
Nema O. Berezny
Examiner (ID: 12635)
| Most Active Art Unit | 2813 |
| Art Unit(s) | 2813 |
| Total Applications | 286 |
| Issued Applications | 250 |
| Pending Applications | 5 |
| Abandoned Applications | 31 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 4419792
[patent_doc_number] => 06177348
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-01-23
[patent_title] => 'Low temperature via fill using liquid phase transport'
[patent_app_type] => 1
[patent_app_number] => 9/009446
[patent_app_country] => US
[patent_app_date] => 1998-01-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 2412
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[patent_words_short_claim] => 143
[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/177/06177348.pdf
[firstpage_image] =>[orig_patent_app_number] => 009446
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/009446 | Low temperature via fill using liquid phase transport | Jan 19, 1998 | Issued |
Array
(
[id] => 4081085
[patent_doc_number] => 06054373
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-04-25
[patent_title] => 'Method of and apparatus for removing metallic impurities diffused in a semiconductor substrate'
[patent_app_type] => 1
[patent_app_number] => 9/006996
[patent_app_country] => US
[patent_app_date] => 1998-01-14
[patent_effective_date] => 0000-00-00
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/054/06054373.pdf
[firstpage_image] =>[orig_patent_app_number] => 006996
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/006996 | Method of and apparatus for removing metallic impurities diffused in a semiconductor substrate | Jan 13, 1998 | Issued |
Array
(
[id] => 4085980
[patent_doc_number] => 06017823
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-01-25
[patent_title] => 'Method of forming a MOS field effect transistor with improved gate side wall insulation films'
[patent_app_type] => 1
[patent_app_number] => 8/998626
[patent_app_country] => US
[patent_app_date] => 1997-12-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
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[patent_no_of_words] => 5832
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[pdf_file] => patents/06/017/06017823.pdf
[firstpage_image] =>[orig_patent_app_number] => 998626
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/998626 | Method of forming a MOS field effect transistor with improved gate side wall insulation films | Dec 28, 1997 | Issued |
Array
(
[id] => 4004759
[patent_doc_number] => 05960322
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-09-28
[patent_title] => 'Suppression of boron segregation for shallow source and drain junctions in semiconductors'
[patent_app_type] => 1
[patent_app_number] => 8/994308
[patent_app_country] => US
[patent_app_date] => 1997-12-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[patent_no_of_words] => 2155
[patent_no_of_claims] => 11
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/960/05960322.pdf
[firstpage_image] =>[orig_patent_app_number] => 994308
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/994308 | Suppression of boron segregation for shallow source and drain junctions in semiconductors | Dec 18, 1997 | Issued |
Array
(
[id] => 4152575
[patent_doc_number] => 06107109
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-08-22
[patent_title] => 'Method for fabricating a semiconductor interconnect with laser machined electrical paths through substrate'
[patent_app_type] => 1
[patent_app_number] => 8/993965
[patent_app_country] => US
[patent_app_date] => 1997-12-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[patent_no_of_words] => 9177
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[pdf_file] => patents/06/107/06107109.pdf
[firstpage_image] =>[orig_patent_app_number] => 993965
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/993965 | Method for fabricating a semiconductor interconnect with laser machined electrical paths through substrate | Dec 17, 1997 | Issued |
Array
(
[id] => 4107647
[patent_doc_number] => 06057211
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-05-02
[patent_title] => 'Method for manufacturing an integrated circuit arrangement'
[patent_app_type] => 1
[patent_app_number] => 8/990516
[patent_app_country] => US
[patent_app_date] => 1997-12-15
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/057/06057211.pdf
[firstpage_image] =>[orig_patent_app_number] => 990516
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/990516 | Method for manufacturing an integrated circuit arrangement | Dec 14, 1997 | Issued |
Array
(
[id] => 6276874
[patent_doc_number] => 20020106832
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-08-08
[patent_title] => 'METHOD AND APPARATUS FOR ATTACHING SOLDER MEMBERS TO A SUBSTRATE'
[patent_app_type] => new
[patent_app_number] => 08/964734
[patent_app_country] => US
[patent_app_date] => 1997-11-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
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[patent_no_of_words] => 7061
[patent_no_of_claims] => 47
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0106/20020106832.pdf
[firstpage_image] =>[orig_patent_app_number] => 08964734
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/964734 | METHOD AND APPARATUS FOR ATTACHING SOLDER MEMBERS TO A SUBSTRATE | Nov 4, 1997 | Abandoned |
Array
(
[id] => 4099626
[patent_doc_number] => 06066514
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-05-23
[patent_title] => 'Adhesion enhanced semiconductor die for mold compound packaging'
[patent_app_type] => 1
[patent_app_number] => 8/963395
[patent_app_country] => US
[patent_app_date] => 1997-11-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 2
[patent_no_of_words] => 1737
[patent_no_of_claims] => 18
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/066/06066514.pdf
[firstpage_image] =>[orig_patent_app_number] => 963395
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/963395 | Adhesion enhanced semiconductor die for mold compound packaging | Nov 2, 1997 | Issued |
Array
(
[id] => 4206842
[patent_doc_number] => 06027987
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-02-22
[patent_title] => 'Method of manufacturing a crystalline semiconductor'
[patent_app_type] => 1
[patent_app_number] => 8/962234
[patent_app_country] => US
[patent_app_date] => 1997-10-31
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/027/06027987.pdf
[firstpage_image] =>[orig_patent_app_number] => 962234
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/962234 | Method of manufacturing a crystalline semiconductor | Oct 30, 1997 | Issued |
Array
(
[id] => 4131814
[patent_doc_number] => 06146999
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-11-14
[patent_title] => 'Method for forming metal line of semiconductor device'
[patent_app_type] => 1
[patent_app_number] => 8/956387
[patent_app_country] => US
[patent_app_date] => 1997-10-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[patent_no_of_words] => 2249
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[pdf_file] => patents/06/146/06146999.pdf
[firstpage_image] =>[orig_patent_app_number] => 956387
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/956387 | Method for forming metal line of semiconductor device | Oct 22, 1997 | Issued |
Array
(
[id] => 3935655
[patent_doc_number] => 05972802
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-10-26
[patent_title] => 'Prevention of edge stain in silicon wafers by ozone dipping'
[patent_app_type] => 1
[patent_app_number] => 8/944542
[patent_app_country] => US
[patent_app_date] => 1997-10-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[pdf_file] => patents/05/972/05972802.pdf
[firstpage_image] =>[orig_patent_app_number] => 944542
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/944542 | Prevention of edge stain in silicon wafers by ozone dipping | Oct 6, 1997 | Issued |
Array
(
[id] => 4155589
[patent_doc_number] => 06114236
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-09-05
[patent_title] => 'Process for production of semiconductor device having an insulating film of low dielectric constant'
[patent_app_type] => 1
[patent_app_number] => 8/946224
[patent_app_country] => US
[patent_app_date] => 1997-10-07
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/114/06114236.pdf
[firstpage_image] =>[orig_patent_app_number] => 946224
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/946224 | Process for production of semiconductor device having an insulating film of low dielectric constant | Oct 6, 1997 | Issued |
Array
(
[id] => 4236326
[patent_doc_number] => 06143668
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-11-07
[patent_title] => 'KLXX technology with integrated passivation process, probe geometry and probing process'
[patent_app_type] => 1
[patent_app_number] => 8/941795
[patent_app_country] => US
[patent_app_date] => 1997-09-30
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[pdf_file] => patents/06/143/06143668.pdf
[firstpage_image] =>[orig_patent_app_number] => 941795
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/941795 | KLXX technology with integrated passivation process, probe geometry and probing process | Sep 29, 1997 | Issued |
Array
(
[id] => 4064315
[patent_doc_number] => 06008119
[patent_country] => US
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[patent_issue_date] => 1999-12-28
[patent_title] => 'Chemical-mechanical polishing of semiconductor wafers'
[patent_app_type] => 1
[patent_app_number] => 8/940762
[patent_app_country] => US
[patent_app_date] => 1997-09-30
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[pdf_file] => patents/06/008/06008119.pdf
[firstpage_image] =>[orig_patent_app_number] => 940762
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/940762 | Chemical-mechanical polishing of semiconductor wafers | Sep 29, 1997 | Issued |
Array
(
[id] => 4203506
[patent_doc_number] => 06013937
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-01-11
[patent_title] => 'Buffer layer for improving control of layer thickness'
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[patent_app_number] => 8/938196
[patent_app_country] => US
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[pdf_file] => patents/06/013/06013937.pdf
[firstpage_image] =>[orig_patent_app_number] => 938196
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/938196 | Buffer layer for improving control of layer thickness | Sep 25, 1997 | Issued |
Array
(
[id] => 3994622
[patent_doc_number] => 05918152
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-06-29
[patent_title] => 'Gap filling method using high pressure'
[patent_app_type] => 1
[patent_app_number] => 8/933368
[patent_app_country] => US
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[pdf_file] => patents/05/918/05918152.pdf
[firstpage_image] =>[orig_patent_app_number] => 933368
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/933368 | Gap filling method using high pressure | Sep 18, 1997 | Issued |
Array
(
[id] => 4168770
[patent_doc_number] => 06140163
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-10-31
[patent_title] => 'Method and apparatus for upper level substrate isolation integrated with bulk silicon'
[patent_app_type] => 1
[patent_app_number] => 8/893744
[patent_app_country] => US
[patent_app_date] => 1997-07-11
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/140/06140163.pdf
[firstpage_image] =>[orig_patent_app_number] => 893744
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/893744 | Method and apparatus for upper level substrate isolation integrated with bulk silicon | Jul 10, 1997 | Issued |
| 08/891438 | SEMICONDUCTOR WAFER FABRICATION | Jul 9, 1997 | Abandoned |
Array
(
[id] => 4234122
[patent_doc_number] => 06074935
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[patent_issue_date] => 2000-06-13
[patent_title] => 'Method of reducing the formation of watermarks on semiconductor wafers'
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[firstpage_image] =>[orig_patent_app_number] => 882057
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/882057 | Method of reducing the formation of watermarks on semiconductor wafers | Jun 24, 1997 | Issued |
Array
(
[id] => 4081422
[patent_doc_number] => 06054396
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-04-25
[patent_title] => 'Semiconductor processing method of reducing thickness depletion of a silicide layer at a junction of different underlying layers'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/868042 | Semiconductor processing method of reducing thickness depletion of a silicide layer at a junction of different underlying layers | Jun 2, 1997 | Issued |