
Motilewa Good Johnson
Examiner (ID: 18978, Phone: (571)272-7658 , Office: P/2616 )
| Most Active Art Unit | 2616 |
| Art Unit(s) | 2779, 2616, 2675, 2672, 2677, 2628, 2619, 2772, 2679 |
| Total Applications | 1213 |
| Issued Applications | 862 |
| Pending Applications | 101 |
| Abandoned Applications | 273 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 7074919
[patent_doc_number] => 20050148187
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-07-07
[patent_title] => 'Chemical mechanical polishing systems and methods for their use'
[patent_app_type] => utility
[patent_app_number] => 11/033068
[patent_app_country] => US
[patent_app_date] => 2005-01-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5851
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[pdf_file] => publications/A1/0148/20050148187.pdf
[firstpage_image] =>[orig_patent_app_number] => 11033068
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/033068 | Chemical mechanical polishing systems and methods for their use | Jan 9, 2005 | Issued |
Array
(
[id] => 6983483
[patent_doc_number] => 20050153553
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[patent_kind] => A1
[patent_issue_date] => 2005-07-14
[patent_title] => 'Etching method'
[patent_app_type] => utility
[patent_app_number] => 11/032393
[patent_app_country] => US
[patent_app_date] => 2005-01-10
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/032393 | Etching method | Jan 9, 2005 | Issued |
Array
(
[id] => 586206
[patent_doc_number] => 07435354
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-10-14
[patent_title] => 'Treatment method for surface of photoresist layer and method for forming patterned photoresist layer'
[patent_app_type] => utility
[patent_app_number] => 11/031824
[patent_app_country] => US
[patent_app_date] => 2005-01-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[pdf_file] => patents/07/435/07435354.pdf
[firstpage_image] =>[orig_patent_app_number] => 11031824
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/031824 | Treatment method for surface of photoresist layer and method for forming patterned photoresist layer | Jan 5, 2005 | Issued |
Array
(
[id] => 7037657
[patent_doc_number] => 20050157091
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-07-21
[patent_title] => 'Method for fabricating an enlarged fluid chamber'
[patent_app_type] => utility
[patent_app_number] => 11/030396
[patent_app_country] => US
[patent_app_date] => 2005-01-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
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[patent_no_of_words] => 3555
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[firstpage_image] =>[orig_patent_app_number] => 11030396
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/030396 | Method for fabricating an enlarged fluid chamber | Jan 5, 2005 | Abandoned |
Array
(
[id] => 7107619
[patent_doc_number] => 20050205210
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-09-22
[patent_title] => 'Advanced multi-pressure workpiece processing'
[patent_app_type] => utility
[patent_app_number] => 11/030362
[patent_app_country] => US
[patent_app_date] => 2005-01-05
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 11030362
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/030362 | Advanced multi-pressure workpiece processing | Jan 4, 2005 | Abandoned |
Array
(
[id] => 5724964
[patent_doc_number] => 20060055724
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-03-16
[patent_title] => 'Fluid ejection device structures and methods therefor'
[patent_app_type] => utility
[patent_app_number] => 11/026839
[patent_app_country] => US
[patent_app_date] => 2004-12-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
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[pdf_file] => publications/A1/0055/20060055724.pdf
[firstpage_image] =>[orig_patent_app_number] => 11026839
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/026839 | Fluid ejection device structures and methods therefor | Dec 29, 2004 | Issued |
Array
(
[id] => 7253917
[patent_doc_number] => 20050142886
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-06-30
[patent_title] => 'Method for forming a contact in semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 11/026288
[patent_app_country] => US
[patent_app_date] => 2004-12-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[pdf_file] => publications/A1/0142/20050142886.pdf
[firstpage_image] =>[orig_patent_app_number] => 11026288
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/026288 | Method for forming a contact in semiconductor device | Dec 29, 2004 | Abandoned |
Array
(
[id] => 5762843
[patent_doc_number] => 20060016782
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-01-26
[patent_title] => 'Methods and compositions for dicing through lithographic micro-machining'
[patent_app_type] => utility
[patent_app_number] => 11/026956
[patent_app_country] => US
[patent_app_date] => 2004-12-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[patent_no_of_words] => 6178
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[pdf_file] => publications/A1/0016/20060016782.pdf
[firstpage_image] =>[orig_patent_app_number] => 11026956
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/026956 | Methods and compositions for dicing through lithographic micro-machining | Dec 29, 2004 | Abandoned |
Array
(
[id] => 650953
[patent_doc_number] => 07112530
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-09-26
[patent_title] => 'Method of forming contact hole'
[patent_app_type] => utility
[patent_app_number] => 11/024662
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[pdf_file] => patents/07/112/07112530.pdf
[firstpage_image] =>[orig_patent_app_number] => 11024662
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/024662 | Method of forming contact hole | Dec 29, 2004 | Issued |
Array
(
[id] => 5652350
[patent_doc_number] => 20060138085
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-06-29
[patent_title] => 'Plasma etching method with reduced particles production'
[patent_app_type] => utility
[patent_app_number] => 11/022227
[patent_app_country] => US
[patent_app_date] => 2004-12-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
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[pdf_file] => publications/A1/0138/20060138085.pdf
[firstpage_image] =>[orig_patent_app_number] => 11022227
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/022227 | Plasma etching method with reduced particles production | Dec 22, 2004 | Abandoned |
Array
(
[id] => 32578
[patent_doc_number] => 07790618
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-09-07
[patent_title] => 'Selective slurry for chemical mechanical polishing'
[patent_app_type] => utility
[patent_app_number] => 11/019882
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[patent_app_date] => 2004-12-22
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[pdf_file] => patents/07/790/07790618.pdf
[firstpage_image] =>[orig_patent_app_number] => 11019882
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/019882 | Selective slurry for chemical mechanical polishing | Dec 21, 2004 | Issued |
Array
(
[id] => 6996852
[patent_doc_number] => 20050136630
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[patent_issue_date] => 2005-06-23
[patent_title] => 'Methods of forming a pattern for a semiconductor device'
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[firstpage_image] =>[orig_patent_app_number] => 11021072
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/021072 | Methods of forming a pattern for a semiconductor device | Dec 21, 2004 | Issued |
Array
(
[id] => 6993983
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[patent_title] => 'High-purity alkali etching solution for silicon wafers and use thereof'
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Array
(
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[firstpage_image] =>[orig_patent_app_number] => 11020545
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Array
(
[id] => 232395
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[patent_title] => 'Redox buffered hydrofluoric acid etchant for the reduction of galvanic attack during release etching of MEMS devices having noble material films'
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Array
(
[id] => 7185719
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/014081 | Capping layer for a semiconductor device and a method of fabrication | Dec 14, 2004 | Abandoned |
Array
(
[id] => 7144347
[patent_doc_number] => 20050118828
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[patent_title] => 'Method for removing photoresist'
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Array
(
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Array
(
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Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/993422 | Processing method for glass substrate, processed glass product and stress applying apparatus | Nov 18, 2004 | Issued |