
Matthew D. Krcha
Examiner (ID: 3797, Phone: (571)270-0386 , Office: P/1798 )
| Most Active Art Unit | 1798 |
| Art Unit(s) | 1798, 1773, 1796 |
| Total Applications | 724 |
| Issued Applications | 406 |
| Pending Applications | 134 |
| Abandoned Applications | 200 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 18561162
[patent_doc_number] => 11726405
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2023-08-15
[patent_title] => Photoresist for semiconductor fabrication
[patent_app_type] => utility
[patent_app_number] => 17/177008
[patent_app_country] => US
[patent_app_date] => 2021-02-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 11
[patent_no_of_words] => 6913
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 45
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17177008
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/177008 | Photoresist for semiconductor fabrication | Feb 15, 2021 | Issued |
Array
(
[id] => 18591662
[patent_doc_number] => 11740555
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2023-08-29
[patent_title] => Resist composition and method for producing resist pattern
[patent_app_type] => utility
[patent_app_number] => 17/175957
[patent_app_country] => US
[patent_app_date] => 2021-02-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 30028
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 266
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17175957
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/175957 | Resist composition and method for producing resist pattern | Feb 14, 2021 | Issued |
Array
(
[id] => 18335965
[patent_doc_number] => 20230127914
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2023-04-27
[patent_title] => RESIST PATTERN FORMATION METHOD
[patent_app_type] => utility
[patent_app_number] => 17/759396
[patent_app_country] => US
[patent_app_date] => 2021-02-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 35550
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -7
[patent_words_short_claim] => 151
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17759396
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/759396 | RESIST PATTERN FORMATION METHOD | Feb 8, 2021 | Pending |
Array
(
[id] => 17053978
[patent_doc_number] => 20210263412
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2021-08-26
[patent_title] => RESIST COMPOSITION FOR FORMING THICK-FILM RESIST FILM, THICK-FILM RESIST LAMINATE, AND RESIST PATTERN FORMING METHOD
[patent_app_type] => utility
[patent_app_number] => 17/169959
[patent_app_country] => US
[patent_app_date] => 2021-02-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 20968
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -7
[patent_words_short_claim] => 193
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17169959
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/169959 | RESIST COMPOSITION FOR FORMING THICK-FILM RESIST FILM, THICK-FILM RESIST LAMINATE, AND RESIST PATTERN FORMING METHOD | Feb 7, 2021 | Abandoned |
Array
(
[id] => 17068948
[patent_doc_number] => 20210271164
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2021-09-02
[patent_title] => PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
[patent_app_type] => utility
[patent_app_number] => 17/168145
[patent_app_country] => US
[patent_app_date] => 2021-02-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 10500
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 88
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17168145
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/168145 | Photoresist composition and method of manufacturing a semiconductor device | Feb 3, 2021 | Issued |
Array
(
[id] => 16856490
[patent_doc_number] => 20210157235
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2021-05-27
[patent_title] => COMPOSITION, PATTERN-FORMING METHOD, AND COMPOUND-PRODUCING METHOD
[patent_app_type] => utility
[patent_app_number] => 17/163675
[patent_app_country] => US
[patent_app_date] => 2021-02-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 10935
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 176
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17163675
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/163675 | Composition, pattern-forming method, and compound-producing method | Jan 31, 2021 | Issued |
Array
(
[id] => 18306516
[patent_doc_number] => 20230110416
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2023-04-13
[patent_title] => NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR MANUFACTURING CURED RELIEF PATTERN
[patent_app_type] => utility
[patent_app_number] => 17/793751
[patent_app_country] => US
[patent_app_date] => 2021-01-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 19262
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -24
[patent_words_short_claim] => 61
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17793751
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/793751 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR MANUFACTURING CURED RELIEF PATTERN | Jan 26, 2021 | Issued |
Array
(
[id] => 17549777
[patent_doc_number] => 20220121119
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2022-04-21
[patent_title] => INFRARED RADIATION SENSITIVE POSITIVE-WORKING IMAGEABLE ELEMENT AND METHOD FOR FORMING IMAGE USING SAME
[patent_app_type] => utility
[patent_app_number] => 17/432809
[patent_app_country] => US
[patent_app_date] => 2021-01-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 9945
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -19
[patent_words_short_claim] => 81
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17432809
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/432809 | INFRARED RADIATION SENSITIVE POSITIVE-WORKING IMAGEABLE ELEMENT AND METHOD FOR FORMING IMAGE USING SAME | Jan 21, 2021 | Abandoned |
Array
(
[id] => 17924236
[patent_doc_number] => 11467483
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2022-10-11
[patent_title] => Photographic color image using black and while emulsion
[patent_app_type] => utility
[patent_app_number] => 17/154933
[patent_app_country] => US
[patent_app_date] => 2021-01-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 7
[patent_no_of_words] => 5031
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 72
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17154933
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/154933 | Photographic color image using black and while emulsion | Jan 20, 2021 | Issued |
Array
(
[id] => 18363855
[patent_doc_number] => 20230145446
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2023-05-11
[patent_title] => LIGHT-SENSITIVE RESIN ORIGINAL PRINTING PLATE FOR LETTERPRESS PRINTING
[patent_app_type] => utility
[patent_app_number] => 17/913610
[patent_app_country] => US
[patent_app_date] => 2021-01-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6651
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -5
[patent_words_short_claim] => 138
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17913610
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/913610 | LIGHT-SENSITIVE RESIN ORIGINAL PRINTING PLATE FOR LETTERPRESS PRINTING | Jan 17, 2021 | Pending |
Array
(
[id] => 17143380
[patent_doc_number] => 20210311393
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2021-10-07
[patent_title] => PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
[patent_app_type] => utility
[patent_app_number] => 17/150317
[patent_app_country] => US
[patent_app_date] => 2021-01-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 9658
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 51
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17150317
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/150317 | Photoresist composition and method of manufacturing a semiconductor device | Jan 14, 2021 | Issued |
Array
(
[id] => 16826017
[patent_doc_number] => 20210141310
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2021-05-13
[patent_title] => PHOTOSENSITIVE COMPOSITION AND METHOD OF MANUFACTURING GRAPHENE DEVICE
[patent_app_type] => utility
[patent_app_number] => 17/148849
[patent_app_country] => US
[patent_app_date] => 2021-01-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 9421
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -21
[patent_words_short_claim] => 220
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17148849
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/148849 | PHOTOSENSITIVE COMPOSITION AND METHOD OF MANUFACTURING GRAPHENE DEVICE | Jan 13, 2021 | Abandoned |
Array
(
[id] => 17274414
[patent_doc_number] => 20210380612
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2021-12-09
[patent_title] => PHOTORESIST COMPOSITIONS
[patent_app_type] => utility
[patent_app_number] => 17/144242
[patent_app_country] => US
[patent_app_date] => 2021-01-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4906
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 34
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17144242
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/144242 | PHOTORESIST COMPOSITIONS | Jan 7, 2021 | Abandoned |
Array
(
[id] => 19949736
[patent_doc_number] => 12321097
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2025-06-03
[patent_title] => Method of removing photoresist, laminate, method of forming metallic pattern, polyimide resin and stripper
[patent_app_type] => utility
[patent_app_number] => 17/141228
[patent_app_country] => US
[patent_app_date] => 2021-01-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 5
[patent_no_of_words] => 1866
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 35
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17141228
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/141228 | Method of removing photoresist, laminate, method of forming metallic pattern, polyimide resin and stripper | Jan 4, 2021 | Issued |
Array
(
[id] => 18531432
[patent_doc_number] => 20230236504
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2023-07-27
[patent_title] => COMPOUND, BINDER RESIN, NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, AND DISPLAY DEVICE COMPRISING BLACK BANK FORMED USING SAME
[patent_app_type] => utility
[patent_app_number] => 17/769477
[patent_app_country] => US
[patent_app_date] => 2020-12-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 9412
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -12
[patent_words_short_claim] => 228
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17769477
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/769477 | COMPOUND, BINDER RESIN, NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, AND DISPLAY DEVICE COMPRISING BLACK BANK FORMED USING SAME | Dec 16, 2020 | Pending |
Array
(
[id] => 18184577
[patent_doc_number] => 20230045307
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2023-02-09
[patent_title] => REPLACEMENT LIQUID OF LIQUID FILLING BETWEEN RESIST PATTERNS, AND METHOD FOR PRODUCING RESIST PATTERNS USING THE SAME
[patent_app_type] => utility
[patent_app_number] => 17/777638
[patent_app_country] => US
[patent_app_date] => 2020-11-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 8906
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -15
[patent_words_short_claim] => 2
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17777638
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/777638 | REPLACEMENT LIQUID OF LIQUID FILLING BETWEEN RESIST PATTERNS, AND METHOD FOR PRODUCING RESIST PATTERNS USING THE SAME | Nov 15, 2020 | Pending |
Array
(
[id] => 17991621
[patent_doc_number] => 20220357658
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2022-11-10
[patent_title] => DNQ-TYPE PHOTORESIST COMPOSITION INCLUDING ALKALI-SOLUBLE ACRYLIC RESINS
[patent_app_type] => utility
[patent_app_number] => 17/762589
[patent_app_country] => US
[patent_app_date] => 2020-11-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 11663
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -23
[patent_words_short_claim] => 2
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17762589
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/762589 | DNQ-type photoresist composition including alkali-soluble acrylic resins | Nov 11, 2020 | Issued |
Array
(
[id] => 18163601
[patent_doc_number] => 20230030194
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2023-02-02
[patent_title] => PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, PATTERNING PROCESS, AND LIGHT EMITTING DEVICE
[patent_app_type] => utility
[patent_app_number] => 17/778203
[patent_app_country] => US
[patent_app_date] => 2020-11-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 11874
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -20
[patent_words_short_claim] => 2
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17778203
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/778203 | Photosensitive resin composition, photosensitive resin film, photosensitive dry film, patterning process, and light emitting device | Nov 11, 2020 | Issued |
Array
(
[id] => 19044994
[patent_doc_number] => 11934101
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2024-03-19
[patent_title] => Photoresist composition and method of forming photoresist pattern
[patent_app_type] => utility
[patent_app_number] => 17/094706
[patent_app_country] => US
[patent_app_date] => 2020-11-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 21
[patent_figures_cnt] => 22
[patent_no_of_words] => 9820
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 112
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17094706
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/094706 | Photoresist composition and method of forming photoresist pattern | Nov 9, 2020 | Issued |
Array
(
[id] => 17961724
[patent_doc_number] => 20220342305
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2022-10-27
[patent_title] => DUAL-CURE PHASE-SEPARATION TYPE PHOTOSENSITIVE RESIN COMPOSITION FOR CONTINUOUS 3D PRINTING WITH HIGH PRECISION
[patent_app_type] => utility
[patent_app_number] => 17/433946
[patent_app_country] => US
[patent_app_date] => 2020-11-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4217
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -16
[patent_words_short_claim] => 86
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17433946
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/433946 | Dual-cure phase-separation type photosensitive resin composition for continuous 3D printing with high precision | Nov 3, 2020 | Issued |