
Noah P Kamen
Examiner (ID: 110)
| Most Active Art Unit | 3747 |
| Art Unit(s) | 3783, 3741, 3302, 3405, 3747, 3402, 2899, 1802 |
| Total Applications | 4075 |
| Issued Applications | 3515 |
| Pending Applications | 138 |
| Abandoned Applications | 425 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 4921842
[patent_doc_number] => 20080070157
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-03-20
[patent_title] => 'CYCLODEXTRIN DERIVATIVE, PHOTORESIST COMPOSITION INCLUDING THE CYCLODEXTRIN DERIVATIVE AND METHOD OF FORMING A PATTERN USING THE PHOTORESIST COMPOSITION'
[patent_app_type] => utility
[patent_app_number] => 11/853047
[patent_app_country] => US
[patent_app_date] => 2007-09-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 5346
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0070/20080070157.pdf
[firstpage_image] =>[orig_patent_app_number] => 11853047
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/853047 | Cyclodextrin derivative, photoresist composition including the cyclodextrin derivative and method of forming a pattern using the photoresist composition | Sep 10, 2007 | Issued |
Array
(
[id] => 4943969
[patent_doc_number] => 20080081294
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-04-03
[patent_title] => 'PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD OF CURED RELIEF PATTERN USING THE SAME AND SEMICONDUCTOR DEVICE'
[patent_app_type] => utility
[patent_app_number] => 11/851751
[patent_app_country] => US
[patent_app_date] => 2007-09-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 13968
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0081/20080081294.pdf
[firstpage_image] =>[orig_patent_app_number] => 11851751
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/851751 | Photosensitive resin composition, production method of cured relief pattern using the same and semiconductor device | Sep 6, 2007 | Issued |
Array
(
[id] => 6254131
[patent_doc_number] => 20100028816
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-02-04
[patent_title] => 'PROCESS FOR PREPARING A POLYMERIC RELIEF STRUCTURE'
[patent_app_type] => utility
[patent_app_number] => 12/438209
[patent_app_country] => US
[patent_app_date] => 2007-08-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 6590
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0028/20100028816.pdf
[firstpage_image] =>[orig_patent_app_number] => 12438209
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/438209 | PROCESS FOR PREPARING A POLYMERIC RELIEF STRUCTURE | Aug 27, 2007 | Abandoned |
Array
(
[id] => 5337188
[patent_doc_number] => 20090053652
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-02-26
[patent_title] => 'PHOTORESIST COMPOSITIONS'
[patent_app_type] => utility
[patent_app_number] => 11/844589
[patent_app_country] => US
[patent_app_date] => 2007-08-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 20630
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0053/20090053652.pdf
[firstpage_image] =>[orig_patent_app_number] => 11844589
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/844589 | Photoresist compositions | Aug 23, 2007 | Issued |
Array
(
[id] => 4771788
[patent_doc_number] => 20080057446
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-03-06
[patent_title] => 'Polyimide resin soluble in aqueous alkaline solution, composition comprising the resin and cured coating prepared from the composition'
[patent_app_type] => utility
[patent_app_number] => 11/892244
[patent_app_country] => US
[patent_app_date] => 2007-08-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6568
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0057/20080057446.pdf
[firstpage_image] =>[orig_patent_app_number] => 11892244
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/892244 | Polyimide resin soluble in aqueous alkaline solution, composition comprising the resin and cured coating prepared from the composition | Aug 20, 2007 | Issued |
Array
(
[id] => 4512838
[patent_doc_number] => 07910284
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-03-22
[patent_title] => 'Materials for photoresist, photoresist composition and method of forming resist pattern'
[patent_app_type] => utility
[patent_app_number] => 11/838951
[patent_app_country] => US
[patent_app_date] => 2007-08-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 38
[patent_no_of_words] => 8475
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 145
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/910/07910284.pdf
[firstpage_image] =>[orig_patent_app_number] => 11838951
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/838951 | Materials for photoresist, photoresist composition and method of forming resist pattern | Aug 14, 2007 | Issued |
Array
(
[id] => 9285920
[patent_doc_number] => 08642246
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-02-04
[patent_title] => 'Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof'
[patent_app_type] => utility
[patent_app_number] => 11/838854
[patent_app_country] => US
[patent_app_date] => 2007-08-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 7
[patent_no_of_words] => 15836
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 89
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 11838854
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/838854 | Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof | Aug 13, 2007 | Issued |
Array
(
[id] => 4938744
[patent_doc_number] => 20080076063
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-03-27
[patent_title] => 'Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same'
[patent_app_type] => utility
[patent_app_number] => 11/889353
[patent_app_country] => US
[patent_app_date] => 2007-08-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 11613
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0076/20080076063.pdf
[firstpage_image] =>[orig_patent_app_number] => 11889353
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/889353 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | Aug 9, 2007 | Issued |
Array
(
[id] => 5479837
[patent_doc_number] => 20090202794
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-08-13
[patent_title] => 'POSITIVE PHOTOSENSITIVE RESIN COMPOSITION'
[patent_app_type] => utility
[patent_app_number] => 12/309766
[patent_app_country] => US
[patent_app_date] => 2007-08-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 10460
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0202/20090202794.pdf
[firstpage_image] =>[orig_patent_app_number] => 12309766
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/309766 | Positive photosensitive resin composition | Aug 9, 2007 | Issued |
Array
(
[id] => 4771778
[patent_doc_number] => 20080057436
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-03-06
[patent_title] => 'PHOTOSENSITIVE POLYMER AND PHOTORESIST COMPOSITION'
[patent_app_type] => utility
[patent_app_number] => 11/836599
[patent_app_country] => US
[patent_app_date] => 2007-08-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 4605
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0057/20080057436.pdf
[firstpage_image] =>[orig_patent_app_number] => 11836599
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/836599 | Photosensitive polymer and photoresist composition | Aug 8, 2007 | Issued |
Array
(
[id] => 6470954
[patent_doc_number] => 20100040970
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-02-18
[patent_title] => 'POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN'
[patent_app_type] => utility
[patent_app_number] => 12/440447
[patent_app_country] => US
[patent_app_date] => 2007-08-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 16691
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0040/20100040970.pdf
[firstpage_image] =>[orig_patent_app_number] => 12440447
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/440447 | Positive resist composition and method of forming resist pattern | Aug 6, 2007 | Issued |
Array
(
[id] => 5416261
[patent_doc_number] => 20090042148
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-02-12
[patent_title] => 'Photoresist Composition for Deep UV and Process Thereof'
[patent_app_type] => utility
[patent_app_number] => 11/834490
[patent_app_country] => US
[patent_app_date] => 2007-08-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 14998
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0042/20090042148.pdf
[firstpage_image] =>[orig_patent_app_number] => 11834490
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/834490 | Photoresist Composition for Deep UV and Process Thereof | Aug 5, 2007 | Abandoned |
Array
(
[id] => 8270109
[patent_doc_number] => 08211614
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-07-03
[patent_title] => 'Photoresist composition and patterning method thereof'
[patent_app_type] => utility
[patent_app_number] => 12/376107
[patent_app_country] => US
[patent_app_date] => 2007-08-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 5
[patent_no_of_words] => 5588
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 80
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12376107
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/376107 | Photoresist composition and patterning method thereof | Aug 1, 2007 | Issued |
Array
(
[id] => 4943968
[patent_doc_number] => 20080081293
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-04-03
[patent_title] => 'Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same'
[patent_app_type] => utility
[patent_app_number] => 11/882084
[patent_app_country] => US
[patent_app_date] => 2007-07-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 15759
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0081/20080081293.pdf
[firstpage_image] =>[orig_patent_app_number] => 11882084
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/882084 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | Jul 29, 2007 | Issued |
Array
(
[id] => 4657470
[patent_doc_number] => 20080026331
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-01-31
[patent_title] => 'Lactone-containing compound, polymer, resist composition, and patterning process'
[patent_app_type] => utility
[patent_app_number] => 11/878759
[patent_app_country] => US
[patent_app_date] => 2007-07-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 22734
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0026/20080026331.pdf
[firstpage_image] =>[orig_patent_app_number] => 11878759
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/878759 | Lactone-containing compound, polymer, resist composition, and patterning process | Jul 25, 2007 | Issued |
Array
(
[id] => 4915535
[patent_doc_number] => 20080096135
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-04-24
[patent_title] => 'METHODS FOR FORMING PATTERNS OF A FILLED DIELECTRIC MATERIAL ON SUBSTRATES'
[patent_app_type] => utility
[patent_app_number] => 11/773586
[patent_app_country] => US
[patent_app_date] => 2007-07-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 11
[patent_no_of_words] => 5476
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0096/20080096135.pdf
[firstpage_image] =>[orig_patent_app_number] => 11773586
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/773586 | METHODS FOR FORMING PATTERNS OF A FILLED DIELECTRIC MATERIAL ON SUBSTRATES | Jul 4, 2007 | Abandoned |
Array
(
[id] => 4485980
[patent_doc_number] => 07902385
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-03-08
[patent_title] => 'Ester compounds and their preparation, polymers, resist compositions and patterning process'
[patent_app_type] => utility
[patent_app_number] => 11/822441
[patent_app_country] => US
[patent_app_date] => 2007-07-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 24293
[patent_no_of_claims] => 4
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 16
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/902/07902385.pdf
[firstpage_image] =>[orig_patent_app_number] => 11822441
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/822441 | Ester compounds and their preparation, polymers, resist compositions and patterning process | Jul 4, 2007 | Issued |
Array
(
[id] => 1076811
[patent_doc_number] => 07615322
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-11-10
[patent_title] => 'Photoresist composition and method of manufacturing a color filter substrate by using the same'
[patent_app_type] => utility
[patent_app_number] => 11/821411
[patent_app_country] => US
[patent_app_date] => 2007-06-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 6
[patent_no_of_words] => 5485
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 31
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/615/07615322.pdf
[firstpage_image] =>[orig_patent_app_number] => 11821411
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/821411 | Photoresist composition and method of manufacturing a color filter substrate by using the same | Jun 21, 2007 | Issued |
Array
(
[id] => 6416571
[patent_doc_number] => 20100167178
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-07-01
[patent_title] => 'Oxime sulfonates and the use thereof as latent acids'
[patent_app_type] => utility
[patent_app_number] => 12/308279
[patent_app_country] => US
[patent_app_date] => 2007-06-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 34451
[patent_no_of_claims] => 26
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0167/20100167178.pdf
[firstpage_image] =>[orig_patent_app_number] => 12308279
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/308279 | Oxime sulfonates and the use thereof as latent acids | Jun 14, 2007 | Abandoned |
Array
(
[id] => 4505835
[patent_doc_number] => 07914968
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-03-29
[patent_title] => 'Positive resist composition and method of forming resist pattern'
[patent_app_type] => utility
[patent_app_number] => 12/374474
[patent_app_country] => US
[patent_app_date] => 2007-06-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 16600
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 48
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/914/07914968.pdf
[firstpage_image] =>[orig_patent_app_number] => 12374474
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/374474 | Positive resist composition and method of forming resist pattern | Jun 7, 2007 | Issued |