Search

Liliana Di Nola Baron

Examiner (ID: 15438)

Most Active Art Unit
1615
Art Unit(s)
1615
Total Applications
361
Issued Applications
209
Pending Applications
88
Abandoned Applications
63

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 4378393 [patent_doc_number] => 06261727 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-07-17 [patent_title] => 'DOF for both dense and isolated contact holes' [patent_app_type] => 1 [patent_app_number] => 9/473030 [patent_app_country] => US [patent_app_date] => 1999-12-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 9 [patent_no_of_words] => 2739 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 100 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/261/06261727.pdf [firstpage_image] =>[orig_patent_app_number] => 473030 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/473030
DOF for both dense and isolated contact holes Dec 27, 1999 Issued
Array ( [id] => 4374455 [patent_doc_number] => 06303252 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-10-16 [patent_title] => 'Reticle having assist feature between semi-dense lines' [patent_app_type] => 1 [patent_app_number] => 9/470635 [patent_app_country] => US [patent_app_date] => 1999-12-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 5 [patent_no_of_words] => 1724 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 113 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/303/06303252.pdf [firstpage_image] =>[orig_patent_app_number] => 470635 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/470635
Reticle having assist feature between semi-dense lines Dec 26, 1999 Issued
Array ( [id] => 4324531 [patent_doc_number] => 06319636 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-11-20 [patent_title] => 'Cell projection mask' [patent_app_type] => 1 [patent_app_number] => 9/471972 [patent_app_country] => US [patent_app_date] => 1999-12-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 4 [patent_no_of_words] => 1940 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 80 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/319/06319636.pdf [firstpage_image] =>[orig_patent_app_number] => 471972 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/471972
Cell projection mask Dec 22, 1999 Issued
Array ( [id] => 4392912 [patent_doc_number] => 06296991 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-10-02 [patent_title] => 'Bi-focus exposure process' [patent_app_type] => 1 [patent_app_number] => 9/471078 [patent_app_country] => US [patent_app_date] => 1999-12-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 1797 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 162 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/296/06296991.pdf [firstpage_image] =>[orig_patent_app_number] => 471078 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/471078
Bi-focus exposure process Dec 21, 1999 Issued
Array ( [id] => 1469359 [patent_doc_number] => 06406819 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-06-18 [patent_title] => 'Method for selective PSM with assist OPC' [patent_app_type] => B1 [patent_app_number] => 09/469009 [patent_app_country] => US [patent_app_date] => 1999-12-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 4 [patent_no_of_words] => 2623 [patent_no_of_claims] => 32 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 113 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/406/06406819.pdf [firstpage_image] =>[orig_patent_app_number] => 09469009 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/469009
Method for selective PSM with assist OPC Dec 20, 1999 Issued
Array ( [id] => 1487337 [patent_doc_number] => 06428936 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-08-06 [patent_title] => 'Method and apparatus that compensates for phase shift mask manufacturing defects' [patent_app_type] => B1 [patent_app_number] => 09/465520 [patent_app_country] => US [patent_app_date] => 1999-12-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 17 [patent_no_of_words] => 3667 [patent_no_of_claims] => 42 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 73 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/428/06428936.pdf [firstpage_image] =>[orig_patent_app_number] => 09465520 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/465520
Method and apparatus that compensates for phase shift mask manufacturing defects Dec 15, 1999 Issued
Array ( [id] => 4406306 [patent_doc_number] => 06309781 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-10-30 [patent_title] => 'Photomask provided with an ESD-precluding envelope' [patent_app_type] => 1 [patent_app_number] => 9/460934 [patent_app_country] => US [patent_app_date] => 1999-12-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 2 [patent_no_of_words] => 1726 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 108 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/309/06309781.pdf [firstpage_image] =>[orig_patent_app_number] => 460934 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/460934
Photomask provided with an ESD-precluding envelope Dec 13, 1999 Issued
Array ( [id] => 4363665 [patent_doc_number] => 06274280 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-08-14 [patent_title] => 'Multilayer attenuating phase-shift masks' [patent_app_type] => 1 [patent_app_number] => 9/459777 [patent_app_country] => US [patent_app_date] => 1999-12-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 3960 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 89 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/274/06274280.pdf [firstpage_image] =>[orig_patent_app_number] => 459777 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/459777
Multilayer attenuating phase-shift masks Dec 12, 1999 Issued
Array ( [id] => 4323533 [patent_doc_number] => 06319568 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-11-20 [patent_title] => 'Formation of silicon nitride film for a phase shift mask at 193 nm' [patent_app_type] => 1 [patent_app_number] => 9/459729 [patent_app_country] => US [patent_app_date] => 1999-12-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 6 [patent_no_of_words] => 2175 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 64 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/319/06319568.pdf [firstpage_image] =>[orig_patent_app_number] => 459729 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/459729
Formation of silicon nitride film for a phase shift mask at 193 nm Dec 12, 1999 Issued
Array ( [id] => 1531629 [patent_doc_number] => 06410192 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-06-25 [patent_title] => 'Photolithography method, photolithography mask blanks, and method of making' [patent_app_type] => B1 [patent_app_number] => 09/458254 [patent_app_country] => US [patent_app_date] => 1999-12-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 18 [patent_no_of_words] => 8218 [patent_no_of_claims] => 31 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 79 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/410/06410192.pdf [firstpage_image] =>[orig_patent_app_number] => 09458254 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/458254
Photolithography method, photolithography mask blanks, and method of making Dec 8, 1999 Issued
Array ( [id] => 4264100 [patent_doc_number] => 06306547 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-10-23 [patent_title] => 'Photomask and manufacturing method thereof, and exposure method using the photomask' [patent_app_type] => 1 [patent_app_number] => 9/457531 [patent_app_country] => US [patent_app_date] => 1999-12-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 41 [patent_no_of_words] => 10024 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 92 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/306/06306547.pdf [firstpage_image] =>[orig_patent_app_number] => 457531 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/457531
Photomask and manufacturing method thereof, and exposure method using the photomask Dec 8, 1999 Issued
Array ( [id] => 1593572 [patent_doc_number] => 06383689 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-05-07 [patent_title] => 'Attenuated phase-shift mask and method of manufacturing the same' [patent_app_type] => B1 [patent_app_number] => 09/457475 [patent_app_country] => US [patent_app_date] => 1999-12-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 28 [patent_no_of_words] => 5298 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 8 [patent_words_short_claim] => 94 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/383/06383689.pdf [firstpage_image] =>[orig_patent_app_number] => 09457475 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/457475
Attenuated phase-shift mask and method of manufacturing the same Dec 8, 1999 Issued
Array ( [id] => 4326787 [patent_doc_number] => 06312856 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-11-06 [patent_title] => 'Half-tone phase shift mask for fabrication of poly line' [patent_app_type] => 1 [patent_app_number] => 9/455720 [patent_app_country] => US [patent_app_date] => 1999-12-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 4 [patent_no_of_words] => 1671 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 87 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/312/06312856.pdf [firstpage_image] =>[orig_patent_app_number] => 455720 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/455720
Half-tone phase shift mask for fabrication of poly line Dec 6, 1999 Issued
Array ( [id] => 1433252 [patent_doc_number] => 06340542 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-01-22 [patent_title] => 'Method of manufacturing a semiconductor device, method of manufacturing a photomask, and a master mask' [patent_app_type] => B1 [patent_app_number] => 09/455320 [patent_app_country] => US [patent_app_date] => 1999-12-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 16 [patent_figures_cnt] => 39 [patent_no_of_words] => 7475 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 32 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/340/06340542.pdf [firstpage_image] =>[orig_patent_app_number] => 09455320 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/455320
Method of manufacturing a semiconductor device, method of manufacturing a photomask, and a master mask Dec 5, 1999 Issued
Array ( [id] => 4378378 [patent_doc_number] => 06261726 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-07-17 [patent_title] => 'Projection electron-beam lithography masks using advanced materials and membrane size' [patent_app_type] => 1 [patent_app_number] => 9/455570 [patent_app_country] => US [patent_app_date] => 1999-12-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 6 [patent_no_of_words] => 4220 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 79 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/261/06261726.pdf [firstpage_image] =>[orig_patent_app_number] => 455570 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/455570
Projection electron-beam lithography masks using advanced materials and membrane size Dec 5, 1999 Issued
Array ( [id] => 4324514 [patent_doc_number] => 06319635 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-11-20 [patent_title] => 'Mitigation of substrate defects in reticles using multilayer buffer layers' [patent_app_type] => 1 [patent_app_number] => 9/454715 [patent_app_country] => US [patent_app_date] => 1999-12-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 5 [patent_no_of_words] => 4543 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 43 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/319/06319635.pdf [firstpage_image] =>[orig_patent_app_number] => 454715 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/454715
Mitigation of substrate defects in reticles using multilayer buffer layers Dec 5, 1999 Issued
Array ( [id] => 1549466 [patent_doc_number] => 06399256 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-06-04 [patent_title] => 'Reticle having accessory pattern divided into sub-patterns' [patent_app_type] => B1 [patent_app_number] => 09/453709 [patent_app_country] => US [patent_app_date] => 1999-12-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 15 [patent_figures_cnt] => 36 [patent_no_of_words] => 5667 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 51 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/399/06399256.pdf [firstpage_image] =>[orig_patent_app_number] => 09453709 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/453709
Reticle having accessory pattern divided into sub-patterns Dec 2, 1999 Issued
Array ( [id] => 1520355 [patent_doc_number] => 06413681 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-07-02 [patent_title] => 'Diamond film for x-ray lithography and making method' [patent_app_type] => B1 [patent_app_number] => 09/448295 [patent_app_country] => US [patent_app_date] => 1999-11-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 3491 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 110 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/413/06413681.pdf [firstpage_image] =>[orig_patent_app_number] => 09448295 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/448295
Diamond film for x-ray lithography and making method Nov 23, 1999 Issued
Array ( [id] => 4283254 [patent_doc_number] => 06210843 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-04-03 [patent_title] => 'Modulation of peripheral critical dimension on photomask with differential electron beam dose' [patent_app_type] => 1 [patent_app_number] => 9/447088 [patent_app_country] => US [patent_app_date] => 1999-11-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 11 [patent_no_of_words] => 4338 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 56 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/210/06210843.pdf [firstpage_image] =>[orig_patent_app_number] => 447088 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/447088
Modulation of peripheral critical dimension on photomask with differential electron beam dose Nov 21, 1999 Issued
Array ( [id] => 4326773 [patent_doc_number] => 06312855 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-11-06 [patent_title] => 'Three-phase phase shift mask' [patent_app_type] => 1 [patent_app_number] => 9/444466 [patent_app_country] => US [patent_app_date] => 1999-11-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 27 [patent_figures_cnt] => 34 [patent_no_of_words] => 3416 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 80 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/312/06312855.pdf [firstpage_image] =>[orig_patent_app_number] => 444466 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/444466
Three-phase phase shift mask Nov 21, 1999 Issued
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