Search

Liliana Di Nola Baron

Examiner (ID: 15438)

Most Active Art Unit
1615
Art Unit(s)
1615
Total Applications
361
Issued Applications
209
Pending Applications
88
Abandoned Applications
63

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 1564775 [patent_doc_number] => 06376130 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-04-23 [patent_title] => 'Chromeless alternating reticle for producing semiconductor device features' [patent_app_type] => B1 [patent_app_number] => 09/510359 [patent_app_country] => US [patent_app_date] => 2000-02-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 11 [patent_no_of_words] => 3448 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 78 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/376/06376130.pdf [firstpage_image] =>[orig_patent_app_number] => 09510359 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/510359
Chromeless alternating reticle for producing semiconductor device features Feb 21, 2000 Issued
Array ( [id] => 4153467 [patent_doc_number] => 06156461 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-12-05 [patent_title] => 'Method for repair of photomasks' [patent_app_type] => 1 [patent_app_number] => 9/504031 [patent_app_country] => US [patent_app_date] => 2000-02-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 26 [patent_no_of_words] => 6443 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 143 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/156/06156461.pdf [firstpage_image] =>[orig_patent_app_number] => 504031 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/504031
Method for repair of photomasks Feb 13, 2000 Issued
Array ( [id] => 4301239 [patent_doc_number] => 06326107 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-12-04 [patent_title] => 'Phase shift mask and process for manufacturing the same' [patent_app_type] => 1 [patent_app_number] => 9/501572 [patent_app_country] => US [patent_app_date] => 2000-02-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 22 [patent_no_of_words] => 3664 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 157 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/326/06326107.pdf [firstpage_image] =>[orig_patent_app_number] => 501572 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/501572
Phase shift mask and process for manufacturing the same Feb 9, 2000 Issued
Array ( [id] => 1506637 [patent_doc_number] => 06440615 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-08-27 [patent_title] => 'Method of repairing a mask with high electron scattering and low electron absorption properties' [patent_app_type] => B1 [patent_app_number] => 09/500560 [patent_app_country] => US [patent_app_date] => 2000-02-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 10 [patent_no_of_words] => 11506 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 75 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/440/06440615.pdf [firstpage_image] =>[orig_patent_app_number] => 09500560 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/500560
Method of repairing a mask with high electron scattering and low electron absorption properties Feb 8, 2000 Issued
Array ( [id] => 1527745 [patent_doc_number] => 06479194 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-11-12 [patent_title] => 'Transparent phase shift mask for fabrication of small feature sizes' [patent_app_type] => B1 [patent_app_number] => 09/499244 [patent_app_country] => US [patent_app_date] => 2000-02-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 12 [patent_no_of_words] => 7493 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 133 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/479/06479194.pdf [firstpage_image] =>[orig_patent_app_number] => 09499244 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/499244
Transparent phase shift mask for fabrication of small feature sizes Feb 6, 2000 Issued
Array ( [id] => 1446260 [patent_doc_number] => 06368755 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-04-09 [patent_title] => 'Masks for use in optical lithography below 180 nm' [patent_app_type] => B1 [patent_app_number] => 09/498775 [patent_app_country] => US [patent_app_date] => 2000-02-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 10 [patent_no_of_words] => 2530 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 68 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/368/06368755.pdf [firstpage_image] =>[orig_patent_app_number] => 09498775 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/498775
Masks for use in optical lithography below 180 nm Feb 3, 2000 Issued
Array ( [id] => 1462028 [patent_doc_number] => 06350547 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-02-26 [patent_title] => 'Oxide structure having a finely calibrated thickness' [patent_app_type] => B1 [patent_app_number] => 09/498552 [patent_app_country] => US [patent_app_date] => 2000-02-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 8 [patent_no_of_words] => 3759 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 148 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/350/06350547.pdf [firstpage_image] =>[orig_patent_app_number] => 09498552 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/498552
Oxide structure having a finely calibrated thickness Feb 3, 2000 Issued
Array ( [id] => 1553043 [patent_doc_number] => 06348287 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-02-19 [patent_title] => 'Multiphase phase shifting mask' [patent_app_type] => B1 [patent_app_number] => 09/495247 [patent_app_country] => US [patent_app_date] => 2000-01-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 8 [patent_no_of_words] => 1636 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 143 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/348/06348287.pdf [firstpage_image] =>[orig_patent_app_number] => 09495247 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/495247
Multiphase phase shifting mask Jan 30, 2000 Issued
Array ( [id] => 4324545 [patent_doc_number] => 06319637 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-11-20 [patent_title] => 'Method for forming pattern' [patent_app_type] => 1 [patent_app_number] => 9/492788 [patent_app_country] => US [patent_app_date] => 2000-01-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 25 [patent_no_of_words] => 5344 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 66 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/319/06319637.pdf [firstpage_image] =>[orig_patent_app_number] => 492788 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/492788
Method for forming pattern Jan 27, 2000 Issued
Array ( [id] => 4272378 [patent_doc_number] => 06280886 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-08-28 [patent_title] => 'Clean-enclosure window to protect photolithographic mask' [patent_app_type] => 1 [patent_app_number] => 9/491559 [patent_app_country] => US [patent_app_date] => 2000-01-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 13 [patent_no_of_words] => 3230 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 56 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/280/06280886.pdf [firstpage_image] =>[orig_patent_app_number] => 491559 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/491559
Clean-enclosure window to protect photolithographic mask Jan 25, 2000 Issued
Array ( [id] => 4264127 [patent_doc_number] => 06306549 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-10-23 [patent_title] => 'Method for manufacturing EAPSM-type masks used to produce integrated circuits' [patent_app_type] => 1 [patent_app_number] => 9/490193 [patent_app_country] => US [patent_app_date] => 2000-01-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 4 [patent_no_of_words] => 1784 [patent_no_of_claims] => 27 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 121 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/306/06306549.pdf [firstpage_image] =>[orig_patent_app_number] => 490193 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/490193
Method for manufacturing EAPSM-type masks used to produce integrated circuits Jan 23, 2000 Issued
Array ( [id] => 4378468 [patent_doc_number] => 06277528 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-08-21 [patent_title] => 'Method to change transmittance of attenuated phase-shifting masks' [patent_app_type] => 1 [patent_app_number] => 9/489499 [patent_app_country] => US [patent_app_date] => 2000-01-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 9 [patent_no_of_words] => 3071 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 154 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/277/06277528.pdf [firstpage_image] =>[orig_patent_app_number] => 489499 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/489499
Method to change transmittance of attenuated phase-shifting masks Jan 20, 2000 Issued
Array ( [id] => 1494168 [patent_doc_number] => 06403267 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-06-11 [patent_title] => 'Method for high transmittance attenuated phase-shifting mask fabrication' [patent_app_type] => B1 [patent_app_number] => 09/489500 [patent_app_country] => US [patent_app_date] => 2000-01-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 11 [patent_no_of_words] => 3757 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 146 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/403/06403267.pdf [firstpage_image] =>[orig_patent_app_number] => 09489500 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/489500
Method for high transmittance attenuated phase-shifting mask fabrication Jan 20, 2000 Issued
Array ( [id] => 4354821 [patent_doc_number] => 06174631 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-01-16 [patent_title] => 'Attenuating phase shift photomasks' [patent_app_type] => 1 [patent_app_number] => 9/484149 [patent_app_country] => US [patent_app_date] => 2000-01-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 14 [patent_no_of_words] => 6426 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 90 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/174/06174631.pdf [firstpage_image] =>[orig_patent_app_number] => 484149 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/484149
Attenuating phase shift photomasks Jan 17, 2000 Issued
Array ( [id] => 1341147 [patent_doc_number] => RE038126 [patent_country] => US [patent_kind] => E1 [patent_issue_date] => 2003-05-27 [patent_title] => 'Large die photolithography' [patent_app_type] => E1 [patent_app_number] => 09/478938 [patent_app_country] => US [patent_app_date] => 2000-01-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 4 [patent_no_of_words] => 2147 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 84 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/RE/038/RE038126.pdf [firstpage_image] =>[orig_patent_app_number] => 09478938 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/478938
Large die photolithography Jan 5, 2000 Issued
Array ( [id] => 4405359 [patent_doc_number] => 06238826 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-05-29 [patent_title] => 'Apparatus for transferring structures' [patent_app_type] => 1 [patent_app_number] => 9/477445 [patent_app_country] => US [patent_app_date] => 2000-01-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 6 [patent_no_of_words] => 4635 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 93 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/238/06238826.pdf [firstpage_image] =>[orig_patent_app_number] => 477445 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/477445
Apparatus for transferring structures Jan 3, 2000 Issued
Array ( [id] => 4264113 [patent_doc_number] => 06306548 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-10-23 [patent_title] => 'Micro devices manufacturing method and apparatus therefor' [patent_app_type] => 1 [patent_app_number] => 9/476208 [patent_app_country] => US [patent_app_date] => 1999-12-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 23 [patent_no_of_words] => 9901 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 54 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/306/06306548.pdf [firstpage_image] =>[orig_patent_app_number] => 476208 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/476208
Micro devices manufacturing method and apparatus therefor Dec 29, 1999 Issued
Array ( [id] => 1531636 [patent_doc_number] => 06410193 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-06-25 [patent_title] => 'Method and apparatus for a reflective mask that is inspected at a first wavelength and exposed during semiconductor manufacturing at a second wavelength' [patent_app_type] => B1 [patent_app_number] => 09/474857 [patent_app_country] => US [patent_app_date] => 1999-12-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 14 [patent_no_of_words] => 4329 [patent_no_of_claims] => 48 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 103 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/410/06410193.pdf [firstpage_image] =>[orig_patent_app_number] => 09474857 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/474857
Method and apparatus for a reflective mask that is inspected at a first wavelength and exposed during semiconductor manufacturing at a second wavelength Dec 29, 1999 Issued
Array ( [id] => 1435739 [patent_doc_number] => 06355382 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-03-12 [patent_title] => 'Photomask and exposure method using a photomask' [patent_app_type] => B1 [patent_app_number] => 09/473994 [patent_app_country] => US [patent_app_date] => 1999-12-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 26 [patent_figures_cnt] => 52 [patent_no_of_words] => 12317 [patent_no_of_claims] => 39 [patent_no_of_ind_claims] => 12 [patent_words_short_claim] => 71 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/355/06355382.pdf [firstpage_image] =>[orig_patent_app_number] => 09473994 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/473994
Photomask and exposure method using a photomask Dec 28, 1999 Issued
Array ( [id] => 4363677 [patent_doc_number] => 06274281 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-08-14 [patent_title] => 'Using different transmittance with attenuate phase shift mask (APSM) to compensate ADI critical dimension proximity' [patent_app_type] => 1 [patent_app_number] => 9/473027 [patent_app_country] => US [patent_app_date] => 1999-12-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 13 [patent_no_of_words] => 3179 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 160 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/274/06274281.pdf [firstpage_image] =>[orig_patent_app_number] => 473027 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/473027
Using different transmittance with attenuate phase shift mask (APSM) to compensate ADI critical dimension proximity Dec 27, 1999 Issued
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