Search

Noah P Kamen

Examiner (ID: 110)

Most Active Art Unit
3747
Art Unit(s)
3783, 3741, 3302, 3405, 3747, 3402, 2899, 1802
Total Applications
4075
Issued Applications
3515
Pending Applications
138
Abandoned Applications
425

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 6294240 [patent_doc_number] => 20100239977 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-09-23 [patent_title] => 'POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, PROTECTIVE FILM, INSULATING FILM, AND SEMICONDUCTOR DEVICE' [patent_app_type] => utility [patent_app_number] => 12/669565 [patent_app_country] => US [patent_app_date] => 2008-08-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 10009 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0239/20100239977.pdf [firstpage_image] =>[orig_patent_app_number] => 12669565 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/669565
Positive-type photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device Aug 7, 2008 Issued
Array ( [id] => 224737 [patent_doc_number] => 07604920 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-10-20 [patent_title] => 'Positive resist composition, method of forming resist pattern, polymeric compound, and compound' [patent_app_type] => utility [patent_app_number] => 12/186233 [patent_app_country] => US [patent_app_date] => 2008-08-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 27257 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 17 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/604/07604920.pdf [firstpage_image] =>[orig_patent_app_number] => 12186233 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/186233
Positive resist composition, method of forming resist pattern, polymeric compound, and compound Aug 4, 2008 Issued
Array ( [id] => 7751105 [patent_doc_number] => 08110333 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2012-02-07 [patent_title] => 'Resist composition containing novel sulfonium compound, pattern-forming method using the resist composition, and novel sulfonium compound' [patent_app_type] => utility [patent_app_number] => 12/184780 [patent_app_country] => US [patent_app_date] => 2008-08-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 26575 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 9 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/08/110/08110333.pdf [firstpage_image] =>[orig_patent_app_number] => 12184780 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/184780
Resist composition containing novel sulfonium compound, pattern-forming method using the resist composition, and novel sulfonium compound Jul 31, 2008 Issued
Array ( [id] => 5360899 [patent_doc_number] => 20090035693 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-02-05 [patent_title] => 'PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR CURED RELIEF PATTERN USING IT, AND SEMICONDUCTOR DEVICE' [patent_app_type] => utility [patent_app_number] => 12/182347 [patent_app_country] => US [patent_app_date] => 2008-07-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 12556 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0035/20090035693.pdf [firstpage_image] =>[orig_patent_app_number] => 12182347 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/182347
Photosensitive resin composition, production method for cured relief pattern using it, and semiconductor device Jul 29, 2008 Issued
Array ( [id] => 5360898 [patent_doc_number] => 20090035692 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-02-05 [patent_title] => 'POSITIVE RESIST COMPOSITION AND PATTERN FORMING MEHTOD' [patent_app_type] => utility [patent_app_number] => 12/181757 [patent_app_country] => US [patent_app_date] => 2008-07-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 33765 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0035/20090035692.pdf [firstpage_image] =>[orig_patent_app_number] => 12181757 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/181757
Positive resist composition and pattern forming method Jul 28, 2008 Issued
Array ( [id] => 216912 [patent_doc_number] => 07611822 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-11-03 [patent_title] => 'Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same' [patent_app_type] => utility [patent_app_number] => 12/219453 [patent_app_country] => US [patent_app_date] => 2008-07-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 11205 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 8 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/611/07611822.pdf [firstpage_image] =>[orig_patent_app_number] => 12219453 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/219453
Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same Jul 21, 2008 Issued
Array ( [id] => 5290363 [patent_doc_number] => 20090023093 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-01-22 [patent_title] => 'ACID-AMPLIFIER HAVING ACETAL GROUP AND PHOTORESIST COMPOSITION INCLUDING THE SAME' [patent_app_type] => utility [patent_app_number] => 12/174759 [patent_app_country] => US [patent_app_date] => 2008-07-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 4446 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0023/20090023093.pdf [firstpage_image] =>[orig_patent_app_number] => 12174759 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/174759
Acid-amplifier having acetal group and photoresist composition including the same Jul 16, 2008 Issued
Array ( [id] => 81132 [patent_doc_number] => 07745097 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-06-29 [patent_title] => 'Compound, manufacturing method thereof, acid generator, resist composition and method of forming resist pattern' [patent_app_type] => utility [patent_app_number] => 12/174293 [patent_app_country] => US [patent_app_date] => 2008-07-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 22452 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 11 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/745/07745097.pdf [firstpage_image] =>[orig_patent_app_number] => 12174293 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/174293
Compound, manufacturing method thereof, acid generator, resist composition and method of forming resist pattern Jul 15, 2008 Issued
Array ( [id] => 8968377 [patent_doc_number] => 08507187 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-08-13 [patent_title] => 'Multi-exposure lithography employing a single anti-reflective coating layer' [patent_app_type] => utility [patent_app_number] => 12/169888 [patent_app_country] => US [patent_app_date] => 2008-07-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 5653 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 197 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12169888 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/169888
Multi-exposure lithography employing a single anti-reflective coating layer Jul 8, 2008 Issued
Array ( [id] => 4960729 [patent_doc_number] => 20080275154 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-11-06 [patent_title] => 'Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition' [patent_app_type] => utility [patent_app_number] => 12/166449 [patent_app_country] => US [patent_app_date] => 2008-07-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 41889 [patent_no_of_claims] => 51 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0275/20080275154.pdf [firstpage_image] =>[orig_patent_app_number] => 12166449 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/166449
Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition Jul 1, 2008 Issued
Array ( [id] => 7527196 [patent_doc_number] => 08043788 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2011-10-25 [patent_title] => 'Resist composition and patterning process' [patent_app_type] => utility [patent_app_number] => 12/167151 [patent_app_country] => US [patent_app_date] => 2008-07-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 23229 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 51 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/08/043/08043788.pdf [firstpage_image] =>[orig_patent_app_number] => 12167151 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/167151
Resist composition and patterning process Jul 1, 2008 Issued
Array ( [id] => 4595361 [patent_doc_number] => 07981589 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2011-07-19 [patent_title] => 'Fluorinated monomer, fluorinated polymer, resist composition and patterning process' [patent_app_type] => utility [patent_app_number] => 12/146375 [patent_app_country] => US [patent_app_date] => 2008-06-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 19076 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 16 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/981/07981589.pdf [firstpage_image] =>[orig_patent_app_number] => 12146375 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/146375
Fluorinated monomer, fluorinated polymer, resist composition and patterning process Jun 24, 2008 Issued
Array ( [id] => 5349240 [patent_doc_number] => 20090004601 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-01-01 [patent_title] => 'Chemically amplified positive resist composition' [patent_app_type] => utility [patent_app_number] => 12/213800 [patent_app_country] => US [patent_app_date] => 2008-06-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10254 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0004/20090004601.pdf [firstpage_image] =>[orig_patent_app_number] => 12213800 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/213800
Chemically amplified positive resist composition Jun 23, 2008 Issued
Array ( [id] => 7502829 [patent_doc_number] => 08034547 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2011-10-11 [patent_title] => 'Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method' [patent_app_type] => utility [patent_app_number] => 12/145151 [patent_app_country] => US [patent_app_date] => 2008-06-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 11 [patent_no_of_words] => 29542 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 66 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/08/034/08034547.pdf [firstpage_image] =>[orig_patent_app_number] => 12145151 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/145151
Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method Jun 23, 2008 Issued
Array ( [id] => 81090 [patent_doc_number] => 07745077 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-06-29 [patent_title] => 'Composition for coating over a photoresist pattern' [patent_app_type] => utility [patent_app_number] => 12/141307 [patent_app_country] => US [patent_app_date] => 2008-06-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 8962 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 33 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/745/07745077.pdf [firstpage_image] =>[orig_patent_app_number] => 12141307 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/141307
Composition for coating over a photoresist pattern Jun 17, 2008 Issued
Array ( [id] => 4663481 [patent_doc_number] => 20080254388 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-10-16 [patent_title] => 'FLUORINATED POLYMER, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND PARTITION WALLS' [patent_app_type] => utility [patent_app_number] => 12/138648 [patent_app_country] => US [patent_app_date] => 2008-06-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 12578 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0254/20080254388.pdf [firstpage_image] =>[orig_patent_app_number] => 12138648 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/138648
Fluorinated polymer, negative photosensitive resin composition and partition walls Jun 12, 2008 Issued
Array ( [id] => 6416767 [patent_doc_number] => 20100167201 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-07-01 [patent_title] => 'RESIST COMPOSITION FOR NEGATIVE TONE DEVELOPMENT AND PATTERN FORMING METHOD USING THE SAME' [patent_app_type] => utility [patent_app_number] => 12/664117 [patent_app_country] => US [patent_app_date] => 2008-06-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 29764 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0167/20100167201.pdf [firstpage_image] =>[orig_patent_app_number] => 12664117 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/664117
Resist composition for negative tone development and pattern forming method using the same Jun 11, 2008 Issued
Array ( [id] => 6538571 [patent_doc_number] => 20100124718 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-05-20 [patent_title] => 'POLYMERIC COMPOUND, POSITIVE RESIST COMPOSITION, AND METHOD OF FORMING RESITS PATTERN' [patent_app_type] => utility [patent_app_number] => 12/451971 [patent_app_country] => US [patent_app_date] => 2008-06-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 16048 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0124/20100124718.pdf [firstpage_image] =>[orig_patent_app_number] => 12451971 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/451971
Polymeric compound, positive resist composition, and method of forming resist pattern Jun 10, 2008 Issued
Array ( [id] => 4531802 [patent_doc_number] => 07887990 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2011-02-15 [patent_title] => 'Fluorine-containing compound, fluorine-containing polymer, postive-type resist composition, and patterning process using same' [patent_app_type] => utility [patent_app_number] => 12/137145 [patent_app_country] => US [patent_app_date] => 2008-06-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 14402 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 15 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/887/07887990.pdf [firstpage_image] =>[orig_patent_app_number] => 12137145 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/137145
Fluorine-containing compound, fluorine-containing polymer, postive-type resist composition, and patterning process using same Jun 10, 2008 Issued
Array ( [id] => 4739861 [patent_doc_number] => 20080233514 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-09-25 [patent_title] => 'POSITIVE PHOTORESIST COMPOSITION WITH A POLYMER INCLUDING A FLUOROSULFONAMIDE GROUP AND PROCESS FOR ITS USE' [patent_app_type] => utility [patent_app_number] => 12/136163 [patent_app_country] => US [patent_app_date] => 2008-06-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 4051 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0233/20080233514.pdf [firstpage_image] =>[orig_patent_app_number] => 12136163 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/136163
Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use Jun 9, 2008 Issued
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