
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 3806089
[patent_doc_number] => 05811208
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-09-22
[patent_title] => 'Phase shift mask and method of producing the same'
[patent_app_type] => 1
[patent_app_number] => 8/691369
[patent_app_country] => US
[patent_app_date] => 1996-08-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 49
[patent_no_of_words] => 9372
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 75
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/811/05811208.pdf
[firstpage_image] =>[orig_patent_app_number] => 691369
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/691369 | Phase shift mask and method of producing the same | Aug 1, 1996 | Issued |
Array
(
[id] => 3870948
[patent_doc_number] => 05824437
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-10-20
[patent_title] => 'Mask and method of creating mask as well as electron-beam exposure method and electron-beam exposure device'
[patent_app_type] => 1
[patent_app_number] => 8/685958
[patent_app_country] => US
[patent_app_date] => 1996-07-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 21
[patent_no_of_words] => 10561
[patent_no_of_claims] => 30
[patent_no_of_ind_claims] => 7
[patent_words_short_claim] => 122
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/824/05824437.pdf
[firstpage_image] =>[orig_patent_app_number] => 685958
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/685958 | Mask and method of creating mask as well as electron-beam exposure method and electron-beam exposure device | Jul 21, 1996 | Issued |
Array
(
[id] => 3930217
[patent_doc_number] => 05928813
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-07-27
[patent_title] => 'Attenuated phase shift mask'
[patent_app_type] => 1
[patent_app_number] => 8/684506
[patent_app_country] => US
[patent_app_date] => 1996-07-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 10
[patent_no_of_words] => 2474
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 84
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/928/05928813.pdf
[firstpage_image] =>[orig_patent_app_number] => 684506
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/684506 | Attenuated phase shift mask | Jul 18, 1996 | Issued |
| 08/250898 | ATTENUATED PHASE SHIFT MASK | Jul 18, 1996 | Abandoned |
Array
(
[id] => 3661572
[patent_doc_number] => 05667919
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-09-16
[patent_title] => 'Attenuated phase shift mask and method of manufacture thereof'
[patent_app_type] => 1
[patent_app_number] => 8/682458
[patent_app_country] => US
[patent_app_date] => 1996-07-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 17
[patent_no_of_words] => 4682
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 66
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/667/05667919.pdf
[firstpage_image] =>[orig_patent_app_number] => 682458
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/682458 | Attenuated phase shift mask and method of manufacture thereof | Jul 16, 1996 | Issued |
| 08/680887 | SIDELOBE SUPPRESSING APSM | Jul 15, 1996 | Abandoned |
Array
(
[id] => 4021714
[patent_doc_number] => 05882826
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-03-16
[patent_title] => 'Membrane and mask, and exposure apparatus using the mask, and device producing method using the mask'
[patent_app_type] => 1
[patent_app_number] => 8/680796
[patent_app_country] => US
[patent_app_date] => 1996-07-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 8
[patent_no_of_words] => 3603
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 9
[patent_words_short_claim] => 23
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/882/05882826.pdf
[firstpage_image] =>[orig_patent_app_number] => 680796
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/680796 | Membrane and mask, and exposure apparatus using the mask, and device producing method using the mask | Jul 15, 1996 | Issued |
Array
(
[id] => 3923214
[patent_doc_number] => 05876878
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-03-02
[patent_title] => 'Phase shifting mask and process for forming comprising a phase shift layer for shifting two wavelengths of light'
[patent_app_type] => 1
[patent_app_number] => 8/679835
[patent_app_country] => US
[patent_app_date] => 1996-07-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 1676
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 40
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/876/05876878.pdf
[firstpage_image] =>[orig_patent_app_number] => 679835
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/679835 | Phase shifting mask and process for forming comprising a phase shift layer for shifting two wavelengths of light | Jul 14, 1996 | Issued |
Array
(
[id] => 4003805
[patent_doc_number] => 05888674
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-03-30
[patent_title] => 'Method of manufacturing a halftone phase shift mask'
[patent_app_type] => 1
[patent_app_number] => 8/679141
[patent_app_country] => US
[patent_app_date] => 1996-07-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 25
[patent_no_of_words] => 3080
[patent_no_of_claims] => 35
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 84
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/888/05888674.pdf
[firstpage_image] =>[orig_patent_app_number] => 679141
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/679141 | Method of manufacturing a halftone phase shift mask | Jul 11, 1996 | Issued |
Array
(
[id] => 3769773
[patent_doc_number] => 05807647
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-09-15
[patent_title] => 'Method for determining phase variance and shifter stability of phase shift masks'
[patent_app_type] => 1
[patent_app_number] => 8/674805
[patent_app_country] => US
[patent_app_date] => 1996-07-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 8
[patent_no_of_words] => 5230
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 68
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/807/05807647.pdf
[firstpage_image] =>[orig_patent_app_number] => 674805
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/674805 | Method for determining phase variance and shifter stability of phase shift masks | Jul 2, 1996 | Issued |
Array
(
[id] => 3789960
[patent_doc_number] => 05725975
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-03-10
[patent_title] => 'Gradation mask and process for producing the same'
[patent_app_type] => 1
[patent_app_number] => 8/675372
[patent_app_country] => US
[patent_app_date] => 1996-07-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 23
[patent_no_of_words] => 4897
[patent_no_of_claims] => 4
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 119
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/725/05725975.pdf
[firstpage_image] =>[orig_patent_app_number] => 675372
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/675372 | Gradation mask and process for producing the same | Jul 1, 1996 | Issued |
Array
(
[id] => 3766059
[patent_doc_number] => 05849438
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-12-15
[patent_title] => 'Phase shift mask and method for fabricating the same'
[patent_app_type] => 1
[patent_app_number] => 8/670841
[patent_app_country] => US
[patent_app_date] => 1996-06-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 9
[patent_no_of_words] => 2790
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 129
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/849/05849438.pdf
[firstpage_image] =>[orig_patent_app_number] => 670841
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/670841 | Phase shift mask and method for fabricating the same | Jun 27, 1996 | Issued |
Array
(
[id] => 3823630
[patent_doc_number] => 05759723
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-06-02
[patent_title] => 'Light exposure mask for semiconductor devices and method for forming the same'
[patent_app_type] => 1
[patent_app_number] => 8/671509
[patent_app_country] => US
[patent_app_date] => 1996-06-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 12
[patent_no_of_words] => 2389
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 56
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/759/05759723.pdf
[firstpage_image] =>[orig_patent_app_number] => 671509
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/671509 | Light exposure mask for semiconductor devices and method for forming the same | Jun 26, 1996 | Issued |
Array
(
[id] => 3938366
[patent_doc_number] => 05989753
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-11-23
[patent_title] => 'Method, apparatus, and mask for pattern projection using a beam of charged particles'
[patent_app_type] => 1
[patent_app_number] => 8/670436
[patent_app_country] => US
[patent_app_date] => 1996-06-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 28
[patent_no_of_words] => 7137
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 79
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/989/05989753.pdf
[firstpage_image] =>[orig_patent_app_number] => 670436
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/670436 | Method, apparatus, and mask for pattern projection using a beam of charged particles | Jun 25, 1996 | Issued |
Array
(
[id] => 3732767
[patent_doc_number] => 05698349
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-12-16
[patent_title] => 'Sub-resolution phase shift mask'
[patent_app_type] => 1
[patent_app_number] => 8/670271
[patent_app_country] => US
[patent_app_date] => 1996-06-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 10
[patent_no_of_words] => 1698
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 87
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/698/05698349.pdf
[firstpage_image] =>[orig_patent_app_number] => 670271
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/670271 | Sub-resolution phase shift mask | Jun 20, 1996 | Issued |
Array
(
[id] => 3783449
[patent_doc_number] => 05840446
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-11-24
[patent_title] => 'Mask for monitoring defect'
[patent_app_type] => 1
[patent_app_number] => 8/666885
[patent_app_country] => US
[patent_app_date] => 1996-06-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 2
[patent_no_of_words] => 1861
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 101
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/840/05840446.pdf
[firstpage_image] =>[orig_patent_app_number] => 666885
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/666885 | Mask for monitoring defect | Jun 18, 1996 | Issued |
Array
(
[id] => 3738423
[patent_doc_number] => 05786112
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-07-28
[patent_title] => 'Photomask manufacturing process and semiconductor integrated circuit device manufacturing process using the photomask'
[patent_app_type] => 1
[patent_app_number] => 8/664865
[patent_app_country] => US
[patent_app_date] => 1996-06-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 26
[patent_figures_cnt] => 45
[patent_no_of_words] => 22384
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 152
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/786/05786112.pdf
[firstpage_image] =>[orig_patent_app_number] => 664865
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/664865 | Photomask manufacturing process and semiconductor integrated circuit device manufacturing process using the photomask | Jun 16, 1996 | Issued |
Array
(
[id] => 3724985
[patent_doc_number] => 05670281
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-09-23
[patent_title] => 'Masks and methods of forming masks which avoid phase conflict problems in phase shifting masks'
[patent_app_type] => 1
[patent_app_number] => 8/665327
[patent_app_country] => US
[patent_app_date] => 1996-06-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 18
[patent_no_of_words] => 3026
[patent_no_of_claims] => 27
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 133
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/670/05670281.pdf
[firstpage_image] =>[orig_patent_app_number] => 665327
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/665327 | Masks and methods of forming masks which avoid phase conflict problems in phase shifting masks | Jun 16, 1996 | Issued |
Array
(
[id] => 3767515
[patent_doc_number] => 05756234
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-05-26
[patent_title] => 'High accuracy fabrication of X-ray masks with optical and E-beam lithography'
[patent_app_type] => 1
[patent_app_number] => 8/663826
[patent_app_country] => US
[patent_app_date] => 1996-06-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 5
[patent_no_of_words] => 2330
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 79
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/756/05756234.pdf
[firstpage_image] =>[orig_patent_app_number] => 663826
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/663826 | High accuracy fabrication of X-ray masks with optical and E-beam lithography | Jun 13, 1996 | Issued |
Array
(
[id] => 3822638
[patent_doc_number] => 05731109
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-03-24
[patent_title] => 'Pattern structure of photomask comprising a sawtooth pattern'
[patent_app_type] => 1
[patent_app_number] => 8/661372
[patent_app_country] => US
[patent_app_date] => 1996-06-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 8
[patent_no_of_words] => 1250
[patent_no_of_claims] => 6
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/731/05731109.pdf
[firstpage_image] =>[orig_patent_app_number] => 661372
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/661372 | Pattern structure of photomask comprising a sawtooth pattern | Jun 10, 1996 | Issued |