
Long T. Tran
Examiner (ID: 3302)
| Most Active Art Unit | 3747 |
| Art Unit(s) | 3783, 3747, 4165 |
| Total Applications | 1764 |
| Issued Applications | 1463 |
| Pending Applications | 103 |
| Abandoned Applications | 234 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 4182816
[patent_doc_number] => 06150264
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-11-21
[patent_title] => 'Method of manufacturing self-aligned silicide'
[patent_app_type] => 1
[patent_app_number] => 9/075420
[patent_app_country] => US
[patent_app_date] => 1998-05-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 8
[patent_no_of_words] => 1744
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 128
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/150/06150264.pdf
[firstpage_image] =>[orig_patent_app_number] => 075420
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/075420 | Method of manufacturing self-aligned silicide | May 7, 1998 | Issued |
Array
(
[id] => 4084735
[patent_doc_number] => 06025241
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-02-15
[patent_title] => 'Method of fabricating semiconductor devices with self-aligned silicide'
[patent_app_type] => 1
[patent_app_number] => 9/073576
[patent_app_country] => US
[patent_app_date] => 1998-05-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 7
[patent_no_of_words] => 1963
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 130
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/025/06025241.pdf
[firstpage_image] =>[orig_patent_app_number] => 073576
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/073576 | Method of fabricating semiconductor devices with self-aligned silicide | May 5, 1998 | Issued |
Array
(
[id] => 4097515
[patent_doc_number] => 06048747
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-04-11
[patent_title] => 'Laser bar cleaving apparatus'
[patent_app_type] => 1
[patent_app_number] => 9/071629
[patent_app_country] => US
[patent_app_date] => 1998-05-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 5
[patent_no_of_words] => 1661
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 157
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/048/06048747.pdf
[firstpage_image] =>[orig_patent_app_number] => 071629
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/071629 | Laser bar cleaving apparatus | Apr 30, 1998 | Issued |
Array
(
[id] => 4233708
[patent_doc_number] => 06074907
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-06-13
[patent_title] => 'Method of manufacturing capacitor for analog function'
[patent_app_type] => 1
[patent_app_number] => 9/069710
[patent_app_country] => US
[patent_app_date] => 1998-04-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 13
[patent_no_of_words] => 3551
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 132
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/074/06074907.pdf
[firstpage_image] =>[orig_patent_app_number] => 069710
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/069710 | Method of manufacturing capacitor for analog function | Apr 28, 1998 | Issued |
Array
(
[id] => 4182313
[patent_doc_number] => 06150226
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-11-21
[patent_title] => 'Semiconductor processing methods, methods of forming capacitors, methods of forming silicon nitride, and methods of densifying silicon nitride layers'
[patent_app_type] => 1
[patent_app_number] => 9/018230
[patent_app_country] => US
[patent_app_date] => 1998-02-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 8
[patent_no_of_words] => 2926
[patent_no_of_claims] => 39
[patent_no_of_ind_claims] => 7
[patent_words_short_claim] => 54
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/150/06150226.pdf
[firstpage_image] =>[orig_patent_app_number] => 018230
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/018230 | Semiconductor processing methods, methods of forming capacitors, methods of forming silicon nitride, and methods of densifying silicon nitride layers | Feb 2, 1998 | Issued |
Array
(
[id] => 4214306
[patent_doc_number] => 06110772
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-08-29
[patent_title] => 'Semiconductor integrated circuit and manufacturing method thereof'
[patent_app_type] => 1
[patent_app_number] => 9/016512
[patent_app_country] => US
[patent_app_date] => 1998-01-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 18
[patent_figures_cnt] => 26
[patent_no_of_words] => 6922
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 150
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/110/06110772.pdf
[firstpage_image] =>[orig_patent_app_number] => 016512
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/016512 | Semiconductor integrated circuit and manufacturing method thereof | Jan 29, 1998 | Issued |
Array
(
[id] => 4236699
[patent_doc_number] => 06090645
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-07-18
[patent_title] => 'Fabrication method of semiconductor device with gettering treatment'
[patent_app_type] => 1
[patent_app_number] => 9/015667
[patent_app_country] => US
[patent_app_date] => 1998-01-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 22
[patent_no_of_words] => 9768
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 234
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/090/06090645.pdf
[firstpage_image] =>[orig_patent_app_number] => 015667
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/015667 | Fabrication method of semiconductor device with gettering treatment | Jan 28, 1998 | Issued |
Array
(
[id] => 4125549
[patent_doc_number] => 06127272
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-10-03
[patent_title] => 'Method of electron beam lithography on very high resistivity substrates'
[patent_app_type] => 1
[patent_app_number] => 9/013271
[patent_app_country] => US
[patent_app_date] => 1998-01-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 14
[patent_no_of_words] => 1649
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 75
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/127/06127272.pdf
[firstpage_image] =>[orig_patent_app_number] => 013271
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/013271 | Method of electron beam lithography on very high resistivity substrates | Jan 25, 1998 | Issued |
Array
(
[id] => 1602614
[patent_doc_number] => 06432793
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-08-13
[patent_title] => 'Oxidative conditioning method for metal oxide layer and applications thereof'
[patent_app_type] => B1
[patent_app_number] => 08/989694
[patent_app_country] => US
[patent_app_date] => 1997-12-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 4
[patent_no_of_words] => 6841
[patent_no_of_claims] => 64
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 61
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/432/06432793.pdf
[firstpage_image] =>[orig_patent_app_number] => 08989694
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/989694 | Oxidative conditioning method for metal oxide layer and applications thereof | Dec 11, 1997 | Issued |
Array
(
[id] => 4235936
[patent_doc_number] => 06143640
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-11-07
[patent_title] => 'Method of fabricating a stacked via in copper/polyimide beol'
[patent_app_type] => 1
[patent_app_number] => 8/936090
[patent_app_country] => US
[patent_app_date] => 1997-09-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 16
[patent_no_of_words] => 4194
[patent_no_of_claims] => 25
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 194
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/143/06143640.pdf
[firstpage_image] =>[orig_patent_app_number] => 936090
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/936090 | Method of fabricating a stacked via in copper/polyimide beol | Sep 22, 1997 | Issued |
Array
(
[id] => 4145485
[patent_doc_number] => 06063659
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-05-16
[patent_title] => 'Method of forming a high-precision linear MOS capacitor using conventional MOS device processing steps'
[patent_app_type] => 1
[patent_app_number] => 8/923810
[patent_app_country] => US
[patent_app_date] => 1997-09-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 3
[patent_no_of_words] => 1084
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 93
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/063/06063659.pdf
[firstpage_image] =>[orig_patent_app_number] => 923810
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/923810 | Method of forming a high-precision linear MOS capacitor using conventional MOS device processing steps | Sep 3, 1997 | Issued |