| Application number | Title of the application | Filing Date | Status |
|---|
Array
(
[id] => 3830119
[patent_doc_number] => 05712063
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-01-27
[patent_title] => 'Phase shift mask comprising light shielding regions having a multiple box structure'
[patent_app_type] => 1
[patent_app_number] => 8/729675
[patent_app_country] => US
[patent_app_date] => 1996-10-03
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[pdf_file] => patents/05/712/05712063.pdf
[firstpage_image] =>[orig_patent_app_number] => 729675
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/729675 | Phase shift mask comprising light shielding regions having a multiple box structure | Oct 2, 1996 | Issued |
Array
(
[id] => 3725077
[patent_doc_number] => 05702849
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-12-30
[patent_title] => 'Mask for transferring a pattern for use in a semiconductor device and method of manufacturing the same'
[patent_app_type] => 1
[patent_app_number] => 8/721076
[patent_app_country] => US
[patent_app_date] => 1996-09-26
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[firstpage_image] =>[orig_patent_app_number] => 721076
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/721076 | Mask for transferring a pattern for use in a semiconductor device and method of manufacturing the same | Sep 25, 1996 | Issued |
Array
(
[id] => 3833794
[patent_doc_number] => 05846676
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-12-08
[patent_title] => 'Mask structure and exposure method and apparatus using the same'
[patent_app_type] => 1
[patent_app_number] => 8/710979
[patent_app_country] => US
[patent_app_date] => 1996-09-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
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[pdf_file] => patents/05/846/05846676.pdf
[firstpage_image] =>[orig_patent_app_number] => 710979
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/710979 | Mask structure and exposure method and apparatus using the same | Sep 24, 1996 | Issued |
| 08/718678 | PHASE-SHIFTING MASK AND A MANUFACTURING METHOD THEREOF COMPRISING PHASE SHIFTERS WITH FLAT TOP AND ROUNDED SIDES | Sep 23, 1996 | Abandoned |
Array
(
[id] => 4059930
[patent_doc_number] => 05866280
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-02-02
[patent_title] => 'Exposure mask and manufacturing method thereof'
[patent_app_type] => 1
[patent_app_number] => 8/710408
[patent_app_country] => US
[patent_app_date] => 1996-09-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
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[pdf_file] => patents/05/866/05866280.pdf
[firstpage_image] =>[orig_patent_app_number] => 710408
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/710408 | Exposure mask and manufacturing method thereof | Sep 16, 1996 | Issued |
Array
(
[id] => 3846289
[patent_doc_number] => 05766805
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-06-16
[patent_title] => 'Method for fabricating phase shift mask'
[patent_app_type] => 1
[patent_app_number] => 8/710234
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[patent_app_date] => 1996-09-13
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[firstpage_image] =>[orig_patent_app_number] => 710234
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/710234 | Method for fabricating phase shift mask | Sep 12, 1996 | Issued |
Array
(
[id] => 3758623
[patent_doc_number] => 05741613
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-04-21
[patent_title] => 'Methods of forming half-tone phase-shift masks with reduced susceptiblity to parasitic sputtering'
[patent_app_type] => 1
[patent_app_number] => 8/713953
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[firstpage_image] =>[orig_patent_app_number] => 713953
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/713953 | Methods of forming half-tone phase-shift masks with reduced susceptiblity to parasitic sputtering | Sep 12, 1996 | Issued |
Array
(
[id] => 3846305
[patent_doc_number] => 05766806
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-06-16
[patent_title] => 'Method of optical lithography using phase shift masking'
[patent_app_type] => 1
[patent_app_number] => 8/711112
[patent_app_country] => US
[patent_app_date] => 1996-09-09
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[pdf_file] => patents/05/766/05766806.pdf
[firstpage_image] =>[orig_patent_app_number] => 711112
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/711112 | Method of optical lithography using phase shift masking | Sep 8, 1996 | Issued |
Array
(
[id] => 4031793
[patent_doc_number] => 05942355
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-08-24
[patent_title] => 'Method of fabricating a phase-shifting semiconductor photomask'
[patent_app_type] => 1
[patent_app_number] => 8/706474
[patent_app_country] => US
[patent_app_date] => 1996-09-04
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/942/05942355.pdf
[firstpage_image] =>[orig_patent_app_number] => 706474
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/706474 | Method of fabricating a phase-shifting semiconductor photomask | Sep 3, 1996 | Issued |
Array
(
[id] => 3801813
[patent_doc_number] => 05830605
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-11-03
[patent_title] => 'Gradation mask method of producing the same and method of forming special surface profile on material using gradation mask'
[patent_app_type] => 1
[patent_app_number] => 8/703539
[patent_app_country] => US
[patent_app_date] => 1996-08-27
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[pdf_file] => patents/05/830/05830605.pdf
[firstpage_image] =>[orig_patent_app_number] => 703539
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/703539 | Gradation mask method of producing the same and method of forming special surface profile on material using gradation mask | Aug 26, 1996 | Issued |
Array
(
[id] => 3846363
[patent_doc_number] => 05718996
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-02-17
[patent_title] => 'Electrostatic information recording medium and electrostatic information recording and reproducing method'
[patent_app_type] => 1
[patent_app_number] => 8/703653
[patent_app_country] => US
[patent_app_date] => 1996-08-27
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[pdf_file] => patents/05/718/05718996.pdf
[firstpage_image] =>[orig_patent_app_number] => 703653
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/703653 | Electrostatic information recording medium and electrostatic information recording and reproducing method | Aug 26, 1996 | Issued |
Array
(
[id] => 3725064
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[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-12-30
[patent_title] => 'Mask for optical lithography using phase shift masking and integrated circuit produced therefrom'
[patent_app_type] => 1
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[patent_app_date] => 1996-08-23
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[pdf_file] => patents/05/702/05702848.pdf
[firstpage_image] =>[orig_patent_app_number] => 702058
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/702058 | Mask for optical lithography using phase shift masking and integrated circuit produced therefrom | Aug 22, 1996 | Issued |
Array
(
[id] => 3846276
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/702057 | Method of optical lithography using phase shift masking | Aug 22, 1996 | Issued |
Array
(
[id] => 3658448
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/699732 | Photomask and pattern forming method employing the same | Aug 19, 1996 | Issued |
Array
(
[id] => 3875093
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[patent_issue_date] => 1998-09-08
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[firstpage_image] =>[orig_patent_app_number] => 696173
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/696173 | Method of forming opaque border on semiconductor photomask | Aug 12, 1996 | Issued |
Array
(
[id] => 4021700
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[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-03-16
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[pdf_file] => patents/05/882/05882825.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/695024 | Production method of a phase shift photomask having a phase shift layer comprising SOG | Aug 8, 1996 | Issued |
Array
(
[id] => 3732781
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[patent_kind] => NA
[patent_issue_date] => 1997-12-16
[patent_title] => 'Light exposure method for the fabrication of semiconductor devices'
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[firstpage_image] =>[orig_patent_app_number] => 695297
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/695297 | Light exposure method for the fabrication of semiconductor devices | Aug 8, 1996 | Issued |
Array
(
[id] => 3872543
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[patent_kind] => NA
[patent_issue_date] => 1998-05-05
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[firstpage_image] =>[orig_patent_app_number] => 695300
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/695300 | Method of fabricating a phase-shift photomask | Aug 8, 1996 | Issued |
Array
(
[id] => 3783818
[patent_doc_number] => 05736300
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[patent_kind] => NA
[patent_issue_date] => 1998-04-07
[patent_title] => 'Manufacturing method or an exposing method for a semiconductor device or a semiconductor integrated circuit device and a mask used therefor'
[patent_app_type] => 1
[patent_app_number] => 8/694263
[patent_app_country] => US
[patent_app_date] => 1996-08-08
[patent_effective_date] => 0000-00-00
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/694263 | Manufacturing method or an exposing method for a semiconductor device or a semiconductor integrated circuit device and a mask used therefor | Aug 7, 1996 | Issued |
| 08/692543 | PHOTO MASK AND EXPOSURE METHOD USING THE SAME | Aug 4, 1996 | Abandoned |