
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1523411
[patent_doc_number] => 06352802
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-03-05
[patent_title] => 'Mask for electron beam exposure and method of manufacturing semiconductor device using the same'
[patent_app_type] => B1
[patent_app_number] => 09/578476
[patent_app_country] => US
[patent_app_date] => 2000-05-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 10
[patent_no_of_words] => 8571
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 111
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/352/06352802.pdf
[firstpage_image] =>[orig_patent_app_number] => 09578476
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/578476 | Mask for electron beam exposure and method of manufacturing semiconductor device using the same | May 25, 2000 | Issued |
Array
(
[id] => 4334739
[patent_doc_number] => 06333130
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-12-25
[patent_title] => 'Method and apparatus for correcting defects in photomask'
[patent_app_type] => 1
[patent_app_number] => 9/577348
[patent_app_country] => US
[patent_app_date] => 2000-05-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 5
[patent_no_of_words] => 3338
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 76
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/333/06333130.pdf
[firstpage_image] =>[orig_patent_app_number] => 577348
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/577348 | Method and apparatus for correcting defects in photomask | May 23, 2000 | Issued |
Array
(
[id] => 4256481
[patent_doc_number] => 06258513
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-07-10
[patent_title] => 'Photomask and pattern forming method employing the same'
[patent_app_type] => 1
[patent_app_number] => 9/577367
[patent_app_country] => US
[patent_app_date] => 2000-05-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 13
[patent_no_of_words] => 4020
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 8
[patent_words_short_claim] => 135
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/258/06258513.pdf
[firstpage_image] =>[orig_patent_app_number] => 577367
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/577367 | Photomask and pattern forming method employing the same | May 22, 2000 | Issued |
Array
(
[id] => 1520356
[patent_doc_number] => 06413682
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-07-02
[patent_title] => 'Synthetic quartz glass substrate for photomask and making method'
[patent_app_type] => B1
[patent_app_number] => 09/576006
[patent_app_country] => US
[patent_app_date] => 2000-05-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 3650
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 50
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/413/06413682.pdf
[firstpage_image] =>[orig_patent_app_number] => 09576006
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/576006 | Synthetic quartz glass substrate for photomask and making method | May 21, 2000 | Issued |
Array
(
[id] => 1435742
[patent_doc_number] => 06355385
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-03-12
[patent_title] => 'Methods for making reticle blanks, and for making reticles therefrom, for charged-particle-beam microlithography'
[patent_app_type] => B1
[patent_app_number] => 09/574279
[patent_app_country] => US
[patent_app_date] => 2000-05-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 31
[patent_no_of_words] => 4014
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 104
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/355/06355385.pdf
[firstpage_image] =>[orig_patent_app_number] => 09574279
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/574279 | Methods for making reticle blanks, and for making reticles therefrom, for charged-particle-beam microlithography | May 18, 2000 | Issued |
Array
(
[id] => 1523409
[patent_doc_number] => 06352801
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-03-05
[patent_title] => 'Phase shift mask and making process'
[patent_app_type] => B1
[patent_app_number] => 09/573560
[patent_app_country] => US
[patent_app_date] => 2000-05-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 8
[patent_no_of_words] => 3169
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 36
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/352/06352801.pdf
[firstpage_image] =>[orig_patent_app_number] => 09573560
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/573560 | Phase shift mask and making process | May 18, 2000 | Issued |
Array
(
[id] => 1577358
[patent_doc_number] => 06447959
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-09-10
[patent_title] => 'Amplitude mask for writing long-period gratings'
[patent_app_type] => B1
[patent_app_number] => 09/572520
[patent_app_country] => US
[patent_app_date] => 2000-05-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 13
[patent_no_of_words] => 4336
[patent_no_of_claims] => 27
[patent_no_of_ind_claims] => 10
[patent_words_short_claim] => 131
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/447/06447959.pdf
[firstpage_image] =>[orig_patent_app_number] => 09572520
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/572520 | Amplitude mask for writing long-period gratings | May 16, 2000 | Issued |
Array
(
[id] => 1487342
[patent_doc_number] => 06428937
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-08-06
[patent_title] => 'Methods for fabricating reticle blanks for use in making charged-particle-beam microlithography reticles, and reticle blanks and reticles formed using such methods'
[patent_app_type] => B1
[patent_app_number] => 09/572723
[patent_app_country] => US
[patent_app_date] => 2000-05-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 18
[patent_no_of_words] => 3275
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 172
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/428/06428937.pdf
[firstpage_image] =>[orig_patent_app_number] => 09572723
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/572723 | Methods for fabricating reticle blanks for use in making charged-particle-beam microlithography reticles, and reticle blanks and reticles formed using such methods | May 15, 2000 | Issued |
Array
(
[id] => 1564601
[patent_doc_number] => 06338923
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-01-15
[patent_title] => 'Photolithography mask having monitoring marks and manufacturing method thereof'
[patent_app_type] => B1
[patent_app_number] => 09/568536
[patent_app_country] => US
[patent_app_date] => 2000-05-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 14
[patent_no_of_words] => 7208
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 68
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/338/06338923.pdf
[firstpage_image] =>[orig_patent_app_number] => 09568536
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/568536 | Photolithography mask having monitoring marks and manufacturing method thereof | May 10, 2000 | Issued |
Array
(
[id] => 1564596
[patent_doc_number] => 06338922
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-01-15
[patent_title] => 'Optimized alternating phase shifted mask design'
[patent_app_type] => B1
[patent_app_number] => 09/566885
[patent_app_country] => US
[patent_app_date] => 2000-05-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 11
[patent_no_of_words] => 3916
[patent_no_of_claims] => 33
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 96
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/338/06338922.pdf
[firstpage_image] =>[orig_patent_app_number] => 09566885
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/566885 | Optimized alternating phase shifted mask design | May 7, 2000 | Issued |
Array
(
[id] => 1305523
[patent_doc_number] => 06617080
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-09-09
[patent_title] => 'Photomask, semiconductor device, and method for exposing through photomask'
[patent_app_type] => B1
[patent_app_number] => 09/563953
[patent_app_country] => US
[patent_app_date] => 2000-05-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 20
[patent_no_of_words] => 6542
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 98
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/617/06617080.pdf
[firstpage_image] =>[orig_patent_app_number] => 09563953
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/563953 | Photomask, semiconductor device, and method for exposing through photomask | May 1, 2000 | Issued |
Array
(
[id] => 1440747
[patent_doc_number] => 06335130
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-01-01
[patent_title] => 'System and method of providing optical proximity correction for features using phase-shifted halftone transparent/semi-transparent features'
[patent_app_type] => B1
[patent_app_number] => 09/562445
[patent_app_country] => US
[patent_app_date] => 2000-05-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 33
[patent_figures_cnt] => 75
[patent_no_of_words] => 10730
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 44
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/335/06335130.pdf
[firstpage_image] =>[orig_patent_app_number] => 09562445
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/562445 | System and method of providing optical proximity correction for features using phase-shifted halftone transparent/semi-transparent features | Apr 30, 2000 | Issued |
| 09/562443 | Hybrid phase shift mask providing improved optical proximity correction capabilities and a method of forming the same | Apr 30, 2000 | Abandoned |
Array
(
[id] => 1564780
[patent_doc_number] => 06376132
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-04-23
[patent_title] => 'Mask for electron beam exposure, manufacturing method for the same, and manufacturing method for semiconductor device'
[patent_app_type] => B1
[patent_app_number] => 09/560336
[patent_app_country] => US
[patent_app_date] => 2000-04-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 15
[patent_no_of_words] => 4156
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 64
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/376/06376132.pdf
[firstpage_image] =>[orig_patent_app_number] => 09560336
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/560336 | Mask for electron beam exposure, manufacturing method for the same, and manufacturing method for semiconductor device | Apr 27, 2000 | Issued |
Array
(
[id] => 4355174
[patent_doc_number] => 06190836
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-02-20
[patent_title] => 'Methods for repair of photomasks'
[patent_app_type] => 1
[patent_app_number] => 9/561560
[patent_app_country] => US
[patent_app_date] => 2000-04-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 26
[patent_no_of_words] => 6445
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 168
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/190/06190836.pdf
[firstpage_image] =>[orig_patent_app_number] => 561560
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/561560 | Methods for repair of photomasks | Apr 27, 2000 | Issued |
Array
(
[id] => 4326802
[patent_doc_number] => 06312857
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-11-06
[patent_title] => 'Photomask material and method of processing thereof'
[patent_app_type] => 1
[patent_app_number] => 9/559254
[patent_app_country] => US
[patent_app_date] => 2000-04-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 17455
[patent_no_of_claims] => 28
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 85
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/312/06312857.pdf
[firstpage_image] =>[orig_patent_app_number] => 559254
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/559254 | Photomask material and method of processing thereof | Apr 26, 2000 | Issued |
Array
(
[id] => 1489659
[patent_doc_number] => 06416907
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-07-09
[patent_title] => 'Method for designing photolithographic reticle layout, reticle, and photolithographic process'
[patent_app_type] => B1
[patent_app_number] => 09/559262
[patent_app_country] => US
[patent_app_date] => 2000-04-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 24
[patent_figures_cnt] => 28
[patent_no_of_words] => 11706
[patent_no_of_claims] => 38
[patent_no_of_ind_claims] => 8
[patent_words_short_claim] => 112
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/416/06416907.pdf
[firstpage_image] =>[orig_patent_app_number] => 09559262
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/559262 | Method for designing photolithographic reticle layout, reticle, and photolithographic process | Apr 26, 2000 | Issued |
Array
(
[id] => 1433253
[patent_doc_number] => 06340543
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-01-22
[patent_title] => 'Photomask, manufacturing method thereof, and semiconductor device'
[patent_app_type] => B1
[patent_app_number] => 09/557326
[patent_app_country] => US
[patent_app_date] => 2000-04-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 23
[patent_figures_cnt] => 35
[patent_no_of_words] => 15968
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 54
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/340/06340543.pdf
[firstpage_image] =>[orig_patent_app_number] => 09557326
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/557326 | Photomask, manufacturing method thereof, and semiconductor device | Apr 24, 2000 | Issued |
Array
(
[id] => 1484460
[patent_doc_number] => 06365303
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-04-02
[patent_title] => 'Electrostatic discharge damage prevention method on masks'
[patent_app_type] => B1
[patent_app_number] => 09/557397
[patent_app_country] => US
[patent_app_date] => 2000-04-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 13
[patent_no_of_words] => 2567
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 150
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/365/06365303.pdf
[firstpage_image] =>[orig_patent_app_number] => 09557397
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/557397 | Electrostatic discharge damage prevention method on masks | Apr 23, 2000 | Issued |
Array
(
[id] => 1553047
[patent_doc_number] => 06348288
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-02-19
[patent_title] => 'Resolution enhancement method for deep quarter micron technology'
[patent_app_type] => B1
[patent_app_number] => 09/550266
[patent_app_country] => US
[patent_app_date] => 2000-04-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 13
[patent_no_of_words] => 1500
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 57
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/348/06348288.pdf
[firstpage_image] =>[orig_patent_app_number] => 09550266
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/550266 | Resolution enhancement method for deep quarter micron technology | Apr 16, 2000 | Issued |