
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 3946029
[patent_doc_number] => 05955222
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-09-21
[patent_title] => 'Method of making a rim-type phase-shift mask and mask manufactured thereby'
[patent_app_type] => 1
[patent_app_number] => 8/759744
[patent_app_country] => US
[patent_app_date] => 1996-12-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
[patent_figures_cnt] => 28
[patent_no_of_words] => 6304
[patent_no_of_claims] => 26
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 110
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/955/05955222.pdf
[firstpage_image] =>[orig_patent_app_number] => 759744
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/759744 | Method of making a rim-type phase-shift mask and mask manufactured thereby | Dec 2, 1996 | Issued |
Array
(
[id] => 3810764
[patent_doc_number] => 05789117
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-08-04
[patent_title] => 'Transfer method for non-critical photoresist patterns'
[patent_app_type] => 1
[patent_app_number] => 8/758418
[patent_app_country] => US
[patent_app_date] => 1996-12-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 18
[patent_no_of_words] => 2327
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 70
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/789/05789117.pdf
[firstpage_image] =>[orig_patent_app_number] => 758418
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/758418 | Transfer method for non-critical photoresist patterns | Dec 1, 1996 | Issued |
Array
(
[id] => 3691432
[patent_doc_number] => 05679484
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-10-21
[patent_title] => 'Exposure mask, exposure mask substrate, method for fabricating the same, and method for forming pattern based on exposure mask'
[patent_app_type] => 1
[patent_app_number] => 8/757957
[patent_app_country] => US
[patent_app_date] => 1996-11-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 30
[patent_figures_cnt] => 118
[patent_no_of_words] => 21794
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 123
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/679/05679484.pdf
[firstpage_image] =>[orig_patent_app_number] => 757957
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/757957 | Exposure mask, exposure mask substrate, method for fabricating the same, and method for forming pattern based on exposure mask | Nov 24, 1996 | Issued |
Array
(
[id] => 3625113
[patent_doc_number] => 05686209
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-11-11
[patent_title] => 'Phase shifting mask and method of forming a pattern using the same'
[patent_app_type] => 1
[patent_app_number] => 8/754162
[patent_app_country] => US
[patent_app_date] => 1996-11-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 56
[patent_no_of_words] => 21432
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 90
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/686/05686209.pdf
[firstpage_image] =>[orig_patent_app_number] => 754162
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/754162 | Phase shifting mask and method of forming a pattern using the same | Nov 21, 1996 | Issued |
Array
(
[id] => 3740725
[patent_doc_number] => 05800951
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-09-01
[patent_title] => 'Exposure method and exposure mask with monitoring patterns'
[patent_app_type] => 1
[patent_app_number] => 8/754367
[patent_app_country] => US
[patent_app_date] => 1996-11-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 11
[patent_no_of_words] => 5433
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 94
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/800/05800951.pdf
[firstpage_image] =>[orig_patent_app_number] => 754367
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/754367 | Exposure method and exposure mask with monitoring patterns | Nov 21, 1996 | Issued |
Array
(
[id] => 3875137
[patent_doc_number] => 05804339
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-09-08
[patent_title] => 'Fidelity ratio corrected photomasks and methods of fabricating fidelity ratio corrected photomasks'
[patent_app_type] => 1
[patent_app_number] => 8/754685
[patent_app_country] => US
[patent_app_date] => 1996-11-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 7
[patent_no_of_words] => 2635
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 35
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[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/804/05804339.pdf
[firstpage_image] =>[orig_patent_app_number] => 754685
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/754685 | Fidelity ratio corrected photomasks and methods of fabricating fidelity ratio corrected photomasks | Nov 20, 1996 | Issued |
Array
(
[id] => 3885990
[patent_doc_number] => 05834143
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-11-10
[patent_title] => 'Frame-supported dustproof pellicle for photolithographic photomask'
[patent_app_type] => 1
[patent_app_number] => 8/754777
[patent_app_country] => US
[patent_app_date] => 1996-11-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 2
[patent_no_of_words] => 3899
[patent_no_of_claims] => 4
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 83
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/834/05834143.pdf
[firstpage_image] =>[orig_patent_app_number] => 754777
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/754777 | Frame-supported dustproof pellicle for photolithographic photomask | Nov 20, 1996 | Issued |
Array
(
[id] => 3769788
[patent_doc_number] => 05807648
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-09-15
[patent_title] => 'Photo-Mask having optical filtering layer on transparent substrate uncovered with photo-shield pattern and process of fabrication'
[patent_app_type] => 1
[patent_app_number] => 8/751816
[patent_app_country] => US
[patent_app_date] => 1996-11-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 17
[patent_no_of_words] => 3962
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 127
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/807/05807648.pdf
[firstpage_image] =>[orig_patent_app_number] => 751816
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/751816 | Photo-Mask having optical filtering layer on transparent substrate uncovered with photo-shield pattern and process of fabrication | Nov 18, 1996 | Issued |
Array
(
[id] => 3875106
[patent_doc_number] => 05804337
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-09-08
[patent_title] => 'Phase shift mask and phase shift mask blank'
[patent_app_type] => 1
[patent_app_number] => 8/744747
[patent_app_country] => US
[patent_app_date] => 1996-11-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 5
[patent_no_of_words] => 4000
[patent_no_of_claims] => 28
[patent_no_of_ind_claims] => 9
[patent_words_short_claim] => 74
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[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/804/05804337.pdf
[firstpage_image] =>[orig_patent_app_number] => 744747
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/744747 | Phase shift mask and phase shift mask blank | Nov 5, 1996 | Issued |
Array
(
[id] => 3875123
[patent_doc_number] => 05804338
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-09-08
[patent_title] => 'Photolithography masks including phase-shifting layers and related methods and structures'
[patent_app_type] => 1
[patent_app_number] => 8/742247
[patent_app_country] => US
[patent_app_date] => 1996-10-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 12
[patent_no_of_words] => 3410
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 88
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/804/05804338.pdf
[firstpage_image] =>[orig_patent_app_number] => 742247
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/742247 | Photolithography masks including phase-shifting layers and related methods and structures | Oct 30, 1996 | Issued |
Array
(
[id] => 3769800
[patent_doc_number] => 05807649
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-09-15
[patent_title] => 'Lithographic patterning method and mask set therefor with light field trim mask'
[patent_app_type] => 1
[patent_app_number] => 8/740598
[patent_app_country] => US
[patent_app_date] => 1996-10-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 7
[patent_no_of_words] => 5489
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 74
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/807/05807649.pdf
[firstpage_image] =>[orig_patent_app_number] => 740598
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/740598 | Lithographic patterning method and mask set therefor with light field trim mask | Oct 30, 1996 | Issued |
Array
(
[id] => 3830399
[patent_doc_number] => 05814423
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-09-29
[patent_title] => 'Transmission mask for charged particle beam exposure apparatuses, and an exposure apparatus using such a transmission mask'
[patent_app_type] => 1
[patent_app_number] => 8/739962
[patent_app_country] => US
[patent_app_date] => 1996-10-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 15
[patent_no_of_words] => 4576
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 80
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/814/05814423.pdf
[firstpage_image] =>[orig_patent_app_number] => 739962
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/739962 | Transmission mask for charged particle beam exposure apparatuses, and an exposure apparatus using such a transmission mask | Oct 29, 1996 | Issued |
Array
(
[id] => 3795081
[patent_doc_number] => 05827623
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-10-27
[patent_title] => 'Optical proximity correction halftone type phase shift photomask'
[patent_app_type] => 1
[patent_app_number] => 8/741016
[patent_app_country] => US
[patent_app_date] => 1996-10-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 17
[patent_figures_cnt] => 55
[patent_no_of_words] => 4785
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 62
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/827/05827623.pdf
[firstpage_image] =>[orig_patent_app_number] => 741016
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/741016 | Optical proximity correction halftone type phase shift photomask | Oct 29, 1996 | Issued |
Array
(
[id] => 3885969
[patent_doc_number] => 05834142
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-11-10
[patent_title] => 'Method of manufacturing X-ray mask and heating apparatus'
[patent_app_type] => 1
[patent_app_number] => 8/738287
[patent_app_country] => US
[patent_app_date] => 1996-10-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 20
[patent_figures_cnt] => 60
[patent_no_of_words] => 12659
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 62
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/834/05834142.pdf
[firstpage_image] =>[orig_patent_app_number] => 738287
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/738287 | Method of manufacturing X-ray mask and heating apparatus | Oct 24, 1996 | Issued |
Array
(
[id] => 3772244
[patent_doc_number] => 05817438
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-10-06
[patent_title] => 'Masking technology for etching contacts'
[patent_app_type] => 1
[patent_app_number] => 8/736416
[patent_app_country] => US
[patent_app_date] => 1996-10-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[patent_no_of_words] => 1489
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/817/05817438.pdf
[firstpage_image] =>[orig_patent_app_number] => 736416
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/736416 | Masking technology for etching contacts | Oct 23, 1996 | Issued |
Array
(
[id] => 3826762
[patent_doc_number] => 05738959
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-04-14
[patent_title] => 'Halftone phase shift photomask, halftone phase shift photomask blank, and method of producing the same comprising fluorine in phase shift layer'
[patent_app_type] => 1
[patent_app_number] => 8/722439
[patent_app_country] => US
[patent_app_date] => 1996-10-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 34
[patent_no_of_words] => 10670
[patent_no_of_claims] => 19
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/738/05738959.pdf
[firstpage_image] =>[orig_patent_app_number] => 722439
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/722439 | Halftone phase shift photomask, halftone phase shift photomask blank, and method of producing the same comprising fluorine in phase shift layer | Oct 16, 1996 | Issued |
Array
(
[id] => 3875039
[patent_doc_number] => 05728494
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-03-17
[patent_title] => 'Exposure mask and method and apparatus for manufacturing the same'
[patent_app_type] => 1
[patent_app_number] => 8/730017
[patent_app_country] => US
[patent_app_date] => 1996-10-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 41
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[pdf_file] => patents/05/728/05728494.pdf
[firstpage_image] =>[orig_patent_app_number] => 730017
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/730017 | Exposure mask and method and apparatus for manufacturing the same | Oct 10, 1996 | Issued |
Array
(
[id] => 3823663
[patent_doc_number] => 05783336
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-07-21
[patent_title] => 'Mask for exposure'
[patent_app_type] => 1
[patent_app_number] => 8/729281
[patent_app_country] => US
[patent_app_date] => 1996-10-10
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/783/05783336.pdf
[firstpage_image] =>[orig_patent_app_number] => 729281
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/729281 | Mask for exposure | Oct 9, 1996 | Issued |
Array
(
[id] => 3875020
[patent_doc_number] => 05728493
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-03-17
[patent_title] => 'Antireflection mask for contact hole opening'
[patent_app_type] => 1
[patent_app_number] => 8/725809
[patent_app_country] => US
[patent_app_date] => 1996-10-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/728/05728493.pdf
[firstpage_image] =>[orig_patent_app_number] => 725809
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/725809 | Antireflection mask for contact hole opening | Oct 3, 1996 | Issued |
Array
(
[id] => 3772230
[patent_doc_number] => 05817437
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-10-06
[patent_title] => 'Method for detecting phase error of a phase shift mask'
[patent_app_type] => 1
[patent_app_number] => 8/725162
[patent_app_country] => US
[patent_app_date] => 1996-10-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[patent_no_of_words] => 1529
[patent_no_of_claims] => 19
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[patent_words_short_claim] => 157
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/817/05817437.pdf
[firstpage_image] =>[orig_patent_app_number] => 725162
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/725162 | Method for detecting phase error of a phase shift mask | Oct 2, 1996 | Issued |