
Maureen Gramaglia Passey
Examiner (ID: 334)
| Most Active Art Unit | 1716 |
| Art Unit(s) | 1763, 1716, 1792 |
| Total Applications | 553 |
| Issued Applications | 215 |
| Pending Applications | 11 |
| Abandoned Applications | 328 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 7442759
[patent_doc_number] => 20040163765
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-08-26
[patent_title] => 'Plasma reactor for manufacturing electronic components'
[patent_app_type] => new
[patent_app_number] => 10/373506
[patent_app_country] => US
[patent_app_date] => 2003-02-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 24
[patent_figures_cnt] => 24
[patent_no_of_words] => 3789
[patent_no_of_claims] => 9
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[patent_words_short_claim] => 148
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0163/20040163765.pdf
[firstpage_image] =>[orig_patent_app_number] => 10373506
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/373506 | Plasma reactor for manufacturing electronic components | Feb 24, 2003 | Abandoned |
Array
(
[id] => 6819651
[patent_doc_number] => 20030217812
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-11-27
[patent_title] => 'Plasma etching equipment and method for manufacturing semiconductor device'
[patent_app_type] => new
[patent_app_number] => 10/359164
[patent_app_country] => US
[patent_app_date] => 2003-02-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[pdf_file] => publications/A1/0217/20030217812.pdf
[firstpage_image] =>[orig_patent_app_number] => 10359164
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/359164 | Plasma etching equipment and method for manufacturing semiconductor device | Feb 5, 2003 | Abandoned |
Array
(
[id] => 6840444
[patent_doc_number] => 20030145791
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-08-07
[patent_title] => 'Thermal processing apparatus'
[patent_app_type] => new
[patent_app_number] => 10/359245
[patent_app_country] => US
[patent_app_date] => 2003-02-06
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[patent_drawing_sheets_cnt] => 10
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[pdf_file] => publications/A1/0145/20030145791.pdf
[firstpage_image] =>[orig_patent_app_number] => 10359245
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/359245 | Thermal processing apparatus | Feb 5, 2003 | Abandoned |
Array
(
[id] => 752963
[patent_doc_number] => 07018505
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-03-28
[patent_title] => 'Apparatus including chuck and matching box'
[patent_app_type] => utility
[patent_app_number] => 10/355777
[patent_app_country] => US
[patent_app_date] => 2003-01-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 3200
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[pdf_file] => patents/07/018/07018505.pdf
[firstpage_image] =>[orig_patent_app_number] => 10355777
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/355777 | Apparatus including chuck and matching box | Jan 30, 2003 | Issued |
Array
(
[id] => 6848815
[patent_doc_number] => 20030141017
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-07-31
[patent_title] => 'Plasma processing apparatus'
[patent_app_type] => new
[patent_app_number] => 10/354127
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[patent_app_date] => 2003-01-30
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0141/20030141017.pdf
[firstpage_image] =>[orig_patent_app_number] => 10354127
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/354127 | Plasma processing apparatus | Jan 29, 2003 | Abandoned |
Array
(
[id] => 6666459
[patent_doc_number] => 20030111442
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-06-19
[patent_title] => 'Method for controlling chamber inner wall surface of an inductively coupled plasma etching apparatus'
[patent_app_type] => new
[patent_app_number] => 10/353412
[patent_app_country] => US
[patent_app_date] => 2003-01-28
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[pdf_file] => publications/A1/0111/20030111442.pdf
[firstpage_image] =>[orig_patent_app_number] => 10353412
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/353412 | Method for controlling chamber inner wall surface of an inductively coupled plasma etching apparatus | Jan 27, 2003 | Abandoned |
Array
(
[id] => 7304631
[patent_doc_number] => 20040140291
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-07-22
[patent_title] => 'Copper etch'
[patent_app_type] => new
[patent_app_number] => 10/348057
[patent_app_country] => US
[patent_app_date] => 2003-01-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[pdf_file] => publications/A1/0140/20040140291.pdf
[firstpage_image] =>[orig_patent_app_number] => 10348057
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/348057 | Copper etch | Jan 19, 2003 | Abandoned |
Array
(
[id] => 7364132
[patent_doc_number] => 20040025791
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-02-12
[patent_title] => 'Etch chamber with dual frequency biasing sources and a single frequency plasma generating source'
[patent_app_type] => new
[patent_app_number] => 10/342575
[patent_app_country] => US
[patent_app_date] => 2003-01-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 5844
[patent_no_of_claims] => 25
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[pdf_file] => publications/A1/0025/20040025791.pdf
[firstpage_image] =>[orig_patent_app_number] => 10342575
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/342575 | Etch chamber with dual frequency biasing sources and a single frequency plasma generating source | Jan 13, 2003 | Abandoned |
Array
(
[id] => 6840844
[patent_doc_number] => 20030146191
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-08-07
[patent_title] => 'ETCHING METHOD FOR NICKEL-VANADIUM ALLOY'
[patent_app_type] => new
[patent_app_number] => 10/248335
[patent_app_country] => US
[patent_app_date] => 2003-01-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[pdf_file] => publications/A1/0146/20030146191.pdf
[firstpage_image] =>[orig_patent_app_number] => 10248335
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/248335 | ETCHING METHOD FOR NICKEL-VANADIUM ALLOY | Jan 9, 2003 | Abandoned |
Array
(
[id] => 993302
[patent_doc_number] => 06916401
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-07-12
[patent_title] => 'Adjustable segmented electrode apparatus and method'
[patent_app_type] => utility
[patent_app_number] => 10/339597
[patent_app_country] => US
[patent_app_date] => 2003-01-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[pdf_file] => patents/06/916/06916401.pdf
[firstpage_image] =>[orig_patent_app_number] => 10339597
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/339597 | Adjustable segmented electrode apparatus and method | Jan 9, 2003 | Issued |
Array
(
[id] => 6844976
[patent_doc_number] => 20030164143
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-09-04
[patent_title] => 'Batch-type remote plasma processing apparatus'
[patent_app_type] => new
[patent_app_number] => 10/339639
[patent_app_country] => US
[patent_app_date] => 2003-01-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
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[pdf_file] => publications/A1/0164/20030164143.pdf
[firstpage_image] =>[orig_patent_app_number] => 10339639
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/339639 | Batch-type remote plasma processing apparatus | Jan 8, 2003 | Abandoned |
Array
(
[id] => 6655004
[patent_doc_number] => 20030132199
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-07-17
[patent_title] => 'Wafer protection device'
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[firstpage_image] =>[orig_patent_app_number] => 10339034
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/339034 | Wafer protection device | Jan 7, 2003 | Abandoned |
Array
(
[id] => 756102
[patent_doc_number] => 07014732
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[patent_kind] => B2
[patent_issue_date] => 2006-03-21
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[firstpage_image] =>[orig_patent_app_number] => 10330433
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/330433 | Etching apparatus | Dec 29, 2002 | Issued |
Array
(
[id] => 7336317
[patent_doc_number] => 20040244690
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[patent_kind] => A1
[patent_issue_date] => 2004-12-09
[patent_title] => 'Surface treatment system and method thereof'
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[pdf_file] => publications/A1/0244/20040244690.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/486031 | Surface treatment system and method thereof | Dec 27, 2002 | Issued |
Array
(
[id] => 935200
[patent_doc_number] => 06974549
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[patent_issue_date] => 2005-12-13
[patent_title] => 'Method for forming fine grooves and stamper and structure with fine grooves'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/320683 | Method for forming fine grooves and stamper and structure with fine grooves | Dec 16, 2002 | Issued |
Array
(
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[patent_title] => 'Apparatus and method for shielding a wafer from charged particles during plasma etching'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/314497 | Apparatus and method for shielding a wafer from charged particles during plasma etching | Dec 5, 2002 | Abandoned |
Array
(
[id] => 6617906
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Array
(
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Array
(
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Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/307484 | Apparatus and method for improving electron ecceleration | Dec 1, 2002 | Abandoned |