
Nicole M. Barreca
Examiner (ID: 14576)
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1756 |
| Total Applications | 389 |
| Issued Applications | 279 |
| Pending Applications | 40 |
| Abandoned Applications | 70 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6884815
[patent_doc_number] => 20010038976
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-11-08
[patent_title] => 'Rinsing solution for lithography and method for processing substrate with the use of the same'
[patent_app_type] => new
[patent_app_number] => 09/877124
[patent_app_country] => US
[patent_app_date] => 2001-06-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 2720
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[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0038/20010038976.pdf
[firstpage_image] =>[orig_patent_app_number] => 09877124
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/877124 | Rinsing solution for lithography and method for processing substrate with the use of the same | Jun 10, 2001 | Issued |
Array
(
[id] => 1280103
[patent_doc_number] => 06641982
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-11-04
[patent_title] => 'Methodology to introduce metal and via openings'
[patent_app_type] => B2
[patent_app_number] => 09/878058
[patent_app_country] => US
[patent_app_date] => 2001-06-07
[patent_effective_date] => 0000-00-00
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[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/641/06641982.pdf
[firstpage_image] =>[orig_patent_app_number] => 09878058
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/878058 | Methodology to introduce metal and via openings | Jun 6, 2001 | Issued |
Array
(
[id] => 1302214
[patent_doc_number] => 06620575
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-09-16
[patent_title] => 'Construction of built-up structures on the surface of patterned masking used for polysilicon etch'
[patent_app_type] => B2
[patent_app_number] => 09/875069
[patent_app_country] => US
[patent_app_date] => 2001-06-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 13
[patent_no_of_words] => 7914
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/620/06620575.pdf
[firstpage_image] =>[orig_patent_app_number] => 09875069
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/875069 | Construction of built-up structures on the surface of patterned masking used for polysilicon etch | Jun 4, 2001 | Issued |
Array
(
[id] => 6444687
[patent_doc_number] => 20020177085
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-11-28
[patent_title] => 'Self-aligned photolithographic process for forming silicon-on-insulator devices'
[patent_app_type] => new
[patent_app_number] => 09/864056
[patent_app_country] => US
[patent_app_date] => 2001-05-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 2248
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[pdf_file] => publications/A1/0177/20020177085.pdf
[firstpage_image] =>[orig_patent_app_number] => 09864056
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/864056 | Self-aligned photolithographic process for forming silicon-on-insulator devices | May 22, 2001 | Abandoned |
| 09/807331 | Exposure apparatus | May 13, 2001 | Abandoned |
Array
(
[id] => 6047425
[patent_doc_number] => 20020168591
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-11-14
[patent_title] => 'Method for reducing silicide spiking in a gate'
[patent_app_type] => new
[patent_app_number] => 09/851578
[patent_app_country] => US
[patent_app_date] => 2001-05-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[pdf_file] => publications/A1/0168/20020168591.pdf
[firstpage_image] =>[orig_patent_app_number] => 09851578
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/851578 | Method for reducing silicide spiking in a gate | May 9, 2001 | Abandoned |
Array
(
[id] => 1369639
[patent_doc_number] => 06562553
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-05-13
[patent_title] => 'Lithographic printing method using a low surface energy layer'
[patent_app_type] => B2
[patent_app_number] => 09/881242
[patent_app_country] => US
[patent_app_date] => 2001-05-10
[patent_effective_date] => 0000-00-00
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/881242 | Lithographic printing method using a low surface energy layer | May 9, 2001 | Issued |
Array
(
[id] => 1046647
[patent_doc_number] => 06864041
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-03-08
[patent_title] => 'Gate linewidth tailoring and critical dimension control for sub-100 nm devices using plasma etching'
[patent_app_type] => utility
[patent_app_number] => 09/847479
[patent_app_country] => US
[patent_app_date] => 2001-05-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
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[pdf_file] => patents/06/864/06864041.pdf
[firstpage_image] =>[orig_patent_app_number] => 09847479
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/847479 | Gate linewidth tailoring and critical dimension control for sub-100 nm devices using plasma etching | May 1, 2001 | Issued |
Array
(
[id] => 5786854
[patent_doc_number] => 20020160314
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-10-31
[patent_title] => 'Method of improving astigmatism of a photoresist layer'
[patent_app_type] => new
[patent_app_number] => 09/840996
[patent_app_country] => US
[patent_app_date] => 2001-04-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
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[patent_no_of_words] => 2160
[patent_no_of_claims] => 18
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[pdf_file] => publications/A1/0160/20020160314.pdf
[firstpage_image] =>[orig_patent_app_number] => 09840996
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/840996 | Method of improving astigmatism of a photoresist layer | Apr 24, 2001 | Issued |
Array
(
[id] => 1326114
[patent_doc_number] => 06599682
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[patent_kind] => B2
[patent_issue_date] => 2003-07-29
[patent_title] => 'Method for forming a finely patterned photoresist layer'
[patent_app_type] => B2
[patent_app_number] => 09/839200
[patent_app_country] => US
[patent_app_date] => 2001-04-23
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[firstpage_image] =>[orig_patent_app_number] => 09839200
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/839200 | Method for forming a finely patterned photoresist layer | Apr 22, 2001 | Issued |
Array
(
[id] => 1296655
[patent_doc_number] => 06627387
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-09-30
[patent_title] => 'Method of photolithography'
[patent_app_type] => B2
[patent_app_number] => 09/827827
[patent_app_country] => US
[patent_app_date] => 2001-04-05
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[pdf_file] => patents/06/627/06627387.pdf
[firstpage_image] =>[orig_patent_app_number] => 09827827
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/827827 | Method of photolithography | Apr 4, 2001 | Issued |
Array
(
[id] => 7092751
[patent_doc_number] => 20010033975
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-10-25
[patent_title] => 'Yield of dies by adding dummy pattern on open area of multi-project mask'
[patent_app_type] => new
[patent_app_number] => 09/813935
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[patent_app_date] => 2001-03-22
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/813935 | Yield of dies by adding dummy pattern on open area of multi-project mask | Mar 21, 2001 | Abandoned |
Array
(
[id] => 1326104
[patent_doc_number] => 06599680
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[patent_kind] => B2
[patent_issue_date] => 2003-07-29
[patent_title] => 'Method for forming cells array of mask read only memory'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/811392 | Method for forming cells array of mask read only memory | Mar 19, 2001 | Issued |
Array
(
[id] => 1338261
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[patent_title] => 'Process for depositing and developing a plasma polymerized organosilicon photoresist film'
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Array
(
[id] => 5844054
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[patent_title] => 'Method for forming a contact pad'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/803882 | Method for forming a contact pad | Mar 12, 2001 | Abandoned |
Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/792969 | Three-dimensional microstructure | Feb 25, 2001 | Abandoned |
Array
(
[id] => 7041051
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[patent_title] => 'Method for removing photoresist layer'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/792570 | Method for removing photoresist layer | Feb 22, 2001 | Abandoned |
Array
(
[id] => 6275558
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[patent_title] => 'Two mask via pattern to improve pattern definition'
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Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/788612 | Process for filling apertures in a circuit board or chip carrier | Feb 20, 2001 | Issued |
Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/781462 | Nanolaminated thin film circuitry materials | Feb 11, 2001 | Issued |