Search

Matthew L. Reames

Examiner (ID: 13297, Phone: (571)272-2408 , Office: P/2893 )

Most Active Art Unit
2893
Art Unit(s)
2891, 2893, 2896
Total Applications
1473
Issued Applications
1086
Pending Applications
118
Abandoned Applications
305

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 1345834 [patent_doc_number] => 06579658 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-06-17 [patent_title] => 'Polymers, resist compositions and patterning process' [patent_app_type] => B2 [patent_app_number] => 09/783446 [patent_app_country] => US [patent_app_date] => 2001-02-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 11971 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 16 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/579/06579658.pdf [firstpage_image] =>[orig_patent_app_number] => 09783446 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/783446
Polymers, resist compositions and patterning process Feb 14, 2001 Issued
Array ( [id] => 6842867 [patent_doc_number] => 20030148214 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-08-07 [patent_title] => 'Resins for resists and chemically amplifiable resist compositions' [patent_app_type] => new [patent_app_number] => 10/332770 [patent_app_country] => US [patent_app_date] => 2003-01-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6175 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 21 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0148/20030148214.pdf [firstpage_image] =>[orig_patent_app_number] => 10332770 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/332770
Resins for resists and chemically amplifiable resist compositions Feb 8, 2001 Issued
Array ( [id] => 5888313 [patent_doc_number] => 20020012868 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-01-31 [patent_title] => 'Composition for forming electroconductive film such as electrode or wiring, method for forming electroconductive film such as electrode or wiring, and method for producing electron emitting device, electron source and image forming apparatus' [patent_app_type] => new [patent_app_number] => 09/777842 [patent_app_country] => US [patent_app_date] => 2001-02-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 4703 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 20 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0012/20020012868.pdf [firstpage_image] =>[orig_patent_app_number] => 09777842 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/777842
Composition for forming electroconductive film Feb 6, 2001 Issued
Array ( [id] => 6901467 [patent_doc_number] => 20010023050 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-09-20 [patent_title] => 'Radiation-sensitive resin composition' [patent_app_type] => new [patent_app_number] => 09/774714 [patent_app_country] => US [patent_app_date] => 2001-02-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 27572 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 76 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0023/20010023050.pdf [firstpage_image] =>[orig_patent_app_number] => 09774714 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/774714
Radiation-sensitive resin composition Jan 31, 2001 Issued
Array ( [id] => 1269424 [patent_doc_number] => 06653044 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-11-25 [patent_title] => 'Chemical amplification type resist composition' [patent_app_type] => B2 [patent_app_number] => 09/760716 [patent_app_country] => US [patent_app_date] => 2001-01-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8213 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 455 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/653/06653044.pdf [firstpage_image] =>[orig_patent_app_number] => 09760716 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/760716
Chemical amplification type resist composition Jan 16, 2001 Issued
Array ( [id] => 1280048 [patent_doc_number] => 06641974 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-11-04 [patent_title] => 'Chemically amplified resist composition containing low molecular weight additives' [patent_app_type] => B2 [patent_app_number] => 09/759825 [patent_app_country] => US [patent_app_date] => 2001-01-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6597 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 335 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/641/06641974.pdf [firstpage_image] =>[orig_patent_app_number] => 09759825 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/759825
Chemically amplified resist composition containing low molecular weight additives Jan 11, 2001 Issued
Array ( [id] => 1417586 [patent_doc_number] => 06506536 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-01-14 [patent_title] => 'Imageable element and composition comprising thermally reversible polymers' [patent_app_type] => B2 [patent_app_number] => 09/751650 [patent_app_country] => US [patent_app_date] => 2000-12-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8125 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 83 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/506/06506536.pdf [firstpage_image] =>[orig_patent_app_number] => 09751650 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/751650
Imageable element and composition comprising thermally reversible polymers Dec 28, 2000 Issued
Array ( [id] => 6080221 [patent_doc_number] => 20020081520 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-06-27 [patent_title] => 'Substantially transparent aqueous base soluble polymer system for use in 157 nm resist applications' [patent_app_type] => new [patent_app_number] => 09/748071 [patent_app_country] => US [patent_app_date] => 2000-12-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 8762 [patent_no_of_claims] => 61 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 13 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0081/20020081520.pdf [firstpage_image] =>[orig_patent_app_number] => 09748071 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/748071
Substantially transparent aqueous base soluble polymer system for use in 157 nm resist applications Dec 20, 2000 Abandoned
Array ( [id] => 1376486 [patent_doc_number] => 06555288 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-04-29 [patent_title] => 'Optical devices made from radiation curable fluorinated compositions' [patent_app_type] => B1 [patent_app_number] => 09/745076 [patent_app_country] => US [patent_app_date] => 2000-12-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 18 [patent_figures_cnt] => 51 [patent_no_of_words] => 24259 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 52 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/555/06555288.pdf [firstpage_image] =>[orig_patent_app_number] => 09745076 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/745076
Optical devices made from radiation curable fluorinated compositions Dec 19, 2000 Issued
Array ( [id] => 7105333 [patent_doc_number] => 20010004510 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-06-21 [patent_title] => 'Refractory bilayer resist materials for lithography using highly attenuated radiation' [patent_app_type] => new-utility [patent_app_number] => 09/741450 [patent_app_country] => US [patent_app_date] => 2000-12-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 2320 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 7 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0004/20010004510.pdf [firstpage_image] =>[orig_patent_app_number] => 09741450 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/741450
Refractory bilayer resist materials for lithography using highly attenuated radiation Dec 18, 2000 Abandoned
Array ( [id] => 1192676 [patent_doc_number] => 06730451 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-05-04 [patent_title] => 'Polymers, chemical amplification resist compositions and patterning process' [patent_app_type] => B2 [patent_app_number] => 09/735521 [patent_app_country] => US [patent_app_date] => 2000-12-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8722 [patent_no_of_claims] => 30 [patent_no_of_ind_claims] => 10 [patent_words_short_claim] => 112 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/730/06730451.pdf [firstpage_image] =>[orig_patent_app_number] => 09735521 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/735521
Polymers, chemical amplification resist compositions and patterning process Dec 13, 2000 Issued
Array ( [id] => 1422893 [patent_doc_number] => 06503687 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-01-07 [patent_title] => 'Alicyclic photosensitive polymer, resist composition containing the same and method of preparing the resist composition' [patent_app_type] => B2 [patent_app_number] => 09/731896 [patent_app_country] => US [patent_app_date] => 2000-12-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3331 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 50 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/503/06503687.pdf [firstpage_image] =>[orig_patent_app_number] => 09731896 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/731896
Alicyclic photosensitive polymer, resist composition containing the same and method of preparing the resist composition Dec 7, 2000 Issued
Array ( [id] => 7040951 [patent_doc_number] => 20010005569 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-06-28 [patent_title] => 'Photosensitive resin composition' [patent_app_type] => new-utility [patent_app_number] => 09/730575 [patent_app_country] => US [patent_app_date] => 2000-12-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 6470 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 49 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0005/20010005569.pdf [firstpage_image] =>[orig_patent_app_number] => 09730575 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/730575
Photosensitive resin composition Dec 6, 2000 Abandoned
Array ( [id] => 6973847 [patent_doc_number] => 20010003772 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-06-14 [patent_title] => 'Polymer, resist composition and patterning process' [patent_app_type] => new-utility [patent_app_number] => 09/726592 [patent_app_country] => US [patent_app_date] => 2000-12-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 12493 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 17 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0003/20010003772.pdf [firstpage_image] =>[orig_patent_app_number] => 09726592 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/726592
Polymer, resist composition and patterning process Nov 30, 2000 Issued
Array ( [id] => 1287805 [patent_doc_number] => 06632581 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-10-14 [patent_title] => 'Chemically amplified positive resist composition' [patent_app_type] => B2 [patent_app_number] => 09/726476 [patent_app_country] => US [patent_app_date] => 2000-12-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4922 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 133 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/632/06632581.pdf [firstpage_image] =>[orig_patent_app_number] => 09726476 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/726476
Chemically amplified positive resist composition Nov 30, 2000 Issued
Array ( [id] => 1331064 [patent_doc_number] => 06596459 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-07-22 [patent_title] => 'Photosensitive polymer and resist composition containing the same' [patent_app_type] => B1 [patent_app_number] => 09/716269 [patent_app_country] => US [patent_app_date] => 2000-11-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4900 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 107 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/596/06596459.pdf [firstpage_image] =>[orig_patent_app_number] => 09716269 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/716269
Photosensitive polymer and resist composition containing the same Nov 20, 2000 Issued
Array ( [id] => 946507 [patent_doc_number] => 06964839 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2005-11-15 [patent_title] => 'Photosensitive polymer having cyclic backbone and resist composition containing the same' [patent_app_type] => utility [patent_app_number] => 09/715041 [patent_app_country] => US [patent_app_date] => 2000-11-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4104 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 29 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/964/06964839.pdf [firstpage_image] =>[orig_patent_app_number] => 09715041 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/715041
Photosensitive polymer having cyclic backbone and resist composition containing the same Nov 19, 2000 Issued
Array ( [id] => 1040446 [patent_doc_number] => 06869743 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2005-03-22 [patent_title] => 'Method of processing light-sensitive material' [patent_app_type] => utility [patent_app_number] => 09/712182 [patent_app_country] => US [patent_app_date] => 2000-11-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 12742 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 118 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/869/06869743.pdf [firstpage_image] =>[orig_patent_app_number] => 09712182 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/712182
Method of processing light-sensitive material Nov 14, 2000 Issued
Array ( [id] => 1409459 [patent_doc_number] => 06524765 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-02-25 [patent_title] => 'Polymer, resist composition and patterning process' [patent_app_type] => B1 [patent_app_number] => 09/711311 [patent_app_country] => US [patent_app_date] => 2000-11-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 12366 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 84 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/524/06524765.pdf [firstpage_image] =>[orig_patent_app_number] => 09711311 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/711311
Polymer, resist composition and patterning process Nov 13, 2000 Issued
Array ( [id] => 1415921 [patent_doc_number] => 06514666 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-02-04 [patent_title] => 'Photoresist monomers, polymers thereof and photoresist compositions containing it' [patent_app_type] => B1 [patent_app_number] => 09/703763 [patent_app_country] => US [patent_app_date] => 2000-11-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 2328 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 22 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/514/06514666.pdf [firstpage_image] =>[orig_patent_app_number] => 09703763 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/703763
Photoresist monomers, polymers thereof and photoresist compositions containing it Oct 31, 2000 Issued
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