Search

Liliana Di Nola Baron

Examiner (ID: 15438)

Most Active Art Unit
1615
Art Unit(s)
1615
Total Applications
361
Issued Applications
209
Pending Applications
88
Abandoned Applications
63

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 4082043 [patent_doc_number] => 06162568 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-12-19 [patent_title] => 'Process for forming features on a semiconductor wafer using a phase shifting mask that can be used with two different wavelengths of light' [patent_app_type] => 1 [patent_app_number] => 9/550765 [patent_app_country] => US [patent_app_date] => 2000-04-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 1676 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 57 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/162/06162568.pdf [firstpage_image] =>[orig_patent_app_number] => 550765 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/550765
Process for forming features on a semiconductor wafer using a phase shifting mask that can be used with two different wavelengths of light Apr 16, 2000 Issued
Array ( [id] => 1523408 [patent_doc_number] => 06352800 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-03-05 [patent_title] => 'Reticle for use in exposing semiconductor, method of producing the reticle, and semiconductor device' [patent_app_type] => B1 [patent_app_number] => 09/549931 [patent_app_country] => US [patent_app_date] => 2000-04-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 10 [patent_no_of_words] => 3930 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 116 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/352/06352800.pdf [firstpage_image] =>[orig_patent_app_number] => 09549931 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/549931
Reticle for use in exposing semiconductor, method of producing the reticle, and semiconductor device Apr 13, 2000 Issued
Array ( [id] => 1449402 [patent_doc_number] => 06455203 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-09-24 [patent_title] => 'Mask structure and method of manufacturing the same' [patent_app_type] => B1 [patent_app_number] => 09/545464 [patent_app_country] => US [patent_app_date] => 2000-04-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 31 [patent_no_of_words] => 6856 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 73 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/455/06455203.pdf [firstpage_image] =>[orig_patent_app_number] => 09545464 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/545464
Mask structure and method of manufacturing the same Apr 6, 2000 Issued
Array ( [id] => 1383818 [patent_doc_number] => RE037996 [patent_country] => US [patent_kind] => E1 [patent_issue_date] => 2003-02-18 [patent_title] => 'Manufacturing method or an exposing method for a semiconductor device or a semiconductor integrated circuit device and a mask used therefor' [patent_app_type] => E1 [patent_app_number] => 09/544634 [patent_app_country] => US [patent_app_date] => 2000-04-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 47 [patent_figures_cnt] => 90 [patent_no_of_words] => 14105 [patent_no_of_claims] => 34 [patent_no_of_ind_claims] => 8 [patent_words_short_claim] => 159 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/RE/037/RE037996.pdf [firstpage_image] =>[orig_patent_app_number] => 09544634 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/544634
Manufacturing method or an exposing method for a semiconductor device or a semiconductor integrated circuit device and a mask used therefor Apr 5, 2000 Issued
Array ( [id] => 1564779 [patent_doc_number] => 06376131 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-04-23 [patent_title] => 'Methods and structures for protecting reticles from ESD failure' [patent_app_type] => B1 [patent_app_number] => 09/542127 [patent_app_country] => US [patent_app_date] => 2000-04-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 12 [patent_no_of_words] => 4625 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 80 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/376/06376131.pdf [firstpage_image] =>[orig_patent_app_number] => 09542127 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/542127
Methods and structures for protecting reticles from ESD failure Apr 3, 2000 Issued
Array ( [id] => 1494172 [patent_doc_number] => 06403268 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-06-11 [patent_title] => 'Reticles for charged-particle beam microlithography' [patent_app_type] => B1 [patent_app_number] => 09/542026 [patent_app_country] => US [patent_app_date] => 2000-04-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 6 [patent_no_of_words] => 2984 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 99 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/403/06403268.pdf [firstpage_image] =>[orig_patent_app_number] => 09542026 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/542026
Reticles for charged-particle beam microlithography Apr 2, 2000 Issued
Array ( [id] => 4356128 [patent_doc_number] => 06255024 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-07-03 [patent_title] => 'Use of attenuating phase-shifting mask for improved printability of clear-field patterns' [patent_app_type] => 1 [patent_app_number] => 9/539084 [patent_app_country] => US [patent_app_date] => 2000-03-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 14 [patent_no_of_words] => 3743 [patent_no_of_claims] => 30 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 56 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/255/06255024.pdf [firstpage_image] =>[orig_patent_app_number] => 539084 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/539084
Use of attenuating phase-shifting mask for improved printability of clear-field patterns Mar 29, 2000 Issued
Array ( [id] => 5828138 [patent_doc_number] => 20020068226 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-06-06 [patent_title] => 'Method for improving the performance of photolithographic equipment and for increasing the lifetime of the optics thereof' [patent_app_type] => new [patent_app_number] => 09/538064 [patent_app_country] => US [patent_app_date] => 2000-03-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 1803 [patent_no_of_claims] => 1 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 88 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0068/20020068226.pdf [firstpage_image] =>[orig_patent_app_number] => 09538064 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/538064
Method for improving the performance of photolithographic equipment and for increasing the lifetime of the optics thereof Mar 28, 2000 Abandoned
Array ( [id] => 4284013 [patent_doc_number] => 06268091 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-07-31 [patent_title] => 'Subresolution grating for attenuated phase shifting mask fabrication' [patent_app_type] => 1 [patent_app_number] => 9/536947 [patent_app_country] => US [patent_app_date] => 2000-03-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 4 [patent_no_of_words] => 1889 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 10 [patent_words_short_claim] => 28 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/268/06268091.pdf [firstpage_image] =>[orig_patent_app_number] => 536947 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/536947
Subresolution grating for attenuated phase shifting mask fabrication Mar 27, 2000 Issued
Array ( [id] => 4244079 [patent_doc_number] => 06221540 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-04-24 [patent_title] => 'Photomask and projection exposure apparatus' [patent_app_type] => 1 [patent_app_number] => 9/527036 [patent_app_country] => US [patent_app_date] => 2000-03-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 33 [patent_no_of_words] => 10907 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 9 [patent_words_short_claim] => 87 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/221/06221540.pdf [firstpage_image] =>[orig_patent_app_number] => 527036 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/527036
Photomask and projection exposure apparatus Mar 15, 2000 Issued
Array ( [id] => 4374469 [patent_doc_number] => 06303253 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-10-16 [patent_title] => 'Hierarchy and domain-balancing method and algorithm for serif mask design in microlithography' [patent_app_type] => 1 [patent_app_number] => 9/526856 [patent_app_country] => US [patent_app_date] => 2000-03-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 29 [patent_figures_cnt] => 55 [patent_no_of_words] => 13588 [patent_no_of_claims] => 28 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 105 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/303/06303253.pdf [firstpage_image] =>[orig_patent_app_number] => 526856 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/526856
Hierarchy and domain-balancing method and algorithm for serif mask design in microlithography Mar 15, 2000 Issued
Array ( [id] => 4322414 [patent_doc_number] => 06329107 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-12-11 [patent_title] => 'Method of characterizing partial coherent light illumination and its application to serif mask design' [patent_app_type] => 1 [patent_app_number] => 9/526424 [patent_app_country] => US [patent_app_date] => 2000-03-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 16 [patent_no_of_words] => 5977 [patent_no_of_claims] => 43 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 70 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/329/06329107.pdf [firstpage_image] =>[orig_patent_app_number] => 526424 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/526424
Method of characterizing partial coherent light illumination and its application to serif mask design Mar 14, 2000 Issued
Array ( [id] => 1440745 [patent_doc_number] => 06335129 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-01-01 [patent_title] => 'Method for repairing pattern defect, photo mask using the method, and semiconductor device manufacturing method employing the photo mask' [patent_app_type] => B1 [patent_app_number] => 09/524963 [patent_app_country] => US [patent_app_date] => 2000-03-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 25 [patent_figures_cnt] => 41 [patent_no_of_words] => 11362 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 105 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/335/06335129.pdf [firstpage_image] =>[orig_patent_app_number] => 09524963 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/524963
Method for repairing pattern defect, photo mask using the method, and semiconductor device manufacturing method employing the photo mask Mar 13, 2000 Issued
Array ( [id] => 4379030 [patent_doc_number] => 06294295 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-09-25 [patent_title] => 'Variable transmittance phase shifter to compensate for side lobe problem on rim type attenuating phase shifting masks' [patent_app_type] => 1 [patent_app_number] => 9/519612 [patent_app_country] => US [patent_app_date] => 2000-03-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 26 [patent_no_of_words] => 4795 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 225 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/294/06294295.pdf [firstpage_image] =>[orig_patent_app_number] => 519612 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/519612
Variable transmittance phase shifter to compensate for side lobe problem on rim type attenuating phase shifting masks Mar 5, 2000 Issued
Array ( [id] => 1435741 [patent_doc_number] => 06355384 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-03-12 [patent_title] => 'Mask, its method of formation, and a semiconductor device made thereby' [patent_app_type] => B1 [patent_app_number] => 09/519739 [patent_app_country] => US [patent_app_date] => 2000-03-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 11 [patent_no_of_words] => 4318 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 66 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/355/06355384.pdf [firstpage_image] =>[orig_patent_app_number] => 09519739 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/519739
Mask, its method of formation, and a semiconductor device made thereby Mar 5, 2000 Issued
Array ( [id] => 4272392 [patent_doc_number] => 06280887 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-08-28 [patent_title] => 'Complementary and exchange mask design methodology for optical proximity correction in microlithography' [patent_app_type] => 1 [patent_app_number] => 9/518069 [patent_app_country] => US [patent_app_date] => 2000-03-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 20 [patent_figures_cnt] => 37 [patent_no_of_words] => 9742 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 57 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/280/06280887.pdf [firstpage_image] =>[orig_patent_app_number] => 518069 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/518069
Complementary and exchange mask design methodology for optical proximity correction in microlithography Mar 1, 2000 Issued
Array ( [id] => 4268619 [patent_doc_number] => 06322935 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-11-27 [patent_title] => 'Method and apparatus for repairing an alternating phase shift mask' [patent_app_type] => 1 [patent_app_number] => 9/514823 [patent_app_country] => US [patent_app_date] => 2000-02-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 21 [patent_no_of_words] => 5043 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 57 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/322/06322935.pdf [firstpage_image] =>[orig_patent_app_number] => 514823 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/514823
Method and apparatus for repairing an alternating phase shift mask Feb 27, 2000 Issued
Array ( [id] => 1549138 [patent_doc_number] => 06346352 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-02-12 [patent_title] => 'Quartz defect removal utilizing gallium staining and femtosecond ablation' [patent_app_type] => B1 [patent_app_number] => 09/512951 [patent_app_country] => US [patent_app_date] => 2000-02-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 10 [patent_no_of_words] => 4463 [patent_no_of_claims] => 32 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 52 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/346/06346352.pdf [firstpage_image] =>[orig_patent_app_number] => 09512951 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/512951
Quartz defect removal utilizing gallium staining and femtosecond ablation Feb 24, 2000 Issued
Array ( [id] => 1559121 [patent_doc_number] => 06436585 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-08-20 [patent_title] => 'Method of using optical proximity effects to create electrically blown fuses with sub-critical dimension neck downs' [patent_app_type] => B1 [patent_app_number] => 09/512923 [patent_app_country] => US [patent_app_date] => 2000-02-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 5 [patent_no_of_words] => 5336 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 126 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/436/06436585.pdf [firstpage_image] =>[orig_patent_app_number] => 09512923 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/512923
Method of using optical proximity effects to create electrically blown fuses with sub-critical dimension neck downs Feb 24, 2000 Issued
Array ( [id] => 4283998 [patent_doc_number] => 06268090 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-07-31 [patent_title] => 'Process for manufacturing semiconductor device and exposure mask' [patent_app_type] => 1 [patent_app_number] => 9/512352 [patent_app_country] => US [patent_app_date] => 2000-02-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 16 [patent_no_of_words] => 2463 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 73 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/268/06268090.pdf [firstpage_image] =>[orig_patent_app_number] => 512352 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/512352
Process for manufacturing semiconductor device and exposure mask Feb 23, 2000 Issued
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