
Liliana P. Cerullo
Examiner (ID: 9205, Phone: (571)270-5882 , Office: P/2621 )
| Most Active Art Unit | 2621 |
| Art Unit(s) | 2691, 2629, 2621, 4163 |
| Total Applications | 1083 |
| Issued Applications | 778 |
| Pending Applications | 69 |
| Abandoned Applications | 254 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
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[patent_title] => 'RADIO-WAVE TRANSPARENT COVER FOR VEHICLE'
[patent_app_type] => utility
[patent_app_number] => 14/956839
[patent_app_country] => US
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Array
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[patent_kind] => B2
[patent_issue_date] => 2019-09-17
[patent_title] => Lithographic patterning process and resists to use therein
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Array
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[patent_issue_date] => 2017-06-01
[patent_title] => 'POLY(THIOAMINAL) PROBE BASED LITHOGRAPHY'
[patent_app_type] => utility
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[patent_app_date] => 2015-11-30
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Array
(
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[patent_title] => 'METHOD OF MANUFACTURING STRUCTURE ON SUBSTRATE'
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Array
(
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[patent_doc_number] => 20160149136
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[patent_issue_date] => 2016-05-26
[patent_title] => 'LOW SURFACE ENERGY PHOTORESIST COMPOSITION AND PROCESS'
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Array
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[patent_issue_date] => 2019-04-23
[patent_title] => Phenolic hydroxyl-containing compound, composition containing the same, and cured film of the composition
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Array
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[patent_title] => Curable composition for permanent resist films, and permanent resist film
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Array
(
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[patent_title] => 'Recording material and optical information recording medium'
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[patent_app_country] => US
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Array
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[id] => 10800985
[patent_doc_number] => 20160147142
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[patent_kind] => A1
[patent_issue_date] => 2016-05-26
[patent_title] => 'PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND METHOD FOR MAKING PHOTOMASK'
[patent_app_type] => utility
[patent_app_number] => 14/943331
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[rel_patent_id] =>[rel_patent_doc_number] =>) 14/943331 | PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND METHOD FOR MAKING PHOTOMASK | Nov 16, 2015 | Abandoned |
Array
(
[id] => 12052877
[patent_doc_number] => 20170329221
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[patent_issue_date] => 2017-11-16
[patent_title] => 'PHOTOSENSITIVE COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND RESIST UNDERLAYER FILM'
[patent_app_type] => utility
[patent_app_number] => 15/532367
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Array
(
[id] => 12346968
[patent_doc_number] => 09951159
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[patent_issue_date] => 2018-04-24
[patent_title] => Compound, resin, resist composition and method for producing resist pattern
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[patent_app_number] => 14/937216
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Array
(
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[patent_issue_date] => 2017-12-28
[patent_title] => COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM REMOVABLE BY WET PROCESS
[patent_app_type] => utility
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Array
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Array
(
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[patent_title] => 'SUPPORT FRAME FOR PELLICLES'
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Array
(
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Array
(
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Array
(
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Array
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Array
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Array
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