Search

Matthew L. Reames

Examiner (ID: 13297, Phone: (571)272-2408 , Office: P/2893 )

Most Active Art Unit
2893
Art Unit(s)
2891, 2893, 2896
Total Applications
1473
Issued Applications
1086
Pending Applications
118
Abandoned Applications
305

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 6465275 [patent_doc_number] => 20020150834 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-10-17 [patent_title] => 'Chemically amplified resist composition and method for forming patterned film using same' [patent_app_type] => new [patent_app_number] => 09/940665 [patent_app_country] => US [patent_app_date] => 2001-08-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 4068 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 48 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0150/20020150834.pdf [firstpage_image] =>[orig_patent_app_number] => 09940665 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/940665
Chemically amplified resist composition and method for forming patterned film using same Aug 28, 2001 Issued
Array ( [id] => 1241024 [patent_doc_number] => 06682870 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-01-27 [patent_title] => 'Enhanced adhesion for LIGA microfabrication by using a buffer layer' [patent_app_type] => B1 [patent_app_number] => 09/925369 [patent_app_country] => US [patent_app_date] => 2001-08-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 14 [patent_no_of_words] => 4809 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 175 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/682/06682870.pdf [firstpage_image] =>[orig_patent_app_number] => 09925369 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/925369
Enhanced adhesion for LIGA microfabrication by using a buffer layer Aug 9, 2001 Issued
Array ( [id] => 1040447 [patent_doc_number] => 06869744 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2005-03-22 [patent_title] => 'Chemically amplified positive resist composition' [patent_app_type] => utility [patent_app_number] => 09/907653 [patent_app_country] => US [patent_app_date] => 2001-07-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 11490 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 150 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/869/06869744.pdf [firstpage_image] =>[orig_patent_app_number] => 09907653 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/907653
Chemically amplified positive resist composition Jul 18, 2001 Issued
Array ( [id] => 6796747 [patent_doc_number] => 20030175621 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-09-18 [patent_title] => 'Paste filled with metal powder and metal products obtained with same' [patent_app_type] => new [patent_app_number] => 10/333428 [patent_app_country] => US [patent_app_date] => 2003-01-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8116 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 16 [patent_words_short_claim] => 20 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0175/20030175621.pdf [firstpage_image] =>[orig_patent_app_number] => 10333428 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/333428
Paste filled with metal powder and metal products obtained with same Jul 18, 2001 Issued
Array ( [id] => 5951206 [patent_doc_number] => 20020006586 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-01-17 [patent_title] => 'Optical devices made from radiation curable fluorinated compositions' [patent_app_type] => new [patent_app_number] => 09/908954 [patent_app_country] => US [patent_app_date] => 2001-07-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 15 [patent_figures_cnt] => 15 [patent_no_of_words] => 23505 [patent_no_of_claims] => 50 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 38 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0006/20020006586.pdf [firstpage_image] =>[orig_patent_app_number] => 09908954 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/908954
Optical devices made from radiation curable fluorinated compositions Jul 18, 2001 Abandoned
Array ( [id] => 1230897 [patent_doc_number] => 06692897 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-02-17 [patent_title] => 'Positive resist composition' [patent_app_type] => B2 [patent_app_number] => 09/902793 [patent_app_country] => US [patent_app_date] => 2001-07-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 16676 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 119 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/692/06692897.pdf [firstpage_image] =>[orig_patent_app_number] => 09902793 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/902793
Positive resist composition Jul 11, 2001 Issued
Array ( [id] => 6592271 [patent_doc_number] => 20020042016 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-04-11 [patent_title] => 'Resist composition comprising photosensitive polymer having loctone in its backbone' [patent_app_type] => new [patent_app_number] => 09/901569 [patent_app_country] => US [patent_app_date] => 2001-07-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5963 [patent_no_of_claims] => 40 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 18 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0042/20020042016.pdf [firstpage_image] =>[orig_patent_app_number] => 09901569 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/901569
Resist composition comprising photosensitive polymer having loctone in its backbone Jul 10, 2001 Issued
Array ( [id] => 6063231 [patent_doc_number] => 20020031720 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-03-14 [patent_title] => 'Novel copolymer, photoresist composition , and process for forming resist pattern with high aspect ratio' [patent_app_type] => new [patent_app_number] => 09/901657 [patent_app_country] => US [patent_app_date] => 2001-07-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 6035 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 55 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0031/20020031720.pdf [firstpage_image] =>[orig_patent_app_number] => 09901657 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/901657
Novel copolymer, photoresist composition , and process for forming resist pattern with high aspect ratio Jul 10, 2001 Abandoned
Array ( [id] => 6063232 [patent_doc_number] => 20020031721 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-03-14 [patent_title] => 'Photoresist composition for top-surface imaging processes by silylation' [patent_app_type] => new [patent_app_number] => 09/902152 [patent_app_country] => US [patent_app_date] => 2001-07-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 3340 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 72 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0031/20020031721.pdf [firstpage_image] =>[orig_patent_app_number] => 09902152 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/902152
Photoresist composition for top-surface imaging processes by silylation Jul 9, 2001 Issued
Array ( [id] => 5952180 [patent_doc_number] => 20020007018 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-01-17 [patent_title] => 'Hydroxy-amino thermally cured undercoat for 193 nm lithography' [patent_app_type] => new [patent_app_number] => 09/901933 [patent_app_country] => US [patent_app_date] => 2001-07-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4791 [patent_no_of_claims] => 33 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 54 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0007/20020007018.pdf [firstpage_image] =>[orig_patent_app_number] => 09901933 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/901933
Hydroxy-amino thermally cured undercoat of 193 nm lithography Jul 8, 2001 Issued
Array ( [id] => 6636572 [patent_doc_number] => 20030211734 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-11-13 [patent_title] => 'Resist resin, chemical amplification type resist, and method of forming of pattern with the same' [patent_app_type] => new [patent_app_number] => 10/240404 [patent_app_country] => US [patent_app_date] => 2002-09-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9154 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 11 [patent_words_short_claim] => 2 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0211/20030211734.pdf [firstpage_image] =>[orig_patent_app_number] => 10240404 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/240404
Resist resin, chemical amplification type resist, and method of forming of pattern with the same Jul 1, 2001 Issued
Array ( [id] => 5888335 [patent_doc_number] => 20020012879 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-01-31 [patent_title] => 'Novel photoresist monomers, polymers thereof, and photoresist compositions containing the same' [patent_app_type] => new [patent_app_number] => 09/888836 [patent_app_country] => US [patent_app_date] => 2001-06-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 2770 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 8 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0012/20020012879.pdf [firstpage_image] =>[orig_patent_app_number] => 09888836 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/888836
Photoresist monomers, polymers thereof, and photoresist compositions containing the same Jun 24, 2001 Issued
Array ( [id] => 6129101 [patent_doc_number] => 20020076641 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-06-20 [patent_title] => 'Photosensitive polymer having fused aromatic ring and photoresist composition containing the same' [patent_app_type] => new [patent_app_number] => 09/888912 [patent_app_country] => US [patent_app_date] => 2001-06-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5776 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 14 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0076/20020076641.pdf [firstpage_image] =>[orig_patent_app_number] => 09888912 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/888912
Photosensitive polymer having fused aromatic ring and photoresist composition containing the same Jun 24, 2001 Issued
Array ( [id] => 1148261 [patent_doc_number] => 06770415 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-08-03 [patent_title] => 'Photoresist polymer for top-surface imaging process by silylation and photoresist composition containing the same' [patent_app_type] => B2 [patent_app_number] => 09/884313 [patent_app_country] => US [patent_app_date] => 2001-06-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 2996 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 104 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/770/06770415.pdf [firstpage_image] =>[orig_patent_app_number] => 09884313 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/884313
Photoresist polymer for top-surface imaging process by silylation and photoresist composition containing the same Jun 18, 2001 Issued
Array ( [id] => 1115067 [patent_doc_number] => 06800414 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-10-05 [patent_title] => 'Radiation-sensitive resin composition' [patent_app_type] => B2 [patent_app_number] => 09/879894 [patent_app_country] => US [patent_app_date] => 2001-06-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 23124 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 9 [patent_words_short_claim] => 90 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/800/06800414.pdf [firstpage_image] =>[orig_patent_app_number] => 09879894 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/879894
Radiation-sensitive resin composition Jun 13, 2001 Issued
Array ( [id] => 6611308 [patent_doc_number] => 20020015917 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-02-07 [patent_title] => 'Multi-oxygen containing compound for preventing acid diffusion, and photoresist composition containing the same' [patent_app_type] => new [patent_app_number] => 09/881562 [patent_app_country] => US [patent_app_date] => 2001-06-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 2238 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 38 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0015/20020015917.pdf [firstpage_image] =>[orig_patent_app_number] => 09881562 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/881562
Multi-oxygen containing compound for preventing acid diffusion, and photoresist composition containing the same Jun 12, 2001 Abandoned
Array ( [id] => 1148257 [patent_doc_number] => 06770414 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-08-03 [patent_title] => 'Additive for photoresist composition for resist flow process' [patent_app_type] => B2 [patent_app_number] => 09/878803 [patent_app_country] => US [patent_app_date] => 2001-06-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 3163 [patent_no_of_claims] => 2 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 115 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/770/06770414.pdf [firstpage_image] =>[orig_patent_app_number] => 09878803 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/878803
Additive for photoresist composition for resist flow process Jun 10, 2001 Issued
Array ( [id] => 6032686 [patent_doc_number] => 20020018960 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-02-14 [patent_title] => 'Novel photoresist polymers, and photoresist compositions containing the same' [patent_app_type] => new [patent_app_number] => 09/862199 [patent_app_country] => US [patent_app_date] => 2001-05-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 2618 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 7 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0018/20020018960.pdf [firstpage_image] =>[orig_patent_app_number] => 09862199 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/862199
Novel photoresist polymers, and photoresist compositions containing the same May 20, 2001 Abandoned
Array ( [id] => 1180157 [patent_doc_number] => 06737215 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-05-18 [patent_title] => 'Photoresist composition for deep ultraviolet lithography' [patent_app_type] => B2 [patent_app_number] => 09/853732 [patent_app_country] => US [patent_app_date] => 2001-05-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6045 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 150 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/737/06737215.pdf [firstpage_image] =>[orig_patent_app_number] => 09853732 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/853732
Photoresist composition for deep ultraviolet lithography May 10, 2001 Issued
Array ( [id] => 5999623 [patent_doc_number] => 20020028406 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-03-07 [patent_title] => 'Partially crosslinked polymer for bilayer photoresist' [patent_app_type] => new [patent_app_number] => 09/852371 [patent_app_country] => US [patent_app_date] => 2001-05-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 3860 [patent_no_of_claims] => 33 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 129 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0028/20020028406.pdf [firstpage_image] =>[orig_patent_app_number] => 09852371 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/852371
Partially crosslinked polymer for bilayer photoresist May 9, 2001 Issued
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