
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1564775
[patent_doc_number] => 06376130
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-04-23
[patent_title] => 'Chromeless alternating reticle for producing semiconductor device features'
[patent_app_type] => B1
[patent_app_number] => 09/510359
[patent_app_country] => US
[patent_app_date] => 2000-02-22
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[pdf_file] => patents/06/376/06376130.pdf
[firstpage_image] =>[orig_patent_app_number] => 09510359
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/510359 | Chromeless alternating reticle for producing semiconductor device features | Feb 21, 2000 | Issued |
Array
(
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[patent_doc_number] => 06156461
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-12-05
[patent_title] => 'Method for repair of photomasks'
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Array
(
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[patent_kind] => NA
[patent_issue_date] => 2001-12-04
[patent_title] => 'Phase shift mask and process for manufacturing the same'
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[patent_app_date] => 2000-02-10
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Array
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[patent_issue_date] => 2002-08-27
[patent_title] => 'Method of repairing a mask with high electron scattering and low electron absorption properties'
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[patent_app_number] => 09/500560
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Array
(
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[patent_doc_number] => 06479194
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[patent_issue_date] => 2002-11-12
[patent_title] => 'Transparent phase shift mask for fabrication of small feature sizes'
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Array
(
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[patent_issue_date] => 2002-04-09
[patent_title] => 'Masks for use in optical lithography below 180 nm'
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Array
(
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Array
(
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[patent_issue_date] => 2002-02-19
[patent_title] => 'Multiphase phase shifting mask'
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[patent_app_number] => 09/495247
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/495247 | Multiphase phase shifting mask | Jan 30, 2000 | Issued |
Array
(
[id] => 4324545
[patent_doc_number] => 06319637
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[patent_issue_date] => 2001-11-20
[patent_title] => 'Method for forming pattern'
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Array
(
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[patent_issue_date] => 2001-08-28
[patent_title] => 'Clean-enclosure window to protect photolithographic mask'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/491559 | Clean-enclosure window to protect photolithographic mask | Jan 25, 2000 | Issued |
Array
(
[id] => 4264127
[patent_doc_number] => 06306549
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[patent_issue_date] => 2001-10-23
[patent_title] => 'Method for manufacturing EAPSM-type masks used to produce integrated circuits'
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Array
(
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[patent_title] => 'Method to change transmittance of attenuated phase-shifting masks'
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Array
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Array
(
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Array
(
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Array
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Array
(
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Array
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Array
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Array
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