
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 4405348
[patent_doc_number] => 06238825
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-05-29
[patent_title] => 'Mask with alternating scattering bars'
[patent_app_type] => 1
[patent_app_number] => 9/442839
[patent_app_country] => US
[patent_app_date] => 1999-11-18
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/238/06238825.pdf
[firstpage_image] =>[orig_patent_app_number] => 442839
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/442839 | Mask with alternating scattering bars | Nov 17, 1999 | Issued |
Array
(
[id] => 4307576
[patent_doc_number] => 06316151
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[patent_kind] => NA
[patent_issue_date] => 2001-11-13
[patent_title] => 'Stencil mask'
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[patent_app_number] => 9/442983
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[patent_app_date] => 1999-11-18
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Array
(
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[patent_doc_number] => 06368754
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[patent_kind] => B1
[patent_issue_date] => 2002-04-09
[patent_title] => 'Reticle used for fabrication of semiconductor device'
[patent_app_type] => B1
[patent_app_number] => 09/442251
[patent_app_country] => US
[patent_app_date] => 1999-11-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/442251 | Reticle used for fabrication of semiconductor device | Nov 14, 1999 | Issued |
Array
(
[id] => 4322495
[patent_doc_number] => 06329112
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-12-11
[patent_title] => 'Method for measuring aberration of projection lens, method for forming patterns, mask, and method for correcting a projection lens'
[patent_app_type] => 1
[patent_app_number] => 9/438481
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[pdf_file] => patents/06/329/06329112.pdf
[firstpage_image] =>[orig_patent_app_number] => 438481
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Array
(
[id] => 4356114
[patent_doc_number] => 06255023
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-07-03
[patent_title] => 'Method of manufacturing binary phase shift mask'
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Array
(
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[patent_doc_number] => 06296977
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[patent_title] => 'Method for the measurement of aberration of optical projection system'
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Array
(
[id] => 1506633
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[patent_issue_date] => 2002-08-27
[patent_title] => 'Mask and method of manufacturing semiconductor device'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/431033 | Mask and method of manufacturing semiconductor device | Oct 31, 1999 | Issued |
Array
(
[id] => 4378362
[patent_doc_number] => 06261725
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[patent_kind] => NA
[patent_issue_date] => 2001-07-17
[patent_title] => 'Phase angle modulation of PSM by chemical treatment method'
[patent_app_type] => 1
[patent_app_number] => 9/428572
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[patent_app_date] => 1999-10-28
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[pdf_file] => patents/06/261/06261725.pdf
[firstpage_image] =>[orig_patent_app_number] => 428572
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/428572 | Phase angle modulation of PSM by chemical treatment method | Oct 27, 1999 | Issued |
Array
(
[id] => 4298992
[patent_doc_number] => 06251549
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-06-26
[patent_title] => 'Generic phase shift mask'
[patent_app_type] => 1
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Array
(
[id] => 4365588
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[firstpage_image] =>[orig_patent_app_number] => 428308
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Array
(
[id] => 4267347
[patent_doc_number] => 06245468
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-06-12
[patent_title] => 'Optical proximity correction methods, and methods of forming radiation-patterning tools'
[patent_app_type] => 1
[patent_app_number] => 9/429737
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/429737 | Optical proximity correction methods, and methods of forming radiation-patterning tools | Oct 26, 1999 | Issued |
Array
(
[id] => 7636808
[patent_doc_number] => 06379847
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2002-04-30
[patent_title] => 'Electrically programmable photolithography mask'
[patent_app_type] => B2
[patent_app_number] => 09/426386
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/426386 | Electrically programmable photolithography mask | Oct 24, 1999 | Issued |
Array
(
[id] => 4379016
[patent_doc_number] => 06294294
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[patent_issue_date] => 2001-09-25
[patent_title] => 'Implantation mask for producing a memory cell configuration'
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Array
(
[id] => 4298959
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[patent_title] => 'Simplified process for making an outrigger type phase shift mask'
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Array
(
[id] => 4347426
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Array
(
[id] => 4354774
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Array
(
[id] => 4415254
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Array
(
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Array
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Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/407447 | Method and apparatus for determining phase shifts and trim masks for an integrated circuit | Sep 27, 1999 | Issued |