
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 4070420
[patent_doc_number] => 05965302
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-10-12
[patent_title] => 'Method for producing mask ROM and photomask used therefor'
[patent_app_type] => 1
[patent_app_number] => 9/020423
[patent_app_country] => US
[patent_app_date] => 1998-02-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 14
[patent_no_of_words] => 3838
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 69
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/965/05965302.pdf
[firstpage_image] =>[orig_patent_app_number] => 020423
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/020423 | Method for producing mask ROM and photomask used therefor | Feb 8, 1998 | Issued |
| 09/020502 | MASK AND SIMPLIFIED METHOD OF FORMING A MASK INTEGRATING ATTENUATING PHASE SHIFTING MASK PATTERNS AND BINARY MASK PATTERNS ON THE SAME MASK SUBSTRATE | Feb 8, 1998 | Issued |
Array
(
[id] => 4026534
[patent_doc_number] => 05994004
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-11-30
[patent_title] => 'Levenson type phase shift photomask and manufacture method of semiconductor device using such photomask'
[patent_app_type] => 1
[patent_app_number] => 9/019743
[patent_app_country] => US
[patent_app_date] => 1998-02-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 8
[patent_no_of_words] => 4504
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 200
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/994/05994004.pdf
[firstpage_image] =>[orig_patent_app_number] => 019743
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/019743 | Levenson type phase shift photomask and manufacture method of semiconductor device using such photomask | Feb 5, 1998 | Issued |
Array
(
[id] => 4178945
[patent_doc_number] => 06020092
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-02-01
[patent_title] => 'Partial one-shot electron beam exposure mask and method of forming a partial one-shot electron beam exposure pattern'
[patent_app_type] => 1
[patent_app_number] => 9/019204
[patent_app_country] => US
[patent_app_date] => 1998-02-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 25
[patent_figures_cnt] => 36
[patent_no_of_words] => 6815
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 111
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/020/06020092.pdf
[firstpage_image] =>[orig_patent_app_number] => 019204
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/019204 | Partial one-shot electron beam exposure mask and method of forming a partial one-shot electron beam exposure pattern | Feb 4, 1998 | Issued |
Array
(
[id] => 3941187
[patent_doc_number] => 05998068
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-12-07
[patent_title] => 'Reticle and pattern formation method'
[patent_app_type] => 1
[patent_app_number] => 9/017052
[patent_app_country] => US
[patent_app_date] => 1998-01-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 14
[patent_no_of_words] => 4434
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 219
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/998/05998068.pdf
[firstpage_image] =>[orig_patent_app_number] => 017052
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/017052 | Reticle and pattern formation method | Jan 26, 1998 | Issued |
Array
(
[id] => 3990159
[patent_doc_number] => 05985492
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-11-16
[patent_title] => 'Multi-phase mask'
[patent_app_type] => 1
[patent_app_number] => 9/010611
[patent_app_country] => US
[patent_app_date] => 1998-01-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 5
[patent_no_of_words] => 3775
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 164
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/985/05985492.pdf
[firstpage_image] =>[orig_patent_app_number] => 010611
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/010611 | Multi-phase mask | Jan 21, 1998 | Issued |
Array
(
[id] => 4153453
[patent_doc_number] => 06156460
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-12-05
[patent_title] => 'Photo-mask and method of fabricating the same'
[patent_app_type] => 1
[patent_app_number] => 9/010136
[patent_app_country] => US
[patent_app_date] => 1998-01-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 21
[patent_no_of_words] => 2063
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 72
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/156/06156460.pdf
[firstpage_image] =>[orig_patent_app_number] => 010136
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/010136 | Photo-mask and method of fabricating the same | Jan 20, 1998 | Issued |
Array
(
[id] => 3976375
[patent_doc_number] => 05948572
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-09-07
[patent_title] => 'Mixed mode photomask for nikon stepper'
[patent_app_type] => 1
[patent_app_number] => 9/008862
[patent_app_country] => US
[patent_app_date] => 1998-01-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 4
[patent_no_of_words] => 1873
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 194
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/948/05948572.pdf
[firstpage_image] =>[orig_patent_app_number] => 008862
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/008862 | Mixed mode photomask for nikon stepper | Jan 19, 1998 | Issued |
Array
(
[id] => 3922050
[patent_doc_number] => 05914205
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-06-22
[patent_title] => 'Method of manufacturing a semiconductor device whereby photomasks comprising partial patterns are projected onto a photoresist layer so as to merge into one another'
[patent_app_type] => 1
[patent_app_number] => 9/007552
[patent_app_country] => US
[patent_app_date] => 1998-01-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 12
[patent_no_of_words] => 4347
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 224
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/914/05914205.pdf
[firstpage_image] =>[orig_patent_app_number] => 007552
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/007552 | Method of manufacturing a semiconductor device whereby photomasks comprising partial patterns are projected onto a photoresist layer so as to merge into one another | Jan 14, 1998 | Issued |
Array
(
[id] => 4188623
[patent_doc_number] => 06042971
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-03-28
[patent_title] => 'Method of manufacturing an EB mask for electron beam image drawing and device for manufacturing an EB mask'
[patent_app_type] => 1
[patent_app_number] => 9/006503
[patent_app_country] => US
[patent_app_date] => 1998-01-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 11
[patent_no_of_words] => 3672
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 92
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/042/06042971.pdf
[firstpage_image] =>[orig_patent_app_number] => 006503
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/006503 | Method of manufacturing an EB mask for electron beam image drawing and device for manufacturing an EB mask | Jan 13, 1998 | Issued |
Array
(
[id] => 3994192
[patent_doc_number] => 05922497
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-07-13
[patent_title] => 'Lithographic imaging system'
[patent_app_type] => 1
[patent_app_number] => 9/006236
[patent_app_country] => US
[patent_app_date] => 1998-01-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 1916
[patent_no_of_claims] => 42
[patent_no_of_ind_claims] => 7
[patent_words_short_claim] => 44
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/922/05922497.pdf
[firstpage_image] =>[orig_patent_app_number] => 006236
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/006236 | Lithographic imaging system | Jan 12, 1998 | Issued |
Array
(
[id] => 3972916
[patent_doc_number] => 05916712
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-06-29
[patent_title] => 'Halftone phase shift photomask, halftone phase shift photomask blank, and method of producing the same'
[patent_app_type] => 1
[patent_app_number] => 9/006587
[patent_app_country] => US
[patent_app_date] => 1998-01-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 36
[patent_no_of_words] => 10689
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 76
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/916/05916712.pdf
[firstpage_image] =>[orig_patent_app_number] => 006587
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/006587 | Halftone phase shift photomask, halftone phase shift photomask blank, and method of producing the same | Jan 12, 1998 | Issued |
Array
(
[id] => 4202902
[patent_doc_number] => 06077630
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-06-20
[patent_title] => 'Subresolution grating for attenuated phase shifting mask fabrication'
[patent_app_type] => 1
[patent_app_number] => 9/004183
[patent_app_country] => US
[patent_app_date] => 1998-01-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 4
[patent_no_of_words] => 1890
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/077/06077630.pdf
[firstpage_image] =>[orig_patent_app_number] => 004183
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/004183 | Subresolution grating for attenuated phase shifting mask fabrication | Jan 7, 1998 | Issued |
Array
(
[id] => 3940402
[patent_doc_number] => 05976732
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-11-02
[patent_title] => 'Photomask for reconfiguring a circuit by exposure at two different wavelengths'
[patent_app_type] => 1
[patent_app_number] => 9/003543
[patent_app_country] => US
[patent_app_date] => 1998-01-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 4
[patent_no_of_words] => 2152
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/976/05976732.pdf
[firstpage_image] =>[orig_patent_app_number] => 003543
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/003543 | Photomask for reconfiguring a circuit by exposure at two different wavelengths | Jan 5, 1998 | Issued |
Array
(
[id] => 4150591
[patent_doc_number] => 06106979
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-08-22
[patent_title] => 'Use of attenuating phase-shifting mask for improved printability of clear-field patterns'
[patent_app_type] => 1
[patent_app_number] => 9/000595
[patent_app_country] => US
[patent_app_date] => 1997-12-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 14
[patent_no_of_words] => 3743
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/106/06106979.pdf
[firstpage_image] =>[orig_patent_app_number] => 000595
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/000595 | Use of attenuating phase-shifting mask for improved printability of clear-field patterns | Dec 29, 1997 | Issued |
Array
(
[id] => 3979069
[patent_doc_number] => 05958630
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-09-28
[patent_title] => 'Phase shifting mask and method of manufacturing the same'
[patent_app_type] => 1
[patent_app_number] => 9/000953
[patent_app_country] => US
[patent_app_date] => 1997-12-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[patent_no_of_words] => 3456
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/958/05958630.pdf
[firstpage_image] =>[orig_patent_app_number] => 000953
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/000953 | Phase shifting mask and method of manufacturing the same | Dec 29, 1997 | Issued |
Array
(
[id] => 3921949
[patent_doc_number] => 05945237
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-08-31
[patent_title] => 'Halftone phase-shift mask and halftone phase-shift mask defect correction method'
[patent_app_type] => 1
[patent_app_number] => 8/998834
[patent_app_country] => US
[patent_app_date] => 1997-12-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 27
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[patent_no_of_words] => 11910
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/945/05945237.pdf
[firstpage_image] =>[orig_patent_app_number] => 998834
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/998834 | Halftone phase-shift mask and halftone phase-shift mask defect correction method | Dec 28, 1997 | Issued |
Array
(
[id] => 4044154
[patent_doc_number] => 05869221
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-02-09
[patent_title] => 'Method of fabricating an LED array'
[patent_app_type] => 1
[patent_app_number] => 8/997735
[patent_app_country] => US
[patent_app_date] => 1997-12-24
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/869/05869221.pdf
[firstpage_image] =>[orig_patent_app_number] => 997735
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/997735 | Method of fabricating an LED array | Dec 23, 1997 | Issued |
Array
(
[id] => 3979058
[patent_doc_number] => 05958629
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-09-28
[patent_title] => 'Using thin films as etch stop in EUV mask fabrication process'
[patent_app_type] => 1
[patent_app_number] => 8/995949
[patent_app_country] => US
[patent_app_date] => 1997-12-22
[patent_effective_date] => 0000-00-00
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/958/05958629.pdf
[firstpage_image] =>[orig_patent_app_number] => 995949
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/995949 | Using thin films as etch stop in EUV mask fabrication process | Dec 21, 1997 | Issued |
Array
(
[id] => 3952776
[patent_doc_number] => 05935737
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-08-10
[patent_title] => 'Method for eliminating final euv mask repairs in the reflector region'
[patent_app_type] => 1
[patent_app_number] => 8/996358
[patent_app_country] => US
[patent_app_date] => 1997-12-22
[patent_effective_date] => 0000-00-00
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/935/05935737.pdf
[firstpage_image] =>[orig_patent_app_number] => 996358
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/996358 | Method for eliminating final euv mask repairs in the reflector region | Dec 21, 1997 | Issued |