Search

Liliana Di Nola Baron

Examiner (ID: 15438)

Most Active Art Unit
1615
Art Unit(s)
1615
Total Applications
361
Issued Applications
209
Pending Applications
88
Abandoned Applications
63

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 1523411 [patent_doc_number] => 06352802 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-03-05 [patent_title] => 'Mask for electron beam exposure and method of manufacturing semiconductor device using the same' [patent_app_type] => B1 [patent_app_number] => 09/578476 [patent_app_country] => US [patent_app_date] => 2000-05-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 10 [patent_no_of_words] => 8571 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 111 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/352/06352802.pdf [firstpage_image] =>[orig_patent_app_number] => 09578476 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/578476
Mask for electron beam exposure and method of manufacturing semiconductor device using the same May 25, 2000 Issued
Array ( [id] => 4334739 [patent_doc_number] => 06333130 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-12-25 [patent_title] => 'Method and apparatus for correcting defects in photomask' [patent_app_type] => 1 [patent_app_number] => 9/577348 [patent_app_country] => US [patent_app_date] => 2000-05-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 5 [patent_no_of_words] => 3338 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 76 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/333/06333130.pdf [firstpage_image] =>[orig_patent_app_number] => 577348 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/577348
Method and apparatus for correcting defects in photomask May 23, 2000 Issued
Array ( [id] => 4256481 [patent_doc_number] => 06258513 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-07-10 [patent_title] => 'Photomask and pattern forming method employing the same' [patent_app_type] => 1 [patent_app_number] => 9/577367 [patent_app_country] => US [patent_app_date] => 2000-05-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 13 [patent_no_of_words] => 4020 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 8 [patent_words_short_claim] => 135 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/258/06258513.pdf [firstpage_image] =>[orig_patent_app_number] => 577367 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/577367
Photomask and pattern forming method employing the same May 22, 2000 Issued
Array ( [id] => 1520356 [patent_doc_number] => 06413682 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-07-02 [patent_title] => 'Synthetic quartz glass substrate for photomask and making method' [patent_app_type] => B1 [patent_app_number] => 09/576006 [patent_app_country] => US [patent_app_date] => 2000-05-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 3650 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 50 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/413/06413682.pdf [firstpage_image] =>[orig_patent_app_number] => 09576006 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/576006
Synthetic quartz glass substrate for photomask and making method May 21, 2000 Issued
Array ( [id] => 1435742 [patent_doc_number] => 06355385 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-03-12 [patent_title] => 'Methods for making reticle blanks, and for making reticles therefrom, for charged-particle-beam microlithography' [patent_app_type] => B1 [patent_app_number] => 09/574279 [patent_app_country] => US [patent_app_date] => 2000-05-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 31 [patent_no_of_words] => 4014 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 104 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/355/06355385.pdf [firstpage_image] =>[orig_patent_app_number] => 09574279 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/574279
Methods for making reticle blanks, and for making reticles therefrom, for charged-particle-beam microlithography May 18, 2000 Issued
Array ( [id] => 1523409 [patent_doc_number] => 06352801 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-03-05 [patent_title] => 'Phase shift mask and making process' [patent_app_type] => B1 [patent_app_number] => 09/573560 [patent_app_country] => US [patent_app_date] => 2000-05-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 8 [patent_no_of_words] => 3169 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 36 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/352/06352801.pdf [firstpage_image] =>[orig_patent_app_number] => 09573560 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/573560
Phase shift mask and making process May 18, 2000 Issued
Array ( [id] => 1577358 [patent_doc_number] => 06447959 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-09-10 [patent_title] => 'Amplitude mask for writing long-period gratings' [patent_app_type] => B1 [patent_app_number] => 09/572520 [patent_app_country] => US [patent_app_date] => 2000-05-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 13 [patent_no_of_words] => 4336 [patent_no_of_claims] => 27 [patent_no_of_ind_claims] => 10 [patent_words_short_claim] => 131 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/447/06447959.pdf [firstpage_image] =>[orig_patent_app_number] => 09572520 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/572520
Amplitude mask for writing long-period gratings May 16, 2000 Issued
Array ( [id] => 1487342 [patent_doc_number] => 06428937 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-08-06 [patent_title] => 'Methods for fabricating reticle blanks for use in making charged-particle-beam microlithography reticles, and reticle blanks and reticles formed using such methods' [patent_app_type] => B1 [patent_app_number] => 09/572723 [patent_app_country] => US [patent_app_date] => 2000-05-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 18 [patent_no_of_words] => 3275 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 172 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/428/06428937.pdf [firstpage_image] =>[orig_patent_app_number] => 09572723 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/572723
Methods for fabricating reticle blanks for use in making charged-particle-beam microlithography reticles, and reticle blanks and reticles formed using such methods May 15, 2000 Issued
Array ( [id] => 1564601 [patent_doc_number] => 06338923 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-01-15 [patent_title] => 'Photolithography mask having monitoring marks and manufacturing method thereof' [patent_app_type] => B1 [patent_app_number] => 09/568536 [patent_app_country] => US [patent_app_date] => 2000-05-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 14 [patent_no_of_words] => 7208 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 68 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/338/06338923.pdf [firstpage_image] =>[orig_patent_app_number] => 09568536 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/568536
Photolithography mask having monitoring marks and manufacturing method thereof May 10, 2000 Issued
Array ( [id] => 1564596 [patent_doc_number] => 06338922 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-01-15 [patent_title] => 'Optimized alternating phase shifted mask design' [patent_app_type] => B1 [patent_app_number] => 09/566885 [patent_app_country] => US [patent_app_date] => 2000-05-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 11 [patent_no_of_words] => 3916 [patent_no_of_claims] => 33 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 96 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/338/06338922.pdf [firstpage_image] =>[orig_patent_app_number] => 09566885 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/566885
Optimized alternating phase shifted mask design May 7, 2000 Issued
Array ( [id] => 1305523 [patent_doc_number] => 06617080 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-09-09 [patent_title] => 'Photomask, semiconductor device, and method for exposing through photomask' [patent_app_type] => B1 [patent_app_number] => 09/563953 [patent_app_country] => US [patent_app_date] => 2000-05-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 20 [patent_no_of_words] => 6542 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 98 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/617/06617080.pdf [firstpage_image] =>[orig_patent_app_number] => 09563953 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/563953
Photomask, semiconductor device, and method for exposing through photomask May 1, 2000 Issued
Array ( [id] => 1440747 [patent_doc_number] => 06335130 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-01-01 [patent_title] => 'System and method of providing optical proximity correction for features using phase-shifted halftone transparent/semi-transparent features' [patent_app_type] => B1 [patent_app_number] => 09/562445 [patent_app_country] => US [patent_app_date] => 2000-05-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 33 [patent_figures_cnt] => 75 [patent_no_of_words] => 10730 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 44 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/335/06335130.pdf [firstpage_image] =>[orig_patent_app_number] => 09562445 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/562445
System and method of providing optical proximity correction for features using phase-shifted halftone transparent/semi-transparent features Apr 30, 2000 Issued
09/562443 Hybrid phase shift mask providing improved optical proximity correction capabilities and a method of forming the same Apr 30, 2000 Abandoned
Array ( [id] => 1564780 [patent_doc_number] => 06376132 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-04-23 [patent_title] => 'Mask for electron beam exposure, manufacturing method for the same, and manufacturing method for semiconductor device' [patent_app_type] => B1 [patent_app_number] => 09/560336 [patent_app_country] => US [patent_app_date] => 2000-04-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 15 [patent_no_of_words] => 4156 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 64 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/376/06376132.pdf [firstpage_image] =>[orig_patent_app_number] => 09560336 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/560336
Mask for electron beam exposure, manufacturing method for the same, and manufacturing method for semiconductor device Apr 27, 2000 Issued
Array ( [id] => 4355174 [patent_doc_number] => 06190836 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-02-20 [patent_title] => 'Methods for repair of photomasks' [patent_app_type] => 1 [patent_app_number] => 9/561560 [patent_app_country] => US [patent_app_date] => 2000-04-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 26 [patent_no_of_words] => 6445 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 168 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/190/06190836.pdf [firstpage_image] =>[orig_patent_app_number] => 561560 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/561560
Methods for repair of photomasks Apr 27, 2000 Issued
Array ( [id] => 4326802 [patent_doc_number] => 06312857 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-11-06 [patent_title] => 'Photomask material and method of processing thereof' [patent_app_type] => 1 [patent_app_number] => 9/559254 [patent_app_country] => US [patent_app_date] => 2000-04-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 17455 [patent_no_of_claims] => 28 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 85 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/312/06312857.pdf [firstpage_image] =>[orig_patent_app_number] => 559254 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/559254
Photomask material and method of processing thereof Apr 26, 2000 Issued
Array ( [id] => 1489659 [patent_doc_number] => 06416907 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-07-09 [patent_title] => 'Method for designing photolithographic reticle layout, reticle, and photolithographic process' [patent_app_type] => B1 [patent_app_number] => 09/559262 [patent_app_country] => US [patent_app_date] => 2000-04-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 24 [patent_figures_cnt] => 28 [patent_no_of_words] => 11706 [patent_no_of_claims] => 38 [patent_no_of_ind_claims] => 8 [patent_words_short_claim] => 112 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/416/06416907.pdf [firstpage_image] =>[orig_patent_app_number] => 09559262 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/559262
Method for designing photolithographic reticle layout, reticle, and photolithographic process Apr 26, 2000 Issued
Array ( [id] => 1433253 [patent_doc_number] => 06340543 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-01-22 [patent_title] => 'Photomask, manufacturing method thereof, and semiconductor device' [patent_app_type] => B1 [patent_app_number] => 09/557326 [patent_app_country] => US [patent_app_date] => 2000-04-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 23 [patent_figures_cnt] => 35 [patent_no_of_words] => 15968 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 54 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/340/06340543.pdf [firstpage_image] =>[orig_patent_app_number] => 09557326 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/557326
Photomask, manufacturing method thereof, and semiconductor device Apr 24, 2000 Issued
Array ( [id] => 1484460 [patent_doc_number] => 06365303 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-04-02 [patent_title] => 'Electrostatic discharge damage prevention method on masks' [patent_app_type] => B1 [patent_app_number] => 09/557397 [patent_app_country] => US [patent_app_date] => 2000-04-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 13 [patent_no_of_words] => 2567 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 150 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/365/06365303.pdf [firstpage_image] =>[orig_patent_app_number] => 09557397 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/557397
Electrostatic discharge damage prevention method on masks Apr 23, 2000 Issued
Array ( [id] => 1553047 [patent_doc_number] => 06348288 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-02-19 [patent_title] => 'Resolution enhancement method for deep quarter micron technology' [patent_app_type] => B1 [patent_app_number] => 09/550266 [patent_app_country] => US [patent_app_date] => 2000-04-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 13 [patent_no_of_words] => 1500 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 57 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/348/06348288.pdf [firstpage_image] =>[orig_patent_app_number] => 09550266 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/550266
Resolution enhancement method for deep quarter micron technology Apr 16, 2000 Issued
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