
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6015458
[patent_doc_number] => 20020102471
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-08-01
[patent_title] => 'Phase shift mask and system and method for making the same'
[patent_app_type] => new
[patent_app_number] => 09/772577
[patent_app_country] => US
[patent_app_date] => 2001-01-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
[patent_figures_cnt] => 14
[patent_no_of_words] => 5269
[patent_no_of_claims] => 19
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[patent_words_short_claim] => 71
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0102/20020102471.pdf
[firstpage_image] =>[orig_patent_app_number] => 09772577
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/772577 | Phase shift mask and system and method for making the same | Jan 29, 2001 | Issued |
Array
(
[id] => 1386997
[patent_doc_number] => 06544694
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-04-08
[patent_title] => 'Method of manufacturing a device by means of a mask phase-shifting mask for use in said method'
[patent_app_type] => B2
[patent_app_number] => 09/772485
[patent_app_country] => US
[patent_app_date] => 2001-01-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[patent_no_of_words] => 7803
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[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 201
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/544/06544694.pdf
[firstpage_image] =>[orig_patent_app_number] => 09772485
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/772485 | Method of manufacturing a device by means of a mask phase-shifting mask for use in said method | Jan 28, 2001 | Issued |
Array
(
[id] => 1386980
[patent_doc_number] => 06544693
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-04-08
[patent_title] => 'Pellicle for use in small wavelength lithography and a method for making such a pellicle'
[patent_app_type] => B2
[patent_app_number] => 09/770733
[patent_app_country] => US
[patent_app_date] => 2001-01-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 8
[patent_no_of_words] => 3471
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/544/06544693.pdf
[firstpage_image] =>[orig_patent_app_number] => 09770733
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/770733 | Pellicle for use in small wavelength lithography and a method for making such a pellicle | Jan 25, 2001 | Issued |
Array
(
[id] => 1334429
[patent_doc_number] => 06593035
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-07-15
[patent_title] => 'Pellicle for use in small wavelength lithography and a method for making such a pellicle using polymer films'
[patent_app_type] => B1
[patent_app_number] => 09/771236
[patent_app_country] => US
[patent_app_date] => 2001-01-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 8
[patent_no_of_words] => 3431
[patent_no_of_claims] => 20
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/593/06593035.pdf
[firstpage_image] =>[orig_patent_app_number] => 09771236
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/771236 | Pellicle for use in small wavelength lithography and a method for making such a pellicle using polymer films | Jan 25, 2001 | Issued |
Array
(
[id] => 1409240
[patent_doc_number] => 06524754
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-02-25
[patent_title] => 'Fused silica pellicle'
[patent_app_type] => B2
[patent_app_number] => 09/766907
[patent_app_country] => US
[patent_app_date] => 2001-01-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 1770
[patent_no_of_claims] => 36
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/524/06524754.pdf
[firstpage_image] =>[orig_patent_app_number] => 09766907
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/766907 | Fused silica pellicle | Jan 21, 2001 | Issued |
Array
(
[id] => 6921496
[patent_doc_number] => 20010028981
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-10-11
[patent_title] => 'Data processing apparatus, method and program product for compensating for photo proximity effect with reduced data amount, and photomask fabricated using same'
[patent_app_type] => new
[patent_app_number] => 09/764162
[patent_app_country] => US
[patent_app_date] => 2001-01-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
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[patent_no_of_words] => 3221
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0028/20010028981.pdf
[firstpage_image] =>[orig_patent_app_number] => 09764162
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/764162 | Data processing apparatus, method and program product for compensating for photo proximity effect with reduced data amount, and photomask fabricated using same | Jan 18, 2001 | Issued |
Array
(
[id] => 1390445
[patent_doc_number] => 06541166
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-04-01
[patent_title] => 'Method and apparatus for lithographically printing tightly nested and isolated device features using multiple mask exposures'
[patent_app_type] => B2
[patent_app_number] => 09/766005
[patent_app_country] => US
[patent_app_date] => 2001-01-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
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[patent_no_of_words] => 5135
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[pdf_file] => patents/06/541/06541166.pdf
[firstpage_image] =>[orig_patent_app_number] => 09766005
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/766005 | Method and apparatus for lithographically printing tightly nested and isolated device features using multiple mask exposures | Jan 17, 2001 | Issued |
Array
(
[id] => 6947842
[patent_doc_number] => 20010021476
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-09-13
[patent_title] => 'Phase mask'
[patent_app_type] => new
[patent_app_number] => 09/761810
[patent_app_country] => US
[patent_app_date] => 2001-01-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[patent_no_of_words] => 4512
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[pdf_file] => publications/A1/0021/20010021476.pdf
[firstpage_image] =>[orig_patent_app_number] => 09761810
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/761810 | Phase mask | Jan 15, 2001 | Abandoned |
Array
(
[id] => 6900069
[patent_doc_number] => 20010009745
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-07-26
[patent_title] => 'Half tone phase shift mask having a stepped aperture'
[patent_app_type] => new
[patent_app_number] => 09/759161
[patent_app_country] => US
[patent_app_date] => 2001-01-16
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[pdf_file] => publications/A1/0009/20010009745.pdf
[firstpage_image] =>[orig_patent_app_number] => 09759161
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/759161 | Half-tone phase shift mask having a stepped aperture | Jan 15, 2001 | Issued |
Array
(
[id] => 1422682
[patent_doc_number] => 06503668
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-01-07
[patent_title] => 'Phase shift mask blank, phase shift mask, and method of manufacture'
[patent_app_type] => B2
[patent_app_number] => 09/757615
[patent_app_country] => US
[patent_app_date] => 2001-01-11
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[pdf_file] => patents/06/503/06503668.pdf
[firstpage_image] =>[orig_patent_app_number] => 09757615
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/757615 | Phase shift mask blank, phase shift mask, and method of manufacture | Jan 10, 2001 | Issued |
Array
(
[id] => 1413723
[patent_doc_number] => 06511778
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-01-28
[patent_title] => 'Phase shift mask blank, phase shift mask and method of manufacture'
[patent_app_type] => B2
[patent_app_number] => 09/753517
[patent_app_country] => US
[patent_app_date] => 2001-01-04
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[firstpage_image] =>[orig_patent_app_number] => 09753517
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/753517 | Phase shift mask blank, phase shift mask and method of manufacture | Jan 3, 2001 | Issued |
Array
(
[id] => 1287772
[patent_doc_number] => 06632576
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-10-14
[patent_title] => 'Optical assist feature for two-mask exposure lithography'
[patent_app_type] => B2
[patent_app_number] => 09/751175
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[pdf_file] => patents/06/632/06632576.pdf
[firstpage_image] =>[orig_patent_app_number] => 09751175
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/751175 | Optical assist feature for two-mask exposure lithography | Dec 29, 2000 | Issued |
Array
(
[id] => 1406487
[patent_doc_number] => 06528216
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[patent_issue_date] => 2003-03-04
[patent_title] => 'Phase shift mask and fabrication method thereof'
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[firstpage_image] =>[orig_patent_app_number] => 09749574
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/749574 | Phase shift mask and fabrication method thereof | Dec 27, 2000 | Issued |
Array
(
[id] => 6876600
[patent_doc_number] => 20010006753
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[patent_kind] => A1
[patent_issue_date] => 2001-07-05
[patent_title] => 'Photomask and method of fabricating the same'
[patent_app_type] => new-utility
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Array
(
[id] => 6896237
[patent_doc_number] => 20010027027
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[patent_issue_date] => 2001-10-04
[patent_title] => 'Ferroelectric random access memory device and method for manufacture thereof'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/740926 | Method for manufacturing phase shift mask | Dec 20, 2000 | Issued |
Array
(
[id] => 1296457
[patent_doc_number] => 06627355
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[patent_issue_date] => 2003-09-30
[patent_title] => 'Method of and system for improving stability of photomasks'
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[firstpage_image] =>[orig_patent_app_number] => 09742970
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/742970 | Method of and system for improving stability of photomasks | Dec 19, 2000 | Issued |
Array
(
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[patent_title] => 'Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask'
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Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/736805 | Blank for halftone phase shift photomask and halftone phase shift photomask | Dec 13, 2000 | Issued |
Array
(
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[firstpage_image] =>[orig_patent_app_number] => 09731801
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/731801 | Reticle having an interleave kerf | Dec 7, 2000 | Issued |
Array
(
[id] => 7118383
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[patent_title] => 'Process for forming features on a semiconductor wafer using a phase shifting mask that can be used with two different wavelengths of light'
[patent_app_type] => new-utility
[patent_app_number] => 09/732816
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/732816 | Process for forming features on a semiconductor wafer using a phase shifting mask that can be used with two different wavelengths of light | Dec 7, 2000 | Issued |