
Noah P Kamen
Examiner (ID: 110)
| Most Active Art Unit | 3747 |
| Art Unit(s) | 3783, 3741, 3302, 3405, 3747, 3402, 2899, 1802 |
| Total Applications | 4075 |
| Issued Applications | 3515 |
| Pending Applications | 138 |
| Abandoned Applications | 425 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
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[patent_title] => 'Photo sensitive composition, pattern-forming method using the photosensitive composition and compound for use in the photosensitive composition'
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Array
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[patent_issue_date] => 2008-04-01
[patent_title] => 'Photoresist composition for deep ultraviolet lithography'
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Array
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[patent_title] => 'Photoresist composition for deep ultraviolet lithography'
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Array
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[patent_issue_date] => 2007-09-06
[patent_title] => 'Polymers, positive resist compositions and patterning process'
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Array
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Array
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Array
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[patent_issue_date] => 2009-02-05
[patent_title] => 'TERTIARY ALCOHOL DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION'
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[patent_app_number] => 12/279770
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Array
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Array
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[patent_title] => 'Photoactive Compounds'
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Array
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Array
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