Search

Noah P Kamen

Examiner (ID: 110)

Most Active Art Unit
3747
Art Unit(s)
3783, 3741, 3302, 3405, 3747, 3402, 2899, 1802
Total Applications
4075
Issued Applications
3515
Pending Applications
138
Abandoned Applications
425

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 4719214 [patent_doc_number] => 20080241736 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-10-02 [patent_title] => 'RESIST COMPOSITION AND PATTERNING PROCESS' [patent_app_type] => utility [patent_app_number] => 12/053292 [patent_app_country] => US [patent_app_date] => 2008-03-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 23684 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0241/20080241736.pdf [firstpage_image] =>[orig_patent_app_number] => 12053292 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/053292
Resist composition and patterning process Mar 20, 2008 Issued
Array ( [id] => 259848 [patent_doc_number] => 07572570 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-08-11 [patent_title] => 'Chemically amplified resist composition' [patent_app_type] => utility [patent_app_number] => 12/052189 [patent_app_country] => US [patent_app_date] => 2008-03-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 11730 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 53 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/572/07572570.pdf [firstpage_image] =>[orig_patent_app_number] => 12052189 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/052189
Chemically amplified resist composition Mar 19, 2008 Issued
Array ( [id] => 9099343 [patent_doc_number] => 08563215 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-10-22 [patent_title] => 'Diazonaphthoquinonesulfonic acid bisphenol derivative useful in photo lithographic sub micron patterning and a process for preparation thereof' [patent_app_type] => utility [patent_app_number] => 12/532234 [patent_app_country] => US [patent_app_date] => 2008-03-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6992 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 9 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12532234 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/532234
Diazonaphthoquinonesulfonic acid bisphenol derivative useful in photo lithographic sub micron patterning and a process for preparation thereof Mar 19, 2008 Issued
Array ( [id] => 4682197 [patent_doc_number] => 20080248423 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-10-09 [patent_title] => 'Chemically amplified resist composition' [patent_app_type] => utility [patent_app_number] => 12/076529 [patent_app_country] => US [patent_app_date] => 2008-03-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 11512 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0248/20080248423.pdf [firstpage_image] =>[orig_patent_app_number] => 12076529 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/076529
Chemically amplified resist composition Mar 18, 2008 Issued
Array ( [id] => 1076813 [patent_doc_number] => 07615324 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-11-10 [patent_title] => 'Photosensitive composition, and cured relief pattern production method and semiconductor device using the same' [patent_app_type] => utility [patent_app_number] => 12/048530 [patent_app_country] => US [patent_app_date] => 2008-03-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 22356 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 44 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/615/07615324.pdf [firstpage_image] =>[orig_patent_app_number] => 12048530 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/048530
Photosensitive composition, and cured relief pattern production method and semiconductor device using the same Mar 13, 2008 Issued
Array ( [id] => 16031431 [patent_doc_number] => 10678132 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2020-06-09 [patent_title] => Resin for hydrophobilizing resist surface, method for production thereof, and positive resist composition containing the resin [patent_app_type] => utility [patent_app_number] => 12/048629 [patent_app_country] => US [patent_app_date] => 2008-03-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 29612 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 224 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12048629 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/048629
Resin for hydrophobilizing resist surface, method for production thereof, and positive resist composition containing the resin Mar 13, 2008 Issued
Array ( [id] => 6606971 [patent_doc_number] => 20100323292 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-12-23 [patent_title] => 'RESIST PATTERN FORMATION METHOD, AND RESIN COMPOSITION CAPABLE OF INSOLUBILIZING RESIST PATTERN' [patent_app_type] => utility [patent_app_number] => 12/526045 [patent_app_country] => US [patent_app_date] => 2008-03-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 20036 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0323/20100323292.pdf [firstpage_image] =>[orig_patent_app_number] => 12526045 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/526045
RESIST PATTERN FORMATION METHOD, AND RESIN COMPOSITION CAPABLE OF INSOLUBILIZING RESIST PATTERN Mar 10, 2008 Abandoned
Array ( [id] => 4764941 [patent_doc_number] => 20080176152 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-07-24 [patent_title] => 'Mask Patterns for Semiconductor Device Fabrication and Related Methods and Structures' [patent_app_type] => utility [patent_app_number] => 12/042625 [patent_app_country] => US [patent_app_date] => 2008-03-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 4891 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0176/20080176152.pdf [firstpage_image] =>[orig_patent_app_number] => 12042625 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/042625
Mask patterns for semiconductor device fabrication and related methods and structures Mar 4, 2008 Issued
Array ( [id] => 4698185 [patent_doc_number] => 20080220369 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-09-11 [patent_title] => 'CHEMICALLY AMPLIFIED RESIST COMPOSITION' [patent_app_type] => utility [patent_app_number] => 12/042242 [patent_app_country] => US [patent_app_date] => 2008-03-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 12087 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0220/20080220369.pdf [firstpage_image] =>[orig_patent_app_number] => 12042242 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/042242
CHEMICALLY AMPLIFIED RESIST COMPOSITION Mar 3, 2008 Abandoned
Array ( [id] => 4727129 [patent_doc_number] => 20080206671 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-08-28 [patent_title] => 'Novel polymers and photoresist compositions' [patent_app_type] => utility [patent_app_number] => 12/072790 [patent_app_country] => US [patent_app_date] => 2008-02-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 8012 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 8 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0206/20080206671.pdf [firstpage_image] =>[orig_patent_app_number] => 12072790 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/072790
Polymers and photoresist compositions Feb 27, 2008 Issued
Array ( [id] => 4727127 [patent_doc_number] => 20080206669 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-08-28 [patent_title] => 'POSITIVE WORKING RESIST COMPOSITION AND PATTERN FORMING METHOD' [patent_app_type] => utility [patent_app_number] => 12/037135 [patent_app_country] => US [patent_app_date] => 2008-02-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 22981 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0206/20080206669.pdf [firstpage_image] =>[orig_patent_app_number] => 12037135 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/037135
Positive working resist composition and pattern forming method Feb 25, 2008 Issued
Array ( [id] => 8446022 [patent_doc_number] => 08288072 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2012-10-16 [patent_title] => 'Resist lower layer film-formed substrate' [patent_app_type] => utility [patent_app_number] => 12/071806 [patent_app_country] => US [patent_app_date] => 2008-02-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 17642 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 43 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12071806 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/071806
Resist lower layer film-formed substrate Feb 25, 2008 Issued
Array ( [id] => 4792015 [patent_doc_number] => 20080292989 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-11-27 [patent_title] => 'POSITIVE WORKING PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME' [patent_app_type] => utility [patent_app_number] => 12/036519 [patent_app_country] => US [patent_app_date] => 2008-02-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 20376 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0292/20080292989.pdf [firstpage_image] =>[orig_patent_app_number] => 12036519 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/036519
POSITIVE WORKING PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME Feb 24, 2008 Abandoned
Array ( [id] => 4727126 [patent_doc_number] => 20080206668 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-08-28 [patent_title] => 'NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME' [patent_app_type] => utility [patent_app_number] => 12/036692 [patent_app_country] => US [patent_app_date] => 2008-02-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 23230 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0206/20080206668.pdf [firstpage_image] =>[orig_patent_app_number] => 12036692 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/036692
NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME Feb 24, 2008 Abandoned
Array ( [id] => 4873072 [patent_doc_number] => 20080199806 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-08-21 [patent_title] => 'PATTERNING PROCESS AND RESIST COMPOSITION' [patent_app_type] => utility [patent_app_number] => 12/029940 [patent_app_country] => US [patent_app_date] => 2008-02-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 18000 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0199/20080199806.pdf [firstpage_image] =>[orig_patent_app_number] => 12029940 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/029940
Patterning process and resist composition Feb 11, 2008 Issued
Array ( [id] => 341466 [patent_doc_number] => 07501224 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-03-10 [patent_title] => 'Compositions for use in forming a pattern and methods of forming a pattern' [patent_app_type] => utility [patent_app_number] => 12/025823 [patent_app_country] => US [patent_app_date] => 2008-02-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 7 [patent_no_of_words] => 5401 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 35 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/501/07501224.pdf [firstpage_image] =>[orig_patent_app_number] => 12025823 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/025823
Compositions for use in forming a pattern and methods of forming a pattern Feb 4, 2008 Issued
Array ( [id] => 8114221 [patent_doc_number] => 08158324 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2012-04-17 [patent_title] => 'Positive-type photosensitive resin composition' [patent_app_type] => utility [patent_app_number] => 12/449527 [patent_app_country] => US [patent_app_date] => 2008-02-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 18822 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 61 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/08/158/08158324.pdf [firstpage_image] =>[orig_patent_app_number] => 12449527 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/449527
Positive-type photosensitive resin composition Feb 4, 2008 Issued
Array ( [id] => 16758114 [patent_doc_number] => 10976659 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2021-04-13 [patent_title] => Photoresists comprising novolak resin blends [patent_app_type] => utility [patent_app_number] => 12/011534 [patent_app_country] => US [patent_app_date] => 2008-01-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 2620 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 164 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12011534 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/011534
Photoresists comprising novolak resin blends Jan 27, 2008 Issued
Array ( [id] => 4813243 [patent_doc_number] => 20080193874 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-08-14 [patent_title] => 'CHEMICALLY AMPLIFIED RESIST COMPOSITION' [patent_app_type] => utility [patent_app_number] => 12/021149 [patent_app_country] => US [patent_app_date] => 2008-01-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 18321 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0193/20080193874.pdf [firstpage_image] =>[orig_patent_app_number] => 12021149 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/021149
Chemically amplified resist composition Jan 27, 2008 Issued
Array ( [id] => 310890 [patent_doc_number] => 07527913 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-05-05 [patent_title] => 'Photoacid generators, photoresist composition including the same and method of forming pattern using the same' [patent_app_type] => utility [patent_app_number] => 12/011226 [patent_app_country] => US [patent_app_date] => 2008-01-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 7 [patent_no_of_words] => 8679 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 110 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/527/07527913.pdf [firstpage_image] =>[orig_patent_app_number] => 12011226 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/011226
Photoacid generators, photoresist composition including the same and method of forming pattern using the same Jan 23, 2008 Issued
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