
Noah P Kamen
Examiner (ID: 110)
| Most Active Art Unit | 3747 |
| Art Unit(s) | 3783, 3741, 3302, 3405, 3747, 3402, 2899, 1802 |
| Total Applications | 4075 |
| Issued Applications | 3515 |
| Pending Applications | 138 |
| Abandoned Applications | 425 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 5034578
[patent_doc_number] => 20070099117
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-05-03
[patent_title] => 'Sulfonamide compound, polymer compound, resist material and pattern formation method'
[patent_app_type] => utility
[patent_app_number] => 11/641654
[patent_app_country] => US
[patent_app_date] => 2006-12-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 10175
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0099/20070099117.pdf
[firstpage_image] =>[orig_patent_app_number] => 11641654
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/641654 | Sulfonamide compound, polymer compound, resist material and pattern formation method | Dec 19, 2006 | Issued |
Array
(
[id] => 4879649
[patent_doc_number] => 20080153032
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-06-26
[patent_title] => 'Photoactive Compounds'
[patent_app_type] => utility
[patent_app_number] => 11/613403
[patent_app_country] => US
[patent_app_date] => 2006-12-20
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 11613403
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/613403 | Photoactive compounds | Dec 19, 2006 | Issued |
Array
(
[id] => 852834
[patent_doc_number] => 07378215
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-05-27
[patent_title] => 'Positive photoresist composition'
[patent_app_type] => utility
[patent_app_number] => 11/637103
[patent_app_country] => US
[patent_app_date] => 2006-12-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_no_of_words] => 5728
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[firstpage_image] =>[orig_patent_app_number] => 11637103
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/637103 | Positive photoresist composition | Dec 11, 2006 | Issued |
Array
(
[id] => 6322632
[patent_doc_number] => 20100196823
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-08-05
[patent_title] => 'POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD OF FORMING RESIST PATTERN'
[patent_app_type] => utility
[patent_app_number] => 12/160957
[patent_app_country] => US
[patent_app_date] => 2006-12-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
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[patent_no_of_words] => 19597
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[pdf_file] => publications/A1/0196/20100196823.pdf
[firstpage_image] =>[orig_patent_app_number] => 12160957
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/160957 | Positive resist composition for immersion exposure and method of forming resist pattern | Dec 7, 2006 | Issued |
Array
(
[id] => 5490322
[patent_doc_number] => 20090291393
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-11-26
[patent_title] => 'POSITIVE PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN USING THE SAME'
[patent_app_type] => utility
[patent_app_number] => 12/095208
[patent_app_country] => US
[patent_app_date] => 2006-12-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[pdf_file] => publications/A1/0291/20090291393.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/095208 | POSITIVE PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN USING THE SAME | Dec 4, 2006 | Abandoned |
Array
(
[id] => 6505548
[patent_doc_number] => 20100216070
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-08-26
[patent_title] => 'Photosensitive Polyimides and Methods of Making the Same'
[patent_app_type] => utility
[patent_app_number] => 12/517501
[patent_app_country] => US
[patent_app_date] => 2006-12-04
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 12517501
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/517501 | Photosensitive Polyimides and Methods of Making the Same | Dec 3, 2006 | Abandoned |
Array
(
[id] => 5171690
[patent_doc_number] => 20070072122
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-03-29
[patent_title] => 'Photosensitive polymer composition, method of forming relief patterns, and electronic equipment'
[patent_app_type] => utility
[patent_app_number] => 11/605262
[patent_app_country] => US
[patent_app_date] => 2006-11-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[patent_no_of_words] => 18473
[patent_no_of_claims] => 11
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[pdf_file] => publications/A1/0072/20070072122.pdf
[firstpage_image] =>[orig_patent_app_number] => 11605262
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/605262 | Photosensitive polymer composition, method of forming relief patterns, and electronic equipment | Nov 28, 2006 | Issued |
Array
(
[id] => 8257411
[patent_doc_number] => 08206888
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-06-26
[patent_title] => 'Radiation-sensitive resin composition'
[patent_app_type] => utility
[patent_app_number] => 12/094820
[patent_app_country] => US
[patent_app_date] => 2006-11-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12094820
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/094820 | Radiation-sensitive resin composition | Nov 20, 2006 | Issued |
Array
(
[id] => 5432232
[patent_doc_number] => 20090166818
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-07-02
[patent_title] => 'Positive Photosensitive Resin Composition, and Semiconductor Device and Display Therewith'
[patent_app_type] => utility
[patent_app_number] => 12/085751
[patent_app_country] => US
[patent_app_date] => 2006-11-17
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[patent_drawing_sheets_cnt] => 2
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[pdf_file] => publications/A1/0166/20090166818.pdf
[firstpage_image] =>[orig_patent_app_number] => 12085751
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/085751 | Positive photosensitive resin composition, and semiconductor device and display therewith | Nov 16, 2006 | Issued |
Array
(
[id] => 4512845
[patent_doc_number] => 07910285
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-03-22
[patent_title] => 'Positive resist composition for immersion exposure and method of forming resist pattern'
[patent_app_type] => utility
[patent_app_number] => 12/162080
[patent_app_country] => US
[patent_app_date] => 2006-11-16
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/07/910/07910285.pdf
[firstpage_image] =>[orig_patent_app_number] => 12162080
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/162080 | Positive resist composition for immersion exposure and method of forming resist pattern | Nov 15, 2006 | Issued |
| 11/598263 | RADIATION CURABLE RESIN COMPOSITION | Nov 12, 2006 | Abandoned |
Array
(
[id] => 5502098
[patent_doc_number] => 20090162786
[patent_country] => US
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[patent_issue_date] => 2009-06-25
[patent_title] => 'POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN'
[patent_app_type] => utility
[patent_app_number] => 12/090826
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Array
(
[id] => 4634215
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[patent_issue_date] => 2011-09-06
[patent_title] => 'Light-sensitive component for use in photoresists'
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Array
(
[id] => 5016063
[patent_doc_number] => 20070259272
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[patent_title] => 'PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A THIN-FILM TRANSISTOR SUBSTRATE USING THE SAME'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/554194 | Photoresist composition and method of manufacturing a thin-film transistor substrate using the same | Oct 29, 2006 | Issued |
Array
(
[id] => 5106876
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[patent_title] => 'PLANOGRAPHIC PRINTING PLATE MATERIAL'
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Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/091122 | Positive photosensitive resin composition | Oct 19, 2006 | Issued |
Array
(
[id] => 376916
[patent_doc_number] => 07312016
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[patent_issue_date] => 2007-12-25
[patent_title] => 'Chemically amplified positive resist composition and patterning process'
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Array
(
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