
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1422646
[patent_doc_number] => 06503666
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-01-07
[patent_title] => 'Phase shift masking for complex patterns'
[patent_app_type] => B1
[patent_app_number] => 09/669359
[patent_app_country] => US
[patent_app_date] => 2000-09-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 21
[patent_no_of_words] => 7629
[patent_no_of_claims] => 51
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 105
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/503/06503666.pdf
[firstpage_image] =>[orig_patent_app_number] => 09669359
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/669359 | Phase shift masking for complex patterns | Sep 25, 2000 | Issued |
Array
(
[id] => 1390424
[patent_doc_number] => 06541165
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-04-01
[patent_title] => 'Phase shift mask sub-resolution assist features'
[patent_app_type] => B1
[patent_app_number] => 09/669367
[patent_app_country] => US
[patent_app_date] => 2000-09-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 21
[patent_no_of_words] => 7444
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 95
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/541/06541165.pdf
[firstpage_image] =>[orig_patent_app_number] => 09669367
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/669367 | Phase shift mask sub-resolution assist features | Sep 25, 2000 | Issued |
Array
(
[id] => 1095409
[patent_doc_number] => 06821682
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-11-23
[patent_title] => 'Repair of localized defects in multilayer-coated reticle blanks for extreme ultraviolet lithography'
[patent_app_type] => B1
[patent_app_number] => 09/669390
[patent_app_country] => US
[patent_app_date] => 2000-09-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 8
[patent_no_of_words] => 3616
[patent_no_of_claims] => 21
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/821/06821682.pdf
[firstpage_image] =>[orig_patent_app_number] => 09669390
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/669390 | Repair of localized defects in multilayer-coated reticle blanks for extreme ultraviolet lithography | Sep 25, 2000 | Issued |
Array
(
[id] => 1409210
[patent_doc_number] => 06524752
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-02-25
[patent_title] => 'Phase shift masking for intersecting lines'
[patent_app_type] => B1
[patent_app_number] => 09/669368
[patent_app_country] => US
[patent_app_date] => 2000-09-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
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[patent_no_of_words] => 7595
[patent_no_of_claims] => 93
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/524/06524752.pdf
[firstpage_image] =>[orig_patent_app_number] => 09669368
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/669368 | Phase shift masking for intersecting lines | Sep 25, 2000 | Issued |
Array
(
[id] => 1413708
[patent_doc_number] => 06511777
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-01-28
[patent_title] => 'Method for manufacturing a phase shift photomask'
[patent_app_type] => B1
[patent_app_number] => 09/666933
[patent_app_country] => US
[patent_app_date] => 2000-09-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
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[patent_no_of_words] => 2224
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/511/06511777.pdf
[firstpage_image] =>[orig_patent_app_number] => 09666933
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/666933 | Method for manufacturing a phase shift photomask | Sep 20, 2000 | Issued |
Array
(
[id] => 1477301
[patent_doc_number] => 06451489
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-09-17
[patent_title] => 'Phase shift photomask'
[patent_app_type] => B1
[patent_app_number] => 09/666907
[patent_app_country] => US
[patent_app_date] => 2000-09-20
[patent_effective_date] => 0000-00-00
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/451/06451489.pdf
[firstpage_image] =>[orig_patent_app_number] => 09666907
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/666907 | Phase shift photomask | Sep 19, 2000 | Issued |
Array
(
[id] => 1499708
[patent_doc_number] => 06485870
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-11-26
[patent_title] => 'Charged-particle-beam microlithography masks and methods for manufacturing same'
[patent_app_type] => B1
[patent_app_number] => 09/666730
[patent_app_country] => US
[patent_app_date] => 2000-09-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 4
[patent_no_of_words] => 4314
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/485/06485870.pdf
[firstpage_image] =>[orig_patent_app_number] => 09666730
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/666730 | Charged-particle-beam microlithography masks and methods for manufacturing same | Sep 19, 2000 | Issued |
Array
(
[id] => 1449406
[patent_doc_number] => 06455204
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-09-24
[patent_title] => 'X-ray mask and method of fabricating the same'
[patent_app_type] => B1
[patent_app_number] => 09/664746
[patent_app_country] => US
[patent_app_date] => 2000-09-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
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[patent_no_of_words] => 9764
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/455/06455204.pdf
[firstpage_image] =>[orig_patent_app_number] => 09664746
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/664746 | X-ray mask and method of fabricating the same | Sep 18, 2000 | Issued |
Array
(
[id] => 1559128
[patent_doc_number] => 06436587
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-08-20
[patent_title] => 'Method of making a multi-level reticle using bi-level photoresist, including a phase-shifted multi-level reticle'
[patent_app_type] => B1
[patent_app_number] => 09/665236
[patent_app_country] => US
[patent_app_date] => 2000-09-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
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[patent_no_of_words] => 4335
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/436/06436587.pdf
[firstpage_image] =>[orig_patent_app_number] => 09665236
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/665236 | Method of making a multi-level reticle using bi-level photoresist, including a phase-shifted multi-level reticle | Sep 17, 2000 | Issued |
Array
(
[id] => 1527746
[patent_doc_number] => 06479195
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-11-12
[patent_title] => 'Mask absorber for extreme ultraviolet lithography'
[patent_app_type] => B1
[patent_app_number] => 09/662055
[patent_app_country] => US
[patent_app_date] => 2000-09-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[patent_no_of_words] => 3993
[patent_no_of_claims] => 16
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[pdf_file] => patents/06/479/06479195.pdf
[firstpage_image] =>[orig_patent_app_number] => 09662055
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/662055 | Mask absorber for extreme ultraviolet lithography | Sep 14, 2000 | Issued |
Array
(
[id] => 1112571
[patent_doc_number] => 06803154
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-10-12
[patent_title] => 'Two-dimensional phase element and method of manufacturing the same'
[patent_app_type] => B1
[patent_app_number] => 09/654038
[patent_app_country] => US
[patent_app_date] => 2000-09-01
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/803/06803154.pdf
[firstpage_image] =>[orig_patent_app_number] => 09654038
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/654038 | Two-dimensional phase element and method of manufacturing the same | Aug 31, 2000 | Issued |
Array
(
[id] => 1477299
[patent_doc_number] => 06451488
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-09-17
[patent_title] => 'Single-level masking with partial use of attenuated phase-shift technology'
[patent_app_type] => B1
[patent_app_number] => 09/652774
[patent_app_country] => US
[patent_app_date] => 2000-08-31
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 09652774
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/652774 | Single-level masking with partial use of attenuated phase-shift technology | Aug 30, 2000 | Issued |
Array
(
[id] => 4341156
[patent_doc_number] => 06284417
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-09-04
[patent_title] => 'Reticle cleaning without damaging pellicle'
[patent_app_type] => 1
[patent_app_number] => 9/651392
[patent_app_country] => US
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[pdf_file] => patents/06/284/06284417.pdf
[firstpage_image] =>[orig_patent_app_number] => 651392
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/651392 | Reticle cleaning without damaging pellicle | Aug 28, 2000 | Issued |
| 09/639381 | Scan butting error reduction in a raster scan pattern generation system | Aug 13, 2000 | Abandoned |
Array
(
[id] => 4244107
[patent_doc_number] => 06221542
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-04-24
[patent_title] => 'Method for patterning a substrate using a photomask with multiple absorption levels'
[patent_app_type] => 1
[patent_app_number] => 9/635331
[patent_app_country] => US
[patent_app_date] => 2000-08-09
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[pdf_file] => patents/06/221/06221542.pdf
[firstpage_image] =>[orig_patent_app_number] => 635331
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/635331 | Method for patterning a substrate using a photomask with multiple absorption levels | Aug 8, 2000 | Issued |
Array
(
[id] => 4309657
[patent_doc_number] => 06242138
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-06-05
[patent_title] => 'Phase shift mask and phase shift mask blank'
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[patent_app_number] => 9/634480
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[firstpage_image] =>[orig_patent_app_number] => 634480
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/634480 | Phase shift mask and phase shift mask blank | Aug 7, 2000 | Issued |
Array
(
[id] => 4347455
[patent_doc_number] => 06291115
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[patent_kind] => NA
[patent_issue_date] => 2001-09-18
[patent_title] => 'Method for repairing bump and divot defects in a phase shifting mask'
[patent_app_type] => 1
[patent_app_number] => 9/634998
[patent_app_country] => US
[patent_app_date] => 2000-08-08
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[pdf_file] => patents/06/291/06291115.pdf
[firstpage_image] =>[orig_patent_app_number] => 634998
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/634998 | Method for repairing bump and divot defects in a phase shifting mask | Aug 7, 2000 | Issued |
Array
(
[id] => 4341142
[patent_doc_number] => 06284416
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[patent_kind] => NA
[patent_issue_date] => 2001-09-04
[patent_title] => 'Photo mask and exposure method using same'
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[patent_app_number] => 9/631961
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[firstpage_image] =>[orig_patent_app_number] => 631961
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/631961 | Photo mask and exposure method using same | Aug 2, 2000 | Issued |
Array
(
[id] => 1520363
[patent_doc_number] => 06413685
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[patent_title] => 'Method of reducing optical proximity effect'
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[firstpage_image] =>[orig_patent_app_number] => 09626404
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/626404 | Method of reducing optical proximity effect | Jul 25, 2000 | Issued |
Array
(
[id] => 1520361
[patent_doc_number] => 06413684
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[patent_kind] => B1
[patent_issue_date] => 2002-07-02
[patent_title] => 'Method to eliminate side lobe printing of attenuated phase shift masks'
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[pdf_file] => patents/06/413/06413684.pdf
[firstpage_image] =>[orig_patent_app_number] => 09619313
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/619313 | Method to eliminate side lobe printing of attenuated phase shift masks | Jul 18, 2000 | Issued |