
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 4246988
[patent_doc_number] => 06207328
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-03-27
[patent_title] => 'Method of forming a phase shift mask'
[patent_app_type] => 1
[patent_app_number] => 9/378704
[patent_app_country] => US
[patent_app_date] => 1999-08-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 10
[patent_no_of_words] => 1455
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 188
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/207/06207328.pdf
[firstpage_image] =>[orig_patent_app_number] => 378704
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/378704 | Method of forming a phase shift mask | Aug 22, 1999 | Issued |
Array
(
[id] => 1544544
[patent_doc_number] => 06444371
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-09-03
[patent_title] => 'Prevention of die loss to chemical mechanical polishing'
[patent_app_type] => B1
[patent_app_number] => 09/377541
[patent_app_country] => US
[patent_app_date] => 1999-08-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 16
[patent_no_of_words] => 2710
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 85
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/444/06444371.pdf
[firstpage_image] =>[orig_patent_app_number] => 09377541
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/377541 | Prevention of die loss to chemical mechanical polishing | Aug 18, 1999 | Issued |
Array
(
[id] => 4345112
[patent_doc_number] => 06214498
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-04-10
[patent_title] => 'Lithography mask and a fabricating method thereof'
[patent_app_type] => 1
[patent_app_number] => 9/375431
[patent_app_country] => US
[patent_app_date] => 1999-08-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 14
[patent_no_of_words] => 4654
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 120
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/214/06214498.pdf
[firstpage_image] =>[orig_patent_app_number] => 375431
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/375431 | Lithography mask and a fabricating method thereof | Aug 16, 1999 | Issued |
Array
(
[id] => 4267332
[patent_doc_number] => 06245467
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-06-12
[patent_title] => 'Patterned mask and a deep trench capacitor formed thereby'
[patent_app_type] => 1
[patent_app_number] => 9/375574
[patent_app_country] => US
[patent_app_date] => 1999-08-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 1483
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 57
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/245/06245467.pdf
[firstpage_image] =>[orig_patent_app_number] => 375574
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/375574 | Patterned mask and a deep trench capacitor formed thereby | Aug 16, 1999 | Issued |
Array
(
[id] => 4188650
[patent_doc_number] => 06042973
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-03-28
[patent_title] => 'Subresolution grating for attenuated phase shifting mask fabrication'
[patent_app_type] => 1
[patent_app_number] => 9/370833
[patent_app_country] => US
[patent_app_date] => 1999-08-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 4
[patent_no_of_words] => 1891
[patent_no_of_claims] => 27
[patent_no_of_ind_claims] => 11
[patent_words_short_claim] => 29
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/042/06042973.pdf
[firstpage_image] =>[orig_patent_app_number] => 370833
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/370833 | Subresolution grating for attenuated phase shifting mask fabrication | Aug 8, 1999 | Issued |
Array
(
[id] => 4350897
[patent_doc_number] => 06218058
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-04-17
[patent_title] => 'Charged particle beam transfer mask'
[patent_app_type] => 1
[patent_app_number] => 9/363686
[patent_app_country] => US
[patent_app_date] => 1999-07-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 20
[patent_no_of_words] => 4805
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 76
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/218/06218058.pdf
[firstpage_image] =>[orig_patent_app_number] => 363686
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/363686 | Charged particle beam transfer mask | Jul 28, 1999 | Issued |
Array
(
[id] => 4247062
[patent_doc_number] => 06207333
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-03-27
[patent_title] => 'Mask with attenuating phase-shift and opaque regions'
[patent_app_type] => 1
[patent_app_number] => 9/363862
[patent_app_country] => US
[patent_app_date] => 1999-07-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 24
[patent_no_of_words] => 4099
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 67
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/207/06207333.pdf
[firstpage_image] =>[orig_patent_app_number] => 363862
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/363862 | Mask with attenuating phase-shift and opaque regions | Jul 28, 1999 | Issued |
Array
(
[id] => 4256172
[patent_doc_number] => 06258491
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-07-10
[patent_title] => 'Mask for high resolution optical lithography'
[patent_app_type] => 1
[patent_app_number] => 9/361685
[patent_app_country] => US
[patent_app_date] => 1999-07-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 16
[patent_no_of_words] => 3114
[patent_no_of_claims] => 26
[patent_no_of_ind_claims] => 7
[patent_words_short_claim] => 63
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/258/06258491.pdf
[firstpage_image] =>[orig_patent_app_number] => 361685
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/361685 | Mask for high resolution optical lithography | Jul 26, 1999 | Issued |
Array
(
[id] => 4212857
[patent_doc_number] => 06087074
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-07-11
[patent_title] => 'Photomask and pattern forming method employing the same'
[patent_app_type] => 1
[patent_app_number] => 9/359732
[patent_app_country] => US
[patent_app_date] => 1999-07-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 13
[patent_no_of_words] => 4028
[patent_no_of_claims] => 37
[patent_no_of_ind_claims] => 10
[patent_words_short_claim] => 128
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/087/06087074.pdf
[firstpage_image] =>[orig_patent_app_number] => 359732
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/359732 | Photomask and pattern forming method employing the same | Jul 22, 1999 | Issued |
Array
(
[id] => 4244048
[patent_doc_number] => 06221539
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-04-24
[patent_title] => 'Mask pattern correction method and a recording medium which records a mask pattern correction program'
[patent_app_type] => 1
[patent_app_number] => 9/358824
[patent_app_country] => US
[patent_app_date] => 1999-07-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
[patent_figures_cnt] => 28
[patent_no_of_words] => 7994
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 79
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/221/06221539.pdf
[firstpage_image] =>[orig_patent_app_number] => 358824
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/358824 | Mask pattern correction method and a recording medium which records a mask pattern correction program | Jul 21, 1999 | Issued |
Array
(
[id] => 4267318
[patent_doc_number] => 06245466
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-06-12
[patent_title] => 'Mask pattern design method and a photomask'
[patent_app_type] => 1
[patent_app_number] => 9/358769
[patent_app_country] => US
[patent_app_date] => 1999-07-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 11
[patent_no_of_words] => 4813
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 106
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/245/06245466.pdf
[firstpage_image] =>[orig_patent_app_number] => 358769
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/358769 | Mask pattern design method and a photomask | Jul 21, 1999 | Issued |
Array
(
[id] => 4298931
[patent_doc_number] => 06251545
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-06-26
[patent_title] => 'Method and system for improving transmission of light through photomasks'
[patent_app_type] => 1
[patent_app_number] => 9/357422
[patent_app_country] => US
[patent_app_date] => 1999-07-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 10
[patent_no_of_words] => 2227
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 73
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/251/06251545.pdf
[firstpage_image] =>[orig_patent_app_number] => 357422
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/357422 | Method and system for improving transmission of light through photomasks | Jul 19, 1999 | Issued |
Array
(
[id] => 4256143
[patent_doc_number] => 06258489
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-07-10
[patent_title] => 'Mask design utilizing dummy features'
[patent_app_type] => 1
[patent_app_number] => 9/349983
[patent_app_country] => US
[patent_app_date] => 1999-07-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 2132
[patent_no_of_claims] => 37
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 114
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/258/06258489.pdf
[firstpage_image] =>[orig_patent_app_number] => 349983
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/349983 | Mask design utilizing dummy features | Jul 8, 1999 | Issued |
Array
(
[id] => 4415248
[patent_doc_number] => 06194103
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-02-27
[patent_title] => 'E-beam double exposure method for manufacturing ASPM mask with chrome border'
[patent_app_type] => 1
[patent_app_number] => 9/349848
[patent_app_country] => US
[patent_app_date] => 1999-07-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 10
[patent_no_of_words] => 2158
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 388
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/194/06194103.pdf
[firstpage_image] =>[orig_patent_app_number] => 349848
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/349848 | E-beam double exposure method for manufacturing ASPM mask with chrome border | Jul 7, 1999 | Issued |
Array
(
[id] => 4406581
[patent_doc_number] => 06228542
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-05-08
[patent_title] => 'Photomask method of manufacture method of test/repair and method of use therefor'
[patent_app_type] => 1
[patent_app_number] => 9/347272
[patent_app_country] => US
[patent_app_date] => 1999-07-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 74
[patent_no_of_words] => 10497
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 96
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/228/06228542.pdf
[firstpage_image] =>[orig_patent_app_number] => 347272
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/347272 | Photomask method of manufacture method of test/repair and method of use therefor | Jul 5, 1999 | Issued |
Array
(
[id] => 4186159
[patent_doc_number] => 06153342
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-11-28
[patent_title] => 'Selective spacer methodology for fabricating phase shift masks'
[patent_app_type] => 1
[patent_app_number] => 9/345718
[patent_app_country] => US
[patent_app_date] => 1999-06-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 22
[patent_no_of_words] => 4657
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 120
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/153/06153342.pdf
[firstpage_image] =>[orig_patent_app_number] => 345718
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/345718 | Selective spacer methodology for fabricating phase shift masks | Jun 29, 1999 | Issued |
Array
(
[id] => 4345098
[patent_doc_number] => 06214497
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-04-10
[patent_title] => 'Method to eliminate side lobe printing of attenuated phase shift masks'
[patent_app_type] => 1
[patent_app_number] => 9/342229
[patent_app_country] => US
[patent_app_date] => 1999-06-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 17
[patent_no_of_words] => 5475
[patent_no_of_claims] => 37
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 108
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/214/06214497.pdf
[firstpage_image] =>[orig_patent_app_number] => 342229
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/342229 | Method to eliminate side lobe printing of attenuated phase shift masks | Jun 28, 1999 | Issued |
Array
(
[id] => 4165969
[patent_doc_number] => 06139994
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-10-31
[patent_title] => 'Use of intersecting subresolution features for microlithography'
[patent_app_type] => 1
[patent_app_number] => 9/344251
[patent_app_country] => US
[patent_app_date] => 1999-06-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 9
[patent_no_of_words] => 2832
[patent_no_of_claims] => 33
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 79
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/139/06139994.pdf
[firstpage_image] =>[orig_patent_app_number] => 344251
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/344251 | Use of intersecting subresolution features for microlithography | Jun 24, 1999 | Issued |
Array
(
[id] => 4378347
[patent_doc_number] => 06261724
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-07-17
[patent_title] => 'Method of modifying a microchip layout data set to generate a predicted mask printed data set'
[patent_app_type] => 1
[patent_app_number] => 9/334367
[patent_app_country] => US
[patent_app_date] => 1999-06-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 11
[patent_no_of_words] => 2476
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 88
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/261/06261724.pdf
[firstpage_image] =>[orig_patent_app_number] => 334367
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/334367 | Method of modifying a microchip layout data set to generate a predicted mask printed data set | Jun 15, 1999 | Issued |
Array
(
[id] => 4406292
[patent_doc_number] => 06309780
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-10-30
[patent_title] => 'Attenuated phase shift mask and a method for making the mask'
[patent_app_type] => 1
[patent_app_number] => 9/333316
[patent_app_country] => US
[patent_app_date] => 1999-06-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 18
[patent_no_of_words] => 4815
[patent_no_of_claims] => 97
[patent_no_of_ind_claims] => 8
[patent_words_short_claim] => 33
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/309/06309780.pdf
[firstpage_image] =>[orig_patent_app_number] => 333316
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/333316 | Attenuated phase shift mask and a method for making the mask | Jun 14, 1999 | Issued |