Search

Lynette T. Umez Eronini

Examiner (ID: 14831)

Most Active Art Unit
1765
Art Unit(s)
1792, 1763, 1765
Total Applications
437
Issued Applications
331
Pending Applications
29
Abandoned Applications
77

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 6838939 [patent_doc_number] => 20030036279 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-02-20 [patent_title] => 'Thermal inkjet printhead processing with silicon etching' [patent_app_type] => new [patent_app_number] => 09/932055 [patent_app_country] => US [patent_app_date] => 2001-08-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 4426 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 56 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0036/20030036279.pdf [firstpage_image] =>[orig_patent_app_number] => 09932055 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/932055
Thermal inkjet printhead processing with silicon etching Aug 15, 2001 Issued
Array ( [id] => 1177556 [patent_doc_number] => 06743725 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-06-01 [patent_title] => 'High selectivity SiC etch in integrated circuit fabrication' [patent_app_type] => B1 [patent_app_number] => 09/928570 [patent_app_country] => US [patent_app_date] => 2001-08-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 2102 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 173 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/743/06743725.pdf [firstpage_image] =>[orig_patent_app_number] => 09928570 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/928570
High selectivity SiC etch in integrated circuit fabrication Aug 12, 2001 Issued
Array ( [id] => 1312368 [patent_doc_number] => 06610602 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-08-26 [patent_title] => 'Magnetic field sensor and method of manufacturing same using a self-organizing polymer mask' [patent_app_type] => B2 [patent_app_number] => 09/927860 [patent_app_country] => US [patent_app_date] => 2001-08-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 11 [patent_no_of_words] => 4314 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 93 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/610/06610602.pdf [firstpage_image] =>[orig_patent_app_number] => 09927860 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/927860
Magnetic field sensor and method of manufacturing same using a self-organizing polymer mask Aug 9, 2001 Issued
Array ( [id] => 1017965 [patent_doc_number] => 06890859 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2005-05-10 [patent_title] => 'Methods of forming semiconductor structures having reduced defects, and articles and devices formed thereby' [patent_app_type] => utility [patent_app_number] => 09/927863 [patent_app_country] => US [patent_app_date] => 2001-08-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 7 [patent_no_of_words] => 5582 [patent_no_of_claims] => 30 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 110 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/890/06890859.pdf [firstpage_image] =>[orig_patent_app_number] => 09927863 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/927863
Methods of forming semiconductor structures having reduced defects, and articles and devices formed thereby Aug 9, 2001 Issued
Array ( [id] => 1592386 [patent_doc_number] => 06383410 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-05-07 [patent_title] => 'Selective silicon oxide etchant formulation including fluoride salt, chelating agent, and glycol solvent' [patent_app_type] => B1 [patent_app_number] => 09/925874 [patent_app_country] => US [patent_app_date] => 2001-08-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 1745 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 46 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/383/06383410.pdf [firstpage_image] =>[orig_patent_app_number] => 09925874 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/925874
Selective silicon oxide etchant formulation including fluoride salt, chelating agent, and glycol solvent Aug 7, 2001 Issued
Array ( [id] => 6565906 [patent_doc_number] => 20020084248 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-07-04 [patent_title] => 'Wet etch process and composition for forming openings in a polymer substrate' [patent_app_type] => new [patent_app_number] => 09/920499 [patent_app_country] => US [patent_app_date] => 2001-08-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 5190 [patent_no_of_claims] => 72 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 45 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0084/20020084248.pdf [firstpage_image] =>[orig_patent_app_number] => 09920499 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/920499
Wet etch process and composition for forming openings in a polymer substrate Jul 31, 2001 Pending
Array ( [id] => 6209429 [patent_doc_number] => 20020072235 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-06-13 [patent_title] => 'Mixed acid solution in etching process, process for producing the same, etching process using the same and process for producing semiconductor device' [patent_app_type] => new [patent_app_number] => 09/916381 [patent_app_country] => US [patent_app_date] => 2001-07-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 7962 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 35 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0072/20020072235.pdf [firstpage_image] =>[orig_patent_app_number] => 09916381 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/916381
Mixed acid solution in etching process, process for producing the same, etching process using the same and process for producing semiconductor device Jul 26, 2001 Abandoned
Array ( [id] => 1172802 [patent_doc_number] => 06746621 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-06-08 [patent_title] => 'Micro-etching composition for copper or copper alloy, micro-etching method, and method for manufacturing printed circuit board' [patent_app_type] => B2 [patent_app_number] => 09/912318 [patent_app_country] => US [patent_app_date] => 2001-07-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3951 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 40 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/746/06746621.pdf [firstpage_image] =>[orig_patent_app_number] => 09912318 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/912318
Micro-etching composition for copper or copper alloy, micro-etching method, and method for manufacturing printed circuit board Jul 25, 2001 Issued
Array ( [id] => 1264568 [patent_doc_number] => 06660642 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-12-09 [patent_title] => 'Toxic residual gas removal by non-reactive ion sputtering' [patent_app_type] => B2 [patent_app_number] => 09/912623 [patent_app_country] => US [patent_app_date] => 2001-07-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 2 [patent_no_of_words] => 1693 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 131 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/660/06660642.pdf [firstpage_image] =>[orig_patent_app_number] => 09912623 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/912623
Toxic residual gas removal by non-reactive ion sputtering Jul 24, 2001 Issued
Array ( [id] => 1141638 [patent_doc_number] => 06777337 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-08-17 [patent_title] => 'Planarizing method of semiconductor wafer and apparatus thereof' [patent_app_type] => B2 [patent_app_number] => 09/910904 [patent_app_country] => US [patent_app_date] => 2001-07-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 25 [patent_no_of_words] => 6509 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 135 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/777/06777337.pdf [firstpage_image] =>[orig_patent_app_number] => 09910904 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/910904
Planarizing method of semiconductor wafer and apparatus thereof Jul 23, 2001 Issued
Array ( [id] => 5811838 [patent_doc_number] => 20020038681 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-04-04 [patent_title] => 'Masking material for dry etching' [patent_app_type] => new [patent_app_number] => 09/910854 [patent_app_country] => US [patent_app_date] => 2001-07-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 4292 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 61 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0038/20020038681.pdf [firstpage_image] =>[orig_patent_app_number] => 09910854 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/910854
Masking material for dry etching Jul 23, 2001 Abandoned
Array ( [id] => 1155283 [patent_doc_number] => 06764868 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-07-20 [patent_title] => 'Use of slurry waste composition to determine the amount of metal removed during chemical mechanical polishing, and system for accomplishing same' [patent_app_type] => B1 [patent_app_number] => 09/909112 [patent_app_country] => US [patent_app_date] => 2001-07-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 4869 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 122 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/764/06764868.pdf [firstpage_image] =>[orig_patent_app_number] => 09909112 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/909112
Use of slurry waste composition to determine the amount of metal removed during chemical mechanical polishing, and system for accomplishing same Jul 18, 2001 Issued
Array ( [id] => 5814901 [patent_doc_number] => 20020039837 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-04-04 [patent_title] => 'Method of manufacturing a semiconductor device' [patent_app_type] => new [patent_app_number] => 09/908496 [patent_app_country] => US [patent_app_date] => 2001-07-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 4261 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 109 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0039/20020039837.pdf [firstpage_image] =>[orig_patent_app_number] => 09908496 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/908496
Method of manufacturing a semiconductor device Jul 18, 2001 Issued
Array ( [id] => 1299868 [patent_doc_number] => 06624080 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-09-23 [patent_title] => 'Method of fabricating nickel etching mask' [patent_app_type] => B2 [patent_app_number] => 09/906884 [patent_app_country] => US [patent_app_date] => 2001-07-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 14 [patent_no_of_words] => 2269 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 159 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/624/06624080.pdf [firstpage_image] =>[orig_patent_app_number] => 09906884 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/906884
Method of fabricating nickel etching mask Jul 16, 2001 Issued
Array ( [id] => 6733116 [patent_doc_number] => 20030010751 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-01-16 [patent_title] => 'Extrusion-free wet cleaning process for copper-dual damascene structures' [patent_app_type] => new [patent_app_number] => 09/682054 [patent_app_country] => US [patent_app_date] => 2001-07-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 2089 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 48 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0010/20030010751.pdf [firstpage_image] =>[orig_patent_app_number] => 09682054 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/682054
Extrusion-free wet cleaning process for copper-dual damascene structures Jul 15, 2001 Issued
Array ( [id] => 6060235 [patent_doc_number] => 20020030178 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-03-14 [patent_title] => 'Etching solutions and processes for manufacturing flexible wiring boards' [patent_app_type] => new [patent_app_number] => 09/905052 [patent_app_country] => US [patent_app_date] => 2001-07-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 9569 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 8 [patent_words_short_claim] => 100 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0030/20020030178.pdf [firstpage_image] =>[orig_patent_app_number] => 09905052 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/905052
Etching solutions and processes for manufacturing flexible wiring boards Jul 11, 2001 Issued
Array ( [id] => 1172853 [patent_doc_number] => 06750148 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-06-15 [patent_title] => 'Method of manufacturing wireless suspension blank' [patent_app_type] => B2 [patent_app_number] => 09/900768 [patent_app_country] => US [patent_app_date] => 2001-07-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 15 [patent_no_of_words] => 6077 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 140 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/750/06750148.pdf [firstpage_image] =>[orig_patent_app_number] => 09900768 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/900768
Method of manufacturing wireless suspension blank Jul 5, 2001 Issued
Array ( [id] => 1270373 [patent_doc_number] => 06653237 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-11-25 [patent_title] => 'High resist-selectivity etch for silicon trench etch applications' [patent_app_type] => B2 [patent_app_number] => 09/893859 [patent_app_country] => US [patent_app_date] => 2001-06-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 3 [patent_no_of_words] => 3033 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 108 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/653/06653237.pdf [firstpage_image] =>[orig_patent_app_number] => 09893859 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/893859
High resist-selectivity etch for silicon trench etch applications Jun 26, 2001 Issued
Array ( [id] => 686730 [patent_doc_number] => 07078348 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2006-07-18 [patent_title] => 'Dual layer patterning scheme to make dual damascene' [patent_app_type] => utility [patent_app_number] => 09/893188 [patent_app_country] => US [patent_app_date] => 2001-06-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 11 [patent_no_of_words] => 5004 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 116 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/078/07078348.pdf [firstpage_image] =>[orig_patent_app_number] => 09893188 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/893188
Dual layer patterning scheme to make dual damascene Jun 26, 2001 Issued
Array ( [id] => 982332 [patent_doc_number] => 06927176 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2005-08-09 [patent_title] => 'Cleaning method and solution for cleaning a wafer in a single wafer process' [patent_app_type] => utility [patent_app_number] => 09/891730 [patent_app_country] => US [patent_app_date] => 2001-06-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 17 [patent_figures_cnt] => 26 [patent_no_of_words] => 8784 [patent_no_of_claims] => 76 [patent_no_of_ind_claims] => 16 [patent_words_short_claim] => 28 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/927/06927176.pdf [firstpage_image] =>[orig_patent_app_number] => 09891730 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/891730
Cleaning method and solution for cleaning a wafer in a single wafer process Jun 24, 2001 Issued
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