
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6875121
[patent_doc_number] => 20010000240
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-04-12
[patent_title] => 'Phase shifting circuit manufacture method and apparatus'
[patent_app_type] => new-utility
[patent_app_number] => 09/732407
[patent_app_country] => US
[patent_app_date] => 2000-12-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 5751
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 96
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0000/20010000240.pdf
[firstpage_image] =>[orig_patent_app_number] => 09732407
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/732407 | Phase shifting circuit manufacture method and apparatus | Dec 6, 2000 | Issued |
Array
(
[id] => 1588167
[patent_doc_number] => 06482554
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2002-11-19
[patent_title] => 'Method for manufacturing a semiconductor device, photolithography mask and method for manufacturing the same'
[patent_app_type] => B2
[patent_app_number] => 09/730604
[patent_app_country] => US
[patent_app_date] => 2000-12-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 52
[patent_no_of_words] => 7820
[patent_no_of_claims] => 9
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[patent_words_short_claim] => 81
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/482/06482554.pdf
[firstpage_image] =>[orig_patent_app_number] => 09730604
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/730604 | Method for manufacturing a semiconductor device, photolithography mask and method for manufacturing the same | Dec 6, 2000 | Issued |
Array
(
[id] => 6015455
[patent_doc_number] => 20020102468
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-08-01
[patent_title] => 'Method of forming an improved attenuated phase-shifting photomask'
[patent_app_type] => new
[patent_app_number] => 09/729155
[patent_app_country] => US
[patent_app_date] => 2000-12-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[patent_no_of_words] => 3553
[patent_no_of_claims] => 20
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0102/20020102468.pdf
[firstpage_image] =>[orig_patent_app_number] => 09729155
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/729155 | Method of forming an improved attenuated phase-shifting photomask | Dec 3, 2000 | Issued |
Array
(
[id] => 5828139
[patent_doc_number] => 20020068227
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-06-06
[patent_title] => 'Method and apparatus for making an integrated circuit using polarization properties of light'
[patent_app_type] => new
[patent_app_number] => 09/727666
[patent_app_country] => US
[patent_app_date] => 2000-12-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[patent_no_of_words] => 5348
[patent_no_of_claims] => 54
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0068/20020068227.pdf
[firstpage_image] =>[orig_patent_app_number] => 09727666
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/727666 | Method and apparatus for making an integrated circuit using polarization properties of light | Nov 30, 2000 | Issued |
Array
(
[id] => 6614925
[patent_doc_number] => 20020064713
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-05-30
[patent_title] => 'Strong phase shift mask substrates'
[patent_app_type] => new
[patent_app_number] => 09/725380
[patent_app_country] => US
[patent_app_date] => 2000-11-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 4885
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0064/20020064713.pdf
[firstpage_image] =>[orig_patent_app_number] => 09725380
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/725380 | Strong phase shift mask substrates | Nov 28, 2000 | Abandoned |
Array
(
[id] => 1559130
[patent_doc_number] => 06436588
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-08-20
[patent_title] => 'Method and system for varying the transmission of an attenuated phase shift mask'
[patent_app_type] => B1
[patent_app_number] => 09/711120
[patent_app_country] => US
[patent_app_date] => 2000-11-09
[patent_effective_date] => 0000-00-00
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/436/06436588.pdf
[firstpage_image] =>[orig_patent_app_number] => 09711120
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/711120 | Method and system for varying the transmission of an attenuated phase shift mask | Nov 8, 2000 | Issued |
Array
(
[id] => 1477305
[patent_doc_number] => 06451490
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-09-17
[patent_title] => 'Method to overcome image shortening by use of sub-resolution reticle features'
[patent_app_type] => B1
[patent_app_number] => 09/709091
[patent_app_country] => US
[patent_app_date] => 2000-11-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 10
[patent_no_of_words] => 2708
[patent_no_of_claims] => 21
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/451/06451490.pdf
[firstpage_image] =>[orig_patent_app_number] => 09709091
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/709091 | Method to overcome image shortening by use of sub-resolution reticle features | Nov 7, 2000 | Issued |
Array
(
[id] => 1406472
[patent_doc_number] => 06528215
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-03-04
[patent_title] => 'Substrate for diamond stencil mask and method for forming'
[patent_app_type] => B1
[patent_app_number] => 09/707356
[patent_app_country] => US
[patent_app_date] => 2000-11-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 3542
[patent_no_of_claims] => 41
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/528/06528215.pdf
[firstpage_image] =>[orig_patent_app_number] => 09707356
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/707356 | Substrate for diamond stencil mask and method for forming | Nov 6, 2000 | Issued |
Array
(
[id] => 1414828
[patent_doc_number] => 06509124
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-01-21
[patent_title] => 'Method of producing diamond film for lithography'
[patent_app_type] => B1
[patent_app_number] => 09/705709
[patent_app_country] => US
[patent_app_date] => 2000-11-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[patent_no_of_words] => 7659
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/509/06509124.pdf
[firstpage_image] =>[orig_patent_app_number] => 09705709
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/705709 | Method of producing diamond film for lithography | Nov 5, 2000 | Issued |
Array
(
[id] => 1359172
[patent_doc_number] => 06569577
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-05-27
[patent_title] => 'Phase-shift photo mask blank, phase-shift photo mask and method for fabricating semiconductor devices'
[patent_app_type] => B1
[patent_app_number] => 09/704697
[patent_app_country] => US
[patent_app_date] => 2000-11-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[pdf_file] => patents/06/569/06569577.pdf
[firstpage_image] =>[orig_patent_app_number] => 09704697
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/704697 | Phase-shift photo mask blank, phase-shift photo mask and method for fabricating semiconductor devices | Nov 2, 2000 | Issued |
Array
(
[id] => 1473764
[patent_doc_number] => 06387574
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-05-14
[patent_title] => 'Substrate for transfer mask and method for manufacturing transfer mask by use of substrate'
[patent_app_type] => B1
[patent_app_number] => 09/705020
[patent_app_country] => US
[patent_app_date] => 2000-11-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/387/06387574.pdf
[firstpage_image] =>[orig_patent_app_number] => 09705020
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/705020 | Substrate for transfer mask and method for manufacturing transfer mask by use of substrate | Nov 1, 2000 | Issued |
| 09/704964 | PHASE TRANSITION DESIGN TO MAINTAIN CONSTANT LINE LENGTH THROUGH FOCUS | Nov 1, 2000 | Abandoned |
Array
(
[id] => 1422675
[patent_doc_number] => 06503667
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-01-07
[patent_title] => 'Method for fabricating mask'
[patent_app_type] => B1
[patent_app_number] => 09/697424
[patent_app_country] => US
[patent_app_date] => 2000-10-27
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/503/06503667.pdf
[firstpage_image] =>[orig_patent_app_number] => 09697424
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/697424 | Method for fabricating mask | Oct 26, 2000 | Issued |
Array
(
[id] => 7636806
[patent_doc_number] => 06379849
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-04-30
[patent_title] => 'Method for forming binary intensity masks'
[patent_app_type] => B1
[patent_app_number] => 09/696081
[patent_app_country] => US
[patent_app_date] => 2000-10-26
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 09696081
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/696081 | Method for forming binary intensity masks | Oct 25, 2000 | Issued |
Array
(
[id] => 1511807
[patent_doc_number] => 06472108
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-10-29
[patent_title] => 'Optical proximity correction method'
[patent_app_type] => B1
[patent_app_number] => 09/686433
[patent_app_country] => US
[patent_app_date] => 2000-10-10
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/472/06472108.pdf
[firstpage_image] =>[orig_patent_app_number] => 09686433
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/686433 | Optical proximity correction method | Oct 9, 2000 | Issued |
Array
(
[id] => 1458502
[patent_doc_number] => 06391500
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-05-21
[patent_title] => 'Photomask for obtaining a graded pattern profile on a photoresist'
[patent_app_type] => B1
[patent_app_number] => 09/684062
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[patent_app_date] => 2000-10-06
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[pdf_file] => patents/06/391/06391500.pdf
[firstpage_image] =>[orig_patent_app_number] => 09684062
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/684062 | Photomask for obtaining a graded pattern profile on a photoresist | Oct 5, 2000 | Issued |
Array
(
[id] => 1506646
[patent_doc_number] => 06440617
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-08-27
[patent_title] => 'Photomask structure'
[patent_app_type] => B1
[patent_app_number] => 09/680781
[patent_app_country] => US
[patent_app_date] => 2000-10-06
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/440/06440617.pdf
[firstpage_image] =>[orig_patent_app_number] => 09680781
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/680781 | Photomask structure | Oct 5, 2000 | Issued |
Array
(
[id] => 1499710
[patent_doc_number] => 06485871
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-11-26
[patent_title] => 'Method of producing phase masks in an automated layout generation for integrated circuits'
[patent_app_type] => B1
[patent_app_number] => 09/677546
[patent_app_country] => US
[patent_app_date] => 2000-10-02
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[pdf_file] => patents/06/485/06485871.pdf
[firstpage_image] =>[orig_patent_app_number] => 09677546
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/677546 | Method of producing phase masks in an automated layout generation for integrated circuits | Oct 1, 2000 | Issued |
Array
(
[id] => 1489753
[patent_doc_number] => 06416936
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-07-09
[patent_title] => 'Top surface imaging technique for top pole tip width control in magnetoresistive read/write head processing'
[patent_app_type] => B1
[patent_app_number] => 09/672533
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[patent_app_date] => 2000-09-28
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[firstpage_image] =>[orig_patent_app_number] => 09672533
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/672533 | Top surface imaging technique for top pole tip width control in magnetoresistive read/write head processing | Sep 27, 2000 | Issued |
Array
(
[id] => 1506645
[patent_doc_number] => 06440616
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[patent_kind] => B1
[patent_issue_date] => 2002-08-27
[patent_title] => 'Mask and method for focus monitoring'
[patent_app_type] => B1
[patent_app_number] => 09/671501
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[pdf_file] => patents/06/440/06440616.pdf
[firstpage_image] =>[orig_patent_app_number] => 09671501
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/671501 | Mask and method for focus monitoring | Sep 26, 2000 | Issued |