
Lynette T. Umez Eronini
Examiner (ID: 14831)
| Most Active Art Unit | 1765 |
| Art Unit(s) | 1792, 1763, 1765 |
| Total Applications | 437 |
| Issued Applications | 331 |
| Pending Applications | 29 |
| Abandoned Applications | 77 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6081264
[patent_doc_number] => 20020081853
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-06-27
[patent_title] => 'Abrasive slurry and process for a chemical-mechanical polishing of a precious-metal surface'
[patent_app_type] => new
[patent_app_number] => 10/023136
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[pdf_file] => publications/A1/0081/20020081853.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/023136 | Abrasive slurry and process for a chemical-mechanical polishing of a precious-metal surface | Dec 16, 2001 | Abandoned |
Array
(
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[patent_doc_number] => 06866792
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[patent_kind] => B2
[patent_issue_date] => 2005-03-15
[patent_title] => 'Compositions for chemical mechanical planarization of copper'
[patent_app_type] => utility
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Array
(
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[patent_issue_date] => 2004-04-13
[patent_title] => 'Slurry for polishing a barrier layer'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/002855 | Slurry for polishing a barrier layer | Nov 29, 2001 | Issued |
Array
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[patent_title] => 'Polishing slurry for the chemical-mechanical polishing of metal and dielectric structures'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/998560 | Polishing slurry for the chemical-mechanical polishing of metal and dielectric structures | Nov 28, 2001 | Abandoned |
Array
(
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Array
(
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[patent_title] => 'Method for using a hard mask for critical dimension growth containment'
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Array
(
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[patent_title] => 'Etching gas composition for silicon oxide and method of etching silicon oxide using the same'
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Array
(
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[patent_issue_date] => 2002-07-25
[patent_title] => 'Polishing composition and polishing method employing it'
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Array
(
[id] => 1002404
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[patent_title] => 'Method of fabricating semiconductor device having opening filled up with filler'
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Array
(
[id] => 6503734
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[patent_issue_date] => 2002-02-28
[patent_title] => 'Etching gas used for plasma-enhanced etching of vanadium oxide film and method of plasma-enhanced etching of vanadium oxide film'
[patent_app_type] => new
[patent_app_number] => 09/985069
[patent_app_country] => US
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Array
(
[id] => 1012356
[patent_doc_number] => 06896826
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[patent_title] => 'Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate'
[patent_app_type] => utility
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Array
(
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[patent_title] => 'Abrasive liquid for metal and method for polishing'
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Array
(
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[patent_title] => 'Phosphono compound-containing polishing composition and method of using same'
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| 09/953523 | Dielectric plasma etch with deep UV resist and power modulation | Sep 16, 2001 | Abandoned |
Array
(
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Array
(
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Array
(
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Array
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