
Nicole M. Barreca
Examiner (ID: 14576)
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1756 |
| Total Applications | 389 |
| Issued Applications | 279 |
| Pending Applications | 40 |
| Abandoned Applications | 70 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6692491
[patent_doc_number] => 20030039923
[patent_country] => US
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[patent_issue_date] => 2003-02-27
[patent_title] => 'Method of forming a pattern on a semiconductor wafer using an attenuated phase shifting reflective mask'
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[patent_app_number] => 09/940241
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[pdf_file] => publications/A1/0039/20030039923.pdf
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Array
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[patent_title] => 'Method of making an integrated circuit using a reflective mask'
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Array
(
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Array
(
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[patent_issue_date] => 2004-02-24
[patent_title] => 'Method for performing photolithography'
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Array
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Array
(
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[patent_title] => 'Antihalation compositions'
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Array
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[patent_title] => 'Self-aligned conductive line for cross-point magnetic memory integrated circuits'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/923266 | Self-aligned conductive line for cross-point magnetic memory integrated circuits | Aug 2, 2001 | Issued |
Array
(
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[patent_title] => 'Antireflective coating compositions'
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[patent_app_number] => 09/918399
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/918399 | Antireflective coating compositions | Jul 29, 2001 | Issued |
Array
(
[id] => 1269466
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[patent_title] => 'Resin, a double resin layer for extreme ultraviolet light (EUV) photolithography, and an extreme ultraviolet light (EUV) photolithography process'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/912057 | Resin, a double resin layer for extreme ultraviolet light (EUV) photolithography, and an extreme ultraviolet light (EUV) photolithography process | Jul 24, 2001 | Issued |
Array
(
[id] => 1227732
[patent_doc_number] => 06696222
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[patent_issue_date] => 2004-02-24
[patent_title] => 'Dual damascene process using metal hard mask'
[patent_app_type] => B2
[patent_app_number] => 09/910876
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Array
(
[id] => 6715735
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[patent_issue_date] => 2003-02-06
[patent_title] => 'Method of preparing optically imaged high performance photomasks'
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Array
(
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Array
(
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Array
(
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Array
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Array
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Array
(
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Array
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