Application number | Title of the application | Filing Date | Status |
---|
08/268092 | PHOTOPOLYMERISABLE COMPOSITIONS | Jun 27, 1994 | Abandoned |
Array
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[patent_doc_number] => 05580694
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[patent_issue_date] => 1996-12-03
[patent_title] => 'Photoresist composition with androstane and process for its use'
[patent_app_type] => 1
[patent_app_number] => 8/266044
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Array
(
[id] => 3590569
[patent_doc_number] => 05521054
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-05-28
[patent_title] => 'Developing solution comprising an aromatic hydrocarbon, an alcohol, and an ester'
[patent_app_type] => 1
[patent_app_number] => 8/265338
[patent_app_country] => US
[patent_app_date] => 1994-06-24
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/265338 | Developing solution comprising an aromatic hydrocarbon, an alcohol, and an ester | Jun 23, 1994 | Issued |
08/265033 | RESIST MATERIAL INCLUDING SI-CONTAINING RESIST HAVING ACID REMOVABLE GROUP COMBINED WITH PHOTO-ACID GENERATOR | Jun 23, 1994 | Abandoned |
08/258329 | SELF-CONTAINED IMAGING ASSEMBLY AND METHOD FOR FORMING IMAGES THEREIN | Jun 9, 1994 | Abandoned |
08/253071 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES AND A PROJECTION EXPOSURE METHOD COMPRISING THE STEPS OF EXPOSING A TWO-DIMENSIONAL GRID PATTERN OR PATTERNS TO RADIATION AND PROJECTING AN IMAGE OF THE PATTERN OR PATTERNS ONTO A WAFER AT DIFFERENT FOCAL POSITIONS THEREOF | Jun 1, 1994 | Abandoned |
Array
(
[id] => 3485948
[patent_doc_number] => 05474872
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1995-12-12
[patent_title] => 'Polyvinyl alcohol-based photoresist'
[patent_app_type] => 1
[patent_app_number] => 8/250530
[patent_app_country] => US
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[firstpage_image] =>[orig_patent_app_number] => 250530
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/250530 | Polyvinyl alcohol-based photoresist | May 30, 1994 | Issued |
08/248203 | METHOD FOR FORMING RESIST PATTERN BY IRRADIATING A RESIST COATING ON A SUBSTRATE, CONTACTING THE RESIST WITH ORGANIC SOLVENT VAPOR AND REMOVING THE IRRADIATED PORTION | May 23, 1994 | Abandoned |
Array
(
[id] => 3516232
[patent_doc_number] => 05506082
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-04-09
[patent_title] => 'Cross-linked polyvinyl butyral binder for organic photoconductor'
[patent_app_type] => 1
[patent_app_number] => 8/247807
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[pdf_file] => patents/05/506/05506082.pdf
[firstpage_image] =>[orig_patent_app_number] => 247807
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/247807 | Cross-linked polyvinyl butyral binder for organic photoconductor | May 22, 1994 | Issued |
Array
(
[id] => 3733092
[patent_doc_number] => 05698371
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-12-16
[patent_title] => 'Photosensitive polymer composition for flexographic printing plates processable in aqueous media'
[patent_app_type] => 1
[patent_app_number] => 8/242818
[patent_app_country] => US
[patent_app_date] => 1994-05-16
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/242818 | Photosensitive polymer composition for flexographic printing plates processable in aqueous media | May 15, 1994 | Issued |
Array
(
[id] => 3809112
[patent_doc_number] => 05854302
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-12-29
[patent_title] => 'Partially polymerized divinylsiloxane linked bisbenzocyclobutene resins and methods for making said resins'
[patent_app_type] => 1
[patent_app_number] => 8/224203
[patent_app_country] => US
[patent_app_date] => 1994-04-14
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[firstpage_image] =>[orig_patent_app_number] => 224203
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/224203 | Partially polymerized divinylsiloxane linked bisbenzocyclobutene resins and methods for making said resins | Apr 13, 1994 | Issued |
08/227759 | THREE COMPONENT RESIST COMPOSITION WITH DISSOLUTION INHIBITOR | Apr 13, 1994 | Abandoned |
Array
(
[id] => 3518060
[patent_doc_number] => 05529887
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-06-25
[patent_title] => 'Water soluble fluoride-containing solution for removing cured photoresist and solder resist mask'
[patent_app_type] => 1
[patent_app_number] => 8/219159
[patent_app_country] => US
[patent_app_date] => 1994-03-29
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/529/05529887.pdf
[firstpage_image] =>[orig_patent_app_number] => 219159
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/219159 | Water soluble fluoride-containing solution for removing cured photoresist and solder resist mask | Mar 28, 1994 | Issued |
08/204363 | PHOTOPOLYMERIZABLE COMPOSITIONS | Mar 10, 1994 | Abandoned |
08/208041 | PROJECTION EXPOSURE METHOD AND APPARATUS | Mar 8, 1994 | Abandoned |
Array
(
[id] => 3105782
[patent_doc_number] => 05407783
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1995-04-18
[patent_title] => 'Photoimageable compositions containing substituted 1, 2 dihalogenated ethanes for enhanced printout image'
[patent_app_type] => 1
[patent_app_number] => 8/205211
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/205211 | Photoimageable compositions containing substituted 1, 2 dihalogenated ethanes for enhanced printout image | Mar 8, 1994 | Issued |
Array
(
[id] => 3512823
[patent_doc_number] => 05512422
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-04-30
[patent_title] => 'Method of forming resist pattern and organic silane compound for forming anti-reflection film for use in such method'
[patent_app_type] => 1
[patent_app_number] => 8/205480
[patent_app_country] => US
[patent_app_date] => 1994-03-04
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[pdf_file] => patents/05/512/05512422.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/205480 | Method of forming resist pattern and organic silane compound for forming anti-reflection film for use in such method | Mar 3, 1994 | Issued |
Array
(
[id] => 3586001
[patent_doc_number] => 05516608
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-05-14
[patent_title] => 'Method for controlling a line dimension arising in photolithographic processes'
[patent_app_type] => 1
[patent_app_number] => 8/203212
[patent_app_country] => US
[patent_app_date] => 1994-02-28
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 203212
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/203212 | Method for controlling a line dimension arising in photolithographic processes | Feb 27, 1994 | Issued |
08/194149 | PRINTING OF REFLECTIVE SHEETING | Feb 8, 1994 | Abandoned |
08/190062 | PHOTOGRAHIC PROCESSING | Jan 27, 1994 | Abandoned |