
Mahmoud Dahimene
Examiner (ID: 18385, Phone: (571)272-2410 , Office: P/1713 )
| Most Active Art Unit | 1713 |
| Art Unit(s) | 1792, 1713, 1765 |
| Total Applications | 794 |
| Issued Applications | 518 |
| Pending Applications | 8 |
| Abandoned Applications | 270 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 17239492
[patent_doc_number] => 11183383
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2021-11-23
[patent_title] => Tin oxide thin film spacers in semiconductor device manufacturing
[patent_app_type] => utility
[patent_app_number] => 16/825514
[patent_app_country] => US
[patent_app_date] => 2020-03-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 11
[patent_no_of_words] => 12246
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 234
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16825514
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/825514 | Tin oxide thin film spacers in semiconductor device manufacturing | Mar 19, 2020 | Issued |
Array
(
[id] => 16098377
[patent_doc_number] => 20200203175
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-06-25
[patent_title] => Atomic Layer Etch Process Using Plasma In Conjunction With A Rapid Thermal Activation Process
[patent_app_type] => utility
[patent_app_number] => 16/804572
[patent_app_country] => US
[patent_app_date] => 2020-02-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5403
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 2
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16804572
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/804572 | Atomic layer etch process using plasma in conjunction with a rapid thermal activation process | Feb 27, 2020 | Issued |
Array
(
[id] => 16348022
[patent_doc_number] => 20200312673
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-10-01
[patent_title] => ATOMIC LAYER ETCH (ALE) OF TUNGSTEN OR OTHER METAL LAYERS
[patent_app_type] => utility
[patent_app_number] => 16/802554
[patent_app_country] => US
[patent_app_date] => 2020-02-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6731
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -20
[patent_words_short_claim] => 59
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16802554
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/802554 | Atomic layer etch (ALE) of tungsten or other metal layers | Feb 26, 2020 | Issued |
Array
(
[id] => 16012335
[patent_doc_number] => 20200181010
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-06-11
[patent_title] => LOW REFLECTIVITY COATING AND METHOD AND SYSTEM FOR COATING A SUBSTRATE
[patent_app_type] => utility
[patent_app_number] => 16/788203
[patent_app_country] => US
[patent_app_date] => 2020-02-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 10392
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -12
[patent_words_short_claim] => 2
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16788203
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/788203 | Low reflectivity coating and method and system for coating a substrate | Feb 10, 2020 | Issued |
Array
(
[id] => 15905909
[patent_doc_number] => 20200152475
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-05-14
[patent_title] => Method of Fabricating Semiconductor Device, Vacuum Processing Apparatus and Substrate Processing Apparatus
[patent_app_type] => utility
[patent_app_number] => 16/745720
[patent_app_country] => US
[patent_app_date] => 2020-01-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 9101
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -3
[patent_words_short_claim] => 2
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16745720
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/745720 | Method of fabricating semiconductor device, vacuum processing apparatus and substrate processing apparatus | Jan 16, 2020 | Issued |
Array
(
[id] => 16941211
[patent_doc_number] => 11053440
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2021-07-06
[patent_title] => Silicon nitride etching composition and method
[patent_app_type] => utility
[patent_app_number] => 16/681449
[patent_app_country] => US
[patent_app_date] => 2019-11-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 5
[patent_no_of_words] => 7491
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 56
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16681449
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/681449 | Silicon nitride etching composition and method | Nov 11, 2019 | Issued |
Array
(
[id] => 17142119
[patent_doc_number] => 20210310131
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2021-10-07
[patent_title] => PROCESS FOR SURFACE TREATMENT OF ALUMINUM OR ALUMINUM ALLOYS BY AN ALKALINE CHEMICAL BATH
[patent_app_type] => utility
[patent_app_number] => 17/290848
[patent_app_country] => US
[patent_app_date] => 2019-11-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 2356
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -5
[patent_words_short_claim] => 163
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17290848
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/290848 | Process for surface treatment of aluminum or aluminum alloys by an alkaline chemical bath | Nov 4, 2019 | Issued |
Array
(
[id] => 15564221
[patent_doc_number] => 20200066522
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-02-27
[patent_title] => METHOD FOR PATTERNING A SUBSTARATE USING A LAYER WITH MULTIPLE MATERIALS
[patent_app_type] => utility
[patent_app_number] => 16/665697
[patent_app_country] => US
[patent_app_date] => 2019-10-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5061
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -13
[patent_words_short_claim] => 142
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16665697
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/665697 | Method for patterning a substrate using a layer with multiple materials | Oct 27, 2019 | Issued |
Array
(
[id] => 17236806
[patent_doc_number] => 11180678
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2021-11-23
[patent_title] => Suppressing SiN removal rates and reducing oxide trench dishing for Shallow Trench Isolation (STI) process
[patent_app_type] => utility
[patent_app_number] => 16/664924
[patent_app_country] => US
[patent_app_date] => 2019-10-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 10283
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 136
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16664924
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/664924 | Suppressing SiN removal rates and reducing oxide trench dishing for Shallow Trench Isolation (STI) process | Oct 26, 2019 | Issued |
Array
(
[id] => 15865721
[patent_doc_number] => 20200140264
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-05-07
[patent_title] => MANUFACTURING METHOD OF MICRO CHANNEL STRUCTURE
[patent_app_type] => utility
[patent_app_number] => 16/661508
[patent_app_country] => US
[patent_app_date] => 2019-10-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6977
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -16
[patent_words_short_claim] => 870
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16661508
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/661508 | Manufacturing method of micro channel structure | Oct 22, 2019 | Issued |
Array
(
[id] => 17092789
[patent_doc_number] => 11120986
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2021-09-14
[patent_title] => Etching using chamber with top plate formed of non-oxygen containing material
[patent_app_type] => utility
[patent_app_number] => 16/600091
[patent_app_country] => US
[patent_app_date] => 2019-10-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
[patent_figures_cnt] => 13
[patent_no_of_words] => 5251
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 203
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16600091
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/600091 | Etching using chamber with top plate formed of non-oxygen containing material | Oct 10, 2019 | Issued |
Array
(
[id] => 15442669
[patent_doc_number] => 20200035518
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-01-30
[patent_title] => SUBSTRATE PROCESSING METHOD
[patent_app_type] => utility
[patent_app_number] => 16/593105
[patent_app_country] => US
[patent_app_date] => 2019-10-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 18912
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -6
[patent_words_short_claim] => 125
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16593105
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/593105 | SUBSTRATE PROCESSING METHOD | Oct 3, 2019 | Abandoned |
Array
(
[id] => 15807317
[patent_doc_number] => 20200126801
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-04-23
[patent_title] => ETCHING METHOD AND PLASMA PROCESSING APPARATUS
[patent_app_type] => utility
[patent_app_number] => 16/560327
[patent_app_country] => US
[patent_app_date] => 2019-09-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7397
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -16
[patent_words_short_claim] => 59
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16560327
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/560327 | ETCHING METHOD AND PLASMA PROCESSING APPARATUS | Sep 3, 2019 | Abandoned |
Array
(
[id] => 16970613
[patent_doc_number] => 11066575
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2021-07-20
[patent_title] => Chemical mechanical planarization for tungsten-containing substrates
[patent_app_type] => utility
[patent_app_number] => 16/560713
[patent_app_country] => US
[patent_app_date] => 2019-09-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 6274
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 243
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16560713
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/560713 | Chemical mechanical planarization for tungsten-containing substrates | Sep 3, 2019 | Issued |
Array
(
[id] => 15442641
[patent_doc_number] => 20200035504
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-01-30
[patent_title] => ETCHING METHOD AND ETCHING APPARATUS
[patent_app_type] => utility
[patent_app_number] => 16/523541
[patent_app_country] => US
[patent_app_date] => 2019-07-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 8105
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -18
[patent_words_short_claim] => 78
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16523541
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/523541 | Etching method and etching apparatus | Jul 25, 2019 | Issued |
Array
(
[id] => 15442637
[patent_doc_number] => 20200035502
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-01-30
[patent_title] => PLASMA ETCHING METHOD
[patent_app_type] => utility
[patent_app_number] => 16/521701
[patent_app_country] => US
[patent_app_date] => 2019-07-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4831
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -5
[patent_words_short_claim] => 30
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16521701
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/521701 | Plasma etching method | Jul 24, 2019 | Issued |
Array
(
[id] => 15442635
[patent_doc_number] => 20200035501
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-01-30
[patent_title] => PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
[patent_app_type] => utility
[patent_app_number] => 16/521080
[patent_app_country] => US
[patent_app_date] => 2019-07-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 10422
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 92
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16521080
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/521080 | Plasma processing method and plasma processing apparatus | Jul 23, 2019 | Issued |
Array
(
[id] => 16497561
[patent_doc_number] => 10863629
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2020-12-08
[patent_title] => Method of manufacturing through hole of substrate
[patent_app_type] => utility
[patent_app_number] => 16/513896
[patent_app_country] => US
[patent_app_date] => 2019-07-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 30
[patent_no_of_words] => 4527
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 145
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16513896
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/513896 | Method of manufacturing through hole of substrate | Jul 16, 2019 | Issued |
Array
(
[id] => 16681875
[patent_doc_number] => 10941342
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2021-03-09
[patent_title] => Etchant composition and method of manufacturing wiring substrate using the same
[patent_app_type] => utility
[patent_app_number] => 16/505712
[patent_app_country] => US
[patent_app_date] => 2019-07-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 9
[patent_no_of_words] => 11393
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 52
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16505712
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/505712 | Etchant composition and method of manufacturing wiring substrate using the same | Jul 8, 2019 | Issued |
Array
(
[id] => 16495691
[patent_doc_number] => 10861739
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2020-12-08
[patent_title] => Method of patterning low-k materials using thermal decomposition materials
[patent_app_type] => utility
[patent_app_number] => 16/440679
[patent_app_country] => US
[patent_app_date] => 2019-06-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 13
[patent_no_of_words] => 5078
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 100
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16440679
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/440679 | Method of patterning low-k materials using thermal decomposition materials | Jun 12, 2019 | Issued |