
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 4165954
[patent_doc_number] => 06139993
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-10-31
[patent_title] => 'Photomask defect repair method'
[patent_app_type] => 1
[patent_app_number] => 9/333743
[patent_app_country] => US
[patent_app_date] => 1999-06-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 13
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/139/06139993.pdf
[firstpage_image] =>[orig_patent_app_number] => 333743
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/333743 | Photomask defect repair method | Jun 14, 1999 | Issued |
Array
(
[id] => 4186145
[patent_doc_number] => 06153341
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-11-28
[patent_title] => 'Phase shift mask and phase shift mask blank'
[patent_app_type] => 1
[patent_app_number] => 9/327032
[patent_app_country] => US
[patent_app_date] => 1999-06-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
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[patent_words_short_claim] => 151
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/153/06153341.pdf
[firstpage_image] =>[orig_patent_app_number] => 327032
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/327032 | Phase shift mask and phase shift mask blank | Jun 6, 1999 | Issued |
Array
(
[id] => 1594589
[patent_doc_number] => 06492066
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-12-10
[patent_title] => 'Characterization and synthesis of OPC structures by fourier space analysis and/or wavelet transform expansion'
[patent_app_type] => B1
[patent_app_number] => 09/321089
[patent_app_country] => US
[patent_app_date] => 1999-05-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 19
[patent_no_of_words] => 7430
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[pdf_file] => patents/06/492/06492066.pdf
[firstpage_image] =>[orig_patent_app_number] => 09321089
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/321089 | Characterization and synthesis of OPC structures by fourier space analysis and/or wavelet transform expansion | May 27, 1999 | Issued |
Array
(
[id] => 4300267
[patent_doc_number] => 06187483
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-02-13
[patent_title] => 'Mask quality measurements by fourier space analysis'
[patent_app_type] => 1
[patent_app_number] => 9/322546
[patent_app_country] => US
[patent_app_date] => 1999-05-28
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/187/06187483.pdf
[firstpage_image] =>[orig_patent_app_number] => 322546
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/322546 | Mask quality measurements by fourier space analysis | May 27, 1999 | Issued |
Array
(
[id] => 4290806
[patent_doc_number] => 06197457
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-03-06
[patent_title] => 'X-ray mask and method of fabricating the same'
[patent_app_type] => 1
[patent_app_number] => 9/313986
[patent_app_country] => US
[patent_app_date] => 1999-05-19
[patent_effective_date] => 0000-00-00
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[patent_no_of_words] => 9725
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[pdf_file] => patents/06/197/06197457.pdf
[firstpage_image] =>[orig_patent_app_number] => 313986
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/313986 | X-ray mask and method of fabricating the same | May 18, 1999 | Issued |
Array
(
[id] => 4232096
[patent_doc_number] => 06165650
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-12-26
[patent_title] => 'Reticle cleaning without damaging pellicle'
[patent_app_type] => 1
[patent_app_number] => 9/310521
[patent_app_country] => US
[patent_app_date] => 1999-05-12
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/165/06165650.pdf
[firstpage_image] =>[orig_patent_app_number] => 310521
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/310521 | Reticle cleaning without damaging pellicle | May 11, 1999 | Issued |
Array
(
[id] => 4188708
[patent_doc_number] => 06042977
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-03-28
[patent_title] => 'Method and apparatus for manufacturing photomask and method of manufacturing a semiconductor device'
[patent_app_type] => 1
[patent_app_number] => 9/302291
[patent_app_country] => US
[patent_app_date] => 1999-04-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 22
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[pdf_file] => patents/06/042/06042977.pdf
[firstpage_image] =>[orig_patent_app_number] => 302291
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/302291 | Method and apparatus for manufacturing photomask and method of manufacturing a semiconductor device | Apr 29, 1999 | Issued |
Array
(
[id] => 4378454
[patent_doc_number] => 06277527
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-08-21
[patent_title] => 'Method of making a twin alternating phase shift mask'
[patent_app_type] => 1
[patent_app_number] => 9/301778
[patent_app_country] => US
[patent_app_date] => 1999-04-29
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/277/06277527.pdf
[firstpage_image] =>[orig_patent_app_number] => 301778
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/301778 | Method of making a twin alternating phase shift mask | Apr 28, 1999 | Issued |
Array
(
[id] => 4350882
[patent_doc_number] => 06218057
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-04-17
[patent_title] => 'Lithographic process having sub-wavelength resolution'
[patent_app_type] => 1
[patent_app_number] => 9/293103
[patent_app_country] => US
[patent_app_date] => 1999-04-16
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[pdf_file] => patents/06/218/06218057.pdf
[firstpage_image] =>[orig_patent_app_number] => 293103
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/293103 | Lithographic process having sub-wavelength resolution | Apr 15, 1999 | Issued |
Array
(
[id] => 4406571
[patent_doc_number] => 06228541
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-05-08
[patent_title] => 'Phase-shifting photomask blank, phase-shifting photomask, method for producing them and apparatus for manufacturing the blank'
[patent_app_type] => 1
[patent_app_number] => 9/292936
[patent_app_country] => US
[patent_app_date] => 1999-04-16
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[pdf_file] => patents/06/228/06228541.pdf
[firstpage_image] =>[orig_patent_app_number] => 292936
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/292936 | Phase-shifting photomask blank, phase-shifting photomask, method for producing them and apparatus for manufacturing the blank | Apr 15, 1999 | Issued |
Array
(
[id] => 4345070
[patent_doc_number] => 06214495
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-04-10
[patent_title] => 'Phase mask for processing optical fibers and method of manufacturing the same'
[patent_app_type] => 1
[patent_app_number] => 9/254086
[patent_app_country] => US
[patent_app_date] => 1999-04-13
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[pdf_file] => patents/06/214/06214495.pdf
[firstpage_image] =>[orig_patent_app_number] => 254086
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/254086 | Phase mask for processing optical fibers and method of manufacturing the same | Apr 12, 1999 | Issued |
Array
(
[id] => 1350862
[patent_doc_number] => RE038113
[patent_country] => US
[patent_kind] => E1
[patent_issue_date] => 2003-05-06
[patent_title] => 'Method of driving mask stage and method of mask alignment'
[patent_app_type] => E1
[patent_app_number] => 09/276465
[patent_app_country] => US
[patent_app_date] => 1999-03-25
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[pdf_file] => patents/RE/038/RE038113.pdf
[firstpage_image] =>[orig_patent_app_number] => 09276465
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/276465 | Method of driving mask stage and method of mask alignment | Mar 24, 1999 | Issued |
Array
(
[id] => 4300255
[patent_doc_number] => 06187482
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-02-13
[patent_title] => 'Mask for evanescent light exposure, object to be exposed and apparatus using same'
[patent_app_type] => 1
[patent_app_number] => 9/274110
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[firstpage_image] =>[orig_patent_app_number] => 274110
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Array
(
[id] => 4354761
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Array
(
[id] => 4153080
[patent_doc_number] => 06114074
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[patent_issue_date] => 2000-09-05
[patent_title] => 'Extrusion enhanced mask for improving process window'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/266473 | Extrusion enhanced mask for improving process window | Mar 10, 1999 | Issued |
Array
(
[id] => 4234500
[patent_doc_number] => 06090507
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[patent_title] => 'Methods for repair of photomasks'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/261638 | Methods for repair of photomasks | Mar 2, 1999 | Issued |
Array
(
[id] => 4180637
[patent_doc_number] => 06159643
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[patent_issue_date] => 2000-12-12
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[firstpage_image] =>[orig_patent_app_number] => 258959
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/258959 | Extreme ultraviolet lithography reflective mask | Feb 28, 1999 | Issued |
Array
(
[id] => 4179187
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Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/257538 | Method of producing block mask for electron-beam lithography apparatuses | Feb 23, 1999 | Issued |
Array
(
[id] => 4170175
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[patent_title] => 'Microlithography reticle exhibiting reduced stresses and methods for manufacturing same'
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[pdf_file] => patents/06/083/06083648.pdf
[firstpage_image] =>[orig_patent_app_number] => 240209
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/240209 | Microlithography reticle exhibiting reduced stresses and methods for manufacturing same | Jan 28, 1999 | Issued |