
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 4232713
[patent_doc_number] => 06165693
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-12-26
[patent_title] => 'Method of designing an assist feature'
[patent_app_type] => 1
[patent_app_number] => 9/135434
[patent_app_country] => US
[patent_app_date] => 1998-08-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 6
[patent_no_of_words] => 1825
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 111
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/165/06165693.pdf
[firstpage_image] =>[orig_patent_app_number] => 135434
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/135434 | Method of designing an assist feature | Aug 16, 1998 | Issued |
Array
(
[id] => 4202916
[patent_doc_number] => 06077631
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-06-20
[patent_title] => 'Photomask and scanning exposure apparatus and device manufacturing method using same'
[patent_app_type] => 1
[patent_app_number] => 9/134539
[patent_app_country] => US
[patent_app_date] => 1998-08-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 34
[patent_figures_cnt] => 67
[patent_no_of_words] => 15015
[patent_no_of_claims] => 45
[patent_no_of_ind_claims] => 12
[patent_words_short_claim] => 24
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/077/06077631.pdf
[firstpage_image] =>[orig_patent_app_number] => 134539
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/134539 | Photomask and scanning exposure apparatus and device manufacturing method using same | Aug 13, 1998 | Issued |
Array
(
[id] => 4127769
[patent_doc_number] => 06033811
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-03-07
[patent_title] => 'Optical proximity correction mask for semiconductor device fabrication'
[patent_app_type] => 1
[patent_app_number] => 9/134374
[patent_app_country] => US
[patent_app_date] => 1998-08-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 10
[patent_no_of_words] => 2954
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 76
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/033/06033811.pdf
[firstpage_image] =>[orig_patent_app_number] => 134374
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/134374 | Optical proximity correction mask for semiconductor device fabrication | Aug 13, 1998 | Issued |
Array
(
[id] => 4105340
[patent_doc_number] => 06057065
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-05-02
[patent_title] => 'Lithographic system having diffraction grating and attenuated phase shifters'
[patent_app_type] => 1
[patent_app_number] => 9/132445
[patent_app_country] => US
[patent_app_date] => 1998-08-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 15
[patent_no_of_words] => 4372
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 110
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/057/06057065.pdf
[firstpage_image] =>[orig_patent_app_number] => 132445
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/132445 | Lithographic system having diffraction grating and attenuated phase shifters | Aug 10, 1998 | Issued |
Array
(
[id] => 4084441
[patent_doc_number] => 06132939
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-10-17
[patent_title] => 'Method for forming photoresist pattern'
[patent_app_type] => 1
[patent_app_number] => 9/131698
[patent_app_country] => US
[patent_app_date] => 1998-08-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 9
[patent_no_of_words] => 3607
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 93
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/132/06132939.pdf
[firstpage_image] =>[orig_patent_app_number] => 131698
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/131698 | Method for forming photoresist pattern | Aug 9, 1998 | Issued |
Array
(
[id] => 4150295
[patent_doc_number] => 06124063
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-09-26
[patent_title] => 'Method of forming a semiconductor device utilizing lithographic mask and mask therefor'
[patent_app_type] => 1
[patent_app_number] => 9/126140
[patent_app_country] => US
[patent_app_date] => 1998-07-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 8
[patent_no_of_words] => 3152
[patent_no_of_claims] => 34
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 98
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/124/06124063.pdf
[firstpage_image] =>[orig_patent_app_number] => 126140
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/126140 | Method of forming a semiconductor device utilizing lithographic mask and mask therefor | Jul 29, 1998 | Issued |
Array
(
[id] => 4150604
[patent_doc_number] => 06106980
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-08-22
[patent_title] => 'Method and apparatus to accurately correlate defect coordinates between photomask inspection and repair systems'
[patent_app_type] => 1
[patent_app_number] => 9/122249
[patent_app_country] => US
[patent_app_date] => 1998-07-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 9
[patent_no_of_words] => 3036
[patent_no_of_claims] => 23
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 53
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/106/06106980.pdf
[firstpage_image] =>[orig_patent_app_number] => 122249
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/122249 | Method and apparatus to accurately correlate defect coordinates between photomask inspection and repair systems | Jul 23, 1998 | Issued |
Array
(
[id] => 4100414
[patent_doc_number] => 06051346
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-04-18
[patent_title] => 'Process for fabricating a lithographic mask'
[patent_app_type] => 1
[patent_app_number] => 9/121266
[patent_app_country] => US
[patent_app_date] => 1998-07-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 7
[patent_no_of_words] => 3678
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 27
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/051/06051346.pdf
[firstpage_image] =>[orig_patent_app_number] => 121266
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/121266 | Process for fabricating a lithographic mask | Jul 22, 1998 | Issued |
Array
(
[id] => 4000566
[patent_doc_number] => 06004703
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-12-21
[patent_title] => 'Amplitude mask and apparatus for manufacturing long period grating filter using the same'
[patent_app_type] => 1
[patent_app_number] => 9/119783
[patent_app_country] => US
[patent_app_date] => 1998-07-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 6
[patent_no_of_words] => 2265
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 69
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/004/06004703.pdf
[firstpage_image] =>[orig_patent_app_number] => 119783
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/119783 | Amplitude mask and apparatus for manufacturing long period grating filter using the same | Jul 20, 1998 | Issued |
Array
(
[id] => 3923338
[patent_doc_number] => 05952155
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-09-14
[patent_title] => 'Mask and method of creating mask as well as electron-beam exposure method and electron-beam exposure device'
[patent_app_type] => 1
[patent_app_number] => 9/119593
[patent_app_country] => US
[patent_app_date] => 1998-07-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 21
[patent_no_of_words] => 10558
[patent_no_of_claims] => 37
[patent_no_of_ind_claims] => 8
[patent_words_short_claim] => 144
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/952/05952155.pdf
[firstpage_image] =>[orig_patent_app_number] => 119593
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/119593 | Mask and method of creating mask as well as electron-beam exposure method and electron-beam exposure device | Jul 20, 1998 | Issued |
Array
(
[id] => 4406308
[patent_doc_number] => 06265113
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-07-24
[patent_title] => 'Stress adjustment method of X-ray mask'
[patent_app_type] => 1
[patent_app_number] => 9/116334
[patent_app_country] => US
[patent_app_date] => 1998-07-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 27
[patent_figures_cnt] => 72
[patent_no_of_words] => 8719
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 53
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/265/06265113.pdf
[firstpage_image] =>[orig_patent_app_number] => 116334
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/116334 | Stress adjustment method of X-ray mask | Jul 15, 1998 | Issued |
Array
(
[id] => 4134982
[patent_doc_number] => 06015641
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-01-18
[patent_title] => 'Reduction of optical proximity effect of bit line pattern in DRAM devices'
[patent_app_type] => 1
[patent_app_number] => 9/111683
[patent_app_country] => US
[patent_app_date] => 1998-07-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 1545
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 94
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/015/06015641.pdf
[firstpage_image] =>[orig_patent_app_number] => 111683
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/111683 | Reduction of optical proximity effect of bit line pattern in DRAM devices | Jul 7, 1998 | Issued |
Array
(
[id] => 3907917
[patent_doc_number] => 06001514
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-12-14
[patent_title] => 'Mask for an exposure process using X-ray'
[patent_app_type] => 1
[patent_app_number] => 9/111426
[patent_app_country] => US
[patent_app_date] => 1998-07-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 14
[patent_no_of_words] => 1574
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 70
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/001/06001514.pdf
[firstpage_image] =>[orig_patent_app_number] => 111426
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/111426 | Mask for an exposure process using X-ray | Jul 6, 1998 | Issued |
Array
(
[id] => 4099662
[patent_doc_number] => 06100012
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-08-08
[patent_title] => 'Infra-red radiation post-exposure bake process for chemically amplified resist lithography'
[patent_app_type] => 1
[patent_app_number] => 9/110642
[patent_app_country] => US
[patent_app_date] => 1998-07-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 8
[patent_no_of_words] => 3107
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 143
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/100/06100012.pdf
[firstpage_image] =>[orig_patent_app_number] => 110642
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/110642 | Infra-red radiation post-exposure bake process for chemically amplified resist lithography | Jul 5, 1998 | Issued |
Array
(
[id] => 3931652
[patent_doc_number] => 05972543
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-10-26
[patent_title] => 'Phase shift mask and method of producing the same'
[patent_app_type] => 1
[patent_app_number] => 9/100083
[patent_app_country] => US
[patent_app_date] => 1998-06-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 49
[patent_no_of_words] => 9376
[patent_no_of_claims] => 2
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 73
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/972/05972543.pdf
[firstpage_image] =>[orig_patent_app_number] => 100083
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/100083 | Phase shift mask and method of producing the same | Jun 18, 1998 | Issued |
Array
(
[id] => 3907903
[patent_doc_number] => 06001513
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-12-14
[patent_title] => 'Method for forming a lithographic mask used for patterning semiconductor die'
[patent_app_type] => 1
[patent_app_number] => 9/097801
[patent_app_country] => US
[patent_app_date] => 1998-06-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 8
[patent_no_of_words] => 1908
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 129
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/001/06001513.pdf
[firstpage_image] =>[orig_patent_app_number] => 097801
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/097801 | Method for forming a lithographic mask used for patterning semiconductor die | Jun 15, 1998 | Issued |
Array
(
[id] => 4111892
[patent_doc_number] => 06045954
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-04-04
[patent_title] => 'Formation of silicon nitride film for a phase shift mask at 193 nm'
[patent_app_type] => 1
[patent_app_number] => 9/097145
[patent_app_country] => US
[patent_app_date] => 1998-06-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 6
[patent_no_of_words] => 2172
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 84
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/045/06045954.pdf
[firstpage_image] =>[orig_patent_app_number] => 097145
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/097145 | Formation of silicon nitride film for a phase shift mask at 193 nm | Jun 11, 1998 | Issued |
Array
(
[id] => 4100399
[patent_doc_number] => 06051345
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-04-18
[patent_title] => 'Method of producing phase shifting mask'
[patent_app_type] => 1
[patent_app_number] => 9/095406
[patent_app_country] => US
[patent_app_date] => 1998-06-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 15
[patent_figures_cnt] => 33
[patent_no_of_words] => 6732
[patent_no_of_claims] => 33
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 137
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/051/06051345.pdf
[firstpage_image] =>[orig_patent_app_number] => 095406
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/095406 | Method of producing phase shifting mask | Jun 9, 1998 | Issued |
Array
(
[id] => 4300229
[patent_doc_number] => 06187480
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-02-13
[patent_title] => 'Alternating phase-shifting mask'
[patent_app_type] => 1
[patent_app_number] => 9/094460
[patent_app_country] => US
[patent_app_date] => 1998-06-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 7
[patent_no_of_words] => 2029
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 174
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/187/06187480.pdf
[firstpage_image] =>[orig_patent_app_number] => 094460
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/094460 | Alternating phase-shifting mask | Jun 9, 1998 | Issued |
Array
(
[id] => 4049456
[patent_doc_number] => 05932395
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-08-03
[patent_title] => 'Exposure method, aligner, and method manufacturing semiconductor integrated circuit devices'
[patent_app_type] => 1
[patent_app_number] => 9/092139
[patent_app_country] => US
[patent_app_date] => 1998-06-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 33
[patent_figures_cnt] => 84
[patent_no_of_words] => 23481
[patent_no_of_claims] => 32
[patent_no_of_ind_claims] => 12
[patent_words_short_claim] => 283
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/932/05932395.pdf
[firstpage_image] =>[orig_patent_app_number] => 092139
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/092139 | Exposure method, aligner, and method manufacturing semiconductor integrated circuit devices | Jun 4, 1998 | Issued |