features using multiple mask exposures Jan 17, 2001 Issued
Array ( [id] => 6947842 [patent_doc_number] => 20010021476 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-09-13 [patent_title] => 'Phase mask' [patent_app_type] => new [patent_app_number] => 09/761810 [patent_app_country] => US [patent_app_date] => 2001-01-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 4512 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 94 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0021/20010021476.pdf [firstpage_image] =>[orig_patent_app_number] => 09761810 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/761810
Phase mask Jan 15, 2001 Abandoned
Array ( [id] => 6900069 [patent_doc_number] => 20010009745 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-07-26 [patent_title] => 'Half tone phase shift mask having a stepped aperture' [patent_app_type] => new [patent_app_number] => 09/759161 [patent_app_country] => US [patent_app_date] => 2001-01-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 6855 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 265 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0009/20010009745.pdf [firstpage_image] =>[orig_patent_app_number] => 09759161 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/759161
Half-tone phase shift mask having a stepped aperture Jan 15, 2001 Issued
Array ( [id] => 1422682 [patent_doc_number] => 06503668 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-01-07 [patent_title] => 'Phase shift mask blank, phase shift mask, and method of manufacture' [patent_app_type] => B2 [patent_app_number] => 09/757615 [patent_app_country] => US [patent_app_date] => 2001-01-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 13 [patent_no_of_words] => 4470 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 39 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/503/06503668.pdf [firstpage_image] =>[orig_patent_app_number] => 09757615 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/757615
Phase shift mask blank, phase shift mask, and method of manufacture Jan 10, 2001 Issued
Array ( [id] => 1413723 [patent_doc_number] => 06511778 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-01-28 [patent_title] => 'Phase shift mask blank, phase shift mask and method of manufacture' [patent_app_type] => B2 [patent_app_number] => 09/753517 [patent_app_country] => US [patent_app_date] => 2001-01-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 14 [patent_no_of_words] => 6283 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 62 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/511/06511778.pdf [firstpage_image] =>[orig_patent_app_number] => 09753517 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/753517
Phase shift mask blank, phase shift mask and method of manufacture Jan 3, 2001 Issued
Array ( [id] => 1287772 [patent_doc_number] => 06632576 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-10-14 [patent_title] => 'Optical assist feature for two-mask exposure lithography' [patent_app_type] => B2 [patent_app_number] => 09/751175 [patent_app_country] => US [patent_app_date] => 2000-12-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 3520 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 49 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/632/06632576.pdf [firstpage_image] =>[orig_patent_app_number] => 09751175 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/751175
Optical assist feature for two-mask exposure lithography Dec 29, 2000 Issued
Array ( [id] => 1406487 [patent_doc_number] => 06528216 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-03-04 [patent_title] => 'Phase shift mask and fabrication method thereof' [patent_app_type] => B2 [patent_app_number] => 09/749574 [patent_app_country] => US [patent_app_date] => 2000-12-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 19 [patent_no_of_words] => 3747 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 78 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/528/06528216.pdf [firstpage_image] =>[orig_patent_app_number] => 09749574 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/749574
Phase shift mask and fabrication method thereof Dec 27, 2000 Issued
Array ( [id] => 6876600 [patent_doc_number] => 20010006753 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-07-05 [patent_title] => 'Photomask and method of fabricating the same' [patent_app_type] => new-utility [patent_app_number] => 09/745967 [patent_app_country] => US [patent_app_date] => 2000-12-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 6790 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 59 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0006/20010006753.pdf [firstpage_image] =>[orig_patent_app_number] => 09745967 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/745967
Photomask and method of fabricating the same Dec 21, 2000 Issued
Array ( [id] => 6896237 [patent_doc_number] => 20010027027 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-10-04 [patent_title] => 'Ferroelectric random access memory device and method for manufacture thereof' [patent_app_type] => new [patent_app_number] => 09/740926 [patent_app_country] => US [patent_app_date] => 2000-12-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 1558 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 102 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0027/20010027027.pdf [firstpage_image] =>[orig_patent_app_number] => 09740926 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/740926
Method for manufacturing phase shift mask Dec 20, 2000 Issued
Array ( [id] => 1296457 [patent_doc_number] => 06627355 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-09-30 [patent_title] => 'Method of and system for improving stability of photomasks' [patent_app_type] => B2 [patent_app_number] => 09/742970 [patent_app_country] => US [patent_app_date] => 2000-12-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 12 [patent_no_of_words] => 3280 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 54 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/627/06627355.pdf [firstpage_image] =>[orig_patent_app_number] => 09742970 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/742970
Method of and system for improving stability of photomasks Dec 19, 2000 Issued
Array ( [id] => 1269339 [patent_doc_number] => 06653026 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-11-25 [patent_title] => 'Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask' [patent_app_type] => B2 [patent_app_number] => 09/746369 [patent_app_country] => US [patent_app_date] => 2000-12-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 5544 [patent_no_of_claims] => 56 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 100 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/653/06653026.pdf [firstpage_image] =>[orig_patent_app_number] => 09746369 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/746369
Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask Dec 19, 2000 Issued
Array ( [id] => 1466514 [patent_doc_number] => 06458496 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2002-10-01 [patent_title] => 'Blank for halftone phase shift photomask and halftone phase shift photomask' [patent_app_type] => B2 [patent_app_number] => 09/736805 [patent_app_country] => US [patent_app_date] => 2000-12-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 32 [patent_no_of_words] => 11836 [patent_no_of_claims] => 34 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 75 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/458/06458496.pdf [firstpage_image] =>[orig_patent_app_number] => 09736805 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/736805
Blank for halftone phase shift photomask and halftone phase shift photomask Dec 13, 2000 Issued
Array ( [id] => 1559132 [patent_doc_number] => 06436589 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-08-20 [patent_title] => 'Reticle having an interleave kerf' [patent_app_type] => B1 [patent_app_number] => 09/731801 [patent_app_country] => US [patent_app_date] => 2000-12-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 8 [patent_no_of_words] => 2241 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 70 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/436/06436589.pdf [firstpage_image] =>[orig_patent_app_number] => 09731801 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/731801
Reticle having an interleave kerf Dec 7, 2000 Issued
Array ( [id] => 7118383 [patent_doc_number] => 20010001693 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-05-24 [patent_title] => 'Process for forming features on a semiconductor wafer using a phase shifting mask that can be used with two different wavelengths of light' [patent_app_type] => new-utility [patent_app_number] => 09/732816 [patent_app_country] => US [patent_app_date] => 2000-12-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 1703 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 33 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0001/20010001693.pdf [firstpage_image] =>[orig_patent_app_number] => 09732816 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/732816
Process for forming features on a semiconductor wafer using a phase shifting mask that can be used with two different wavelengths of light Dec 7, 2000 Issued
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