Search

Noah P Kamen

Examiner (ID: 110)

Most Active Art Unit
3747
Art Unit(s)
3783, 3741, 3302, 3405, 3747, 3402, 2899, 1802
Total Applications
4075
Issued Applications
3515
Pending Applications
138
Abandoned Applications
425

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 5271422 [patent_doc_number] => 20090075198 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-03-19 [patent_title] => 'Photosensitive Polyimide Resin Composition' [patent_app_type] => utility [patent_app_number] => 12/226822 [patent_app_country] => US [patent_app_date] => 2008-01-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4499 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0075/20090075198.pdf [firstpage_image] =>[orig_patent_app_number] => 12226822 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/226822
Photosensitive polyimide resin composition Jan 22, 2008 Issued
Array ( [id] => 4482705 [patent_doc_number] => 07901871 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2011-03-08 [patent_title] => 'Composition containing a photoacid generator monomer, substrate coated with the composition, method for synthesizing a compound on a substrate using the composition, and microarray produced according to the method' [patent_app_type] => utility [patent_app_number] => 11/971440 [patent_app_country] => US [patent_app_date] => 2008-01-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 4093 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 22 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/901/07901871.pdf [firstpage_image] =>[orig_patent_app_number] => 11971440 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/971440
Composition containing a photoacid generator monomer, substrate coated with the composition, method for synthesizing a compound on a substrate using the composition, and microarray produced according to the method Jan 8, 2008 Issued
Array ( [id] => 5580827 [patent_doc_number] => 20090176173 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-07-09 [patent_title] => 'IONIC, ORGANIC PHOTOACID GENERATORS FOR DUV, MUV AND OPTICAL LITHOGRAPHY BASED ON PERACEPTOR-SUBSTITUTED AROMATIC ANIONS' [patent_app_type] => utility [patent_app_number] => 11/970731 [patent_app_country] => US [patent_app_date] => 2008-01-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 6629 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0176/20090176173.pdf [firstpage_image] =>[orig_patent_app_number] => 11970731 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/970731
Ionic, organic photoacid generators for DUV, MUV and optical lithography based on peraceptor-substituted aromatic anions Jan 7, 2008 Issued
Array ( [id] => 5580829 [patent_doc_number] => 20090176175 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-07-09 [patent_title] => 'PHOTOACID GENERATORS FOR EXTREME ULTRAVIOLET LITHOGRAPHY' [patent_app_type] => utility [patent_app_number] => 11/970827 [patent_app_country] => US [patent_app_date] => 2008-01-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 7219 [patent_no_of_claims] => 30 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0176/20090176175.pdf [firstpage_image] =>[orig_patent_app_number] => 11970827 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/970827
Photoacid generators for extreme ultraviolet lithography Jan 7, 2008 Issued
Array ( [id] => 295863 [patent_doc_number] => 07541132 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-06-02 [patent_title] => 'Chemically amplified resist material, topcoat film material and pattern formation method using the same' [patent_app_type] => utility [patent_app_number] => 11/968826 [patent_app_country] => US [patent_app_date] => 2008-01-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 24 [patent_no_of_words] => 4869 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 83 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/541/07541132.pdf [firstpage_image] =>[orig_patent_app_number] => 11968826 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/968826
Chemically amplified resist material, topcoat film material and pattern formation method using the same Jan 2, 2008 Issued
Array ( [id] => 4663479 [patent_doc_number] => 20080254386 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-10-16 [patent_title] => 'Positive resist composition and patterning process' [patent_app_type] => utility [patent_app_number] => 12/003834 [patent_app_country] => US [patent_app_date] => 2008-01-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 17547 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0254/20080254386.pdf [firstpage_image] =>[orig_patent_app_number] => 12003834 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/003834
Positive resist composition and patterning process Jan 1, 2008 Issued
Array ( [id] => 4873070 [patent_doc_number] => 20080199804 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-08-21 [patent_title] => 'POLYMERIZABLE COMPOSITION, LITHOGRAPHIC PRINTING PLATE PRECURSOR AND LITHOGRAPHIC PRINTING METHOD' [patent_app_type] => utility [patent_app_number] => 11/964125 [patent_app_country] => US [patent_app_date] => 2007-12-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 50065 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0199/20080199804.pdf [firstpage_image] =>[orig_patent_app_number] => 11964125 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/964125
Polymerizable composition, lithographic printing plate precursor and lithographic printing method Dec 25, 2007 Issued
Array ( [id] => 4764957 [patent_doc_number] => 20080176168 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-07-24 [patent_title] => 'CHEMICALLY AMPLIFIED RESIST COMPOSITION' [patent_app_type] => utility [patent_app_number] => 11/961867 [patent_app_country] => US [patent_app_date] => 2007-12-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 13938 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0176/20080176168.pdf [firstpage_image] =>[orig_patent_app_number] => 11961867 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/961867
CHEMICALLY AMPLIFIED RESIST COMPOSITION Dec 19, 2007 Abandoned
Array ( [id] => 266998 [patent_doc_number] => 07566522 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-07-28 [patent_title] => 'Chemically amplified resist composition' [patent_app_type] => utility [patent_app_number] => 12/000316 [patent_app_country] => US [patent_app_date] => 2007-12-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 15887 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 28 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/566/07566522.pdf [firstpage_image] =>[orig_patent_app_number] => 12000316 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/000316
Chemically amplified resist composition Dec 10, 2007 Issued
Array ( [id] => 5575333 [patent_doc_number] => 20090142695 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-06-04 [patent_title] => 'IMAGEABLE ELEMENTS WITH COMPONENTS HAVING 1H-TETRAZOLE GROUPS' [patent_app_type] => utility [patent_app_number] => 11/949810 [patent_app_country] => US [patent_app_date] => 2007-12-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 26478 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0142/20090142695.pdf [firstpage_image] =>[orig_patent_app_number] => 11949810 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/949810
Imageable elements with components having 1H-tetrazole groups Dec 3, 2007 Issued
Array ( [id] => 83055 [patent_doc_number] => 07741007 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-06-22 [patent_title] => 'Chemicallly amplified resist composition' [patent_app_type] => utility [patent_app_number] => 11/987672 [patent_app_country] => US [patent_app_date] => 2007-12-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 15897 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 15 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/741/07741007.pdf [firstpage_image] =>[orig_patent_app_number] => 11987672 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/987672
Chemicallly amplified resist composition Dec 2, 2007 Issued
Array ( [id] => 4938936 [patent_doc_number] => 20080076255 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-03-27 [patent_title] => 'MASK PATTERN FOR SEMICONDUCTOR DEVICE FABRICATION, METHOD OF FORMING THE SAME, METHOD FOR PREPARING COATING, COMPOSITION FOR FINE PATTERN FORMATION, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE' [patent_app_type] => utility [patent_app_number] => 11/949443 [patent_app_country] => US [patent_app_date] => 2007-12-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 12 [patent_no_of_words] => 11915 [patent_no_of_claims] => 62 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0076/20080076255.pdf [firstpage_image] =>[orig_patent_app_number] => 11949443 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/949443
Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating, composition for fine pattern formation, and method of fabricating semiconductor device Dec 2, 2007 Issued
Array ( [id] => 4825526 [patent_doc_number] => 20080124653 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-05-29 [patent_title] => 'Positive resist compositions and patterning process' [patent_app_type] => utility [patent_app_number] => 11/987333 [patent_app_country] => US [patent_app_date] => 2007-11-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 16443 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0124/20080124653.pdf [firstpage_image] =>[orig_patent_app_number] => 11987333 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/987333
Positive resist compositions and patterning process Nov 28, 2007 Issued
Array ( [id] => 23183 [patent_doc_number] => 07794916 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-09-14 [patent_title] => 'Positive photosensitive composition, polymer compound used for the positive photosensitive composition, production method of the polymer compound, and pattern forming method using the positive photosensitive composition' [patent_app_type] => utility [patent_app_number] => 11/943908 [patent_app_country] => US [patent_app_date] => 2007-11-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 18241 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 18 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/794/07794916.pdf [firstpage_image] =>[orig_patent_app_number] => 11943908 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/943908
Positive photosensitive composition, polymer compound used for the positive photosensitive composition, production method of the polymer compound, and pattern forming method using the positive photosensitive composition Nov 20, 2007 Issued
Array ( [id] => 7597813 [patent_doc_number] => 07618764 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-11-17 [patent_title] => 'Positive resist compositions and patterning process' [patent_app_type] => utility [patent_app_number] => 11/984608 [patent_app_country] => US [patent_app_date] => 2007-11-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 20908 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 55 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/618/07618764.pdf [firstpage_image] =>[orig_patent_app_number] => 11984608 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/984608
Positive resist compositions and patterning process Nov 19, 2007 Issued
Array ( [id] => 4825525 [patent_doc_number] => 20080124652 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-05-29 [patent_title] => 'Positive resist composition and patterning process' [patent_app_type] => utility [patent_app_number] => 11/984614 [patent_app_country] => US [patent_app_date] => 2007-11-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 17442 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0124/20080124652.pdf [firstpage_image] =>[orig_patent_app_number] => 11984614 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/984614
Positive resist composition and patterning process Nov 19, 2007 Issued
Array ( [id] => 5278458 [patent_doc_number] => 20090130590 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-05-21 [patent_title] => 'PHOTORESIST COMPOSITIONS AND PROCESS FOR MULTIPLE EXPOSURES WITH MULTIPLE LAYER PHOTORESIST SYSTEMS' [patent_app_type] => utility [patent_app_number] => 11/942062 [patent_app_country] => US [patent_app_date] => 2007-11-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 5889 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0130/20090130590.pdf [firstpage_image] =>[orig_patent_app_number] => 11942062 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/942062
Photoresist compositions and process for multiple exposures with multiple layer photoresist systems Nov 18, 2007 Issued
Array ( [id] => 6471027 [patent_doc_number] => 20100040977 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-02-18 [patent_title] => 'RADIATION-SENSITIVE RESIN COMPOSITION' [patent_app_type] => utility [patent_app_number] => 12/514212 [patent_app_country] => US [patent_app_date] => 2007-11-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 11261 [patent_no_of_claims] => 1 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0040/20100040977.pdf [firstpage_image] =>[orig_patent_app_number] => 12514212 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/514212
Radiation-sensitive resin composition Nov 8, 2007 Issued
Array ( [id] => 220836 [patent_doc_number] => 07608382 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-10-27 [patent_title] => 'Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers' [patent_app_type] => utility [patent_app_number] => 11/981617 [patent_app_country] => US [patent_app_date] => 2007-10-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 5 [patent_no_of_words] => 8124 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 40 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/608/07608382.pdf [firstpage_image] =>[orig_patent_app_number] => 11981617 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/981617
Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers Oct 30, 2007 Issued
Array ( [id] => 10517310 [patent_doc_number] => 09244355 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2016-01-26 [patent_title] => 'Compositions and processes for immersion lithography' [patent_app_type] => utility [patent_app_number] => 11/978910 [patent_app_country] => US [patent_app_date] => 2007-10-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10936 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 106 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 11978910 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/978910
Compositions and processes for immersion lithography Oct 29, 2007 Issued
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