
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 4378393
[patent_doc_number] => 06261727
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-07-17
[patent_title] => 'DOF for both dense and isolated contact holes'
[patent_app_type] => 1
[patent_app_number] => 9/473030
[patent_app_country] => US
[patent_app_date] => 1999-12-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 9
[patent_no_of_words] => 2739
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 100
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/261/06261727.pdf
[firstpage_image] =>[orig_patent_app_number] => 473030
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/473030 | DOF for both dense and isolated contact holes | Dec 27, 1999 | Issued |
Array
(
[id] => 4374455
[patent_doc_number] => 06303252
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-10-16
[patent_title] => 'Reticle having assist feature between semi-dense lines'
[patent_app_type] => 1
[patent_app_number] => 9/470635
[patent_app_country] => US
[patent_app_date] => 1999-12-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 5
[patent_no_of_words] => 1724
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 113
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/303/06303252.pdf
[firstpage_image] =>[orig_patent_app_number] => 470635
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/470635 | Reticle having assist feature between semi-dense lines | Dec 26, 1999 | Issued |
Array
(
[id] => 4324531
[patent_doc_number] => 06319636
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-11-20
[patent_title] => 'Cell projection mask'
[patent_app_type] => 1
[patent_app_number] => 9/471972
[patent_app_country] => US
[patent_app_date] => 1999-12-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 4
[patent_no_of_words] => 1940
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 80
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/319/06319636.pdf
[firstpage_image] =>[orig_patent_app_number] => 471972
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/471972 | Cell projection mask | Dec 22, 1999 | Issued |
Array
(
[id] => 4392912
[patent_doc_number] => 06296991
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-10-02
[patent_title] => 'Bi-focus exposure process'
[patent_app_type] => 1
[patent_app_number] => 9/471078
[patent_app_country] => US
[patent_app_date] => 1999-12-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 1797
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 162
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/296/06296991.pdf
[firstpage_image] =>[orig_patent_app_number] => 471078
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/471078 | Bi-focus exposure process | Dec 21, 1999 | Issued |
Array
(
[id] => 1469359
[patent_doc_number] => 06406819
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-06-18
[patent_title] => 'Method for selective PSM with assist OPC'
[patent_app_type] => B1
[patent_app_number] => 09/469009
[patent_app_country] => US
[patent_app_date] => 1999-12-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 4
[patent_no_of_words] => 2623
[patent_no_of_claims] => 32
[patent_no_of_ind_claims] => 3
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/406/06406819.pdf
[firstpage_image] =>[orig_patent_app_number] => 09469009
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/469009 | Method for selective PSM with assist OPC | Dec 20, 1999 | Issued |
Array
(
[id] => 1487337
[patent_doc_number] => 06428936
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-08-06
[patent_title] => 'Method and apparatus that compensates for phase shift mask manufacturing defects'
[patent_app_type] => B1
[patent_app_number] => 09/465520
[patent_app_country] => US
[patent_app_date] => 1999-12-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 17
[patent_no_of_words] => 3667
[patent_no_of_claims] => 42
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[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/428/06428936.pdf
[firstpage_image] =>[orig_patent_app_number] => 09465520
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/465520 | Method and apparatus that compensates for phase shift mask manufacturing defects | Dec 15, 1999 | Issued |
Array
(
[id] => 4406306
[patent_doc_number] => 06309781
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-10-30
[patent_title] => 'Photomask provided with an ESD-precluding envelope'
[patent_app_type] => 1
[patent_app_number] => 9/460934
[patent_app_country] => US
[patent_app_date] => 1999-12-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 2
[patent_no_of_words] => 1726
[patent_no_of_claims] => 6
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/309/06309781.pdf
[firstpage_image] =>[orig_patent_app_number] => 460934
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/460934 | Photomask provided with an ESD-precluding envelope | Dec 13, 1999 | Issued |
Array
(
[id] => 4363665
[patent_doc_number] => 06274280
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-08-14
[patent_title] => 'Multilayer attenuating phase-shift masks'
[patent_app_type] => 1
[patent_app_number] => 9/459777
[patent_app_country] => US
[patent_app_date] => 1999-12-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 3960
[patent_no_of_claims] => 3
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[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/274/06274280.pdf
[firstpage_image] =>[orig_patent_app_number] => 459777
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/459777 | Multilayer attenuating phase-shift masks | Dec 12, 1999 | Issued |
Array
(
[id] => 4323533
[patent_doc_number] => 06319568
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-11-20
[patent_title] => 'Formation of silicon nitride film for a phase shift mask at 193 nm'
[patent_app_type] => 1
[patent_app_number] => 9/459729
[patent_app_country] => US
[patent_app_date] => 1999-12-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 2175
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/319/06319568.pdf
[firstpage_image] =>[orig_patent_app_number] => 459729
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/459729 | Formation of silicon nitride film for a phase shift mask at 193 nm | Dec 12, 1999 | Issued |
Array
(
[id] => 1531629
[patent_doc_number] => 06410192
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-06-25
[patent_title] => 'Photolithography method, photolithography mask blanks, and method of making'
[patent_app_type] => B1
[patent_app_number] => 09/458254
[patent_app_country] => US
[patent_app_date] => 1999-12-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
[patent_figures_cnt] => 18
[patent_no_of_words] => 8218
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[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/410/06410192.pdf
[firstpage_image] =>[orig_patent_app_number] => 09458254
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/458254 | Photolithography method, photolithography mask blanks, and method of making | Dec 8, 1999 | Issued |
Array
(
[id] => 4264100
[patent_doc_number] => 06306547
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-10-23
[patent_title] => 'Photomask and manufacturing method thereof, and exposure method using the photomask'
[patent_app_type] => 1
[patent_app_number] => 9/457531
[patent_app_country] => US
[patent_app_date] => 1999-12-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
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[patent_no_of_words] => 10024
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[pdf_file] => patents/06/306/06306547.pdf
[firstpage_image] =>[orig_patent_app_number] => 457531
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/457531 | Photomask and manufacturing method thereof, and exposure method using the photomask | Dec 8, 1999 | Issued |
Array
(
[id] => 1593572
[patent_doc_number] => 06383689
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-05-07
[patent_title] => 'Attenuated phase-shift mask and method of manufacturing the same'
[patent_app_type] => B1
[patent_app_number] => 09/457475
[patent_app_country] => US
[patent_app_date] => 1999-12-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
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[pdf_file] => patents/06/383/06383689.pdf
[firstpage_image] =>[orig_patent_app_number] => 09457475
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/457475 | Attenuated phase-shift mask and method of manufacturing the same | Dec 8, 1999 | Issued |
Array
(
[id] => 4326787
[patent_doc_number] => 06312856
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-11-06
[patent_title] => 'Half-tone phase shift mask for fabrication of poly line'
[patent_app_type] => 1
[patent_app_number] => 9/455720
[patent_app_country] => US
[patent_app_date] => 1999-12-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[pdf_file] => patents/06/312/06312856.pdf
[firstpage_image] =>[orig_patent_app_number] => 455720
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/455720 | Half-tone phase shift mask for fabrication of poly line | Dec 6, 1999 | Issued |
Array
(
[id] => 1433252
[patent_doc_number] => 06340542
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-01-22
[patent_title] => 'Method of manufacturing a semiconductor device, method of manufacturing a photomask, and a master mask'
[patent_app_type] => B1
[patent_app_number] => 09/455320
[patent_app_country] => US
[patent_app_date] => 1999-12-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/340/06340542.pdf
[firstpage_image] =>[orig_patent_app_number] => 09455320
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/455320 | Method of manufacturing a semiconductor device, method of manufacturing a photomask, and a master mask | Dec 5, 1999 | Issued |
Array
(
[id] => 4378378
[patent_doc_number] => 06261726
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-07-17
[patent_title] => 'Projection electron-beam lithography masks using advanced materials and membrane size'
[patent_app_type] => 1
[patent_app_number] => 9/455570
[patent_app_country] => US
[patent_app_date] => 1999-12-06
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[pdf_file] => patents/06/261/06261726.pdf
[firstpage_image] =>[orig_patent_app_number] => 455570
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/455570 | Projection electron-beam lithography masks using advanced materials and membrane size | Dec 5, 1999 | Issued |
Array
(
[id] => 4324514
[patent_doc_number] => 06319635
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-11-20
[patent_title] => 'Mitigation of substrate defects in reticles using multilayer buffer layers'
[patent_app_type] => 1
[patent_app_number] => 9/454715
[patent_app_country] => US
[patent_app_date] => 1999-12-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[pdf_file] => patents/06/319/06319635.pdf
[firstpage_image] =>[orig_patent_app_number] => 454715
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/454715 | Mitigation of substrate defects in reticles using multilayer buffer layers | Dec 5, 1999 | Issued |
Array
(
[id] => 1549466
[patent_doc_number] => 06399256
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-06-04
[patent_title] => 'Reticle having accessory pattern divided into sub-patterns'
[patent_app_type] => B1
[patent_app_number] => 09/453709
[patent_app_country] => US
[patent_app_date] => 1999-12-03
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/399/06399256.pdf
[firstpage_image] =>[orig_patent_app_number] => 09453709
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/453709 | Reticle having accessory pattern divided into sub-patterns | Dec 2, 1999 | Issued |
Array
(
[id] => 1520355
[patent_doc_number] => 06413681
[patent_country] => US
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[patent_issue_date] => 2002-07-02
[patent_title] => 'Diamond film for x-ray lithography and making method'
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[pdf_file] => patents/06/413/06413681.pdf
[firstpage_image] =>[orig_patent_app_number] => 09448295
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/448295 | Diamond film for x-ray lithography and making method | Nov 23, 1999 | Issued |
Array
(
[id] => 4283254
[patent_doc_number] => 06210843
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[patent_kind] => NA
[patent_issue_date] => 2001-04-03
[patent_title] => 'Modulation of peripheral critical dimension on photomask with differential electron beam dose'
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[pdf_file] => patents/06/210/06210843.pdf
[firstpage_image] =>[orig_patent_app_number] => 447088
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/447088 | Modulation of peripheral critical dimension on photomask with differential electron beam dose | Nov 21, 1999 | Issued |
Array
(
[id] => 4326773
[patent_doc_number] => 06312855
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[patent_kind] => NA
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[patent_title] => 'Three-phase phase shift mask'
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[pdf_file] => patents/06/312/06312855.pdf
[firstpage_image] =>[orig_patent_app_number] => 444466
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/444466 | Three-phase phase shift mask | Nov 21, 1999 | Issued |