
Lisa A. Kilday
Examiner (ID: 6965)
| Most Active Art Unit | 2829 |
| Art Unit(s) | 2813, 2829 |
| Total Applications | 329 |
| Issued Applications | 312 |
| Pending Applications | 7 |
| Abandoned Applications | 10 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1474727
[patent_doc_number] => 06387828
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-05-14
[patent_title] => 'High-pressure anneal process for integrated circuits'
[patent_app_type] => B1
[patent_app_number] => 09/654029
[patent_app_country] => US
[patent_app_date] => 2000-08-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 1759
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 88
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/387/06387828.pdf
[firstpage_image] =>[orig_patent_app_number] => 09654029
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/654029 | High-pressure anneal process for integrated circuits | Aug 30, 2000 | Issued |
Array
(
[id] => 1459674
[patent_doc_number] => 06391805
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-05-21
[patent_title] => 'High-pressure anneal process for integrated circuits'
[patent_app_type] => B1
[patent_app_number] => 09/653120
[patent_app_country] => US
[patent_app_date] => 2000-08-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 1757
[patent_no_of_claims] => 3
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 138
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/391/06391805.pdf
[firstpage_image] =>[orig_patent_app_number] => 09653120
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/653120 | High-pressure anneal process for integrated circuits | Aug 30, 2000 | Issued |
Array
(
[id] => 1169058
[patent_doc_number] => 06753270
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-06-22
[patent_title] => 'Process for depositing a porous, low dielectric constant silicon oxide film'
[patent_app_type] => B1
[patent_app_number] => 09/632425
[patent_app_country] => US
[patent_app_date] => 2000-08-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 7894
[patent_no_of_claims] => 25
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 98
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/753/06753270.pdf
[firstpage_image] =>[orig_patent_app_number] => 09632425
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/632425 | Process for depositing a porous, low dielectric constant silicon oxide film | Aug 3, 2000 | Issued |
| 09/627296 | METHOD AND DEVICE FOR MANUFACTURING SEMICONDUCTOR DEVICES INCLUDING INSULATION OXIDE LAYERS | Jul 26, 2000 | Abandoned |
Array
(
[id] => 1386993
[patent_doc_number] => 06548426
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-04-15
[patent_title] => 'Method for improving a quality of dielectric layer and semiconductor device'
[patent_app_type] => B1
[patent_app_number] => 09/625355
[patent_app_country] => US
[patent_app_date] => 2000-07-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 13
[patent_no_of_words] => 4564
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 75
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/548/06548426.pdf
[firstpage_image] =>[orig_patent_app_number] => 09625355
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/625355 | Method for improving a quality of dielectric layer and semiconductor device | Jul 24, 2000 | Issued |
Array
(
[id] => 4267757
[patent_doc_number] => 06306776
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-10-23
[patent_title] => 'Catalytic breakdown of reactant gases in chemical vapor deposition'
[patent_app_type] => 1
[patent_app_number] => 9/609345
[patent_app_country] => US
[patent_app_date] => 2000-07-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 2939
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 116
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/306/06306776.pdf
[firstpage_image] =>[orig_patent_app_number] => 609345
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/609345 | Catalytic breakdown of reactant gases in chemical vapor deposition | Jul 4, 2000 | Issued |
Array
(
[id] => 4304504
[patent_doc_number] => 06326319
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-12-04
[patent_title] => 'Method for coating ultra-thin resist films'
[patent_app_type] => 1
[patent_app_number] => 9/609746
[patent_app_country] => US
[patent_app_date] => 2000-07-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 2
[patent_no_of_words] => 1746
[patent_no_of_claims] => 4
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 131
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/326/06326319.pdf
[firstpage_image] =>[orig_patent_app_number] => 609746
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/609746 | Method for coating ultra-thin resist films | Jul 2, 2000 | Issued |
Array
(
[id] => 1467089
[patent_doc_number] => 06458713
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-10-01
[patent_title] => 'Method for manufacturing semiconductor device'
[patent_app_type] => B1
[patent_app_number] => 09/604726
[patent_app_country] => US
[patent_app_date] => 2000-06-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 17
[patent_no_of_words] => 6526
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 59
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/458/06458713.pdf
[firstpage_image] =>[orig_patent_app_number] => 09604726
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/604726 | Method for manufacturing semiconductor device | Jun 27, 2000 | Issued |
Array
(
[id] => 1545471
[patent_doc_number] => 06444592
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-09-03
[patent_title] => 'Interfacial oxidation process for high-k gate dielectric process integration'
[patent_app_type] => B1
[patent_app_number] => 09/597765
[patent_app_country] => US
[patent_app_date] => 2000-06-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 2
[patent_no_of_words] => 3820
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 78
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/444/06444592.pdf
[firstpage_image] =>[orig_patent_app_number] => 09597765
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/597765 | Interfacial oxidation process for high-k gate dielectric process integration | Jun 19, 2000 | Issued |
Array
(
[id] => 7643946
[patent_doc_number] => 06429092
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-08-06
[patent_title] => 'Collar formation by selective oxide deposition'
[patent_app_type] => B1
[patent_app_number] => 09/596606
[patent_app_country] => US
[patent_app_date] => 2000-06-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 3258
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 15
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/429/06429092.pdf
[firstpage_image] =>[orig_patent_app_number] => 09596606
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/596606 | Collar formation by selective oxide deposition | Jun 18, 2000 | Issued |
Array
(
[id] => 4267771
[patent_doc_number] => 06306777
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-10-23
[patent_title] => 'Flash memory having a treatment layer disposed between an interpoly dielectric structure and method of forming'
[patent_app_type] => 1
[patent_app_number] => 9/595166
[patent_app_country] => US
[patent_app_date] => 2000-06-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 4
[patent_no_of_words] => 3216
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 214
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/306/06306777.pdf
[firstpage_image] =>[orig_patent_app_number] => 595166
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/595166 | Flash memory having a treatment layer disposed between an interpoly dielectric structure and method of forming | Jun 14, 2000 | Issued |
Array
(
[id] => 1459517
[patent_doc_number] => 06391763
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-05-21
[patent_title] => 'Method for forming a plug or damascene trench on a semiconductor device'
[patent_app_type] => B1
[patent_app_number] => 09/592146
[patent_app_country] => US
[patent_app_date] => 2000-06-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 1918
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 155
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/391/06391763.pdf
[firstpage_image] =>[orig_patent_app_number] => 09592146
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/592146 | Method for forming a plug or damascene trench on a semiconductor device | Jun 11, 2000 | Issued |
Array
(
[id] => 1466976
[patent_doc_number] => 06458655
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-10-01
[patent_title] => 'Method of manufacturing semiconductor device and flash memory'
[patent_app_type] => B1
[patent_app_number] => 09/588475
[patent_app_country] => US
[patent_app_date] => 2000-06-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 25
[patent_no_of_words] => 7333
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 322
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/458/06458655.pdf
[firstpage_image] =>[orig_patent_app_number] => 09588475
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/588475 | Method of manufacturing semiconductor device and flash memory | Jun 6, 2000 | Issued |
Array
(
[id] => 1441042
[patent_doc_number] => 06335261
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-01-01
[patent_title] => 'Directional CVD process with optimized etchback'
[patent_app_type] => B1
[patent_app_number] => 09/584355
[patent_app_country] => US
[patent_app_date] => 2000-05-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 11
[patent_no_of_words] => 3721
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 130
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/335/06335261.pdf
[firstpage_image] =>[orig_patent_app_number] => 09584355
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/584355 | Directional CVD process with optimized etchback | May 30, 2000 | Issued |
Array
(
[id] => 1390963
[patent_doc_number] => 06544901
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-04-08
[patent_title] => 'Plasma thin-film deposition method'
[patent_app_type] => B1
[patent_app_number] => 09/578726
[patent_app_country] => US
[patent_app_date] => 2000-05-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 20
[patent_figures_cnt] => 28
[patent_no_of_words] => 7716
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 72
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/544/06544901.pdf
[firstpage_image] =>[orig_patent_app_number] => 09578726
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/578726 | Plasma thin-film deposition method | May 25, 2000 | Issued |
Array
(
[id] => 4327245
[patent_doc_number] => 06319812
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-11-20
[patent_title] => 'Method of manufacturing a semiconductor device'
[patent_app_type] => 1
[patent_app_number] => 9/577136
[patent_app_country] => US
[patent_app_date] => 2000-05-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 17
[patent_figures_cnt] => 17
[patent_no_of_words] => 6066
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 104
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/319/06319812.pdf
[firstpage_image] =>[orig_patent_app_number] => 577136
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/577136 | Method of manufacturing a semiconductor device | May 23, 2000 | Issued |
Array
(
[id] => 1474709
[patent_doc_number] => 06387823
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-05-14
[patent_title] => 'Method and apparatus for controlling deposition process using residual gas analysis'
[patent_app_type] => B1
[patent_app_number] => 09/577756
[patent_app_country] => US
[patent_app_date] => 2000-05-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 5
[patent_no_of_words] => 3566
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 73
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/387/06387823.pdf
[firstpage_image] =>[orig_patent_app_number] => 09577756
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/577756 | Method and apparatus for controlling deposition process using residual gas analysis | May 22, 2000 | Issued |
Array
(
[id] => 1542753
[patent_doc_number] => 06372639
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-04-16
[patent_title] => 'Method for constructing interconnects for sub-micron semiconductor devices and the resulting semiconductor devices'
[patent_app_type] => B1
[patent_app_number] => 09/576836
[patent_app_country] => US
[patent_app_date] => 2000-05-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 17
[patent_figures_cnt] => 22
[patent_no_of_words] => 10340
[patent_no_of_claims] => 35
[patent_no_of_ind_claims] => 10
[patent_words_short_claim] => 54
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/372/06372639.pdf
[firstpage_image] =>[orig_patent_app_number] => 09576836
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/576836 | Method for constructing interconnects for sub-micron semiconductor devices and the resulting semiconductor devices | May 22, 2000 | Issued |
Array
(
[id] => 1469941
[patent_doc_number] => 06407008
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-06-18
[patent_title] => 'Method of forming an oxide layer'
[patent_app_type] => B1
[patent_app_number] => 09/564786
[patent_app_country] => US
[patent_app_date] => 2000-05-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 6
[patent_no_of_words] => 2522
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 85
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/407/06407008.pdf
[firstpage_image] =>[orig_patent_app_number] => 09564786
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/564786 | Method of forming an oxide layer | May 4, 2000 | Issued |
Array
(
[id] => 1459549
[patent_doc_number] => 06391774
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-05-21
[patent_title] => 'Fabrication process of semiconductor device'
[patent_app_type] => B1
[patent_app_number] => 09/553315
[patent_app_country] => US
[patent_app_date] => 2000-04-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 19
[patent_no_of_words] => 4963
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 78
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/391/06391774.pdf
[firstpage_image] =>[orig_patent_app_number] => 09553315
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/553315 | Fabrication process of semiconductor device | Apr 19, 2000 | Issued |